JP2009533377A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009533377A5 JP2009533377A5 JP2009504692A JP2009504692A JP2009533377A5 JP 2009533377 A5 JP2009533377 A5 JP 2009533377A5 JP 2009504692 A JP2009504692 A JP 2009504692A JP 2009504692 A JP2009504692 A JP 2009504692A JP 2009533377 A5 JP2009533377 A5 JP 2009533377A5
- Authority
- JP
- Japan
- Prior art keywords
- substituted
- interrupted
- alkyl
- hydrogen
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims description 19
- 239000002253 acid Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims 12
- 229910052739 hydrogen Inorganic materials 0.000 claims 11
- 239000001257 hydrogen Substances 0.000 claims 11
- 150000002431 hydrogen Chemical class 0.000 claims 9
- 229910052717 sulfur Inorganic materials 0.000 claims 9
- 125000000753 cycloalkyl group Chemical group 0.000 claims 8
- 229910052760 oxygen Inorganic materials 0.000 claims 8
- 238000000576 coating method Methods 0.000 claims 7
- 125000003118 aryl group Chemical group 0.000 claims 5
- 229910052736 halogen Inorganic materials 0.000 claims 5
- 150000002367 halogens Chemical class 0.000 claims 5
- 238000007639 printing Methods 0.000 claims 5
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 4
- 125000003342 alkenyl group Chemical group 0.000 claims 4
- 239000008199 coating composition Substances 0.000 claims 4
- 125000000392 cycloalkenyl group Chemical group 0.000 claims 4
- 239000000976 ink Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 239000000853 adhesive Substances 0.000 claims 2
- 230000001070 adhesive effect Effects 0.000 claims 2
- 150000001449 anionic compounds Chemical class 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 150000001767 cationic compounds Chemical group 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 2
- 238000009472 formulation Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 150000002891 organic anions Chemical class 0.000 claims 2
- 150000002892 organic cations Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 239000000843 powder Substances 0.000 claims 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims 2
- 229920002554 vinyl polymer Polymers 0.000 claims 2
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims 1
- 229910017008 AsF 6 Inorganic materials 0.000 claims 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 claims 1
- 229910018286 SbF 6 Inorganic materials 0.000 claims 1
- 239000003377 acid catalyst Substances 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000011350 dental composite resin Substances 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000007641 inkjet printing Methods 0.000 claims 1
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 claims 1
- 230000000269 nucleophilic effect Effects 0.000 claims 1
- -1 o- phenylene Chemical group 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 claims 1
- GJVFBWCTGUSGDD-UHFFFAOYSA-L pentamethonium bromide Chemical compound [Br-].[Br-].C[N+](C)(C)CCCCC[N+](C)(C)C GJVFBWCTGUSGDD-UHFFFAOYSA-L 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000006120 scratch resistant coating Substances 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 claims 1
- 150000007513 acids Chemical class 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06112602.5 | 2006-04-13 | ||
| EP06112602 | 2006-04-13 | ||
| PCT/EP2007/053280 WO2007118794A1 (en) | 2006-04-13 | 2007-04-04 | Sulphonium salt initiators |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009533377A JP2009533377A (ja) | 2009-09-17 |
