JP2009506200A5 - - Google Patents

Info

Publication number
JP2009506200A5
JP2009506200A5 JP2008526067A JP2008526067A JP2009506200A5 JP 2009506200 A5 JP2009506200 A5 JP 2009506200A5 JP 2008526067 A JP2008526067 A JP 2008526067A JP 2008526067 A JP2008526067 A JP 2008526067A JP 2009506200 A5 JP2009506200 A5 JP 2009506200A5
Authority
JP
Japan
Prior art keywords
reflector
thin film
film layer
shadow mask
deposition substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008526067A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009506200A (ja
Filing date
Publication date
Priority claimed from US11/201,587 external-priority patent/US7615501B2/en
Application filed filed Critical
Publication of JP2009506200A publication Critical patent/JP2009506200A/ja
Publication of JP2009506200A5 publication Critical patent/JP2009506200A5/ja
Withdrawn legal-status Critical Current

Links

JP2008526067A 2005-08-11 2006-08-02 薄膜層の作成方法 Withdrawn JP2009506200A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/201,587 US7615501B2 (en) 2005-08-11 2005-08-11 Method for making a thin film layer
PCT/US2006/030067 WO2007021544A2 (en) 2005-08-11 2006-08-02 Method for making a thin film layer

Publications (2)

Publication Number Publication Date
JP2009506200A JP2009506200A (ja) 2009-02-12
JP2009506200A5 true JP2009506200A5 (https=) 2009-09-17

Family

ID=37742820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008526067A Withdrawn JP2009506200A (ja) 2005-08-11 2006-08-02 薄膜層の作成方法

Country Status (5)

