CN101466804B - 硫鎓盐引发剂 - Google Patents

硫鎓盐引发剂 Download PDF

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Publication number
CN101466804B
CN101466804B CN2007800216146A CN200780021614A CN101466804B CN 101466804 B CN101466804 B CN 101466804B CN 2007800216146 A CN2007800216146 A CN 2007800216146A CN 200780021614 A CN200780021614 A CN 200780021614A CN 101466804 B CN101466804 B CN 101466804B
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CN
China
Prior art keywords
acid
compound
group
alkyl
methyl
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CN2007800216146A
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English (en)
Chinese (zh)
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CN101466804A (zh
Inventor
P·哈约茨
S·伊尔格
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
BASF SE
IGM Group BV
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Ciba Holding AG
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03—Powdery paints
    • C09D5/033—Powdery paints characterised by the additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Polyethers (AREA)
  • Detergent Compositions (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
CN2007800216146A 2006-04-13 2007-04-04 硫鎓盐引发剂 Active CN101466804B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06112602.5 2006-04-13
EP06112602 2006-04-13
PCT/EP2007/053280 WO2007118794A1 (en) 2006-04-13 2007-04-04 Sulphonium salt initiators

Publications (2)

Publication Number Publication Date
CN101466804A CN101466804A (zh) 2009-06-24
CN101466804B true CN101466804B (zh) 2012-02-22

Family

ID=36703163

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800216146A Active CN101466804B (zh) 2006-04-13 2007-04-04 硫鎓盐引发剂

Country Status (7)

Country Link
US (1) US8067643B2 (enExample)
EP (1) EP2007834B1 (enExample)
JP (1) JP5313873B2 (enExample)
KR (1) KR101389057B1 (enExample)
CN (1) CN101466804B (enExample)
TW (1) TWI404699B (enExample)
WO (1) WO2007118794A1 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2125713B1 (en) 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
US8652752B2 (en) 2007-10-10 2014-02-18 Basf Se Sulphonium salt initiators
WO2009047151A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
CN102026967B (zh) * 2007-10-10 2013-09-18 巴斯夫欧洲公司 锍盐引发剂
CN102056913A (zh) * 2008-06-12 2011-05-11 巴斯夫欧洲公司 锍衍生物及其作为潜酸的用途
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
KR101653427B1 (ko) * 2008-10-20 2016-09-01 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP2199856B1 (en) 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
CN102317258B (zh) * 2009-02-20 2014-06-04 三亚普罗股份有限公司 锍盐、光酸产生剂及光敏性树脂组合物
WO2010141594A1 (en) * 2009-06-02 2010-12-09 Massachusetts Institute Of Technology Coatings
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
US9034236B2 (en) * 2009-12-17 2015-05-19 Dsm Ip Assets B.V. Substrate-based additive fabrication process
EP2539316B1 (en) 2010-02-24 2019-10-23 Basf Se Latent acids and their use
JP5872470B2 (ja) 2010-07-14 2016-03-01 日本化薬株式会社 感光性樹脂組成物及びその硬化物
US8394575B2 (en) * 2010-09-30 2013-03-12 Lexmark International, Inc. Formulations for environmentally friendly photoresist film layers
TWI537675B (zh) * 2010-10-07 2016-06-11 東京應化工業股份有限公司 導光圖型形成用負型顯像用光阻組成物、導光圖型形成方法、含嵌段共聚物之層的圖型形成方法
JP5691987B2 (ja) 2010-10-13 2015-04-01 信越化学工業株式会社 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
JP5749631B2 (ja) * 2010-12-07 2015-07-15 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
GB201223064D0 (en) * 2012-12-20 2013-02-06 Rainbow Technology Systems Ltd Curable coatings for photoimaging
EP3253735B1 (en) 2015-02-02 2021-03-31 Basf Se Latent acids and their use
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2017059222A1 (en) 2015-10-01 2017-04-06 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
JP2018536731A (ja) 2015-11-17 2018-12-13 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された付加造形用アンチモンフリー放射線硬化性組成物およびインベストメント鋳造プロセスにおけるその用途
KR102321241B1 (ko) * 2016-07-28 2021-11-02 산아프로 가부시키가이샤 술포늄염, 열 또는 광산 발생제, 열 또는 광 경화성 조성물 및 그 경화체
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
KR102278416B1 (ko) * 2016-10-17 2021-07-15 도요 고세이 고교 가부시키가이샤 조성물 및 이를 이용한 디바이스의 제조 방법
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
EP4122915A4 (en) 2020-03-17 2023-09-06 San-Apro Ltd. Sulfonium salt, photoacid generator, curable composition, and resist composition
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4451409A (en) * 1982-02-08 1984-05-29 The Dow Chemical Company Sulfonium organosulfonates
EP1036789B1 (en) * 1997-12-04 2003-03-05 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
EP1557413A1 (en) * 2002-09-25 2005-07-27 Asahi Denka Co., Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
CN1651409A (zh) * 2003-12-29 2005-08-10 奇钛科技股份有限公司 芳基锍盐与其聚合组成物及其聚合方法
CN1727333A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 一种链烷基硫鎓盐的制法及作为光聚合引发剂的用途