| JP2009533377A5 true JP2009533377A5 (enExample) | 2010-05-20 |
| JP5313873B2 JP5313873B2 (ja) | 2013-10-09 |
Family
ID=36703163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009504692A Active JP5313873B2 (ja) | 2006-04-13 | 2007-04-04 | スルホニウム塩開始剤 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8067643B2 (enExample) |
| EP (1) | EP2007834B1 (enExample) |
| JP (1) | JP5313873B2 (enExample) |
| KR (1) | KR101389057B1 (enExample) |
| CN (1) | CN101466804B (enExample) |
| TW (1) | TWI404699B (enExample) |
| WO (1) | WO2007118794A1 (enExample) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5290183B2 (ja) | 2006-10-04 | 2013-09-18 | チバ ホールディング インコーポレーテッド | スルホニウム塩光開始剤 |
| JP5538229B2 (ja) | 2007-10-10 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | スルホニウム塩開始剤 |
| CN101952269B (zh) | 2007-10-10 | 2014-06-25 | 巴斯夫欧洲公司 | 锍盐引发剂 |
| US8512934B2 (en) | 2007-10-10 | 2013-08-20 | Basf Se | Sulphonium salt initiators |
| KR20110025211A (ko) * | 2008-06-12 | 2011-03-09 | 바스프 에스이 | 술포늄 유도체 및 잠재성 산으로서의 그의 용도 |
| JP5247396B2 (ja) * | 2008-07-02 | 2013-07-24 | 日本化薬株式会社 | Ｍｅｍｓ用感光性樹脂組成物及びその硬化物 |
| EP2349993B1 (en) * | 2008-10-20 | 2012-12-12 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| EP2199856B1 (en) | 2008-12-18 | 2013-08-07 | Agfa Graphics N.V. | Cationic radiation curable compositions |
| GB0823282D0 (en) * | 2008-12-20 | 2009-01-28 | Univ Strathclyde | Dose responsive UV indicator |
| US8617787B2 (en) * | 2009-02-20 | 2013-12-31 | San-Apro, Ltd. | Sulfonium salt, photo-acid generator, and photosensitive resin composition |
| EP2438122A1 (en) * | 2009-06-02 | 2012-04-11 | Massachusetts Institute of Technology | Coatings |
| JP5387181B2 (ja) * | 2009-07-08 | 2014-01-15 | 信越化学工業株式会社 | スルホニウム塩、レジスト材料及びパターン形成方法 |
| KR101821426B1 (ko) * | 2009-12-17 | 2018-01-23 | 디에스엠 아이피 어셋츠 비.브이. | 기판-기재 적층식 제작 공정 |
| CN102781911B (zh) | 2010-02-24 | 2015-07-22 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| TWI523882B (zh) | 2010-07-14 | 2016-03-01 | 日本化藥股份有限公司 | 感光性樹脂組成物及其硬化物 |
| US8394575B2 (en) * | 2010-09-30 | 2013-03-12 | Lexmark International, Inc. | Formulations for environmentally friendly photoresist film layers |
| KR20140007797A (ko) * | 2010-10-07 | 2014-01-20 | 도오꾜오까고오교 가부시끼가이샤 | 가이드 패턴 형성용 네거티브형 현상용 레지스트 조성물, 가이드 패턴 형성 방법, 블록 코폴리머를 포함하는 층의 패턴 형성 방법 |
| JP5691987B2 (ja) * | 2010-10-13 | 2015-04-01 | 信越化学工業株式会社 | 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜 |
| JP5749631B2 (ja) * | 2010-12-07 | 2015-07-15 | 東京応化工業株式会社 | 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法 |
| US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| GB201223064D0 (en) * | 2012-12-20 | 2013-02-06 | Rainbow Technology Systems Ltd | Curable coatings for photoimaging |
| CN107207456B (zh) | 2015-02-02 | 2021-05-04 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| US10604659B2 (en) | 2015-06-08 | 2020-03-31 | Dsm Ip Assets B.V. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
| JP6880416B2 (ja) | 2015-10-01 | 2021-06-02 | ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． | 付加造形用液状ハイブリッドＵＶ／ｖｉｓ線硬化性樹脂組成物 |
| JP2018536731A (ja) | 2015-11-17 | 2018-12-13 | ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． | 改善された付加造形用アンチモンフリー放射線硬化性組成物およびインベストメント鋳造プロセスにおけるその用途 |
| EP3492476A4 (en) * | 2016-07-28 | 2020-03-18 | San-Apro Ltd. | SULFONIUM SALT, HEAT OR PHOTO-ACID GENERATOR, THERMOSETTING OR PHOTOSETTING COMPOSITION, AND CORRESPONDING HARDENED PRODUCT |
| CN107698477B (zh) | 2016-08-08 | 2020-05-12 | 常州强力电子新材料股份有限公司 | 一种新型阳离子型光引发剂及其制备方法和应用 |
