JP5882674B2 - 多波長干渉計、計測装置および計測方法 - Google Patents
多波長干渉計、計測装置および計測方法 Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
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- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02061—Reduction or prevention of effects of tilts or misalignment
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
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- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02082—Caused by speckles
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
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- G—PHYSICS
- G01—MEASURING; TESTING
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- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/50—Pupil plane manipulation, e.g. filtering light of certain reflection angles
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
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- Optics & Photonics (AREA)
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Description
上記問題を解決する方法として、レーザ光を物体面に投射して反射光を撮像する装置において、結像レンズの絞り位置を変化させることによりスペックルパターンのランダムな位相のインコヒーレント平均化を行うことが記載されている(特許文献2参照)。
また、別の解決手段として、複数の異なる波長の干渉計測結果から各波長の位相を合成する多波長干渉計が知られている(非特許文献1参照)。非特許文献1によると、2つの波長のスペックルに相関があるならば、その2つの波長の位相差に基づいて巨視的表面プロファイルと微視的表面粗さに関する情報が得られるとしている。
また、2つの波長間のスペックルパターンの相関(度)は2つの波長の合成波長に依存することが知られている(非特許文献2参照)。なお、2つのスペックルパターンが一致するほど相関度が高いとする。非特許文献2によると合成波長Λが小さい程、2波長間のスペックルパターンの相関は減少し、逆に合成波長Λが大きい程、2波長間のスペックルパターンの相関は増加する。ここで、合成波長Λとは2つ波長をλ1、λ2(λ1>λ2)としたとき、Λ=λ1×λ2/(λ1−λ2)で表わされる量である。このように, 単波長干渉計では困難である粗い被検面に対しても多波長干渉計では精度良く計測することが可能となる。
そこで、本発明は、被検面が傾いていても測定精度を悪化させることのない多波長干渉計を提供することを目的とする。
図2は本実施形態の計測装置の概略図である。本実施形態の計測装置は、図2に示すように、複数の固定波長レーザ、被検光と参照光を干渉させる干渉計(光学系)、算出装置(処理部)を有する。
S106では、無効なデータを除いた有効なデータの波長間位相差の平均値(ピクセル平均)を求める。
S107では、S106で求めた波長間位相差の平均値のデータ及び2波長の値(合成波長)に基づいて、測長値(距離)または参照光と被検光との光路長差または形状を求める。ここで、合成波長Λとは2つ波長をλ1、λ2(λ1>λ2)としたとき、Λ=λ1×λ2/(λ1−λ2)で表わされる量である。
図8に本実施形態における測長値算出フローを示す。本実施形態の計測装置は、実施形態1の計測装置と構成は同じである。
Claims (4)
- 波長が互いに異なる少なくとも2つの光束を用いる多波長干渉計において、
前記光束を参照光と被検光とに分割するビームスプリッタと、
前記ビームスプリッタにより分割された前記参照光の周波数と前記被検光の周波数とを互いに異ならせる周波数シフタと、
前記周波数シフタからの前記被検光を被検面に入射させて前記被検面で反射された被検光と、前記周波数シフタからの前記参照光とを干渉させる光学系と、
前記光学系によって干渉した前記被検光と前記参照光との干渉光の波面を複数の光束の波面に分割する波面分割部と、
前記波面分割部により分割された前記複数の光束を各波長について検出する検出部とを有することを特徴とする多波長干渉計。 - 前記検出部によって検出された干渉光の信号から複素振幅を求め、前記複数の光束の各々における波長毎の前記複素振幅の複素相関を求め、前記複素相関に応じて位相を算出するための瞳位置を波長毎に求め、該求められた各波長の瞳位置における位相の情報から、各波長間の位相差を求める処理部を有することを特徴とする請求項1記載の多波長干渉計。
- 前記被検面の傾きの情報を予め取得し、前記傾きの情報から位相を算出するための瞳位置を波長毎に求め、該求められた各波長の瞳位置における位相の情報から、各波長間の位相差を求める処理部を有することを特徴とする請求項1記載の多波長干渉計。
- 前記波面分割部が移動可能であることを特徴とする請求項1記載の多波長干渉計。
Priority Applications (5)
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JP2011233345A JP5882674B2 (ja) | 2011-10-24 | 2011-10-24 | 多波長干渉計、計測装置および計測方法 |
EP12007158.4A EP2587213A1 (en) | 2011-10-24 | 2012-10-16 | Multi-wavelength interferometer, measurement apparatus, and measurement method |
US13/657,631 US9062957B2 (en) | 2011-10-24 | 2012-10-22 | Multi-wavelength interferometer, measurement apparatus, and measurement method |
KR1020120117694A KR20130045189A (ko) | 2011-10-24 | 2012-10-23 | 다파장 간섭계, 측정 장치, 및 측정 방법 |
