JP2009521332A5 - - Google Patents

Download PDF

Info

Publication number
JP2009521332A5
JP2009521332A5 JP2008536478A JP2008536478A JP2009521332A5 JP 2009521332 A5 JP2009521332 A5 JP 2009521332A5 JP 2008536478 A JP2008536478 A JP 2008536478A JP 2008536478 A JP2008536478 A JP 2008536478A JP 2009521332 A5 JP2009521332 A5 JP 2009521332A5
Authority
JP
Japan
Prior art keywords
gap
nano gap
shows
protein
nano
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008536478A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009521332A (ja
Filing date
Publication date
Priority claimed from KR1020060072981A external-priority patent/KR100849384B1/ko
Application filed filed Critical
Priority claimed from PCT/KR2006/003517 external-priority patent/WO2007046582A1/en
Publication of JP2009521332A publication Critical patent/JP2009521332A/ja
Publication of JP2009521332A5 publication Critical patent/JP2009521332A5/ja
Pending legal-status Critical Current

Links

Images

JP2008536478A 2005-10-21 2006-09-05 ナノギャップおよびナノギャップセンサの製造方法 Pending JP2009521332A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20050099585 2005-10-21
KR1020060072981A KR100849384B1 (ko) 2005-10-21 2006-08-02 나노갭 및 나노갭 센서의 제조방법
PCT/KR2006/003517 WO2007046582A1 (en) 2005-10-21 2006-09-05 A method for fabricating nanogap and nanogap sensor

Publications (2)

Publication Number Publication Date
JP2009521332A JP2009521332A (ja) 2009-06-04
JP2009521332A5 true JP2009521332A5 (enExample) 2009-07-23

Family

ID=38178037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008536478A Pending JP2009521332A (ja) 2005-10-21 2006-09-05 ナノギャップおよびナノギャップセンサの製造方法

Country Status (4)

Country Link
US (1) US8557567B2 (enExample)
JP (1) JP2009521332A (enExample)
KR (1) KR100849384B1 (enExample)
CN (1) CN101156228B (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101518733B1 (ko) 2008-11-27 2015-05-11 삼성전자주식회사 노즐 플레이트 및 그 제조방법
US20110020966A1 (en) * 2009-07-23 2011-01-27 Canon Kabushiki Kaisha Method for processing silicon substrate and method for producing substrate for liquid ejecting head
WO2011081308A2 (ko) * 2009-12-29 2011-07-07 연세대학교 산학협력단 수소 센서 및 그 제조 방법
KR101130084B1 (ko) * 2010-04-28 2012-03-28 연세대학교 산학협력단 수소 센서 및 그 제조방법
KR101067557B1 (ko) 2009-12-29 2011-09-27 연세대학교 산학협력단 수소 센서 및 그 제조방법
WO2011108540A1 (ja) 2010-03-03 2011-09-09 国立大学法人大阪大学 ヌクレオチドを識別する方法および装置、ならびにポリヌクレオチドのヌクレオチド配列を決定する方法および装置
KR20110138657A (ko) * 2010-06-21 2011-12-28 (주)미코바이오메드 표면 플라즈몬 공명 센서 모듈 및 이를 포함한 센싱 시스템
KR101694549B1 (ko) * 2010-10-21 2017-01-09 (주)미코바이오메드 나노 갭 패턴 형성 방법, 나노 갭 패턴을 갖는 바이오 센서 및 바이오 센서 제조 방법
JP6276182B2 (ja) 2012-08-17 2018-02-07 クオンタムバイオシステムズ株式会社 試料の分析方法
KR101878747B1 (ko) 2012-11-05 2018-07-16 삼성전자주식회사 나노갭 소자 및 이로부터의 신호를 처리하는 방법
KR101927415B1 (ko) 2012-11-05 2019-03-07 삼성전자주식회사 나노갭 소자 및 이로부터의 신호를 처리하는 방법
JP6282036B2 (ja) 2012-12-27 2018-02-21 クオンタムバイオシステムズ株式会社 物質の移動速度の制御方法および制御装置
CN106104274B (zh) 2013-09-18 2018-05-22 量子生物有限公司 生物分子测序装置、系统和方法
JP2015077652A (ja) 2013-10-16 2015-04-23 クオンタムバイオシステムズ株式会社 ナノギャップ電極およびその製造方法
US10438811B1 (en) 2014-04-15 2019-10-08 Quantum Biosystems Inc. Methods for forming nano-gap electrodes for use in nanosensors
US9343569B2 (en) 2014-05-21 2016-05-17 International Business Machines Corporation Vertical compound semiconductor field effect transistor on a group IV semiconductor substrate
US11198901B2 (en) 2014-07-11 2021-12-14 Oxford University Innovation Limited Method for forming nano-gaps in graphene
DE102015211392B4 (de) * 2015-06-19 2018-05-24 Albert-Ludwigs-Universität Freiburg Elektrodenstruktur und Verfahren zum Herstellen der Elektrodenstruktur und Biosensor-Chip die Elektrodenstruktur umfassend
US10247700B2 (en) 2015-10-30 2019-04-02 International Business Machines Corporation Embedded noble metal electrodes in microfluidics
CN115595360A (zh) 2016-04-27 2023-01-13 因美纳剑桥有限公司(Gb) 用于生物分子的测量和测序的系统和方法
US11673136B2 (en) * 2017-04-04 2023-06-13 Arizona Board Of Regents On Behalf Of Arizona State University Nanopore devices for sensing biomolecules
WO2019072743A1 (en) 2017-10-13 2019-04-18 Analog Devices Global Unlimited Company DESIGN AND MANUFACTURE OF SENSORS IN NANOGAP
CA3135743A1 (en) 2018-05-09 2019-11-14 Arizona Board Of Regents On Behalf Of Arizona State University Method for electronic detection and quantification of antibodies
CN112384296B (zh) 2018-05-17 2023-06-27 识别分析股份有限公司 用于直接电测量酶活性的装置、系统和方法
CN112639466A (zh) * 2018-09-14 2021-04-09 应用材料公司 形成纳米孔的方法及生成的结构
MX2021009150A (es) 2019-01-30 2021-12-10 Univ Arizona State Circuitos bioelectronicos, sistemas y metodos para preparar y usar los mismos.
JP2023516167A (ja) 2020-02-28 2023-04-18 アリゾナ・ボード・オブ・リージェンツ・オン・ビハーフ・オブ・アリゾナ・ステイト・ユニバーシティー 生体高分子の配列を決定する方法
WO2021211950A1 (en) 2020-04-17 2021-10-21 Arizona Board Of Regents On Behalf Of Arizona State University Single-molecule electronic sequence detector and methods of use
WO2021243113A1 (en) 2020-05-29 2021-12-02 Arizona Board Of Regents On Behalf Of Arizona State University Bioelectronic devices with programmable adaptors
WO2023059527A1 (en) * 2021-10-04 2023-04-13 Tintoria Piana, Inc. Diagnostic system and methods of using and manufacturing the same
KR20230060124A (ko) * 2021-10-27 2023-05-04 현대자동차주식회사 수소 센서 및 수소 센서 제조방법
US20250271389A1 (en) * 2024-02-28 2025-08-28 Robert Bosch Gmbh Nucleic acid detection with a nanogap electrical sensor