| CN109843853B (zh) * | 2016-10-17 | 2022-09-20 | 东洋合成工业株式会社 | 组合物和使用该组合物的设备的制造方法 |
| CN109135392B (zh) * | 2017-06-15 | 2021-11-02 | 常州强力电子新材料股份有限公司 | 一种双硫鎓盐光引发剂 |
| CN109134710B (zh) * | 2017-06-15 | 2021-08-03 | 常州强力电子新材料股份有限公司 | 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用 |
| CN109134711B (zh) * | 2017-06-15 | 2021-08-03 | 常州强力电子新材料股份有限公司 | 一种硫鎓盐光引发剂及其制备与应用 |
| CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
| CN110922346A (zh) * | 2019-11-12 | 2020-03-27 | 上海鑫响实业有限公司 | 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法 |
| EP4122915A4 (en) | 2020-03-17 | 2023-09-06 | San-Apro Ltd. | Sulfonium salt, photoacid generator, curable composition, and resist composition |
| JP7702796B2 (ja) * | 2020-04-22 | 2025-07-04 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7716899B2 (ja) * | 2020-07-16 | 2025-08-01 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7716900B2 (ja) * | 2020-07-16 | 2025-08-01 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7758495B2 (ja) * | 2020-08-03 | 2025-10-22 | 住友化学株式会社 | 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法 |
| JP7713327B2 (ja) * | 2020-08-03 | 2025-07-25 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3488378A (en) | 1966-04-06 | 1970-01-06 | Dow Chemical Co | Complexes of organic sulfoxides and hydrogen chloride and related sulfonium salts |
| US4197174A (en) * | 1979-03-14 | 1980-04-08 | American Can Company | Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6 |
| US4201640A (en) * | 1979-03-14 | 1980-05-06 | American Can Company | Method for producing bis-[4-(diphenylsulfonio)phenyl] sulfide bis-M.X6 |
| ZA805273B (en) | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
| US4451409A (en) | 1982-02-08 | 1984-05-29 | The Dow Chemical Company | Sulfonium organosulfonates |
| US4694029A (en) * | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
| CA2034400A1 (en) * | 1990-04-30 | 1991-10-31 | James Vincent Crivello | Method for making triarylsulfonium hexafluorometal or metalloid salts |
| DE4211060A1 (de) | 1992-04-03 | 1993-10-07 | Roehm Gmbh | Polymerprodukte zur Behandlung von Leder |
| US5254760A (en) | 1992-07-29 | 1993-10-19 | Ciba-Geigy Corporation | Inhibiting polymerization of vinyl aromatic monomers |
| US5554664A (en) | 1995-03-06 | 1996-09-10 | Minnesota Mining And Manufacturing Company | Energy-activatable salts with fluorocarbon anions |
| JPH10287643A (ja) * | 1997-04-10 | 1998-10-27 | Nippon Kayaku Co Ltd | 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
| JP4204113B2 (ja) | 1997-12-04 | 2009-01-07 | 株式会社Ａｄｅｋａ | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
| US5973020A (en) | 1998-01-06 | 1999-10-26 | Rhodia Inc. | Photoinitiator composition including hindered amine stabilizer |
| US5998092A (en) | 1998-05-27 | 1999-12-07 | Clariant International, Ltd. | Water soluble negative-working photoresist composition |
| US6337426B1 (en) | 1998-11-23 | 2002-01-08 | Nalco/Exxon Energy Chemicals, L.P. | Antifoulant compositions and processes |
| US6444733B1 (en) | 1999-03-01 | 2002-09-03 | Ciba Specialty Chemicals Corporation | Stabilizer combination for the rotomolding process |
| WO2002048101A1 (fr) | 2000-12-15 | 2002-06-20 | San-Apro Limited | Methode de production de sel de sulfonium |
| US6468595B1 (en) | 2001-02-13 | 2002-10-22 | Sigma Technologies International, Inc. | Vaccum deposition of cationic polymer systems |
| US6696216B2 (en) * | 2001-06-29 | 2004-02-24 | International Business Machines Corporation | Thiophene-containing photo acid generators for photolithography |
