JP2008072126A - オプトエレクトロニクス半導体チップ - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 105
- 230000005693 optoelectronics Effects 0.000 title claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 68
- 239000000463 material Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 10
- 230000001788 irregular Effects 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 5
- 229910002704 AlGaN Inorganic materials 0.000 claims description 4
- -1 InAlGaN Inorganic materials 0.000 claims description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
- 229910002601 GaN Inorganic materials 0.000 description 7
- 238000001514 detection method Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000013139 quantization Methods 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
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- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
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- H01—ELECTRIC ELEMENTS
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
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Abstract
【解決手段】オプトエレクトロニクス半導体チップにおいて、
− 多数の凸部(4)および凹部(3)を有する構造化された成長面(2)を備えた成長基板(1)と、
− この成長面(2)にデポジットされるアクティブ層列(5)と有することを特徴とするオプトエレクトロニクス半導体チップを構成する。
【選択図】図1
Description
つぎに残っているフォトレジスト層20が成長基板1から剥離される。
Claims (19)
- オプトエレクトロニクス半導体チップにおいて、
− 多数の凸部(4)および凹部(3)を有する構造化された成長面(2)を備えた成長基板(1)と、
− 当該成長面(2)にデポジットされるアクティブ層列(5)と有することを特徴とする
オプトエレクトロニクス半導体チップ。 - 前記のアクティブ層列(2)の面積は、成長基板(1)の横方向の断面(Q)の面積よりも大きい、
請求項1に記載のオプトエレクトロニクス半導体チップ。 - 前記のオプトエレクトロニクス半導体チップの動作時にアクティブ層列(5)の全面にわたって電磁ビームが形成されるかまたは検出される、
請求項1または2に記載のオプトエレクトロニクス半導体チップ。 - 前記の成長面(2)が規則的に構造化されている、
請求項1から3までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の凸部(4)および凹部(3)が周期的に配置されている、
請求項1から4までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の成長面(2)は不規則に構造化されている、
請求項1から5までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の成長面(2)は不規則に構造化されており、
アクティブ層列(2)の面積は、成長基板(1)の横方向の断面(Q)の面積よりも大きい、
請求項1に記載のオプトエレクトロニクス半導体チップ。 - 前記の凸部(4)および凹部(3)が不規則な構造として構成されている、
請求項1から7までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の構造化された成長面の2つの凸部(4)間の平均間隔(L)は高々2μmである、
請求項1から8までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の構造化された成長面の2つの凸部(4)間の平均間隔(L)は高々1μmである、
請求項1から9までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の構造化された成長面の2つの凸部(4)間の平均間隔(L)は高々0.5μmである、
請求項1から10までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記のアクティブ層列(5)は、高々20μmの平均厚さ(D)を有する、
請求項1から11までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の凸部(4)および凹部(3)は、構造化された成長面(2)全体にわたって延在している、
請求項1から12までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の成長基板(1)は、材料GaN,SiC,サファイア、InGaN,AlGaN,InAlGaN,ZnOのうちの1つから構成されるか、当該の材料のうちの1つを含む、
請求項1から13までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の成長基板(1)は、nドーピングされたGaNから構成されている、
請求項1から14までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の凸部(4)および凹部(3)は、少なくとも1つのエッチングプロセスによって成長面(2)に構造化される、
請求項1から15までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 前記の凸部(4)および凹部(3)はエピタキシャル成長によって形成される、
請求項1から16までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 成長面(2)が構造化された前記の半導体チップにより、成長面が均一な相応の半導体チップよりも、一層多くの電磁ビームが動作時に形成または検出される、
請求項1から17までのいずれか1項に記載のオプトエレクトロニクス半導体チップ。 - 成長面(2)が構造化された前記の半導体チップにより、当該の成長面(2)が構造化された半導体チップと同じ横方向の断面を有しかつ成長面が均一な相応の半導体チップよりも、ビーム密度の高い電磁ビームが動作時に形成または検出される、
請求項1から18のいずれか1項に記載のオプトエレクトロニクス半導体チップ。
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Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006043400A DE102006043400A1 (de) | 2006-09-15 | 2006-09-15 | Optoelektronischer Halbleiterchip |
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JP2008072126A true JP2008072126A (ja) | 2008-03-27 |
JP2008072126A5 JP2008072126A5 (ja) | 2011-05-26 |
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Country | Link |
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US (1) | US20080073655A1 (ja) |
EP (1) | EP1901357A3 (ja) |
JP (1) | JP2008072126A (ja) |
DE (1) | DE102006043400A1 (ja) |
Cited By (9)
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JP2009111269A (ja) * | 2007-10-31 | 2009-05-21 | Tekcore Co Ltd | 発光ダイオードの構造及びその製造方法 |
WO2009154215A1 (ja) * | 2008-06-20 | 2009-12-23 | 昭和電工株式会社 | Iii族窒化物半導体発光素子及びその製造方法、並びにランプ |
JP2010114159A (ja) * | 2008-11-04 | 2010-05-20 | Meijo Univ | 発光素子及びその製造方法 |
