JP2008198777A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2008198777A JP2008198777A JP2007032034A JP2007032034A JP2008198777A JP 2008198777 A JP2008198777 A JP 2008198777A JP 2007032034 A JP2007032034 A JP 2007032034A JP 2007032034 A JP2007032034 A JP 2007032034A JP 2008198777 A JP2008198777 A JP 2008198777A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 51
- 238000009792 diffusion process Methods 0.000 claims abstract description 8
- 238000002955 isolation Methods 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 40
- 230000010354 integration Effects 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 7
- 238000000926 separation method Methods 0.000 abstract description 4
- 239000012535 impurity Substances 0.000 description 39
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 18
- 229910052710 silicon Inorganic materials 0.000 description 18
- 239000010703 silicon Substances 0.000 description 18
- 230000015556 catabolic process Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823412—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0921—Means for preventing a bipolar, e.g. thyristor, action between the different transistor regions, e.g. Latchup prevention
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823481—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823493—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation [BILLI]
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
【解決手段】 トレンチ分離構造を有する半導体装置において、高電源電圧回路部には少なくとも一つのウエル領域とMOS型トランジスタが形成されて成り、ウエル領域の端部近傍にラッチアップを防止するためのキャリア捕獲領域を有し、キャリア捕獲領域の深さはトレンチ分離領域の深さよりも深くした。また、高電源電圧回路部内に形成されたキャリア捕獲領域は、高電源電圧回路部に形成されたMOS型トランジスタのソースあるいはドレイン領域と同一の拡散層にて形成した。
【選択図】 図1
Description
また、高電源電圧回路部内に形成されたキャリア捕獲領域は、高電源電圧回路部に形成されたMOS型トランジスタのソースあるいはドレイン領域と同一の拡散層にて形成した。
201 Pウエル領域
202 Nウエル領域
301 トレンチ分離領域
401 P型の高濃度不純物領域からなるキャリア捕獲領域
402 N型の高濃度不純物領域からなるキャリア捕獲領域
Claims (8)
- 高電源電圧回路部と低電源電圧回路部とを有し、前記高電源電圧回路部および前記低電源電圧回路部における各素子をトレンチ分離領域により素子分離したトレンチ分離構造を有し、前記高電源電圧回路部には少なくとも一つのウエル領域とMOS型トランジスタが形成されている半導体装置において、前記ウエル領域の端部近傍にラッチアップを防止するためのキャリア捕獲領域を有し、前記キャリア捕獲領域の深さは、前記トレンチ分離領域の深さよりも深くしたことを特徴とする半導体装置。
- 前記高電源電圧回路部は、第1導電型半導体基板と、第1導電型の第1ウエル及び第2導電型の第2ウエルから成り、前記第1ウエルと前記第2ウエルの接合部において、前記第1ウエルと前記第2ウエルの両方の端部に、それぞれ前記キャリア捕獲領域を有する請求項1記載の半導体装置。
- 前記高電源電圧回路部は、第1導電型半導体基板と、第2導電型の第2ウエルからなり、前記第1導電型半導体基板と前記第2ウエルの接合部付近において、前記第1導電型半導体基板と前記第2ウエルのそれぞれに前記キャリア捕獲領域を有する請求項1記載の半導体装置。
- 前記高電源電圧回路部は、第1導電型半導体基板と、第1導電型の第1ウエル及び第2導電型の第2ウエルから成り、前記第1ウエルと前記第2ウエルの接合部において、前記第1ウエルの端部にのみ、前記キャリア捕獲領域を有する請求項1記載の半導体装置。
- 前記高電源電圧回路部は、第1導電型半導体基板と、第1導電型の第1ウエル及び第2導電型の第2ウエルから成り、前記第1ウエルと前記第2ウエルの接合部において、前記第2ウエルの端部にのみ、前記キャリア捕獲領域を有する請求項1記載の半導体装置。
- 前記高電源電圧回路部は、第1導電型半導体基板と、第2導電型の第2ウエルからなり、前記第1導電型半導体基板と前記第2ウエルの接合部付近の、前記第1導電型半導体基板側にのみ前記キャリア捕獲領域を有する請求項1記載の半導体装置。
- 前記高電源電圧回路部は、第1導電型半導体基板と、第2導電型の第2ウエルからなり、前記第1導電型半導体基板と前記第2ウエルの接合部付近の、前記第2ウエル側にのみ前記キャリア捕獲領域を有する請求項1記載の半導体装置。
- 前記高電源電圧回路部内に形成された前記キャリア捕獲領域は、前記高電源電圧回路部に形成された前記MOS型トランジスタのソースあるいはドレイン領域と同一の拡散層にて形成されていることを特徴とする請求項1記載の半導体装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007032034A JP2008198777A (ja) | 2007-02-13 | 2007-02-13 | 半導体装置 |
