JP2009298770A - アントラセン誘導体、発光材料、発光素子用材料、塗布用組成物、発光素子、発光装置及び電子機器 - Google Patents
アントラセン誘導体、発光材料、発光素子用材料、塗布用組成物、発光素子、発光装置及び電子機器 Download PDFInfo
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- JP2009298770A JP2009298770A JP2009074655A JP2009074655A JP2009298770A JP 2009298770 A JP2009298770 A JP 2009298770A JP 2009074655 A JP2009074655 A JP 2009074655A JP 2009074655 A JP2009074655 A JP 2009074655A JP 2009298770 A JP2009298770 A JP 2009298770A
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- light
- emitting element
- emitting
- anthracene derivative
- layer
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- 150000001454 anthracenes Chemical class 0.000 title claims abstract description 109
- 239000000463 material Substances 0.000 title claims description 82
- 239000008199 coating composition Substances 0.000 title claims description 5
- 125000001424 substituent group Chemical group 0.000 claims abstract description 22
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 239000002904 solvent Substances 0.000 claims description 35
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 239000010410 layer Substances 0.000 description 189
- 239000000126 substance Substances 0.000 description 100
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 90
- 238000000034 method Methods 0.000 description 83
- 239000000203 mixture Substances 0.000 description 68
- 239000010408 film Substances 0.000 description 66
- 239000000758 substrate Substances 0.000 description 52
- 239000000243 solution Substances 0.000 description 41
- 239000010409 thin film Substances 0.000 description 34
- 230000015572 biosynthetic process Effects 0.000 description 27
- 230000005525 hole transport Effects 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 25
- 238000000295 emission spectrum Methods 0.000 description 21
- 238000002347 injection Methods 0.000 description 21
- 239000007924 injection Substances 0.000 description 21
- 238000005259 measurement Methods 0.000 description 20
- 150000002894 organic compounds Chemical class 0.000 description 20
- 239000007787 solid Substances 0.000 description 20
- 238000000862 absorption spectrum Methods 0.000 description 18
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 17
- 238000002484 cyclic voltammetry Methods 0.000 description 16
- 238000007254 oxidation reaction Methods 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000002131 composite material Substances 0.000 description 15
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 14
- 239000012298 atmosphere Substances 0.000 description 14
- 238000006722 reduction reaction Methods 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 230000006866 deterioration Effects 0.000 description 12
- 230000006870 function Effects 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 12
- 229910052782 aluminium Inorganic materials 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- -1 sodium tert-butoxide Chemical class 0.000 description 11
