JP2009524918A - 光電式半導体チップ - Google Patents

光電式半導体チップ Download PDF

Info

Publication number
JP2009524918A
JP2009524918A JP2008551640A JP2008551640A JP2009524918A JP 2009524918 A JP2009524918 A JP 2009524918A JP 2008551640 A JP2008551640 A JP 2008551640A JP 2008551640 A JP2008551640 A JP 2008551640A JP 2009524918 A JP2009524918 A JP 2009524918A
Authority
JP
Japan
Prior art keywords
semiconductor chip
substrate
semiconductor
semiconductor layer
layer sequence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008551640A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009524918A5 (enExample
Inventor
フェーラー ミヒャエル
シュトラウス ウーヴェ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ams Osram International GmbH
Original Assignee
Osram Opto Semiconductors GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osram Opto Semiconductors GmbH filed Critical Osram Opto Semiconductors GmbH
Publication of JP2009524918A publication Critical patent/JP2009524918A/ja
Publication of JP2009524918A5 publication Critical patent/JP2009524918A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/819Bodies characterised by their shape, e.g. curved or truncated substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/833Transparent materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/83Electrodes
    • H10H20/832Electrodes characterised by their material
    • H10H20/835Reflective materials

Landscapes

  • Led Devices (AREA)
  • Photovoltaic Devices (AREA)
  • Drying Of Semiconductors (AREA)
JP2008551640A 2006-01-27 2006-12-20 光電式半導体チップ Pending JP2009524918A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006004172 2006-01-27
DE102006015788A DE102006015788A1 (de) 2006-01-27 2006-04-04 Optoelektronischer Halbleiterchip
PCT/DE2006/002293 WO2007085218A1 (de) 2006-01-27 2006-12-20 Optoelektronischer halbleiterchip

Publications (2)

Publication Number Publication Date
JP2009524918A true JP2009524918A (ja) 2009-07-02
JP2009524918A5 JP2009524918A5 (enExample) 2012-07-05

Family

ID=37898325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008551640A Pending JP2009524918A (ja) 2006-01-27 2006-12-20 光電式半導体チップ

Country Status (8)

Country Link
US (1) US8581280B2 (enExample)
EP (1) EP1977457B1 (enExample)
JP (1) JP2009524918A (enExample)
KR (1) KR20080091249A (enExample)
CN (2) CN101395725B (enExample)
DE (1) DE102006015788A1 (enExample)
TW (1) TWI350597B (enExample)
WO (1) WO2007085218A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007266338A (ja) * 2006-03-29 2007-10-11 Nichia Chem Ind Ltd 半導体発光素子及び半導体発光装置
JP2015162631A (ja) * 2014-02-28 2015-09-07 サンケン電気株式会社 発光素子

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007002416A1 (de) 2006-04-13 2007-10-18 Osram Opto Semiconductors Gmbh Strahlungsemittierender Körper und Verfahren zur Herstellung eines strahlungsemittierenden Körpers
DE102006061167A1 (de) 2006-04-25 2007-12-20 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterbauelement
DE102007027641B4 (de) * 2007-06-15 2015-12-03 Huga Optotech Inc. Verfahren zum Herstellen einer Licht emittierenden Diode
DE102007035687A1 (de) * 2007-07-30 2009-02-05 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement mit einem Schichtenstapel
JP5126884B2 (ja) * 2008-01-16 2013-01-23 シャープ株式会社 窒化物半導体発光素子および窒化物半導体発光素子の製造方法
DE102008006987A1 (de) * 2008-01-31 2009-08-06 Osram Opto Semiconductors Gmbh Strahlungsempfänger und Verfahren zur Herstellung eines Strahlungsempfängers
CN102047454B (zh) * 2008-04-16 2013-04-10 Lg伊诺特有限公司 发光器件及其制造方法
DE102008052405A1 (de) * 2008-10-21 2010-04-22 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterbauelement
JP2010192835A (ja) * 2009-02-20 2010-09-02 Showa Denko Kk 発光ダイオード及びその製造方法、並びに発光ダイオードランプ
DE102009032486A1 (de) * 2009-07-09 2011-01-13 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
JP2012004476A (ja) * 2010-06-21 2012-01-05 Toshiba Corp 発光装置
DE102010031237A1 (de) 2010-07-12 2012-01-12 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
DE102010027679A1 (de) 2010-07-20 2012-01-26 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
DE102010038405A1 (de) 2010-07-26 2012-01-26 Osram Opto Semiconductors Gmbh Elektronisches Bauelement und Verfahren zur Herstellung eines elektronischen Bauelements
DE102010039382A1 (de) 2010-08-17 2012-02-23 Osram Opto Semiconductors Gmbh Elektronisches Bauelement und Verfahren zur Herstellung eines elektronischen Bauelements
KR101274651B1 (ko) 2010-11-30 2013-06-12 엘지디스플레이 주식회사 발광 다이오드 및 이의 제조 방법
US8802461B2 (en) * 2011-03-22 2014-08-12 Micron Technology, Inc. Vertical light emitting devices with nickel silicide bonding and methods of manufacturing
JP6056150B2 (ja) * 2011-04-08 2017-01-11 日亜化学工業株式会社 半導体発光素子
DE102011080458A1 (de) 2011-08-04 2013-02-07 Osram Opto Semiconductors Gmbh Optoelektronische anordnung und verfahren zur herstellung einer optoelektronischen anordnung
DE102011087543A1 (de) 2011-12-01 2013-06-06 Osram Opto Semiconductors Gmbh Optoelektronische anordnung
DE102012200416B4 (de) 2012-01-12 2018-03-01 Osram Opto Semiconductors Gmbh Optoelektronisches modul und verfahren zur herstellung eines optoelektronischen moduls
GB201202222D0 (en) * 2012-02-09 2012-03-28 Mled Ltd Enhanced light extraction
DE102012202102A1 (de) * 2012-02-13 2013-08-14 Osram Gmbh Leuchtvorrichtung mit Volumenstrahler-LED-Chips auf einem gemeinsamen Substrat
WO2013134432A1 (en) * 2012-03-06 2013-09-12 Soraa, Inc. Light emitting diodes with low refractive index material layers to reduce light guiding effects
US9501601B2 (en) 2013-03-14 2016-11-22 Taiwan Semiconductor Manufacturing Company, Ltd. Layout optimization of a main pattern and a cut pattern
DE102014107555A1 (de) * 2014-05-28 2015-12-03 Osram Opto Semiconductors Gmbh Elektrische Kontaktstruktur für ein Halbleiterbauelement und Halbleiterbauelement
DE102015103840A1 (de) * 2015-03-16 2016-09-22 Osram Opto Semiconductors Gmbh Elektromagnetische Strahlung emittierende Baugruppe
DE102016100563B4 (de) 2016-01-14 2021-08-05 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Verfahren zum Herstellen einer optoelektronischen Leuchtvorrichtung und optoelektronische Leuchtvorrichtung
DE102018113573B4 (de) * 2018-06-07 2022-11-03 Semikron Elektronik Gmbh & Co. Kg Patentabteilung Diode mit einem Halbleiterkörper
DE102018115225A1 (de) * 2018-06-25 2020-01-02 Otto-Von-Guericke-Universität Magdeburg Lichtemmitierendes Halbleiterbauelement oder Halbleiterbauelementmodul

