JP2009120946A5 - - Google Patents

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Publication number
JP2009120946A5
JP2009120946A5 JP2008271476A JP2008271476A JP2009120946A5 JP 2009120946 A5 JP2009120946 A5 JP 2009120946A5 JP 2008271476 A JP2008271476 A JP 2008271476A JP 2008271476 A JP2008271476 A JP 2008271476A JP 2009120946 A5 JP2009120946 A5 JP 2009120946A5
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JP
Japan
Prior art keywords
shadow mask
substrate
deposition
region
light
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JP2008271476A
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English (en)
Japanese (ja)
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JP2009120946A (ja
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Priority to JP2008271476A priority Critical patent/JP2009120946A/ja
Priority claimed from JP2008271476A external-priority patent/JP2009120946A/ja
Publication of JP2009120946A publication Critical patent/JP2009120946A/ja
Publication of JP2009120946A5 publication Critical patent/JP2009120946A5/ja
Withdrawn legal-status Critical Current

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JP2008271476A 2007-10-23 2008-10-22 成膜方法および発光装置の作製方法 Withdrawn JP2009120946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008271476A JP2009120946A (ja) 2007-10-23 2008-10-22 成膜方法および発光装置の作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007274900 2007-10-23
JP2008271476A JP2009120946A (ja) 2007-10-23 2008-10-22 成膜方法および発光装置の作製方法

Publications (2)

Publication Number Publication Date
JP2009120946A JP2009120946A (ja) 2009-06-04
JP2009120946A5 true JP2009120946A5 (https=) 2011-11-10

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JP2008271476A Withdrawn JP2009120946A (ja) 2007-10-23 2008-10-22 成膜方法および発光装置の作製方法

Country Status (5)