- 230000003647 oxidation Effects 0.000 description 10
- 230000009467 reduction Effects 0.000 description 10
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 125000006269 biphenyl-2-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C(*)C([H])=C([H])C([H])=C1[H] 0.000 description 9
- 238000001704 evaporation Methods 0.000 description 9
- 239000000706 filtrate Substances 0.000 description 9
- 229910044991 metal oxide Inorganic materials 0.000 description 9
- 150000004706 metal oxides Chemical class 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 9
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical class C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 8
- 239000003086 colorant Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 230000005284 excitation Effects 0.000 description 7
- 230000002349 favourable effect Effects 0.000 description 7
- 239000012212 insulator Substances 0.000 description 7
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 239000010453 quartz Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 108091006149 Electron carriers Proteins 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 229910003437 indium oxide Inorganic materials 0.000 description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 6
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 6
- 229910001930 tungsten oxide Inorganic materials 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- OZNXPZBQVNNJCS-UHFFFAOYSA-N 2-bromo-9,10-diphenylanthracene Chemical compound C=12C=CC=CC2=C(C=2C=CC=CC=2)C2=CC(Br)=CC=C2C=1C1=CC=CC=C1 OZNXPZBQVNNJCS-UHFFFAOYSA-N 0.000 description 5
- DHDHJYNTEFLIHY-UHFFFAOYSA-N 4,7-diphenyl-1,10-phenanthroline Chemical compound C1=CC=CC=C1C1=CC=NC2=C1C=CC1=C(C=3C=CC=CC=3)C=CN=C21 DHDHJYNTEFLIHY-UHFFFAOYSA-N 0.000 description 5
- OGWNONZKAOBEIS-UHFFFAOYSA-N 9-(9,10-diphenylanthracen-2-yl)carbazole Chemical compound C1=CC=CC=C1C(C1=CC=C(C=C11)N2C3=CC=CC=C3C3=CC=CC=C32)=C(C=CC=C2)C2=C1C1=CC=CC=C1 OGWNONZKAOBEIS-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 5
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 150000001716 carbazoles Chemical class 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000000859 sublimation Methods 0.000 description 5
- 230000008022 sublimation Effects 0.000 description 5
- 230000002194 synthesizing effect Effects 0.000 description 5
- AZFHXIBNMPIGOD-UHFFFAOYSA-N 4-hydroxypent-3-en-2-one iridium Chemical compound [Ir].CC(O)=CC(C)=O.CC(O)=CC(C)=O.CC(O)=CC(C)=O AZFHXIBNMPIGOD-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 238000006887 Ullmann reaction Methods 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 150000001342 alkaline earth metals Chemical class 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 125000005577 anthracene group Chemical group 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- 230000000295 complement effect Effects 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000000565 sealant Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- FKHIFSZMMVMEQY-UHFFFAOYSA-N talc Chemical compound [Mg+2].[O-][Si]([O-])=O FKHIFSZMMVMEQY-UHFFFAOYSA-N 0.000 description 4