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05129930A (ja) * 1991-04-11 1993-05-25 Natl Semiconductor Corp <Ns> 高速パスゲート、ラツチ及びフリツプフロツプ回路
JP2003523635A (ja) * 2000-02-15 2003-08-05 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 放射線を発する半導体デバイス、その製造方法及び放射線を発する光学素子
JP2004521494A (ja) * 2001-02-01 2004-07-15 クリー インコーポレイテッド 光抽出用の改良を含む発光ダイオード及びその製造方法
JP2005510062A (ja) * 2001-11-12 2005-04-14 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 電気的に励起した多結晶ZnOレーザ及び加工方法
JP2005150741A (ja) * 2003-11-14 2005-06-09 Samsung Electronics Co Ltd 窒化物系発光素子及びその製造方法
JP2005268601A (ja) * 2004-03-19 2005-09-29 Sumitomo Chemical Co Ltd 化合物半導体発光素子
JP2007208047A (ja) * 2006-02-02 2007-08-16 Fujikura Ltd 半導体発光素子

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5892784A (en) * 1994-10-27 1999-04-06 Hewlett-Packard Company N-drive p-common surface emitting laser fabricated on n+ substrate
US5789265A (en) 1995-08-31 1998-08-04 Kabushiki Kaisha Toshiba Method of manufacturing blue light-emitting device by using BCL3 and CL2
JP3165374B2 (ja) 1995-08-31 2001-05-14 株式会社東芝 化合物半導体の電極の形成方法
US6803243B2 (en) * 2001-03-15 2004-10-12 Cree, Inc. Low temperature formation of backside ohmic contacts for vertical devices
JP3469484B2 (ja) * 1998-12-24 2003-11-25 株式会社東芝 半導体発光素子およびその製造方法
DE20022541U1 (de) 2000-02-15 2002-02-28 OSRAM Opto Semiconductors GmbH & Co. oHG, 93049 Regensburg Lichtemittierendes Bauelement mit verbesserter Lichtauskopplung
WO2001061765A1 (de) 2000-02-15 2001-08-23 Osram Opto Semiconductors Gmbh Strahlungsemittierendes halbleiterbauelement und verfahren zu dessen herstellung
JP3506175B2 (ja) 2000-10-05 2004-03-15 日本電気株式会社 メモリ制御回路とメモリ制御方法
US6747298B2 (en) 2001-07-23 2004-06-08 Cree, Inc. Collets for bonding of light emitting diodes having shaped substrates
JP2003168845A (ja) * 2001-12-03 2003-06-13 Hitachi Ltd 半導体レーザ素子及びこれを用いた光モジュール、及び光システム
US6878975B2 (en) * 2002-02-08 2005-04-12 Agilent Technologies, Inc. Polarization field enhanced tunnel structures
TWI228323B (en) * 2002-09-06 2005-02-21 Sony Corp Semiconductor light emitting device and its manufacturing method, integrated semiconductor light emitting device and manufacturing method thereof, image display device and its manufacturing method, illumination device and manufacturing method thereof
JP4143732B2 (ja) * 2002-10-16 2008-09-03 スタンレー電気株式会社 車載用波長変換素子
US20050173724A1 (en) * 2004-02-11 2005-08-11 Heng Liu Group III-nitride based LED having a transparent current spreading layer
TWI240439B (en) 2003-09-24 2005-09-21 Sanken Electric Co Ltd Nitride semiconductor device and manufacturing method thereof
US7022550B2 (en) * 2004-04-07 2006-04-04 Gelcore Llc Methods for forming aluminum-containing p-contacts for group III-nitride light emitting diodes
DE102004040277B4 (de) * 2004-06-30 2015-07-30 Osram Opto Semiconductors Gmbh Reflektierendes Schichtsystem mit einer Mehrzahl von Schichten zur Aufbringung auf ein III/V-Verbindungshalbleitermaterial
DE102004050891B4 (de) * 2004-10-19 2019-01-10 Lumileds Holding B.V. Lichtmittierende III-Nitrid-Halbleitervorrichtung
DE102008030818B4 (de) * 2008-06-30 2022-03-03 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Oberflächenemittierender Halbleiterlaser mit mehreren aktiven Zonen