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US (1) US20090104721A1 (https=)
JP (1) JP2009120946A (https=)
KR (1) KR20090041316A (https=)
CN (1) CN101691652A (https=)
TW (1) TWI500787B (https=)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101689519B1 (ko) * 2007-12-26 2016-12-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 증착용 기판, 증착용 기판의 제조방법, 및 발광장치의 제조방법
US8080811B2 (en) 2007-12-28 2011-12-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing evaporation donor substrate and light-emitting device
WO2009099002A1 (en) 2008-02-04 2009-08-13 Semiconductor Energy Laboratory Co., Ltd. Deposition method and method for manufacturing light-emitting device
WO2009107548A1 (en) * 2008-02-29 2009-09-03 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
JP5416987B2 (ja) * 2008-02-29 2014-02-12 株式会社半導体エネルギー研究所 成膜方法及び発光装置の作製方法
US8182863B2 (en) 2008-03-17 2012-05-22 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
KR101629637B1 (ko) * 2008-05-29 2016-06-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 성막방법 및 발광장치의 제조방법
US8535108B2 (en) 2009-07-03 2013-09-17 Sharp Kabushiki Kaisha Formation method of an organic layer, manufacturing method of an organic electroluminescent element, organic electroluminescent element, and organic electroluminescent display device
KR101892407B1 (ko) * 2009-09-07 2018-08-27 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광 소자, 발광 장치, 조명 장치 및 전자 기기
EP2555594A4 (en) * 2010-03-31 2014-05-07 Toray Industries DONORSUBSTRAT FOR TRANSPORT, DEVICE MANUFACTURING METHOD AND ORGANIC ELEMENT
KR101182448B1 (ko) * 2010-07-12 2012-09-12 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조 방법
JP5559656B2 (ja) * 2010-10-14 2014-07-23 大日本スクリーン製造株式会社 熱処理装置および熱処理方法
CN103168114B (zh) 2010-10-19 2015-09-23 夏普株式会社 蒸镀装置、蒸镀方法和有机电致发光显示装置的制造方法
WO2012053532A1 (ja) * 2010-10-20 2012-04-26 株式会社アルバック 有機膜形成装置及び有機膜形成方法
CN102021536A (zh) * 2010-12-16 2011-04-20 潘重光 任意尺寸底板及显示屏的气相沉积荫罩板系统及其方法
DE112012007377B4 (de) 2011-02-16 2025-08-07 Semiconductor Energy Laboratory Co., Ltd. Licht emittierendes Element
TWI486470B (zh) * 2011-03-22 2015-06-01 Au Optronics Corp 蒸鍍設備
EP2584062A1 (de) * 2011-10-19 2013-04-24 Heraeus Materials Technology GmbH & Co. KG Sputtertarget und seine Verwendung
EP2781296B1 (de) * 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
KR20150007740A (ko) * 2013-07-12 2015-01-21 삼성디스플레이 주식회사 전사용 도너 기판 및 유기 발광 표시 장치의 제조 방법
US9517963B2 (en) 2013-12-17 2016-12-13 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
TWI570982B (zh) * 2013-12-31 2017-02-11 昆山工研院新型平板顯示技術中心有限公司 An organic light emitting display device and a top emission organic light emitting diode device with improved viewing angle characteristics
CN106103789A (zh) * 2014-03-12 2016-11-09 阿德文泰克全球有限公司 用于大面积沉积的小掩模铺设技术
EP3166895B1 (en) 2014-07-08 2021-11-24 Corning Incorporated Methods and apparatuses for laser processing materials
JP2017530867A (ja) 2014-07-14 2017-10-19 コーニング インコーポレイテッド 長さおよび直径の調節可能なレーザビーム焦線を用いて透明材料を加工するためのシステムおよび方法
KR102181239B1 (ko) 2014-09-03 2020-11-23 삼성디스플레이 주식회사 박막 형성 장치 및 그를 이용한 박막 형성 방법
CN105679967B (zh) * 2014-11-18 2018-06-26 昆山国显光电有限公司 掩膜板、制备有机发光显示装置的方法
CN104362170B (zh) * 2014-11-28 2017-04-12 京东方科技集团股份有限公司 一种有机电致发光显示器件、其驱动方法及相关装置
DE102015101932A1 (de) 2015-02-11 2016-08-25 Von Ardenne Gmbh Verfahren und Vorrichtung zur strukturierten Beschichtung von Substraten
JP7292006B2 (ja) 2015-03-24 2023-06-16 コーニング インコーポレイテッド ディスプレイガラス組成物のレーザ切断及び加工
CN104911548B (zh) * 2015-06-30 2017-05-03 合肥鑫晟光电科技有限公司 一种真空蒸镀装置及蒸镀方法
CN107835794A (zh) 2015-07-10 2018-03-23 康宁股份有限公司 在挠性基材板中连续制造孔的方法和与此相关的产品
CN105483619B (zh) * 2016-01-26 2018-01-02 京东方科技集团股份有限公司 移动靶镀膜装置及镀膜方法
EP3452418B1 (en) 2016-05-06 2022-03-02 Corning Incorporated Laser cutting and removal of contoured shapes from transparent substrates
JP6923284B2 (ja) 2016-09-30 2021-08-18 コーニング インコーポレイテッド 非軸対称ビームスポットを用いて透明被加工物をレーザ加工するための装置及び方法
LT3529214T (lt) 2016-10-24 2021-02-25 Corning Incorporated Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui
CN111092171B (zh) * 2018-10-23 2022-08-16 宸鸿光电科技股份有限公司 有机发光二极管结构的形成方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3801730B2 (ja) * 1997-05-09 2006-07-26 株式会社半導体エネルギー研究所 プラズマｃｖｄ装置及びそれを用いた薄膜形成方法
US5937272A (en) * 1997-06-06 1999-08-10 Eastman Kodak Company Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate
US6165543A (en) * 1998-06-17 2000-12-26 Nec Corporation Method of making organic EL device and organic EL transfer base plate
US8853696B1 (en) * 1999-06-04 2014-10-07 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and electronic device
TWI232595B (en) * 1999-06-04 2005-05-11 Semiconductor Energy Lab Electroluminescence display device and electronic device
JP2002175878A (ja) * 2000-09-28 2002-06-21 Sanyo Electric Co Ltd 層の形成方法及びカラー発光装置の製造方法
DE10133686C2 (de) * 2001-07-11 2003-07-17 Osram Opto Semiconductors Gmbh Organisches, elektrolumineszierendes Display und dessen Herstellung
JP2003073804A (ja) * 2001-08-30 2003-03-12 Sony Corp 成膜方法および成膜装置
US6821348B2 (en) * 2002-02-14 2004-11-23 3M Innovative Properties Company In-line deposition processes for circuit fabrication
US6703179B2 (en) * 2002-03-13 2004-03-09 Eastman Kodak Company Transfer of organic material from a donor to form a layer in an OLED device
JP2004103341A (ja) * 2002-09-09 2004-04-02 Matsushita Electric Ind Co Ltd 有機エレクトロルミネッセンス素子の製造方法
US20040191564A1 (en) * 2002-12-17 2004-09-30 Samsung Sdi Co., Ltd. Donor film for low molecular weight full color organic electroluminescent device using laser induced thermal imaging method and method for fabricating low molecular weight full color organic electroluminescent device using the film
JP2004296201A (ja) * 2003-03-26 2004-10-21 Tohoku Pioneer Corp 蒸着源、蒸着装置、有機ｅｌ素子、有機ｅｌ素子の製造方法
JP4493926B2 (ja) * 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 製造装置
US20050079418A1 (en) * 2003-10-14 2005-04-14 3M Innovative Properties Company In-line deposition processes for thin film battery fabrication
JP2005120418A (ja) * 2003-10-16 2005-05-12 Stanley Electric Co Ltd 蒸着装置及び薄膜形成方法
US20050145326A1 (en) * 2004-01-05 2005-07-07 Eastman Kodak Company Method of making an OLED device
JP4534011B2 (ja) * 2004-06-25 2010-09-01 京セラ株式会社 マスクアライメント法を用いたディスプレイの製造方法
JP2006077297A (ja) * 2004-09-10 2006-03-23 Seiko Epson Corp マスク、成膜方法、有機ｅｌ装置の製造方法
JP4375232B2 (ja) * 2005-01-06 2009-12-02 セイコーエプソン株式会社 マスク成膜方法
JP2006309995A (ja) * 2005-04-27 2006-11-09 Sony Corp 転写用基板および表示装置の製造方法ならびに表示装置
JP2006344459A (ja) * 2005-06-08 2006-12-21 Sony Corp 転写方法および転写装置
TWI307612B (en) * 2005-04-27 2009-03-11 Sony Corp Transfer method and transfer apparatus

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