KR20070090033A - 두 측면 측정용 오버래핑 공통 광로 간섭계 - Google Patents

두 측면 측정용 오버래핑 공통 광로 간섭계 Download PDF

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Publication number
KR20070090033A
KR20070090033A KR1020077016726A KR20077016726A KR20070090033A KR 20070090033 A KR20070090033 A KR 20070090033A KR 1020077016726 A KR1020077016726 A KR 1020077016726A KR 20077016726 A KR20077016726 A KR 20077016726A KR 20070090033 A KR20070090033 A KR 20070090033A
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KR
South Korea
Prior art keywords
reference plane
measurement
test piece
interferometer
test
Prior art date
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Ceased
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KR1020077016726A
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English (en)
Korean (ko)
Inventor
앤드류 더블유 쿠라위엑
마크 제이 트로노로네
조셉 씨 마론
토마스 제이 던
Original Assignee
코닝 인코포레이티드
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Publication of KR20070090033A publication Critical patent/KR20070090033A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020077016726A 2004-12-23 2005-12-14 두 측면 측정용 오버래핑 공통 광로 간섭계 Ceased KR20070090033A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/023,018 US7268887B2 (en) 2004-12-23 2004-12-23 Overlapping common-path interferometers for two-sided measurement
US11/023,018 2004-12-23

Publications (1)

Publication Number Publication Date
KR20070090033A true KR20070090033A (ko) 2007-09-04

Family

ID=36611088

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077016726A Ceased KR20070090033A (ko) 2004-12-23 2005-12-14 두 측면 측정용 오버래핑 공통 광로 간섭계

Country Status (7)

Country Link
US (1) US7268887B2 (enExample)
EP (1) EP1831639A4 (enExample)
JP (2) JP2008525801A (enExample)
KR (1) KR20070090033A (enExample)
CN (1) CN101087990A (enExample)
TW (1) TWI282405B (enExample)
WO (1) WO2006071569A2 (enExample)

Cited By (2)

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Publication number Priority date Publication date Assignee Title
KR101464698B1 (ko) * 2013-04-25 2014-11-27 (주)프로옵틱스 이미지 포인트 정렬이 용이한 피조우 간섭계
CN104422401A (zh) * 2013-08-22 2015-03-18 Snu精密股份有限公司 集成式形状测量装置