- 238000005019 vapor deposition process Methods 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- UKSZBOKPHAQOMP-SVLSSHOZSA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 UKSZBOKPHAQOMP-SVLSSHOZSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- VTSDGYDTWADUJQ-UHFFFAOYSA-N 2-bromoanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Br)=CC=C3C(=O)C2=C1 VTSDGYDTWADUJQ-UHFFFAOYSA-N 0.000 description 3
- FCNCGHJSNVOIKE-UHFFFAOYSA-N 9,10-diphenylanthracene Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 FCNCGHJSNVOIKE-UHFFFAOYSA-N 0.000 description 3
- VFUDMQLBKNMONU-UHFFFAOYSA-N 9-[4-(4-carbazol-9-ylphenyl)phenyl]carbazole Chemical group C12=CC=CC=C2C2=CC=CC=C2N1C1=CC=C(C=2C=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C=C1 VFUDMQLBKNMONU-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000005749 Copper compound Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 150000001880 copper compounds Chemical class 0.000 description 3
- 239000000412 dendrimer Substances 0.000 description 3
- 229920000736 dendritic polymer Polymers 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000004770 highest occupied molecular orbital Methods 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 125000003003 spiro group Chemical group 0.000 description 3
- KBLZDCFTQSIIOH-UHFFFAOYSA-M tetrabutylazanium;perchlorate Chemical compound [O-]Cl(=O)(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC KBLZDCFTQSIIOH-UHFFFAOYSA-M 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 3
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 3
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 3
- 229910001935 vanadium oxide Inorganic materials 0.000 description 3
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical group C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 2
- XOYZGLGJSAZOAG-UHFFFAOYSA-N 1-n,1-n,4-n-triphenyl-4-n-[4-[4-(n-[4-(n-phenylanilino)phenyl]anilino)phenyl]phenyl]benzene-1,4-diamine Chemical group C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 XOYZGLGJSAZOAG-UHFFFAOYSA-N 0.000 description 2
- IYZMXHQDXZKNCY-UHFFFAOYSA-N 1-n,1-n-diphenyl-4-n,4-n-bis[4-(n-phenylanilino)phenyl]benzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 IYZMXHQDXZKNCY-UHFFFAOYSA-N 0.000 description 2
- SPDPTFAJSFKAMT-UHFFFAOYSA-N 1-n-[4-[4-(n-[4-(3-methyl-n-(3-methylphenyl)anilino)phenyl]anilino)phenyl]phenyl]-4-n,4-n-bis(3-methylphenyl)-1-n-phenylbenzene-1,4-diamine Chemical compound CC1=CC=CC(N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=CC(=CC=2)N(C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)=C1 SPDPTFAJSFKAMT-UHFFFAOYSA-N 0.000 description 2