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488378A (en) 1966-04-06 1970-01-06 Dow Chemical Co Complexes of organic sulfoxides and hydrogen chloride and related sulfonium salts
US4197174A (en) * 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
US4201640A (en) * 1979-03-14 1980-05-06 American Can Company Method for producing bis-[4-(diphenylsulfonio)phenyl] sulfide bis-M.X6
ZA805273B (en) 1979-09-28 1981-11-25 Gen Electric Process of deep section curing photocurable compositions
US4694029A (en) 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
DE4211060A1 (de) 1992-04-03 1993-10-07 Roehm Gmbh Polymerprodukte zur Behandlung von Leder
US5254760A (en) 1992-07-29 1993-10-19 Ciba-Geigy Corporation Inhibiting polymerization of vinyl aromatic monomers
US5554664A (en) 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
US5973020A (en) 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US5998092A (en) 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
US6337426B1 (en) 1998-11-23 2002-01-08 Nalco/Exxon Energy Chemicals, L.P. Antifoulant compositions and processes
US6444733B1 (en) 1999-03-01 2002-09-03 Ciba Specialty Chemicals Corporation Stabilizer combination for the rotomolding process
EP1350789B1 (en) * 2000-12-15 2008-06-25 San-Apro Limited Process for producing sulfonium salt
US6468595B1 (en) 2001-02-13 2002-10-22 Sigma Technologies International, Inc. Vaccum deposition of cationic polymer systems
US6696216B2 (en) * 2001-06-29 2004-02-24 International Business Machines Corporation Thiophene-containing photo acid generators for photolithography
WO2003008404A2 (en) 2001-07-19 2003-01-30 Lamberti Spa Sulfonium salts as phtoinitiators for radiation curable systems
GB0204467D0 (en) 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
AU2003233559A1 (en) * 2002-05-16 2003-12-02 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
US6632960B2 (en) * 2002-06-21 2003-10-14 Goldschmidt Ag Diaryliodonium salt catalysts made from iodotoluene and a method for preparing them
US7399577B2 (en) 2003-02-19 2008-07-15 Ciba Specialty Chemicals Corporation Halogenated oxime derivatives and the use thereof
KR20070004649A (ko) 2004-01-27 2007-01-09 시바 스페셜티 케미칼스 홀딩 인크. 열적으로 안정한 양이온성 광경화성 조성물
US7592376B2 (en) * 2004-08-23 2009-09-22 Rensselaer Polytechnic Institute Photopolymerizable epoxide and oxetane compositions
US7795323B2 (en) * 2005-09-02 2010-09-14 Konica Minolta Medical & Graphic, Inc. Active ray curable ink-jet ink
WO2009047151A1 (en) * 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4451409A (en) * 1982-02-08 1984-05-29 The Dow Chemical Company Sulfonium organosulfonates
EP1036789B1 (en) * 1997-12-04 2003-03-05 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
EP1557413A1 (en) * 2002-09-25 2005-07-27 Asahi Denka Co., Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
CN1651409A (zh) * 2003-12-29 2005-08-10 奇钛科技股份有限公司 芳基锍盐与其聚合组成物及其聚合方法
CN1727333A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 一种链烷基硫鎓盐的制法及作为光聚合引发剂的用途

Also Published As

Publication number Publication date
TW200804260A (en) 2008-01-16
KR101389057B1 (ko) 2014-05-13
EP2007834B1 (en) 2015-11-04
KR20080112377A (ko) 2008-12-24
US20090197987A1 (en) 2009-08-06
EP2007834A1 (en) 2008-12-31
JP5313873B2 (ja) 2013-10-09
JP2009533377A (ja) 2009-09-17
CN101466804A (zh) 2009-06-24
US8067643B2 (en) 2011-11-29
TWI404699B (zh) 2013-08-11
WO2007118794A1 (en) 2007-10-25
WO2007118794B1 (en) 2008-01-03

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Address after: Basel, Switzerland

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