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US7417743B2 (en) * 2004-03-15 2008-08-26 Zygo Corporation Interferometry systems and methods
JP4556169B2 (ja) * 2004-10-29 2010-10-06 富士フイルム株式会社 保持歪み測定方法および装置
JP2006292539A (ja) * 2005-04-11 2006-10-26 Konica Minolta Sensing Inc 光学特性測定のための支援装置およびコンピュータプログラム
JP4729423B2 (ja) * 2006-03-28 2011-07-20 株式会社ミツトヨ 光学干渉計
JP4878904B2 (ja) * 2006-04-14 2012-02-15 株式会社ミツトヨ 寸法差測定方法、及びその装置
DE102008001473B3 (de) * 2008-04-30 2009-12-31 Robert Bosch Gmbh Optische Anordnung zur Beleuchtung eines Messobjektes, interferometrische Anordnung zur Vermessung von Flächen eines Messobjektes
DE102008001482A1 (de) * 2008-04-30 2009-11-05 Robert Bosch Gmbh Interferometrische Anordnung sowie Verfahren zum Einstellen eines Gangunterschieds
GB0910736D0 (en) * 2009-06-22 2009-08-05 Pilkington Group Ltd Improved film thickness measurement
EP2384692B1 (de) * 2010-05-07 2020-09-09 Rowiak GmbH Anordnung und Verfahren zur Interferometrie
JP2012002608A (ja) * 2010-06-15 2012-01-05 Fujifilm Corp 面ずれ面倒れ測定装置
US8379219B2 (en) * 2011-05-27 2013-02-19 Corning Incorporated Compound interferometer with monolithic measurement cavity
JP5882674B2 (ja) 2011-10-24 2016-03-09 キヤノン株式会社 多波長干渉計、計測装置および計測方法
DE102012203315B4 (de) * 2011-11-30 2014-10-16 Micro-Epsilon Messtechnik Gmbh & Co. Kg Vorrichtung und ein Verfahren zur Abstands- oder Dickenmessung eines Objekts
US9163928B2 (en) * 2013-04-17 2015-10-20 Kla-Tencor Corporation Reducing registration error of front and back wafer surfaces utilizing a see-through calibration wafer
ITBO20130617A1 (it) * 2013-11-12 2015-05-13 Marposs Spa Sistema e metodo per il controllo della posizione mutua di componenti di un pezzo meccanico e apparecchiatura che utilizza tali sistema e metodo
US9651359B2 (en) * 2014-11-21 2017-05-16 Kla-Tencor Corporation Dual wavelength dual interferometer with combiner-splitter
US9683831B2 (en) * 2015-03-23 2017-06-20 The Boeing Company Ring laser measurement apparatus and method
JP6271493B2 (ja) * 2015-05-25 2018-01-31 Ckd株式会社 三次元計測装置
WO2017003983A1 (en) 2015-06-30 2017-01-05 Corning Incorporated Interferometric roll-off measurement using a static fringe pattern
US9892334B2 (en) * 2015-11-01 2018-02-13 Joshua Noel Hogan Optical coherence tomography array based subdermal imaging device
US10236222B2 (en) * 2017-02-08 2019-03-19 Kla-Tencor Corporation System and method for measuring substrate and film thickness distribution
CN109855530B (zh) * 2017-11-30 2021-03-09 上海微电子装备（集团）股份有限公司 干涉仪系统及其使用方法
CN110542393B (zh) * 2018-05-28 2021-09-03 阳程科技股份有限公司 板材的倾角测量装置及测量方法
US10782120B2 (en) * 2018-07-03 2020-09-22 Kla Corporation Dual-interferometry wafer thickness gauge
US11262191B1 (en) * 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same
US10563975B1 (en) * 2018-07-25 2020-02-18 Applejack 199 L.P. Dual-sensor arrangment for inspecting slab of material
US11143503B2 (en) * 2018-08-07 2021-10-12 Kimball Electronics Indiana, Inc. Interferometric waviness detection systems
CN108955549A (zh) * 2018-09-11 2018-12-07 深圳立仪科技有限公司 一种透光材料双面测厚装置
US12196944B2 (en) 2020-01-09 2025-01-14 Kimball Electronics Indiana, Inc. Imaging system for leak detection
US10948356B1 (en) * 2020-06-22 2021-03-16 Quantum Valley Ideas Laboratories Measuring wavelength of light
CN112082492B (zh) * 2020-09-04 2021-12-21 哈尔滨工程大学 具有角度监测的薄膜厚度与折射率同时测量的装置及方法
TWI775152B (zh) * 2020-09-22 2022-08-21 萬潤科技股份有限公司 物件厚度量測方法及裝置
TWI781446B (zh) * 2020-09-22 2022-10-21 萬潤科技股份有限公司 物件厚度量測裝置
US11435234B1 (en) 2021-02-10 2022-09-06 Quantum Valley Ideas Laboratories Increasing the measurement precision of optical instrumentation using Kalman-type filters
CN113340212A (zh) * 2021-05-14 2021-09-03 中国科学院上海光学精密机械研究所 基于双侧干涉仪的形貌与厚度检测装置
CN113251897B (zh) * 2021-05-17 2022-11-11 东北大学秦皇岛分校 一种基于白光干涉的量块测量装置及方法
KR102760712B1 (ko) * 2022-03-18 2025-02-03 덕우전자주식회사 이차전지 벤트캡의 노치두께 측정장치
KR102869254B1 (ko) * 2023-08-22 2025-10-14 주식회사 컨택비젼 2면 이미지 동시 측정 시스템 및 방법
DE102024111194A1 (de) * 2024-04-22 2025-10-23 Precitec Optronik Gmbh Vorrichtung zur optischen Messung der Dicke eines intransparenten Objekts sowie Verfahren zum Kalibrieren einer solchen Vorrichtung

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
KR101464698B1 (ko) * 2013-04-25 2014-11-27 (주)프로옵틱스 이미지 포인트 정렬이 용이한 피조우 간섭계
CN104422401A (zh) * 2013-08-22 2015-03-18 Snu精密股份有限公司 集成式形状测量装置
KR101539946B1 (ko) * 2013-08-22 2015-07-29 에스엔유 프리시젼 주식회사 통합형 형상 측정장치

Also Published As

Publication number Publication date
WO2006071569A2 (en) 2006-07-06
EP1831639A4 (en) 2009-05-27
US20060139656A1 (en) 2006-06-29
TWI282405B (en) 2007-06-11
WO2006071569A3 (en) 2007-02-08
JP2008525801A (ja) 2008-07-17
EP1831639A2 (en) 2007-09-12
JP2013257336A (ja) 2013-12-26
CN101087990A (zh) 2007-12-12
TW200639370A (en) 2006-11-16
US7268887B2 (en) 2007-09-11

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