JP2008525801A - ２面測定用の重複する共通光路干渉計 - Google Patents

２面測定用の重複する共通光路干渉計 Download PDF

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Publication number
JP2008525801A
JP2008525801A JP2007548326A JP2007548326A JP2008525801A JP 2008525801 A JP2008525801 A JP 2008525801A JP 2007548326 A JP2007548326 A JP 2007548326A JP 2007548326 A JP2007548326 A JP 2007548326A JP 2008525801 A JP2008525801 A JP 2008525801A
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Prior art keywords
reference surface
test
measurement
interferometer
optical path
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Pending
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JP2007548326A
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Japanese (ja)
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JP2008525801A5 (enExample
Inventor
ダブリュ クラウィエク，アンドルー
ジェイ トロノロネ，マーク
シー マロン，ジョーゼフ
ジェイ ダン，トーマス
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Corning Inc
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Corning Inc
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Publication of JP2008525801A publication Critical patent/JP2008525801A/ja
Publication of JP2008525801A5 publication Critical patent/JP2008525801A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2007548326A 2004-12-23 2005-12-14 ２面測定用の重複する共通光路干渉計 Pending JP2008525801A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/023,018 US7268887B2 (en) 2004-12-23 2004-12-23 Overlapping common-path interferometers for two-sided measurement
PCT/US2005/045617 WO2006071569A2 (en) 2004-12-23 2005-12-14 Overlapping common-path interferometers for two-sided measurement

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013161155A Division JP2013257336A (ja) 2004-12-23 2013-08-02 ２面測定用の重複する共通光路干渉計

Publications (2)

Publication Number Publication Date
JP2008525801A true JP2008525801A (ja) 2008-07-17
JP2008525801A5 JP2008525801A5 (enExample) 2009-01-29

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Family Applications (2)

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JP2007548326A Pending JP2008525801A (ja) 2004-12-23 2005-12-14 ２面測定用の重複する共通光路干渉計
JP2013161155A Pending JP2013257336A (ja) 2004-12-23 2013-08-02 ２面測定用の重複する共通光路干渉計

Family Applications After (1)

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JP2013161155A Pending JP2013257336A (ja) 2004-12-23 2013-08-02 ２面測定用の重複する共通光路干渉計

Country Status (7)

Country Link
US (1) US7268887B2 (enExample)
EP (1) EP1831639A4 (enExample)
JP (2) JP2008525801A (enExample)
KR (1) KR20070090033A (enExample)
CN (1) CN101087990A (enExample)
TW (1) TWI282405B (enExample)
WO (1) WO2006071569A2 (enExample)

Cited By (2)

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JP2014515498A (ja) * 2011-05-27 2014-06-30 コーニング インコーポレイテッド 一体化光学キャビティを備えた複合二重共通光路干渉計
KR20230136489A (ko) * 2022-03-18 2023-09-26 덕우전자주식회사 이차전지 벤트캡의 노치두께 측정장치

