TWI404699B - 鹽起始劑 - Google Patents

鹽起始劑 Download PDF

Info

Publication number
TWI404699B
TWI404699B TW096112895A TW96112895A TWI404699B TW I404699 B TWI404699 B TW I404699B TW 096112895 A TW096112895 A TW 096112895A TW 96112895 A TW96112895 A TW 96112895A TW I404699 B TWI404699 B TW I404699B
Authority
TW
Taiwan
Prior art keywords
acid
group
compound
substituted
alkyl
Prior art date
Application number
TW096112895A
Other languages
English (en)
Chinese (zh)
Other versions
TW200804260A (en
Inventor
Pascal Hayoz
Stephan Ilg
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of TW200804260A publication Critical patent/TW200804260A/zh
Application granted granted Critical
Publication of TWI404699B publication Critical patent/TWI404699B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03—Powdery paints
    • C09D5/033—Powdery paints characterised by the additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Polyethers (AREA)
  • Detergent Compositions (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
TW096112895A 2006-04-13 2007-04-12 鹽起始劑 TWI404699B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06112602 2006-04-13

Publications (2)

Publication Number Publication Date
TW200804260A TW200804260A (en) 2008-01-16
TWI404699B true TWI404699B (zh) 2013-08-11

Family

ID=36703163

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096112895A TWI404699B (zh) 2006-04-13 2007-04-12 鹽起始劑

Country Status (7)