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05129930A (ja) * 1991-04-11 1993-05-25 Natl Semiconductor Corp <Ns> 高速パスゲート、ラツチ及びフリツプフロツプ回路
JP2003523635A (ja) * 2000-02-15 2003-08-05 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 放射線を発する半導体デバイス、その製造方法及び放射線を発する光学素子
JP2004521494A (ja) * 2001-02-01 2004-07-15 クリー インコーポレイテッド 光抽出用の改良を含む発光ダイオード及びその製造方法
JP2005510062A (ja) * 2001-11-12 2005-04-14 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 電気的に励起した多結晶ZnOレーザ及び加工方法
JP2005150741A (ja) * 2003-11-14 2005-06-09 Samsung Electronics Co Ltd 窒化物系発光素子及びその製造方法
JP2005268601A (ja) * 2004-03-19 2005-09-29 Sumitomo Chemical Co Ltd 化合物半導体発光素子
JP2007208047A (ja) * 2006-02-02 2007-08-16 Fujikura Ltd 半導体発光素子

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007266338A (ja) * 2006-03-29 2007-10-11 Nichia Chem Ind Ltd 半導体発光素子及び半導体発光装置
JP2015162631A (ja) * 2014-02-28 2015-09-07 サンケン電気株式会社 発光素子

Also Published As

Publication number Publication date
CN101976718A (zh) 2011-02-16
EP1977457A1 (de) 2008-10-08
CN101395725B (zh) 2010-11-10
CN101395725A (zh) 2009-03-25
TWI350597B (en) 2011-10-11
US20090315048A1 (en) 2009-12-24
KR20080091249A (ko) 2008-10-09
US8581280B2 (en) 2013-11-12
WO2007085218A1 (de) 2007-08-02
CN101976718B (zh) 2014-06-11
EP1977457B1 (de) 2018-05-09
TW200737553A (en) 2007-10-01
DE102006015788A1 (de) 2007-09-13

Similar Documents

Publication Publication Date Title
JP2009524918A (ja) 光電式半導体チップ
US8017963B2 (en) Light emitting diode with a dielectric mirror having a lateral configuration
JP5693852B2 (ja) 電流低減構造体を有する発光デバイス及び電流低減構造体を有する発光デバイスを形成する方法
US9142726B2 (en) Semiconductor light emitting device with light extraction structures
US7557379B2 (en) Light emitting devices having a roughened reflective bond pad and methods of fabricating light emitting devices having roughened reflective bond pads
CN101026213B (zh) 发光器件及其制造方法
KR101064006B1 (ko) 발광소자
KR101007139B1 (ko) 발광소자 및 그 제조방법
KR101475963B1 (ko) 방출된 복사에 대해 투과성인 전기 전도 접촉층을 포함하는 복사 방출 반도체 몸체
JP2008085337A (ja) 半導体ボディおよび半導体チップ
KR20120027318A (ko) 반사 구조를 갖는 반도체 발광 다이오드 및 그 제조 방법
KR101154750B1 (ko) 발광소자 및 그 제조방법
US8841685B2 (en) Optoelectronic semiconductor chip
KR20100137524A (ko) 발광 다이오드 구조, 램프 장치 및 발광 다이오드 구조를 형성하는 방법
KR20120002130A (ko) 플립칩형 발광 소자 및 그 제조 방법
US10910538B2 (en) Optoelectronic semiconductor component and method for producing an optoelectronic semiconductor component
KR101550951B1 (ko) 발광소자

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090825

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20101227

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20101228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111118

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20120216

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20120223

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20120315

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20120323

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20120418

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20120501

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120518

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20120518

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121221

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130318

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130430

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130730

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130806

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131028

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20131216