JP2009540577A - 非接触印刷のための平面状試験基体 - Google Patents
非接触印刷のための平面状試験基体 Download PDFInfo
- Publication number
- JP2009540577A JP2009540577A JP2009514411A JP2009514411A JP2009540577A JP 2009540577 A JP2009540577 A JP 2009540577A JP 2009514411 A JP2009514411 A JP 2009514411A JP 2009514411 A JP2009514411 A JP 2009514411A JP 2009540577 A JP2009540577 A JP 2009540577A
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- Prior art keywords
- layer
- surface energy
- test substrate
- composition
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 39
- 238000012360 testing method Methods 0.000 title claims abstract description 37
- 238000002508 contact lithography Methods 0.000 title abstract description 5
- 239000007788 liquid Substances 0.000 claims abstract description 45
- 238000005259 measurement Methods 0.000 claims abstract description 29
- 239000010410 layer Substances 0.000 claims description 65
- 239000000463 material Substances 0.000 claims description 42
- 239000000203 mixture Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 23
- 238000007639 printing Methods 0.000 claims description 18
- 230000005855 radiation Effects 0.000 claims description 12
- 206010073306 Exposure to radiation Diseases 0.000 claims description 6
- 239000012044 organic layer Substances 0.000 claims description 6
- 238000012546 transfer Methods 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 239000011149 active material Substances 0.000 claims description 3
- 230000002745 absorbent Effects 0.000 claims description 2
- 239000002250 absorbent Substances 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 description 11
- 230000008901 benefit Effects 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000002987 primer (paints) Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- LVUBSVWMOWKPDJ-UHFFFAOYSA-N 4-methoxy-1,2-dimethylbenzene Chemical compound COC1=CC=C(C)C(C)=C1 LVUBSVWMOWKPDJ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000013386 optimize process Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/006—Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/003—Printing plates or foils; Materials therefor with ink abhesive means or abhesive forming means, such as abhesive siloxane or fluoro compounds, e.g. for dry lithographic printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Pest Control & Pesticides (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Printing Methods (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US81198806P | 2006-06-08 | 2006-06-08 | |
| PCT/US2007/013583 WO2007146170A2 (en) | 2006-06-08 | 2007-06-08 | Planar test substrate for non-contact printing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009540577A true JP2009540577A (ja) | 2009-11-19 |
| JP2009540577A5 JP2009540577A5 (https=) | 2010-07-22 |
Family
ID=38832424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009514411A Pending JP2009540577A (ja) | 2006-06-08 | 2007-06-08 | 非接触印刷のための平面状試験基体 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7838195B2 (https=) |
| EP (1) | EP2024179A2 (https=) |
| JP (1) | JP2009540577A (https=) |
| TW (1) | TW200807176A (https=) |
| WO (1) | WO2007146170A2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017003820A1 (en) * | 2015-06-30 | 2017-01-05 | 3M Innovative Properties Company | Patterned overcoat layer |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002164635A (ja) * | 2000-06-30 | 2002-06-07 | Seiko Epson Corp | 導電膜パターンの形成方法および電気光学装置、電子機器 |