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6207369B1 (en) * 1995-03-10 2001-03-27 Meso Scale Technologies, Llc Multi-array, multi-specific electrochemiluminescence testing
ATE273381T1 (de) * 1997-02-12 2004-08-15 Eugene Y Chan Verfahren zur analyse von polymeren
JP2000315785A (ja) * 1999-04-30 2000-11-14 Canon Inc ナノ構造体の製造方法及びナノ構造体デバイス
JP3794461B2 (ja) 1999-04-30 2006-07-05 日本電信電話株式会社 電子結晶あるいは正孔結晶
JP2003502166A (ja) * 1999-06-22 2003-01-21 プレジデント・アンド・フェローズ・オブ・ハーバード・カレッジ 固体状態の次元的特徴の制御
US6897009B2 (en) 1999-11-29 2005-05-24 Trustees Of The University Of Pennsylvania Fabrication of nanometer size gaps on an electrode
US7001792B2 (en) 2000-04-24 2006-02-21 Eagle Research & Development, Llc Ultra-fast nucleic acid sequencing device and a method for making and using the same
US8232582B2 (en) * 2000-04-24 2012-07-31 Life Technologies Corporation Ultra-fast nucleic acid sequencing device and a method for making and using the same
US7291284B2 (en) * 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
US7148058B2 (en) * 2000-06-05 2006-12-12 Chiron Corporation Protein microarrays on mirrored surfaces for performing proteomic analyses
KR20030052665A (ko) * 2001-12-21 2003-06-27 주식회사 하이닉스반도체 나노 크기의 스페이스 패턴 형성 방법
DE10204690A1 (de) 2002-02-06 2003-08-07 Clariant Gmbh Verfahren zur Herstellung synergistischer Stabilisatormischungen
US7005264B2 (en) * 2002-05-20 2006-02-28 Intel Corporation Method and apparatus for nucleic acid sequencing and identification
EP1366860B1 (en) 2002-05-28 2005-03-23 Asia Pacific Microsystem, Inc. Non-destructive method for measuring the thickness of a bonded wafer
JP2006523144A (ja) 2003-02-03 2006-10-12 プレジデント アンド フェロウズ オブ ハーバード カレッジ 制御された導電性構造体のギャップの製造法
JP3787630B2 (ja) * 2003-02-14 2006-06-21 独立行政法人情報通信研究機構 ナノギャップ電極の製造方法
NL1022855C2 (nl) 2003-03-05 2004-09-07 Univ Delft Tech Werkwijze en inrichting voor het gecontroleerd vervaardigen van openingen op nanometerschaal.
US7172917B2 (en) * 2003-04-17 2007-02-06 Robert Bosch Gmbh Method of making a nanogap for variable capacitive elements, and device having a nanogap
JP3864229B2 (ja) * 2003-08-29 2006-12-27 独立行政法人産業技術総合研究所 ナノギャップ電極の製造方法及び該方法により製造されたナノギャップ電極を有する素子
EP2381255A1 (en) * 2003-09-25 2011-10-26 Toyama Prefecture Microwell array chip and its manufacturing method
US7851203B2 (en) * 2003-10-01 2010-12-14 Lawrence Livermore National Security, Llc Functionalized apertures for the detection of chemical and biological materials
KR100561908B1 (ko) 2003-12-26 2006-03-20 한국전자통신연구원 센서 구조체 및 그 제조방법
JP2005278916A (ja) 2004-03-30 2005-10-13 Sanyo Product Co Ltd 遊技機
US20080025875A1 (en) * 2004-09-29 2008-01-31 Martin Charles R Chemical, Particle, and Biosensing with Nanotechnology
US20060073489A1 (en) * 2004-10-05 2006-04-06 Gangqiang Li Nanopore separation devices and methods of using same
KR100679704B1 (ko) * 2005-01-10 2007-02-06 한국과학기술원 분자소자와 바이오 센서를 위한 나노갭 또는 나노 전계효과 트랜지스터 제작방법
US7947485B2 (en) * 2005-06-03 2011-05-24 Hewlett-Packard Development Company, L.P. Method and apparatus for molecular analysis using nanoelectronic circuits
US7410762B1 (en) * 2005-06-27 2008-08-12 Sandia Corporation Method for detecting biomolecules
TW200700038A (en) * 2005-06-27 2007-01-01 Chieh Shang Co Ltd Inflatable air cushion
US8860438B2 (en) * 2009-05-11 2014-10-14 Clemson University Research Foundation Electrical double layer capacitive devices and methods of using same for sequencing polymers and detecting analytes
KR200457140Y1 (ko) 2010-01-22 2011-12-06 (주)파트론정밀 전자기기용 플랙시블 플레이트 케이블 커넥터

