JP2008525801A5 - - Google Patents

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Publication number
JP2008525801A5
JP2008525801A5 JP2007548326A JP2007548326A JP2008525801A5 JP 2008525801 A5 JP2008525801 A5 JP 2008525801A5 JP 2007548326 A JP2007548326 A JP 2007548326A JP 2007548326 A JP2007548326 A JP 2007548326A JP 2008525801 A5 JP2008525801 A5 JP 2008525801A5
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JP
Japan
Prior art keywords
reference surface
test
measurement
interferometer
test component
Prior art date
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Pending
Application number
JP2007548326A
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English (en)
Japanese (ja)
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JP2008525801A (ja
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Publication date
Priority claimed from US11/023,018 external-priority patent/US7268887B2/en
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Publication of JP2008525801A publication Critical patent/JP2008525801A/ja
Publication of JP2008525801A5 publication Critical patent/JP2008525801A5/ja
Pending legal-status Critical Current

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JP2007548326A 2004-12-23 2005-12-14 ２面測定用の重複する共通光路干渉計 Pending JP2008525801A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/023,018 US7268887B2 (en) 2004-12-23 2004-12-23 Overlapping common-path interferometers for two-sided measurement
PCT/US2005/045617 WO2006071569A2 (en) 2004-12-23 2005-12-14 Overlapping common-path interferometers for two-sided measurement

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013161155A Division JP2013257336A (ja) 2004-12-23 2013-08-02 ２面測定用の重複する共通光路干渉計

Publications (2)

Publication Number Publication Date
JP2008525801A JP2008525801A (ja) 2008-07-17
JP2008525801A5 true JP2008525801A5 (enExample) 2009-01-29

Family

ID=36611088

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007548326A Pending JP2008525801A (ja) 2004-12-23 2005-12-14 ２面測定用の重複する共通光路干渉計
JP2013161155A Pending JP2013257336A (ja) 2004-12-23 2013-08-02 ２面測定用の重複する共通光路干渉計

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013161155A Pending JP2013257336A (ja) 2004-12-23 2013-08-02 ２面測定用の重複する共通光路干渉計

Country Status (7)

Country Link
US (1) US7268887B2 (enExample)
EP (1) EP1831639A4 (enExample)
JP (2) JP2008525801A (enExample)
KR (1) KR20070090033A (enExample)
CN (1) CN101087990A (enExample)
TW (1) TWI282405B (enExample)
WO (1) WO2006071569A2 (enExample)

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DE102012203315B4 (de) * 2011-11-30 2014-10-16 Micro-Epsilon Messtechnik Gmbh & Co. Kg Vorrichtung und ein Verfahren zur Abstands- oder Dickenmessung eines Objekts
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ITBO20130617A1 (it) * 2013-11-12 2015-05-13 Marposs Spa Sistema e metodo per il controllo della posizione mutua di componenti di un pezzo meccanico e apparecchiatura che utilizza tali sistema e metodo
US9651359B2 (en) * 2014-11-21 2017-05-16 Kla-Tencor Corporation Dual wavelength dual interferometer with combiner-splitter
US9683831B2 (en) * 2015-03-23 2017-06-20 The Boeing Company Ring laser measurement apparatus and method
JP6271493B2 (ja) * 2015-05-25 2018-01-31 Ckd株式会社 三次元計測装置
WO2017003983A1 (en) 2015-06-30 2017-01-05 Corning Incorporated Interferometric roll-off measurement using a static fringe pattern
US9892334B2 (en) * 2015-11-01 2018-02-13 Joshua Noel Hogan Optical coherence tomography array based subdermal imaging device
US10236222B2 (en) * 2017-02-08 2019-03-19 Kla-Tencor Corporation System and method for measuring substrate and film thickness distribution
CN109855530B (zh) * 2017-11-30 2021-03-09 上海微电子装备（集团）股份有限公司 干涉仪系统及其使用方法
CN110542393B (zh) * 2018-05-28 2021-09-03 阳程科技股份有限公司 板材的倾角测量装置及测量方法
US10782120B2 (en) * 2018-07-03 2020-09-22 Kla Corporation Dual-interferometry wafer thickness gauge
US11262191B1 (en) * 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same
US10563975B1 (en) * 2018-07-25 2020-02-18 Applejack 199 L.P. Dual-sensor arrangment for inspecting slab of material
US11143503B2 (en) * 2018-08-07 2021-10-12 Kimball Electronics Indiana, Inc. Interferometric waviness detection systems
CN108955549A (zh) * 2018-09-11 2018-12-07 深圳立仪科技有限公司 一种透光材料双面测厚装置
US12196944B2 (en) 2020-01-09 2025-01-14 Kimball Electronics Indiana, Inc. Imaging system for leak detection
US10948356B1 (en) * 2020-06-22 2021-03-16 Quantum Valley Ideas Laboratories Measuring wavelength of light
CN112082492B (zh) * 2020-09-04 2021-12-21 哈尔滨工程大学 具有角度监测的薄膜厚度与折射率同时测量的装置及方法
TWI775152B (zh) * 2020-09-22 2022-08-21 萬潤科技股份有限公司 物件厚度量測方法及裝置
TWI781446B (zh) * 2020-09-22 2022-10-21 萬潤科技股份有限公司 物件厚度量測裝置
US11435234B1 (en) 2021-02-10 2022-09-06 Quantum Valley Ideas Laboratories Increasing the measurement precision of optical instrumentation using Kalman-type filters
CN113340212A (zh) * 2021-05-14 2021-09-03 中国科学院上海光学精密机械研究所 基于双侧干涉仪的形貌与厚度检测装置
CN113251897B (zh) * 2021-05-17 2022-11-11 东北大学秦皇岛分校 一种基于白光干涉的量块测量装置及方法
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