CN2008100966863A CN101271894B (zh) | 2007-02-13 | 2008-02-13 | 半导体装置 |
KR1020080012825A KR101391580B1 (ko) | 2007-02-13 | 2008-02-13 | 반도체 장치 |
US12/030,294 US7667280B2 (en) | 2007-02-13 | 2008-02-13 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007032034A JP2008198777A (ja) | 2007-02-13 | 2007-02-13 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008198777A true JP2008198777A (ja) | 2008-08-28 |
Family
ID=39685113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007032034A Withdrawn JP2008198777A (ja) | 2007-02-13 | 2007-02-13 | 半導体装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7667280B2 (ja) |
JP (1) | JP2008198777A (ja) |
KR (1) | KR101391580B1 (ja) |
CN (1) | CN101271894B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5546191B2 (ja) * | 2009-09-25 | 2014-07-09 | セイコーインスツル株式会社 | 半導体装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS632370A (ja) * | 1986-06-23 | 1988-01-07 | Nissan Motor Co Ltd | 半導体装置 |
JPS63200560A (ja) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Cmos型半導体装置 |
JPH09307000A (ja) * | 1996-05-13 | 1997-11-28 | Citizen Watch Co Ltd | 半導体装置 |
JP2005116744A (ja) * | 2003-10-07 | 2005-04-28 | Seiko Epson Corp | 半導体装置およびその製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5420061A (en) * | 1993-08-13 | 1995-05-30 | Micron Semiconductor, Inc. | Method for improving latchup immunity in a dual-polysilicon gate process |
EP0936677A1 (de) * | 1998-02-16 | 1999-08-18 | Asea Brown Boveri AG | Leistungshalbleiterbauelement mit einer isolierten Gateelektrode und Verfahren zu dessen Herstellung |
JP2000058673A (ja) | 1998-08-14 | 2000-02-25 | Nec Corp | トレンチ分離構造を有する半導体装置 |
US7232712B2 (en) | 2003-10-28 | 2007-06-19 | Dongbu Electronics Co., Ltd. | CMOS image sensor and method for fabricating the same |
JP4854934B2 (ja) * | 2004-06-14 | 2012-01-18 | ルネサスエレクトロニクス株式会社 | 静電気放電保護素子 |
KR100843969B1 (ko) * | 2006-12-20 | 2008-07-03 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서의 제조방법 |
-
2007
- 2007-02-13 JP JP2007032034A patent/JP2008198777A/ja not_active Withdrawn
-
2008
- 2008-02-13 KR KR1020080012825A patent/KR101391580B1/ko active IP Right Grant
- 2008-02-13 US US12/030,294 patent/US7667280B2/en not_active Expired - Fee Related
- 2008-02-13 CN CN2008100966863A patent/CN101271894B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS632370A (ja) * | 1986-06-23 | 1988-01-07 | Nissan Motor Co Ltd | 半導体装置 |
JPS63200560A (ja) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Cmos型半導体装置 |
JPH09307000A (ja) * | 1996-05-13 | 1997-11-28 | Citizen Watch Co Ltd | 半導体装置 |
JP2005116744A (ja) * | 2003-10-07 | 2005-04-28 | Seiko Epson Corp | 半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20080191308A1 (en) | 2008-08-14 |
CN101271894B (zh) | 2012-02-22 |
KR20080075795A (ko) | 2008-08-19 |
KR101391580B1 (ko) | 2014-05-02 |
CN101271894A (zh) | 2008-09-24 |
US7667280B2 (en) | 2010-02-23 |
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