Country Link
US (1) US8067643B2 (enExample)
EP (1) EP2007834B1 (enExample)
JP (1) JP5313873B2 (enExample)
KR (1) KR101389057B1 (enExample)
CN (1) CN101466804B (enExample)
TW (1) TWI404699B (enExample)
WO (1) WO2007118794A1 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008040648A1 (en) 2006-10-04 2008-04-10 Ciba Holding Inc. Sulphonium salt photoinitiators
US20100297541A1 (en) * 2007-10-10 2010-11-25 Basf Se Sulphonium salt initiators
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
US8652752B2 (en) 2007-10-10 2014-02-18 Basf Se Sulphonium salt initiators
KR20110025211A (ko) * 2008-06-12 2011-03-09 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Mems用感光性樹脂組成物及びその硬化物
JP5721630B2 (ja) * 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se スルホニウム誘導体および潜在酸としてのその使用
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP2199856B1 (en) 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
US8617787B2 (en) * 2009-02-20 2013-12-31 San-Apro, Ltd. Sulfonium salt, photo-acid generator, and photosensitive resin composition
WO2010141594A1 (en) * 2009-06-02 2010-12-09 Massachusetts Institute Of Technology Coatings
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
KR101833078B1 (ko) * 2009-12-17 2018-02-27 디에스엠 아이피 어셋츠 비.브이. 적층식 제작을 위한 발광 다이오드 경화성 액체 수지 조성물
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
TWI523882B (zh) * 2010-07-14 2016-03-01 日本化藥股份有限公司 感光性樹脂組成物及其硬化物
US8394575B2 (en) * 2010-09-30 2013-03-12 Lexmark International, Inc. Formulations for environmentally friendly photoresist film layers
JP5885143B2 (ja) * 2010-10-07 2016-03-15 東京応化工業株式会社 ガイドパターン形成用ネガ型現像用レジスト組成物、ガイドパターン形成方法、ブロックコポリマーを含む層のパターン形成方法
JP5691987B2 (ja) 2010-10-13 2015-04-01 信越化学工業株式会社 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
JP5749631B2 (ja) * 2010-12-07 2015-07-15 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
GB201223064D0 (en) * 2012-12-20 2013-02-06 Rainbow Technology Systems Ltd Curable coatings for photoimaging
EP3253735B1 (en) 2015-02-02 2021-03-31 Basf Se Latent acids and their use
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2017059222A1 (en) 2015-10-01 2017-04-06 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
WO2017087614A1 (en) 2015-11-17 2017-05-26 Dsm Ip Assets, B.V. Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
US11370751B2 (en) 2016-07-28 2022-06-28 San Apro Ltd. Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
KR102278416B1 (ko) * 2016-10-17 2021-07-15 도요 고세이 고교 가부시키가이샤 조성물 및 이를 이용한 디바이스의 제조 방법
CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
EP4122915A4 (en) 2020-03-17 2023-09-06 San-Apro Ltd. Sulfonium salt, photoacid generator, curable composition, and resist composition
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1036789A1 (en) * 1997-12-04 2000-09-20 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
EP1557413A1 (en) * 2002-09-25 2005-07-27 Asahi Denka Co., Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488378A (en) 1966-04-06 1970-01-06 Dow Chemical Co Complexes of organic sulfoxides and hydrogen chloride and related sulfonium salts
US4201640A (en) * 1979-03-14 1980-05-06 American Can Company Method for producing bis-[4-(diphenylsulfonio)phenyl] sulfide bis-M.X6
US4197174A (en) * 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
ZA805273B (en) 1979-09-28 1981-11-25 Gen Electric Process of deep section curing photocurable compositions
US4451409A (en) * 1982-02-08 1984-05-29 The Dow Chemical Company Sulfonium organosulfonates
US4694029A (en) * 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
DE4211060A1 (de) 1992-04-03 1993-10-07 Roehm Gmbh Polymerprodukte zur Behandlung von Leder
US5254760A (en) 1992-07-29 1993-10-19 Ciba-Geigy Corporation Inhibiting polymerization of vinyl aromatic monomers
US5554664A (en) 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
US5973020A (en) 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US5998092A (en) 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
US6337426B1 (en) 1998-11-23 2002-01-08 Nalco/Exxon Energy Chemicals, L.P. Antifoulant compositions and processes
US6444733B1 (en) 1999-03-01 2002-09-03 Ciba Specialty Chemicals Corporation Stabilizer combination for the rotomolding process
DE60134574D1 (de) 2000-12-15 2008-08-07 San Apro Ltd Verfahren zur herstellung von sulfoniumsalzen
US6468595B1 (en) 2001-02-13 2002-10-22 Sigma Technologies International, Inc. Vaccum deposition of cationic polymer systems
US6696216B2 (en) * 2001-06-29 2004-02-24 International Business Machines Corporation Thiophene-containing photo acid generators for photolithography
CA2452566C (en) * 2001-07-19 2011-08-23 Lamberti Spa Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
CA2485516A1 (en) * 2002-05-16 2003-11-27 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
US6632960B2 (en) * 2002-06-21 2003-10-14 Goldschmidt Ag Diaryliodonium salt catalysts made from iodotoluene and a method for preparing them
MXPA05008118A (es) 2003-02-19 2005-09-30 Ciba Sc Holding Ag Derivados de oxima halogenados y el uso de los mismos como acidos latentes.
US20050148679A1 (en) * 2003-12-29 2005-07-07 Chingfan Chiu Aryl sulfonium salt, polymerizable composition and polymerization method of the same
JP2007523974A (ja) * 2004-01-27 2007-08-23 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 熱安定性のカチオン光硬化性組成物
US7592376B2 (en) * 2004-08-23 2009-09-22 Rensselaer Polytechnic Institute Photopolymerizable epoxide and oxetane compositions
CN1727333A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 一种链烷基硫鎓盐的制法及作为光聚合引发剂的用途
WO2007029448A1 (ja) * 2005-09-02 2007-03-15 Konica Minolta Medical & Graphic, Inc. 活性光線硬化型インクジェットインク
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1036789A1 (en) * 1997-12-04 2000-09-20 Asahi Denka Kogyo Kabushiki Kaisha Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
EP1557413A1 (en) * 2002-09-25 2005-07-27 Asahi Denka Co., Ltd. Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape

Also Published As

Publication number Publication date
JP5313873B2 (ja) 2013-10-09
WO2007118794B1 (en) 2008-01-03
EP2007834B1 (en) 2015-11-04
CN101466804B (zh) 2012-02-22
KR20080112377A (ko) 2008-12-24
KR101389057B1 (ko) 2014-05-13
TW200804260A (en) 2008-01-16
CN101466804A (zh) 2009-06-24
US20090197987A1 (en) 2009-08-06
JP2009533377A (ja) 2009-09-17
EP2007834A1 (en) 2008-12-31
WO2007118794A1 (en) 2007-10-25
US8067643B2 (en) 2011-11-29

Similar Documents

Publication Publication Date Title
JP5313873B2 (ja) スルホニウム塩開始剤
TWI435864B (zh) 鹽起始劑
TWI225183B (en) A diaryliodonium salt of the formula I, a radiation-sensitive composition comprising the diaryliodonium salt and uses of the compositions and the diaryliodonium salt
EP1902019B1 (en) Sulphonium salt initiators
TWI443082B (zh) 鹽起始劑
TWI433833B (zh) 鹽起始劑
TWI439446B (zh) 鹽起始劑(一)