TW200807176A - Planar test substrate for non-contact printing - Google Patents
Planar test substrate for non-contact printing Download PDFInfo
- Publication number
- TW200807176A TW200807176A TW096120918A TW96120918A TW200807176A TW 200807176 A TW200807176 A TW 200807176A TW 096120918 A TW096120918 A TW 096120918A TW 96120918 A TW96120918 A TW 96120918A TW 200807176 A TW200807176 A TW 200807176A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- test substrate
- surface energy
- pattern
- liquid
- Prior art date
Links
- 238000012360 testing method Methods 0.000 title claims abstract description 39
- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 238000002508 contact lithography Methods 0.000 title abstract description 5
- 239000007788 liquid Substances 0.000 claims abstract description 42
- 238000005259 measurement Methods 0.000 claims abstract description 12
- 239000010410 layer Substances 0.000 claims description 68
- 239000000463 material Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 24
- 238000007639 printing Methods 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 238000011282 treatment Methods 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 7
- 239000011149 active material Substances 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 239000012044 organic layer Substances 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 4
- 206010073306 Exposure to radiation Diseases 0.000 claims description 3
- 238000011161 development Methods 0.000 claims description 3
- 239000011345 viscous material Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 12
- 239000000976 ink Substances 0.000 description 10
- 230000008901 benefit Effects 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- -1 nozzle design) Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- LBNXAWYDQUGHGX-UHFFFAOYSA-N 1-Phenylheptane Chemical compound CCCCCCCC1=CC=CC=C1 LBNXAWYDQUGHGX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- GFTHTFJJUYLMRF-UHFFFAOYSA-N CCCCCCCCCCC1=C(C=C(C=C1)OC)CCCCCCCCCC Chemical compound CCCCCCCCCCC1=C(C=C(C=C1)OC)CCCCCCCCCC GFTHTFJJUYLMRF-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 241001122767 Theaceae Species 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 210000004907 gland Anatomy 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000013386 optimize process Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007560 sedimentation technique Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/006—Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/003—Printing plates or foils; Materials therefor with ink abhesive means or abhesive forming means, such as abhesive siloxane or fluoro compounds, e.g. for dry lithographic printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Pest Control & Pesticides (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Printing Methods (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US81198806P | 2006-06-08 | 2006-06-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200807176A true TW200807176A (en) | 2008-02-01 |
Family
ID=38832424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096120918A TW200807176A (en) | 2006-06-08 | 2007-06-08 | Planar test substrate for non-contact printing |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7838195B2 (https=) |
| EP (1) | EP2024179A2 (https=) |
| JP (1) | JP2009540577A (https=) |
| TW (1) | TW200807176A (https=) |
| WO (1) | WO2007146170A2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017003820A1 (en) * | 2015-06-30 | 2017-01-05 | 3M Innovative Properties Company | Patterned overcoat layer |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4003312A (en) | 1974-12-16 | 1977-01-18 | Xerox Corporation | Preparing waterless lithographic printing masters by ink jet printing |
| US4430403A (en) * | 1982-03-26 | 1984-02-07 | Am International, Inc. | Method of preparing a lithographic printing master |
| JPS62271741A (ja) | 1986-05-21 | 1987-11-26 | Matsushita Electric Ind Co Ltd | 印刷方法 |
| US4911003A (en) | 1988-04-22 | 1990-03-27 | Hewlett-Packard Company | Method and apparatus for measuring the print quality of print media receiving ink jet inks |
| DE3911934C2 (de) | 1989-04-12 | 1995-08-24 | Krause Biagosch Gmbh | Offsetdruckform und Verfahren zur Herstellung dieser Druckform |
| GB9516723D0 (en) | 1995-08-15 | 1995-10-18 | Horsell Plc | Water-less lithographic plates |
| DE69841945D1 (de) * | 1997-08-08 | 2010-11-25 | Dainippon Printing Co Ltd | Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung |
| US6231988B1 (en) | 1997-09-18 | 2001-05-15 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and method of preparing lithographic printing plate using the same |
| JP3767768B2 (ja) | 1997-12-12 | 2006-04-19 | 富士写真フイルム株式会社 | ネガ型水なし平版印刷原版 |
| GB9806478D0 (en) * | 1998-03-27 | 1998-05-27 | Horsell Graphic Ind Ltd | Pattern formation |
| US6734029B2 (en) * | 2000-06-30 | 2004-05-11 | Seiko Epson Corporation | Method for forming conductive film pattern, and electro-optical device and electronic apparatus |
| KR100877708B1 (ko) * | 2001-03-29 | 2009-01-07 | 다이니폰 인사츠 가부시키가이샤 | 패턴 형성체의 제조 방법 및 그것에 사용하는 포토마스크 |
| JP4672233B2 (ja) * | 2001-11-06 | 2011-04-20 | 大日本印刷株式会社 | 導電性パターン形成体の製造方法 |
| JP2003309344A (ja) * | 2002-04-18 | 2003-10-31 | Dainippon Printing Co Ltd | 導電性パターン基材の製造方法 |
| JP4165692B2 (ja) * | 2002-08-05 | 2008-10-15 | 大日本印刷株式会社 | エレクトロルミネッセント素子の製造方法 |
| JP4289852B2 (ja) * | 2002-09-18 | 2009-07-01 | 大日本印刷株式会社 | エレクトロルミネッセント素子の製造方法 |
| US7175876B2 (en) * | 2003-06-27 | 2007-02-13 | 3M Innovative Properties Company | Patterned coating method employing polymeric coatings |
| JP2005223167A (ja) * | 2004-02-06 | 2005-08-18 | Shinko Electric Ind Co Ltd | 親水性処理方法及び配線パターンの形成方法 |
| JP4695360B2 (ja) * | 2004-08-05 | 2011-06-08 | 株式会社リコー | 電子素子の製造方法 |
-
2007
- 2007-06-07 US US11/759,286 patent/US7838195B2/en active Active
- 2007-06-08 TW TW096120918A patent/TW200807176A/zh unknown
- 2007-06-08 JP JP2009514411A patent/JP2009540577A/ja active Pending
- 2007-06-08 EP EP07795935A patent/EP2024179A2/en not_active Withdrawn
- 2007-06-08 WO PCT/US2007/013583 patent/WO2007146170A2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009540577A (ja) | 2009-11-19 |
| WO2007146170A3 (en) | 2008-04-17 |
| US7838195B2 (en) | 2010-11-23 |
| US20080003523A1 (en) | 2008-01-03 |
| EP2024179A2 (en) | 2009-02-18 |
| WO2007146170A2 (en) | 2007-12-21 |
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