JP2007525027A5 - - Google Patents

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Publication number
JP2007525027A5
JP2007525027A5 JP2006552571A JP2006552571A JP2007525027A5 JP 2007525027 A5 JP2007525027 A5 JP 2007525027A5 JP 2006552571 A JP2006552571 A JP 2006552571A JP 2006552571 A JP2006552571 A JP 2006552571A JP 2007525027 A5 JP2007525027 A5 JP 2007525027A5
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Japan
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raster element
optical raster
optical
irradiation system
pupil plane
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JP2006552571A
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Japanese (ja)
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JP2007525027A (ja
JP4846600B2 (ja
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Priority claimed from PCT/EP2005/001501 external-priority patent/WO2005078522A2/en
Publication of JP2007525027A publication Critical patent/JP2007525027A/ja
Publication of JP2007525027A5 publication Critical patent/JP2007525027A5/ja
Application granted granted Critical
Publication of JP4846600B2 publication Critical patent/JP4846600B2/ja
Anticipated expiration legal-status Critical
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JP2006552571A 2004-02-17 2005-02-15 マイクロリソグラフィ投射露光装置用照射システム Expired - Fee Related JP4846600B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US54510504P 2004-02-17 2004-02-17
US60/545,105 2004-02-17
PCT/EP2005/001501 WO2005078522A2 (en) 2004-02-17 2005-02-15 Illumination system for a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2007525027A JP2007525027A (ja) 2007-08-30
JP2007525027A5 true JP2007525027A5 (https=) 2008-04-03
JP4846600B2 JP4846600B2 (ja) 2011-12-28

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JP2006552571A Expired - Fee Related JP4846600B2 (ja) 2004-02-17 2005-02-15 マイクロリソグラフィ投射露光装置用照射システム

Country Status (6)

Country Link
US (2) US8004656B2 (https=)
EP (1) EP1716458B1 (https=)
JP (1) JP4846600B2 (https=)
KR (1) KR101170182B1 (https=)
AT (1) ATE511668T1 (https=)
WO (1) WO2005078522A2 (https=)

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