Country Link
US (1) US7615501B2 (https=)
EP (1) EP1922433A2 (https=)
JP (1) JP2009506200A (https=)
CN (1) CN101287856B (https=)
WO (1) WO2007021544A2 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090110892A1 (en) * 2004-06-30 2009-04-30 General Electric Company System and method for making a graded barrier coating
US8034419B2 (en) 2004-06-30 2011-10-11 General Electric Company Method for making a graded barrier coating
US8293323B2 (en) * 2007-02-23 2012-10-23 The Penn State Research Foundation Thin metal film conductors and their manufacture
US7884316B1 (en) 2007-03-21 2011-02-08 Saint-Gobain Ceramics & Plastics, Inc. Scintillator device
US7829857B2 (en) * 2008-04-17 2010-11-09 Menge Peter R Radiation detector device
KR100994118B1 (ko) * 2009-01-13 2010-11-15 삼성모바일디스플레이주식회사 유기 발광 소자 및 그 제조 방법
US8629523B2 (en) * 2010-04-16 2014-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Inserted reflective shield to improve quantum efficiency of image sensors
KR101846364B1 (ko) * 2011-07-29 2018-04-09 엘지이노텍 주식회사 광소자 패키지 및 그 제조 방법
JP2013115098A (ja) * 2011-11-25 2013-06-10 Sony Corp トランジスタ、トランジスタの製造方法、表示装置および電子機器
TWI526562B (zh) * 2012-01-12 2016-03-21 Dainippon Printing Co Ltd A manufacturing method of a vapor deposition mask, and a method of manufacturing an organic semiconductor device
US9056432B2 (en) * 2012-04-25 2015-06-16 Johnson & Johnson Vision Care, Inc. High-density mask for three-dimensional substrates and methods for making the same
WO2015026139A1 (ko) * 2013-08-19 2015-02-26 주식회사 엘지화학 유기물 마스크를 포함하는 적층체 및 이를 이용한 유기 발광 소자의 제조방법
KR102399575B1 (ko) * 2014-09-26 2022-05-19 삼성디스플레이 주식회사 증착 위치 정밀도 검사장치 및 그것을 이용한 증착 위치 정밀도 검사방법
CN113555452B (zh) * 2020-04-26 2024-03-15 隆基绿能科技股份有限公司 一种太阳能电池金属电极及其制备方法
CN117230411B (zh) * 2023-06-29 2025-07-29 安徽熙泰智能科技有限公司 一种薄膜沉积装置及其沉积方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3678889A (en) 1970-02-06 1972-07-25 Tokyo Shibaura Electric Co Reflector assembly for reflecting the vapors of high temperature volatile materials
US4022928A (en) 1975-05-22 1977-05-10 Piwcyzk Bernhard P Vacuum deposition methods and masking structure
JPS62136566A (ja) 1985-12-09 1987-06-19 Hitachi Maxell Ltd 蒸着方法ならびに蒸着装置
JPH04365852A (ja) 1991-06-12 1992-12-17 Hitachi Ltd イオンビームミキシング方法およびその装置
US5366764A (en) 1992-06-15 1994-11-22 Sunthankar Mandar B Environmentally safe methods and apparatus for depositing and/or reclaiming a metal or semi-conductor material using sublimation
JPH0853763A (ja) 1994-06-06 1996-02-27 Matsushita Electric Ind Co Ltd 薄膜の製造方法
JPH08199345A (ja) 1995-01-30 1996-08-06 Mitsubishi Electric Corp 成膜装置及び成膜方法
US5554220A (en) 1995-05-19 1996-09-10 The Trustees Of Princeton University Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
GB9711237D0 (en) 1997-06-02 1997-07-23 Isis Innovation Organomettallic Complexes
US6242115B1 (en) 1997-09-08 2001-06-05 The University Of Southern California OLEDs containing thermally stable asymmetric charge carrier materials
US6030715A (en) 1997-10-09 2000-02-29 The University Of Southern California Azlactone-related dopants in the emissive layer of an OLED
US6150043A (en) 1998-04-10 2000-11-21 The Trustees Of Princeton University OLEDs containing thermally stable glassy organic hole transporting materials
GB9820805D0 (en) 1998-09-25 1998-11-18 Isis Innovation Divalent lanthanide metal complexes
JP2000195673A (ja) 1998-12-25 2000-07-14 Sanyo Electric Co Ltd 有機エレクトロルミネッセント素子及び発光素子
CN101312235B (zh) 1999-05-13 2010-06-09 普林斯顿大学理事会 基于电致磷光的极高效有机发光器件
US6716656B2 (en) * 2001-09-04 2004-04-06 The Trustees Of Princeton University Self-aligned hybrid deposition
SG114589A1 (en) 2001-12-12 2005-09-28 Semiconductor Energy Lab Film formation apparatus and film formation method and cleaning method
JP2003183834A (ja) 2001-12-20 2003-07-03 Toshiba Mach Co Ltd 気相成長装置用の反射板
US6897164B2 (en) 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
US20030151118A1 (en) 2002-02-14 2003-08-14 3M Innovative Properties Company Aperture masks for circuit fabrication
US6667215B2 (en) 2002-05-02 2003-12-23 3M Innovative Properties Method of making transistors
US20030230238A1 (en) 2002-06-03 2003-12-18 Fotios Papadimitrakopoulos Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM)
JP2004055401A (ja) 2002-07-22 2004-02-19 Sony Corp 有機膜形成装置
US6890627B2 (en) 2002-08-02 2005-05-10 Eastman Kodak Company Laser thermal transfer from a donor element containing a hole-transporting layer
RU2242532C1 (ru) * 2003-09-09 2004-12-20 Гуревич Сергей Александрович Способ получения наночастиц
US7232694B2 (en) * 2004-09-28 2007-06-19 Advantech Global, Ltd. System and method for active array temperature sensing and cooling
US7833834B2 (en) 2004-09-30 2010-11-16 Sharp Kabushiki Kaisha Method for producing nitride semiconductor laser light source and apparatus for producing nitride semiconductor laser light source
KR20070102482A (ko) * 2004-11-02 2007-10-18 아사히 가라스 가부시키가이샤 플루오로카본막 및 그 제조 방법
US7271094B2 (en) * 2004-11-23 2007-09-18 Advantech Global, Ltd Multiple shadow mask structure for deposition shadow mask protection and method of making and using same

Similar Documents

Publication Publication Date Title
JP2009506200A5 (https=)
WO2011090262A3 (ko) 경사 증착을 이용한 리소그래피 방법
JP2008163457A5 (ja) 成膜装置
JP2008293963A5 (https=)
JP2006028583A5 (ja) 製造装置、膜形成方法、発光装置の作製方法
JP2009120946A5 (https=)
JP2009539252A5 (https=)
KR101988115B1 (ko) 마이크로 오엘이디 제조용 원형 면소스, 및 이를 구비한 원형 면소스 증착장치
CN109306448A (zh) 掩膜组件、蒸镀装置、蒸镀方法、阵列基板及显示面板
JP2010540651A5 (https=)
JP2010130013A5 (https=)
WO2010127328A3 (en) Method and apparatus for organic vapor printing
KR930005110A (ko) 집적회로 제조시 재료를 증착시키는 개선된 방법
JP2008518480A5 (https=)
TWI335356B (en) Apparatus and method for depositing thin films
JP2011012948A5 (https=)
JP2004340932A5 (https=)
JP2014505369A5 (https=)
RU2007103324A (ru) Способ формирования защитного покрытия с улучшенным сцеплением слоев
WO2007021544A3 (en) Method for making a thin film layer
JP2015518085A5 (https=)
BR0308562A (pt) Composição de revestimento de substrato metálico
WO2008008750A3 (en) Resonant infrared laser-assisted nanoparticle transfer and applications of same
JP2017114761A5 (https=)
JP2011106017A5 (https=)