- YLYPIBBGWLKELC-RMKNXTFCSA-N 2-[2-[(e)-2-[4-(dimethylamino)phenyl]ethenyl]-6-methylpyran-4-ylidene]propanedinitrile Chemical compound C1=CC(N(C)C)=CC=C1\C=C\C1=CC(=C(C#N)C#N)C=C(C)O1 YLYPIBBGWLKELC-RMKNXTFCSA-N 0.000 description 2
- GEQBRULPNIVQPP-UHFFFAOYSA-N 2-[3,5-bis(1-phenylbenzimidazol-2-yl)phenyl]-1-phenylbenzimidazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2N=C1C1=CC(C=2N(C3=CC=CC=C3N=2)C=2C=CC=CC=2)=CC(C=2N(C3=CC=CC=C3N=2)C=2C=CC=CC=2)=C1 GEQBRULPNIVQPP-UHFFFAOYSA-N 0.000 description 2
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- 230000033116 oxidation-reduction process Effects 0.000 description 1
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- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- LXNAVEXFUKBNMK-UHFFFAOYSA-N palladium(II) acetate Substances [Pd].CC(O)=O.CC(O)=O LXNAVEXFUKBNMK-UHFFFAOYSA-N 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
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- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
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- 229910052761 rare earth metal Inorganic materials 0.000 description 1
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- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- KOUDKOMXLMXFKX-UHFFFAOYSA-N sodium oxido(oxo)phosphanium hydrate Chemical compound O.[Na+].[O-][PH+]=O KOUDKOMXLMXFKX-UHFFFAOYSA-N 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- IOGXOCVLYRDXLW-UHFFFAOYSA-N tert-butyl nitrite Chemical compound CC(C)(C)ON=O IOGXOCVLYRDXLW-UHFFFAOYSA-N 0.000 description 1
- 239000012414 tert-butyl nitrite Substances 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 238000002411 thermogravimetry Methods 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 150000003613 toluenes Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- FPZZZGJWXOHLDJ-UHFFFAOYSA-N trihexylphosphane Chemical compound CCCCCCP(CCCCCC)CCCCCC FPZZZGJWXOHLDJ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- OYQCBJZGELKKPM-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O-2].[Zn+2].[O-2].[In+3] OYQCBJZGELKKPM-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- GWDUZCIBPDVBJM-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzothiazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1 GWDUZCIBPDVBJM-UHFFFAOYSA-L 0.000 description 1
- QEPMORHSGFRDLW-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzoxazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)OC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)OC2=CC=CC=C2N1 QEPMORHSGFRDLW-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1003—Carbocyclic compounds
- C09K2211/1007—Non-condensed systems
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1003—Carbocyclic compounds
- C09K2211/1011—Condensed systems
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1003—Carbocyclic compounds
