TWI404699B - 鹽起始劑 - Google Patents

鹽起始劑 Download PDF

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Publication number
TWI404699B
TWI404699B TW096112895A TW96112895A TWI404699B TW I404699 B TWI404699 B TW I404699B TW 096112895 A TW096112895 A TW 096112895A TW 96112895 A TW96112895 A TW 96112895A TW I404699 B TWI404699 B TW I404699B
Authority
TW
Taiwan
Prior art keywords
acid
group
compound
substituted
alkyl
Prior art date
Application number
TW096112895A
Other languages
English (en)
Chinese (zh)
Other versions
TW200804260A (en
Inventor
Pascal Hayoz
Stephan Ilg
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of TW200804260A publication Critical patent/TW200804260A/zh
Application granted granted Critical
Publication of TWI404699B publication Critical patent/TWI404699B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00Other general methods
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03Powdery paints
    • C09D5/033Powdery paints characterised by the additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08Anti-corrosive paints
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Polyethers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Detergent Compositions (AREA)
TW096112895A 2006-04-13 2007-04-12 鹽起始劑 TWI404699B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06112602 2006-04-13

Publications (2)

Publication Number Publication Date
TW200804260A TW200804260A (en) 2008-01-16
TWI404699B true TWI404699B (zh) 2013-08-11

Family

ID=36703163

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096112895A TWI404699B (zh) 2006-04-13 2007-04-12 鹽起始劑

Country Status (7)

Country Link
US (1) US8067643B2 (enExample)
EP (1) EP2007834B1 (enExample)
JP (1) JP5313873B2 (enExample)
KR (1) KR101389057B1 (enExample)
CN (1) CN101466804B (enExample)
TW (1) TWI404699B (enExample)
WO (1) WO2007118794A1 (enExample)

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EP2125713B1 (en) 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
EP2197869B1 (en) * 2007-10-10 2013-04-24 Basf Se Sulphonium salt initiators
KR101599562B1 (ko) * 2007-10-10 2016-03-03 바스프 에스이 술포늄 염 개시제
US8512934B2 (en) 2007-10-10 2013-08-20 Basf Se Sulphonium salt initiators
CN102056913A (zh) * 2008-06-12 2011-05-11 巴斯夫欧洲公司 锍衍生物及其作为潜酸的用途
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Mems用感光性樹脂組成物及びその硬化物
WO2010046240A1 (en) * 2008-10-20 2010-04-29 Basf Se Sulfonium derivatives and the use therof as latent acids
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP2199856B1 (en) 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
WO2010095385A1 (ja) * 2009-02-20 2010-08-26 サンアプロ株式会社 スルホニウム塩,光酸発生剤及び感光性樹脂組成物
JP2012528718A (ja) 2009-06-02 2012-11-15 マサチューセッツ インスティテュート オブ テクノロジー コーティング
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
US20120251841A1 (en) * 2009-12-17 2012-10-04 Dsm Ip Assets, B.V. Liquid radiation curable resins for additive fabrication comprising a triaryl sulfonium borate cationic photoinitiator
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
KR20130091724A (ko) 2010-07-14 2013-08-19 닛뽄 가야쿠 가부시키가이샤 감광성 수지 조성물 및 이의 경화물
US8394575B2 (en) * 2010-09-30 2013-03-12 Lexmark International, Inc. Formulations for environmentally friendly photoresist film layers
TWI537675B (zh) * 2010-10-07 2016-06-11 東京應化工業股份有限公司 導光圖型形成用負型顯像用光阻組成物、導光圖型形成方法、含嵌段共聚物之層的圖型形成方法
JP5691987B2 (ja) 2010-10-13 2015-04-01 信越化学工業株式会社 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
JP5749631B2 (ja) * 2010-12-07 2015-07-15 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
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CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
US9708442B1 (en) 2015-10-01 2017-07-18 Dsm Ip Assets, B.V. Liquid, hybrid UV/vis radiation curable resin compositions for additive fabrication
EP3827955B1 (en) 2015-11-17 2025-01-01 Stratasys, Inc. Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
WO2018020974A1 (ja) * 2016-07-28 2018-02-01 サンアプロ株式会社 スルホニウム塩、熱又は光酸発生剤、熱又は光硬化性組成物及びその硬化体
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
WO2018074382A1 (ja) * 2016-10-17 2018-04-26 東洋合成工業株式会社 組成物及びそれを用いたデバイスの製造方法
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
CN114901638B (zh) 2020-03-17 2024-10-29 三亚普罗股份有限公司 锍盐、光酸产生剂、固化性组合物和抗蚀剂组合物
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

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EP1036789A1 (en) * 1997-12-04 2000-09-20 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
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Publication number Priority date Publication date Assignee Title
EP1036789A1 (en) * 1997-12-04 2000-09-20 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
EP1557413A1 (en) * 2002-09-25 2005-07-27 Asahi Denka Co., Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape

Also Published As

Publication number Publication date
KR101389057B1 (ko) 2014-05-13
EP2007834A1 (en) 2008-12-31
WO2007118794B1 (en) 2008-01-03
CN101466804B (zh) 2012-02-22
EP2007834B1 (en) 2015-11-04
JP2009533377A (ja) 2009-09-17
JP5313873B2 (ja) 2013-10-09
TW200804260A (en) 2008-01-16
KR20080112377A (ko) 2008-12-24
WO2007118794A1 (en) 2007-10-25
US8067643B2 (en) 2011-11-29
CN101466804A (zh) 2009-06-24
US20090197987A1 (en) 2009-08-06

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