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US7492469B2 (en) 2004-03-15 2009-02-17 Zygo Corporation Interferometry systems and methods using spatial carrier fringes
US7417743B2 (en) * 2004-03-15 2008-08-26 Zygo Corporation Interferometry systems and methods
JP4556169B2 (ja) * 2004-10-29 2010-10-06 富士フイルム株式会社 保持歪み測定方法および装置
JP2006292539A (ja) * 2005-04-11 2006-10-26 Konica Minolta Sensing Inc 光学特性測定のための支援装置およびコンピュータプログラム
JP4729423B2 (ja) * 2006-03-28 2011-07-20 株式会社ミツトヨ 光学干渉計
JP4878904B2 (ja) * 2006-04-14 2012-02-15 株式会社ミツトヨ 寸法差測定方法、及びその装置
DE102008001473B3 (de) * 2008-04-30 2009-12-31 Robert Bosch Gmbh Optische Anordnung zur Beleuchtung eines Messobjektes, interferometrische Anordnung zur Vermessung von Flächen eines Messobjektes
DE102008001482A1 (de) * 2008-04-30 2009-11-05 Robert Bosch Gmbh Interferometrische Anordnung sowie Verfahren zum Einstellen eines Gangunterschieds
GB0910736D0 (en) * 2009-06-22 2009-08-05 Pilkington Group Ltd Improved film thickness measurement
EP2384692B1 (de) * 2010-05-07 2020-09-09 Rowiak GmbH Anordnung und Verfahren zur Interferometrie
JP2012002608A (ja) * 2010-06-15 2012-01-05 Fujifilm Corp 面ずれ面倒れ測定装置
JP5882674B2 (ja) 2011-10-24 2016-03-09 キヤノン株式会社 多波長干渉計、計測装置および計測方法
DE102012203315B4 (de) * 2011-11-30 2014-10-16 Micro-Epsilon Messtechnik Gmbh & Co. Kg Vorrichtung und ein Verfahren zur Abstands- oder Dickenmessung eines Objekts
US9163928B2 (en) * 2013-04-17 2015-10-20 Kla-Tencor Corporation Reducing registration error of front and back wafer surfaces utilizing a see-through calibration wafer
KR101464698B1 (ko) * 2013-04-25 2014-11-27 (주)프로옵틱스 이미지 포인트 정렬이 용이한 피조우 간섭계
KR101539946B1 (ko) * 2013-08-22 2015-07-29 에스엔유 프리시젼 주식회사 통합형 형상 측정장치
ITBO20130617A1 (it) * 2013-11-12 2015-05-13 Marposs Spa Sistema e metodo per il controllo della posizione mutua di componenti di un pezzo meccanico e apparecchiatura che utilizza tali sistema e metodo
US9651359B2 (en) * 2014-11-21 2017-05-16 Kla-Tencor Corporation Dual wavelength dual interferometer with combiner-splitter
US9683831B2 (en) * 2015-03-23 2017-06-20 The Boeing Company Ring laser measurement apparatus and method
JP6271493B2 (ja) * 2015-05-25 2018-01-31 Ckd株式会社 三次元計測装置
WO2017003983A1 (en) 2015-06-30 2017-01-05 Corning Incorporated Interferometric roll-off measurement using a static fringe pattern
US9892334B2 (en) * 2015-11-01 2018-02-13 Joshua Noel Hogan Optical coherence tomography array based subdermal imaging device
US10236222B2 (en) * 2017-02-08 2019-03-19 Kla-Tencor Corporation System and method for measuring substrate and film thickness distribution
CN109855530B (zh) * 2017-11-30 2021-03-09 上海微电子装备（集团）股份有限公司 干涉仪系统及其使用方法
CN110542393B (zh) * 2018-05-28 2021-09-03 阳程科技股份有限公司 板材的倾角测量装置及测量方法
US10782120B2 (en) * 2018-07-03 2020-09-22 Kla Corporation Dual-interferometry wafer thickness gauge
US11262191B1 (en) * 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same
US10563975B1 (en) * 2018-07-25 2020-02-18 Applejack 199 L.P. Dual-sensor arrangment for inspecting slab of material
US11143503B2 (en) * 2018-08-07 2021-10-12 Kimball Electronics Indiana, Inc. Interferometric waviness detection systems
CN108955549A (zh) * 2018-09-11 2018-12-07 深圳立仪科技有限公司 一种透光材料双面测厚装置
US12196944B2 (en) 2020-01-09 2025-01-14 Kimball Electronics Indiana, Inc. Imaging system for leak detection
US10948356B1 (en) * 2020-06-22 2021-03-16 Quantum Valley Ideas Laboratories Measuring wavelength of light
CN112082492B (zh) * 2020-09-04 2021-12-21 哈尔滨工程大学 具有角度监测的薄膜厚度与折射率同时测量的装置及方法
TWI775152B (zh) * 2020-09-22 2022-08-21 萬潤科技股份有限公司 物件厚度量測方法及裝置
TWI781446B (zh) * 2020-09-22 2022-10-21 萬潤科技股份有限公司 物件厚度量測裝置
US11435234B1 (en) 2021-02-10 2022-09-06 Quantum Valley Ideas Laboratories Increasing the measurement precision of optical instrumentation using Kalman-type filters
CN113340212A (zh) * 2021-05-14 2021-09-03 中国科学院上海光学精密机械研究所 基于双侧干涉仪的形貌与厚度检测装置
CN113251897B (zh) * 2021-05-17 2022-11-11 东北大学秦皇岛分校 一种基于白光干涉的量块测量装置及方法
KR102869254B1 (ko) * 2023-08-22 2025-10-14 주식회사 컨택비젼 2면 이미지 동시 측정 시스템 및 방법
DE102024111194A1 (de) * 2024-04-22 2025-10-23 Precitec Optronik Gmbh Vorrichtung zur optischen Messung der Dicke eines intransparenten Objekts sowie Verfahren zum Kalibrieren einer solchen Vorrichtung