- C09K2211/1014—Carbocyclic compounds bridged by heteroatoms, e.g. N, P, Si or B
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1029—Heterocyclic compounds characterised by ligands containing one nitrogen atom as the heteroatom
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Indole Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
【解決手段】下記一般式(G1)で表されるアントラセン誘導体を提供する。但し、式中Ar1、Ar2はそれぞれ独立に、環を形成する炭素数が6乃至13のアリール基の中から選ばれるいずれか一を表し、R1、R2はそれぞれ独立に、水素、炭素数1乃至4のアルキル基及び環を形成する炭素数が6乃至13のアリール基の中から選ばれるいずれか一を表す。また、Ar1、Ar2、R1、R2は置換基を有していても良く、2つの置換基が互いに結合して環を形成していても良い。
【選択図】なし
Description
本発明のアントラセン誘導体は9,10−ジアリールアントラセンの2位にカルバゾリル基が結合した分子構造を有するアントラセン誘導体である。なお、カルバゾリル基は3位と6位に置換基を有していても良い。このような構成を有する本実施の形態におけるアントラセン誘導体は、大きなエネルギーギャップを有し、青色の発光を呈する発光素子の発光素子用材料として非常に好適に用いることができる。
湿式法は、薄膜の形成材料を溶媒に溶解し、その液状の組成物を被形成領域に付着させ、溶媒を除去し固化させることによって薄膜として形成することを特徴とする方法である。この特徴から、湿式法は材料の利用効率が高い、基板の大型化に対応しやすい等の多くのメリットを有し、生産性向上、低コスト化に大きな威力を発する。しかし、発光素子に用いられる多くの低分子化合物は湿式法によって成膜すると膜質が悪く、真空蒸着法で成膜した膜と同様の使用法で用いることが困難である。また、適当な溶媒に不溶若しくは溶けにくい事も多い。このため、低分子化合物の湿式法での成膜はあまり行われていないのが現状である。
実施の形態1に記載のアントラセン誘導体を用いた発光素子の一態様について図1(A)を用いて以下に説明する。
本実施の形態では、実施の形態2で示した構成と異なる構成の発光素子について説明する。
本実施の形態では、実施の形態3又は実施の形態4で示した構成と異なる構成の発光素子について説明する。
本実施の形態は、複数の発光ユニットを積層した構成の発光素子(以下、積層型素子ともいう)の態様について、図1(B)を参照して説明する。この発光素子は、第1の電極と第2の電極との間に、複数の発光ユニットを有する発光素子である。発光ユニットとしては、実施の形態3乃至実施の形態5で示したEL層103と同様な構成を用いることができる。つまり、実施の形態3乃至実施の形態5で示した発光素子は、1つの発光ユニットを有する発光素子であり、本実施の形態では、複数の発光ユニットを有する発光素子ということができる。
本実施の形態では、実施の形態1に記載のアントラセン誘導体を有機半導体素子の一種である縦型トランジスタ(SIT)の活性層として用いる形態を例示する。
本実施の形態では、本発明のアントラセン誘導体を用いて作製された発光装置について説明する。
本実施の形態では、湿式法として液滴吐出法を用いて実施の形態1に記載のアントラセン誘導体を含む膜を形成する方法を発光素子におけるEL層を形成する場合を例に説明する。なお、本実施の形態における成膜方法は、発光素子におけるEL層の作製方法に限定されず、実施の形態2に記載の組成物(実施の形態1に記載のアントラセン誘導体と溶剤とを少なくとも含む組成物)を用いた成膜全てに応用することができる。
本実施の形態では、実施の形態8に示す発光装置をその一部に含む本発明の電子機器について説明する。本発明の電子機器は、実施の形態1に示したアントラセン誘導体を含み、その結果、色再現性に優れ、表示品質の高い表示部を有する電子機器とすることが可能である。
46g(206mmol)の臭化銅(II)、500mLのアセトニトリルを1L三口フラスコへ入れ、17.3g(168mmol)の亜硝酸tert−ブチルを加えた。この混合物を65℃で加熱しながら、25g(111mmol)の2−アミノ−9,10−アントラキノンを加えた。この混合物を同温度で6時間撹拌した。攪拌後、この反応溶液を約500mLの塩酸(3.0mol/L)中に注ぎ、この混合物を3時間撹拌した。攪拌後、混合物中の析出物を濾過し、得られた濾物を水とエタノールで洗浄した。洗浄後、濾物をトルエンに溶かし、この溶液をフロリジール(和光純薬工業株式会社、カタログ番号:540−00135)、セライト(和光純薬工業株式会社、カタログ番号:531−16855)、アルミナを通して吸引ろ過した。得られた濾液を濃縮して得た固体を、クロロホルム/ヘキサンにより再結晶したところ目的物の2−ブロモ−9,10−アントラキノンを淡黄色粉末状固体として18.6g、収率58%で得た。ステップ1の合成スキームを(a−1)に示す。
ステップ1で合成した4.90g(17.0mmol)の2−ブロモ−9,10−アントラキノンを、300mLの三口フラスコへ入れ、フラスコ内を窒素置換してから、フラスコへ100mLのテトラヒドロフラン(THF)を加えた。この溶液へ、17.8mL(37.3mmol)のフェニルリチウムを滴下して加え、滴下終了後、この溶液を室温で15時間撹拌した。攪拌後、この溶液を水で洗浄し、水層を酢酸エチルで抽出した。抽出溶液と有機層を合わせて硫酸マグネシウムで乾燥した。乾燥後、この混合物を自然ろ過し、得られたろ液を濃縮したところ、2−ブロモ−9,10−ジフェニルアントラセン−9,10−ジオールを得た。得られた2−ブロモ−9,10−ジフェニルアントラセン−9,10−ジオール全てと、5.06g(30.5mmol)のヨウ化カリウムと、9.70g(91.5mmol)のホスフィン酸ナトリウム一水和物と、50mLの氷酢酸を500mLの三口フラスコへ入れ、この混合物を120℃で2時間攪拌した。攪拌後、この混合物へ30mLの50%ホスフィン酸を加え、さらに120℃で1時間撹拌した。攪拌後、この溶液を水で洗浄し、水層を酢酸エチルで抽出した。抽出溶液と有機層を合わせて硫酸マグネシウムで乾燥した。この混合物を自然ろ過し、得られたろ液を濃縮したところ、淡黄色固体を得た。得られた固体をトルエンに溶かし、この溶液をセライト(和光純薬工業株式会社、カタログ番号:531−16855)、フロリジール(和光純薬工業株式会社、カタログ番号:540−00135)、アルミナを通して吸引ろ過した。得られたろ液を濃縮して得た固体を、クロロホルム/ヘキサンにより再結晶したところ目的物である2−ブロモ−9,10−ジフェニルアントラセンの淡黄色粉末状固体を5.1g、収率74%で得た。ステップ2の合成スキームを(a−2)に示す。