| CA2452566C (en) | 2001-07-19 | 2011-08-23 | Lamberti Spa | Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
| GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| WO2003098347A1 (en) * | 2002-05-16 | 2003-11-27 | Rensselaer Polytechnic Institute | Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators |
| US6632960B2 (en) * | 2002-06-21 | 2003-10-14 | Goldschmidt Ag | Diaryliodonium salt catalysts made from iodotoluene and a method for preparing them |
| WO2004029037A1 (ja) * | 2002-09-25 | 2004-04-08 | Asahi Denka Co.Ltd. | 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法 |
| BRPI0407605A (pt) | 2003-02-19 | 2006-02-14 | Ciba Sc Holding Ag | derivados de oxima halogenados e o uso dos mesmos como ácidos latentes |
| US20050148679A1 (en) * | 2003-12-29 | 2005-07-07 | Chingfan Chiu | Aryl sulfonium salt, polymerizable composition and polymerization method of the same |
| WO2005070989A2 (en) | 2004-01-27 | 2005-08-04 | Ciba Specialty Chemicals Holding Inc. | Thermally stable cationic photocurable compositions |
| US7592376B2 (en) * | 2004-08-23 | 2009-09-22 | Rensselaer Polytechnic Institute | Photopolymerizable epoxide and oxetane compositions |
| CN1727333A (zh) * | 2005-04-18 | 2006-02-01 | 常州华钛化学有限公司 | 一种链烷基硫鎓盐的制法及作为光聚合引发剂的用途 |
| US7795323B2 (en) * | 2005-09-02 | 2010-09-14 | Konica Minolta Medical & Graphic, Inc. | Active ray curable ink-jet ink |
| US8512934B2 (en) * | 2007-10-10 | 2013-08-20 | Basf Se | Sulphonium salt initiators |
-
2007
- 2007-04-04 US US12/226,116 patent/US8067643B2/en active Active
- 2007-04-04 KR KR1020087027838A patent/KR101389057B1/ko active Active
- 2007-04-04 WO PCT/EP2007/053280 patent/WO2007118794A1/en not_active Ceased
- 2007-04-04 JP JP2009504692A patent/JP5313873B2/ja active Active
- 2007-04-04 CN CN2007800216146A patent/CN101466804B/zh active Active
- 2007-04-04 EP EP07727751.5A patent/EP2007834B1/en active Active
- 2007-04-12 TW TW096112895A patent/TWI404699B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2009533377A5 (enExample) | ||
| ES2798135T5 (es) | Fotoiniciadores policíclicos | |
| WO2007118794B1 (en) | Sulphonium salt initiators | |
| JP2010505787A5 (enExample) | ||
| DE69702605T2 (de) | Fotoerzeugung von Aminen aus alpha-Aminoacetophenonen | |
| JP7032416B2 (ja) | フルオレニルアミノケトン類光開始剤、その調製方法及びフルオレニルアミノケトン類光開始剤を含有するｕｖ光硬化性組成物 | |
| JP2009501148A5 (enExample) | ||
| JP5844416B2 (ja) | 感光性組成物の光硬化物の製造方法 | |
| CN101522613B (zh) | 锍盐光引发剂 | |
| JP5940259B2 (ja) | 感光性組成物 | |
| TW575792B (en) | New unsaturated oxime derivatives and the use thereof as latent acids | |
| KR100591030B1 (ko) | 옥심 유도체를 포함하는 광중합성 조성물 | |
| JP6208119B2 (ja) | 新規化合物及び感光性樹脂組成物 | |
| DE60032131T2 (de) | Neue photoinitiatoren und deren anwendungen | |
| JPS60186838A (ja) | 保護層又はレリーフ像を形成させる方法 | |
| DE19753655A1 (de) | Neue alpha-Aminoacetophenon-Photostarter | |
| EP0670323B1 (de) | Dimere Bisacylphosphine, -oxide und -sulfide | |
| CN112154167A (zh) | 组合物、固化物、光学滤波器及固化物的制造方法 | |
| JP2012168526A (ja) | 感光性組成物 | |
| EP3498691B1 (en) | Novel cationic photoinitiator, and preparation method therefor and applications thereof | |
| EP0560724B1 (de) | Benzoyl substituierte Phosphabicycloalkane und -sulfide als Photoinitiatoren | |
| JPH10245378A (ja) | 新規スルホニウム塩、それからなる光重合開始剤及びエネルギー線硬化性組成物 | |
| JPS59152922A (ja) | 高エネルギ−線硬化型樹脂組成物 | |
| EP0344109B1 (de) | Substituierte Naphthacen-5,12-dione und deren Verwendung | |
| JPH0611875B2 (ja) | 耐摩耗撥水性皮膜 |