Similar Documents

Publication Publication Date Title
JP2009521332A5 (enExample)
AU2020372503B2 (en) Methods for reducing electrode gap distances in electronic devices and resulting devices having nanometer electrode gaps via liquid phase molecular layer deposition technique
JP2013532369A5 (enExample)
JP2004342210A5 (enExample)
WO2007014631A3 (de) Substrat, umfassend zumindest eine voll- oder teilflächige makrostrukturierte schicht, verfahren zu deren herstellung und deren verwendung
WO2008133718A3 (en) A gas separation membrane system and method of making thereof using nanoscale metal material
JP2012505551A5 (enExample)
JP2014528601A5 (enExample)
WO2008156977A3 (en) Methods of fabricating nanostructures by use of thin films of self-assembling of diblock copolymers, and devices resulting from those methods
DE602008004848D1 (de) Struktur mit einer getter-schicht und einer unterschicht zur einstellung sowie verfahren zu ihrer herstellung
JP2011504157A5 (enExample)
WO2006091802A3 (en) Norbornene-type polymers, compositions thereof and lithographic processes using such compositions
WO2008047134A3 (en) Antibody molecules which bind il-17a and il-17f
DE602006020229D1 (de) Mit Titandioxid dotiertes Quarzglas, Herstellungsverfahren, Bestandteil für EUV-Lithographie und Maskensubstrat
WO2011081308A3 (ko) 수소 센서 및 그 제조 방법
WO2006091523A3 (en) Norbornene-type polymers, compositions thereof and lithographic processes using such compositions
WO2005081931A3 (en) Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using same
JP2006507484A5 (enExample)
JP2009518191A5 (enExample)
WO2008062350A3 (en) A sealing structure and a method of manufacturing the same
JP2008530760A5 (enExample)
JP6175134B2 (ja) Memsチップ及びその製造方法
JP2007522673A5 (enExample)
EP2082990A3 (en) Aerogel-bases mold for MEMS fabrication and formation thereof
JP2010024084A5 (enExample)