ステップ2で合成した、1.5g(3.7mmol)の2−ブロモ−9、10−ジフェニルアントラセンと、610mg(3.7mmol)の9H−カルバゾールと、1.5g(16mmol)のナトリウム tert−ブトキシドを100mLの三口フラスコへ入れ、フラスコ内を窒素置換した。この混合物へ、20mLのトルエンと、0.10mLのトリ(tert−ブチル)ホスフィン(10wt%ヘキサン溶液)を加えた。この混合物を、減圧下で攪拌しながら脱気し、脱気後、58mg(0.10mmol)のビス(ジベンジリデンアセトン)パラジウム(0)を加えた。この混合物を、110℃で5時間還流した。還流後、この混合物を室温までさまして、約20mLのトルエンを加えてから、アルミナ、セライト(和光純薬工業株式会社、カタログ番号:531−16855)、フロリジール(和光純薬工業株式会社、カタログ番号:540−00135)を通してろ過した。得られたろ液を濃縮したところ、淡褐色油状物を得た。この油状物をシリカゲルカラムクロマトグラフィー(展開溶媒は、ヘキサン:トルエン=6:4の混合溶媒)により精製し、得られた淡黄色固体をエタノールにより再結晶したところ、淡黄色粉末状固体を1.7g、収率93%で得た。得られた淡黄色粉末状固体1.6gを圧力8.7Pa、アルゴンガスを流量3.0mL/minで流しながら、230℃で加熱し昇華精製を行った(トレインサブリメーション法)。昇華精製後、淡黄色固体を1.5g回収率93%で得た。ステップ3の合成スキームを(a−3)に示す。
まず、陽極として機能する第1の電極102として110nmの膜厚でケイ素を含むインジウム錫酸化物(ITSO)が成膜されたガラス基板101を用意した。ITSO表面は、周辺をポリイミド膜で覆い、電極面積を2mm×2mmとした。この基板101上に発光素子を形成するための前処理として、基板表面を水で洗浄し、200℃で1時間焼成した後、UVオゾン処理を370秒行った。その後、10−4Pa程度まで内部が減圧された真空蒸着装置に基板101を導入し、真空蒸着装置内の加熱室において170℃で30分間の真空焼成を行った後、基板101を30分程度放冷した。
以上により得られた発光素子1を、窒素雰囲気のグローブボックス内において、発光素子が大気に曝されないように封止する作業を行った後、この発光素子の動作特性について測定を行った。なお、測定は室温(25℃に保たれた雰囲気)で行った。
正孔輸送層112を形成するまでは、実施例1と同様に作製した。
以上により得られた発光素子2を、窒素雰囲気のグローブボックス内において、発光素子が大気に曝されないように封止する作業を行った後、この発光素子の動作特性について測定を行った。なお、測定は室温(25℃に保たれた雰囲気)で行った。
正孔輸送層112を形成するまでは、実施例1と同様に作製した。
以上により得られた発光素子3を、窒素雰囲気のグローブボックス内において、発光素子が大気に曝されないように封止する作業を行った後、この発光素子の動作特性について測定を行った。なお、測定は室温(25℃に保たれた雰囲気)で行った。
発光層113を形成するまでは、実施例1と同様に作製した。
以上により得られた発光素子4を、窒素雰囲気のグローブボックス内において、発光素子が大気に曝されないように封止する作業を行った後、この発光素子の動作特性について測定を行った。なお、測定は室温(25℃に保たれた雰囲気)で行った。
比較例として9、10−ジフェニルアントラセン(略称:DPAnth)を溶媒トルエンに溶解し組成物を形成し、湿式法により薄膜を形成した例を示す。
2CzBPhAの合成スキームを(H−1)に示す。
Claims (13)
- 下記一般式(1)で表されるアントラセン誘導体。
但し、式中Ar1、Ar2はそれぞれ独立に、環を形成する炭素数が6乃至13のアリール基の中から選ばれるいずれか一を表し、R1、R2はそれぞれ独立に、水素、炭素数1乃至4のアルキル基及び環を形成する炭素数が6乃至13のアリール基の中から選ばれるいずれか一を表す。また、Ar1、Ar2、R1、R2は置換基を有していても良く、2つの置換基がお互いに結合して環を形成していても良い。 - 下記一般式(1)で表されるアントラセン誘導体。
但し、式中Ar1、Ar2はそれぞれ独立に、下記構造式(1−1)乃至(1−16)で表される置換基のいずれか一を表し、また、R1、R2はそれぞれ独立に、水素又は下記構造式(2−1)乃至(2−24)で表される置換基のいずれか一を表す。
- 下記構造式(1)で表されるアントラセン誘導体。
- 請求項1乃至請求項3に記載のアントラセン誘導体を用いた発光材料。
- 請求項1乃至請求項3に記載のアントラセン誘導体を用いた発光素子用材料。
- 請求項1乃至請求項3に記載のアントラセン誘導体と溶剤とを含む塗布用組成物。
- 請求項1乃至請求項3に記載のアントラセン誘導体を用いた発光素子。
- 請求項1乃至請求項3に記載のアントラセン誘導体を発光層に用いた発光素子。
- 請求項1乃至請求項3に記載のアントラセン誘導体を発光層のホスト材料として用いた発光素子。
- 請求項1乃至請求項3に記載のアントラセン誘導体を発光中心材料として用いた発光素子。
- 請求項6に記載の塗布用組成物を用いて作製された発光素子。
- 請求項7乃至請求項11に記載の発光素子と、前記発光素子を制御する手段とを備えた発光装置。
- 請求項12に記載の発光装置を表示部に備えた電子機器。
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Also Published As
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US20090253916A1 (en) | 2009-10-08 |
EP2107096A3 (en) | 2010-04-14 |
EP2107096B1 (en) | 2012-08-22 |
US8722904B2 (en) | 2014-05-13 |
EP2107096A2 (en) | 2009-10-07 |
JP5352304B2 (ja) | 2013-11-27 |
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