JP2013118378A (ja) * | 2011-12-03 | 2013-06-13 | Qinghua Univ | 発光ダイオード |
JP2013118379A (ja) * | 2011-12-03 | 2013-06-13 | Qinghua Univ | 発光ダイオード |
JP2013118380A (ja) * | 2011-12-03 | 2013-06-13 | Qinghua Univ | 発光ダイオード |
US8759858B2 (en) | 2011-12-03 | 2014-06-24 | Tsinghua University | Light emitting diode |
US8785955B2 (en) | 2011-12-03 | 2014-07-22 | Tsinghua University | Light emitting diode |
US8796716B2 (en) | 2011-12-03 | 2014-08-05 | Tsinghua University | Light emitting diode |
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DE102008030584A1 (de) | 2008-06-27 | 2009-12-31 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines optoelektronischen Bauelementes und optoelektronisches Bauelement |
DE102008035784A1 (de) * | 2008-07-31 | 2010-02-11 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
DE102009008223A1 (de) * | 2009-02-10 | 2010-08-12 | Osram Opto Semiconductors Gmbh | Verfahren zur Strukturierung einer Halbleiteroberfläche und Halbleiterchip |
US8481411B2 (en) * | 2009-06-10 | 2013-07-09 | Seoul Opto Device Co., Ltd. | Method of manufacturing a semiconductor substrate having a cavity |
US8860183B2 (en) | 2009-06-10 | 2014-10-14 | Seoul Viosys Co., Ltd. | Semiconductor substrate, semiconductor device, and manufacturing methods thereof |
US8129205B2 (en) * | 2010-01-25 | 2012-03-06 | Micron Technology, Inc. | Solid state lighting devices and associated methods of manufacturing |
US8859305B2 (en) * | 2010-02-10 | 2014-10-14 | Macron Technology, Inc. | Light emitting diodes and associated methods of manufacturing |
DE102010020162A1 (de) * | 2010-05-11 | 2011-11-17 | Osram Opto Semiconductors Gmbh | Verfahren zur Strukturierung eines Strahlungsauskoppelelements |
DE102010020789B4 (de) * | 2010-05-18 | 2021-05-20 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
EP2509120A1 (en) | 2011-04-05 | 2012-10-10 | Imec | Semiconductor device and method |
CN102184846A (zh) * | 2011-04-22 | 2011-09-14 | 东莞市中镓半导体科技有限公司 | 一种图形化衬底的制备方法 |
DE102012103394A1 (de) | 2012-04-18 | 2013-10-24 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Halbleiterchips und derart hergestellter optoelektronischer Halbleiterchip |
KR20130140325A (ko) * | 2012-06-14 | 2013-12-24 | 삼성디스플레이 주식회사 | 표시 패널 및 이의 제조 방법 |
DE102018133123A1 (de) * | 2018-12-20 | 2020-06-25 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement mit einem zentralen Bereich und einem Randbereich und Verfahren zur Herstellung des optoelektronischen Halbleiterbauelements |
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-
2006
- 2006-09-15 DE DE102006043400A patent/DE102006043400A1/de not_active Withdrawn
-
2007
- 2007-08-29 EP EP07016950.3A patent/EP1901357A3/de not_active Withdrawn
- 2007-09-14 JP JP2007239993A patent/JP2008072126A/ja active Pending
- 2007-09-17 US US11/901,666 patent/US20080073655A1/en not_active Abandoned
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2009111269A (ja) * | 2007-10-31 | 2009-05-21 | Tekcore Co Ltd | 発光ダイオードの構造及びその製造方法 |
WO2009154215A1 (ja) * | 2008-06-20 | 2009-12-23 | 昭和電工株式会社 | Iii族窒化物半導体発光素子及びその製造方法、並びにランプ |
JPWO2009154215A1 (ja) * | 2008-06-20 | 2011-12-01 | 昭和電工株式会社 | Iii族窒化物半導体発光素子及びその製造方法、並びにランプ |
US8421107B2 (en) | 2008-06-20 | 2013-04-16 | Toyoda Gosei Co., Ltd. | Group-III nitride semiconductor light emitting device and production method thereof, and lamp |
JP2010114159A (ja) * | 2008-11-04 | 2010-05-20 | Meijo Univ | 発光素子及びその製造方法 |
JP2013118378A (ja) * | 2011-12-03 | 2013-06-13 | Qinghua Univ | 発光ダイオード |
JP2013118379A (ja) * | 2011-12-03 | 2013-06-13 | Qinghua Univ | 発光ダイオード |
JP2013118380A (ja) * | 2011-12-03 | 2013-06-13 | Qinghua Univ | 発光ダイオード |
US8759858B2 (en) | 2011-12-03 | 2014-06-24 | Tsinghua University | Light emitting diode |
US8785955B2 (en) | 2011-12-03 | 2014-07-22 | Tsinghua University | Light emitting diode |
US8796716B2 (en) | 2011-12-03 | 2014-08-05 | Tsinghua University | Light emitting diode |
Also Published As
Publication number | Publication date |
---|---|
US20080073655A1 (en) | 2008-03-27 |
DE102006043400A1 (de) | 2008-03-27 |
EP1901357A2 (de) | 2008-03-19 |
EP1901357A3 (de) | 2013-07-31 |
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