| JP2003209339A (ja) * | 2001-11-06 | 2003-07-25 | Dainippon Printing Co Ltd | 導電性パターン形成体の製造方法 |
| JP2003309344A (ja) * | 2002-04-18 | 2003-10-31 | Dainippon Printing Co Ltd | 導電性パターン基材の製造方法 |
| WO2005000593A1 (en) * | 2003-06-27 | 2005-01-06 | 3M Innovative Properties Company | Method for preparing a patterned coating |
| JP2005223167A (ja) * | 2004-02-06 | 2005-08-18 | Shinko Electric Ind Co Ltd | 親水性処理方法及び配線パターンの形成方法 |
| JP2006049617A (ja) * | 2004-08-05 | 2006-02-16 | Ricoh Co Ltd | 電子素子、電子素子の製造方法、表示装置及び演算装置 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4003312A (en) | 1974-12-16 | 1977-01-18 | Xerox Corporation | Preparing waterless lithographic printing masters by ink jet printing |
| US4430403A (en) * | 1982-03-26 | 1984-02-07 | Am International, Inc. | Method of preparing a lithographic printing master |
| JPS62271741A (ja) | 1986-05-21 | 1987-11-26 | Matsushita Electric Ind Co Ltd | 印刷方法 |
| US4911003A (en) | 1988-04-22 | 1990-03-27 | Hewlett-Packard Company | Method and apparatus for measuring the print quality of print media receiving ink jet inks |
| DE3911934C2 (de) | 1989-04-12 | 1995-08-24 | Krause Biagosch Gmbh | Offsetdruckform und Verfahren zur Herstellung dieser Druckform |
| GB9516723D0 (en) | 1995-08-15 | 1995-10-18 | Horsell Plc | Water-less lithographic plates |
| DE69841945D1 (de) * | 1997-08-08 | 2010-11-25 | Dainippon Printing Co Ltd | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
| US6231988B1 (en) | 1997-09-18 | 2001-05-15 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and method of preparing lithographic printing plate using the same |
| JP3767768B2 (ja) | 1997-12-12 | 2006-04-19 | 富士写真フイルム株式会社 | ネガ型水なし平版印刷原版 |
| GB9806478D0 (en) * | 1998-03-27 | 1998-05-27 | Horsell Graphic Ind Ltd | Pattern formation |
| KR100877708B1 (ko) * | 2001-03-29 | 2009-01-07 | 다이니폰 인사츠 가부시키가이샤 | 패턴 형성체의 제조 방법 및 그것에 사용하는 포토마스크 |
| JP4165692B2 (ja) * | 2002-08-05 | 2008-10-15 | 大日本印刷株式会社 | エレクトロルミネッセント素子の製造方法 |
| JP4289852B2 (ja) * | 2002-09-18 | 2009-07-01 | 大日本印刷株式会社 | エレクトロルミネッセント素子の製造方法 |
-
2007
- 2007-06-07 US US11/759,286 patent/US7838195B2/en active Active
- 2007-06-08 TW TW096120918A patent/TW200807176A/zh unknown
- 2007-06-08 JP JP2009514411A patent/JP2009540577A/ja active Pending
- 2007-06-08 EP EP07795935A patent/EP2024179A2/en not_active Withdrawn
- 2007-06-08 WO PCT/US2007/013583 patent/WO2007146170A2/en not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002164635A (ja) * | 2000-06-30 | 2002-06-07 | Seiko Epson Corp | 導電膜パターンの形成方法および電気光学装置、電子機器 |
| JP2003209339A (ja) * | 2001-11-06 | 2003-07-25 | Dainippon Printing Co Ltd | 導電性パターン形成体の製造方法 |
| JP2003309344A (ja) * | 2002-04-18 | 2003-10-31 | Dainippon Printing Co Ltd | 導電性パターン基材の製造方法 |
| WO2005000593A1 (en) * | 2003-06-27 | 2005-01-06 | 3M Innovative Properties Company | Method for preparing a patterned coating |
| JP2005223167A (ja) * | 2004-02-06 | 2005-08-18 | Shinko Electric Ind Co Ltd | 親水性処理方法及び配線パターンの形成方法 |
| JP2006049617A (ja) * | 2004-08-05 | 2006-02-16 | Ricoh Co Ltd | 電子素子、電子素子の製造方法、表示装置及び演算装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007146170A3 (en) | 2008-04-17 |
| TW200807176A (en) | 2008-02-01 |
| US7838195B2 (en) | 2010-11-23 |
| US20080003523A1 (en) | 2008-01-03 |
| EP2024179A2 (en) | 2009-02-18 |
| WO2007146170A2 (en) | 2007-12-21 |
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