JP2008527130A5 - - Google Patents

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Publication number
JP2008527130A5
JP2008527130A5 JP2007550778A JP2007550778A JP2008527130A5 JP 2008527130 A5 JP2008527130 A5 JP 2008527130A5 JP 2007550778 A JP2007550778 A JP 2007550778A JP 2007550778 A JP2007550778 A JP 2007550778A JP 2008527130 A5 JP2008527130 A5 JP 2008527130A5
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JP
Japan
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alkyl
monomer
phenyl
ion
polymer
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JP2007550778A
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English (en)
Japanese (ja)
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JP5225689B2 (ja
JP2008527130A (ja
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Priority claimed from PCT/EP2006/050000 external-priority patent/WO2006074969A1/en
Publication of JP2008527130A publication Critical patent/JP2008527130A/ja
Publication of JP2008527130A5 publication Critical patent/JP2008527130A5/ja
Application granted granted Critical
Publication of JP5225689B2 publication Critical patent/JP5225689B2/ja
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JP2007550778A 2005-01-11 2006-01-02 制御されたフリーラジカル重合プロセスにより製造したホモ及びコポリマーの後変性プロセス Expired - Lifetime JP5225689B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP05100102.2 2005-01-11
EP05100102 2005-01-11
PCT/EP2006/050000 WO2006074969A1 (en) 2005-01-11 2006-01-02 Process for the post-modification of homo and copolymers prepared by controlled free radical polymerization processes

Publications (3)

Publication Number Publication Date
JP2008527130A JP2008527130A (ja) 2008-07-24
JP2008527130A5 true JP2008527130A5 (https=) 2009-02-19
JP5225689B2 JP5225689B2 (ja) 2013-07-03

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JP2007550778A Expired - Lifetime JP5225689B2 (ja) 2005-01-11 2006-01-02 制御されたフリーラジカル重合プロセスにより製造したホモ及びコポリマーの後変性プロセス

Country Status (8)

Country Link
US (3) US20090221739A1 (https=)
EP (1) EP1861429B1 (https=)
JP (1) JP5225689B2 (https=)
KR (1) KR101322668B1 (https=)
CN (1) CN100577692C (https=)
BR (1) BRPI0606305A2 (https=)
RU (1) RU2401281C2 (https=)
WO (1) WO2006074969A1 (https=)

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KR102353641B1 (ko) * 2020-10-14 2022-01-21 한국화학연구원 불소계 고분자의 제조 방법, 불소계 고분자, 및 이를 포함하는 고분자막
JP7625243B2 (ja) * 2020-10-16 2025-02-03 山陽色素株式会社 黒色顔料分散体
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