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JPS62106310A (ja) * 1985-11-02 1987-05-16 Fuji Photo Optical Co Ltd 平行平面板の平行度測定装置
JPH11260873A (ja) * 1998-03-09 1999-09-24 Super Silicon Kenkyusho:Kk ウェーハの光学式形状測定器
JP2001241923A (ja) * 2000-02-29 2001-09-07 Kobe Steel Ltd 形状測定装置
JP2002005640A (ja) * 2000-06-20 2002-01-09 Kobe Steel Ltd 光学式形状測定装置
JP2003194523A (ja) * 2001-12-21 2003-07-09 National Institute Of Advanced Industrial & Technology 測長装置
JP2003269923A (ja) * 2002-03-15 2003-09-25 Fuji Photo Optical Co Ltd 絶対厚み測定装置
JP2004037104A (ja) * 2002-06-28 2004-02-05 Mitsutoyo Corp 寸法測定装置
JP2004294432A (ja) * 2003-03-20 2004-10-21 Phase Shift Technology Inc 研磨された不透明なプレートの形状と厚さ変化を測定する方法と装置

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JPS62106310A (ja) * 1985-11-02 1987-05-16 Fuji Photo Optical Co Ltd 平行平面板の平行度測定装置
JPH11260873A (ja) * 1998-03-09 1999-09-24 Super Silicon Kenkyusho:Kk ウェーハの光学式形状測定器
JP2001241923A (ja) * 2000-02-29 2001-09-07 Kobe Steel Ltd 形状測定装置
JP2002005640A (ja) * 2000-06-20 2002-01-09 Kobe Steel Ltd 光学式形状測定装置
JP2003194523A (ja) * 2001-12-21 2003-07-09 National Institute Of Advanced Industrial & Technology 測長装置
JP2003269923A (ja) * 2002-03-15 2003-09-25 Fuji Photo Optical Co Ltd 絶対厚み測定装置
JP2004037104A (ja) * 2002-06-28 2004-02-05 Mitsutoyo Corp 寸法測定装置
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014515498A (ja) * 2011-05-27 2014-06-30 コーニング インコーポレイテッド 一体化光学キャビティを備えた複合二重共通光路干渉計
KR20230136489A (ko) * 2022-03-18 2023-09-26 덕우전자주식회사 이차전지 벤트캡의 노치두께 측정장치
KR102760712B1 (ko) * 2022-03-18 2025-02-03 덕우전자주식회사 이차전지 벤트캡의 노치두께 측정장치

Also Published As

Publication number Publication date
WO2006071569A2 (en) 2006-07-06
EP1831639A4 (en) 2009-05-27
US20060139656A1 (en) 2006-06-29
TWI282405B (en) 2007-06-11
WO2006071569A3 (en) 2007-02-08
EP1831639A2 (en) 2007-09-12
JP2013257336A (ja) 2013-12-26
CN101087990A (zh) 2007-12-12
TW200639370A (en) 2006-11-16
US7268887B2 (en) 2007-09-11
KR20070090033A (ko) 2007-09-04

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