CN2012104081013A CN103063129A (zh) | 2011-10-24 | 2012-10-24 | 多波长干涉仪、测量设备以及测量方法 |
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JP2013092402A5 JP2013092402A5 (ja) | 2015-01-29 |
JP5882674B2 true JP5882674B2 (ja) | 2016-03-09 |
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US (1) | US9062957B2 (ja) |
EP (1) | EP2587213A1 (ja) |
JP (1) | JP5882674B2 (ja) |
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Families Citing this family (17)
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US9518816B2 (en) * | 2011-12-01 | 2016-12-13 | University Of Rochester | Dual beam splitter interferometer measuring 3 degrees of freedom, system and method of use |
JP5954979B2 (ja) * | 2011-12-15 | 2016-07-20 | キヤノン株式会社 | 多波長干渉計を有する計測装置 |
JP2014115228A (ja) * | 2012-12-11 | 2014-06-26 | Canon Inc | 干渉計測装置、および干渉計測方法 |
US20150131078A1 (en) * | 2013-11-08 | 2015-05-14 | The Boeing Company | Synthetic wave laser ranging sensors and methods |
CN104748699A (zh) * | 2013-12-25 | 2015-07-01 | 财团法人金属工业研究发展中心 | 光学测量系统及方法 |
US9606235B2 (en) * | 2014-01-16 | 2017-03-28 | The Boeing Company | Laser metrology system and method |
US9763570B2 (en) | 2014-02-04 | 2017-09-19 | University Of Southern California | Optical coherence tomography (OCT) system with phase-sensitive B-scan registration |
EP3588061B1 (en) | 2014-12-23 | 2023-04-19 | Apple Inc. | Optical inspection system and method including accounting for variations of optical path length within a sample |
CN108449957B (zh) | 2015-09-01 | 2021-03-09 | 苹果公司 | 用于非接触式感测物质的基准开关架构 |
CN114719977A (zh) | 2016-04-21 | 2022-07-08 | 苹果公司 | 用于参考切换的光学系统 |
GB2551968A (en) * | 2016-06-28 | 2018-01-10 | Oclaro Tech Ltd | Optical locker |
JP6246875B1 (ja) * | 2016-08-24 | 2017-12-13 | Ckd株式会社 | 計測装置 |
CN111164415A (zh) | 2017-09-29 | 2020-05-15 | 苹果公司 | 路径解析的光学采样架构 |
EP3752873A1 (en) | 2018-02-13 | 2020-12-23 | Apple Inc. | Integrated photonics device having integrated edge outcouplers |
WO2022002497A1 (en) * | 2020-06-29 | 2022-01-06 | Asml Netherlands B.V. | A signal parameter determination method, a heterodyne interferometer system, a lithographic apparatus and a device manufacturing method |
US11852318B2 (en) | 2020-09-09 | 2023-12-26 | Apple Inc. | Optical system for noise mitigation |
US11761750B1 (en) | 2022-02-25 | 2023-09-19 | Utah State University Space Dynamics Laboratory | Multi-environment Rayleigh interferometer |
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JP2890309B2 (ja) * | 1988-10-20 | 1999-05-10 | 科学技術振興事業団 | 形態及び機能画像化装置 |
JP2808136B2 (ja) * | 1989-06-07 | 1998-10-08 | キヤノン株式会社 | 測長方法及び装置 |
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JP3501605B2 (ja) * | 1996-12-27 | 2004-03-02 | キヤノン株式会社 | 干渉計及び形状測定装置 |
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- 2012-10-23 KR KR1020120117694A patent/KR20130045189A/ko active IP Right Grant
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US9062957B2 (en) | 2015-06-23 |
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US20130100458A1 (en) | 2013-04-25 |
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