JP2007329362A - パワーモジュール - Google Patents
パワーモジュール Download PDFInfo
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- JP2007329362A JP2007329362A JP2006160421A JP2006160421A JP2007329362A JP 2007329362 A JP2007329362 A JP 2007329362A JP 2006160421 A JP2006160421 A JP 2006160421A JP 2006160421 A JP2006160421 A JP 2006160421A JP 2007329362 A JP2007329362 A JP 2007329362A
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Abstract
【解決手段】適正な物性を有する密着力のあるエポキシ系樹脂を、クラック発生起点であるはんだ最外周部周辺に部分的に塗布することで破壊メカニズムを変えさせ、はんだのクラック発生を阻止,遅延させ、かつクラック進展速度を遅延させることができる。
【選択図】図1
Description
60Sn共晶系はんだが使われてきた。
(c)は、チップ5側を変え、更に、AlN絶縁基板1側で2種類のフィレット形状例を示した。
(例えばSn−3Ag−0.5Cu(融点;217〜221℃))箔を載置し、max245℃のリフロー炉ではんだ付けを行う。最高はんだ付け温度は限定されるものではなく、部品の耐熱性,ぬれ性,溶融分離性等を考慮して決まる。
Cuベース基板2との密着性を確保する必要から、樹脂3にはカップリング剤等を入れる工夫はなされるが、万能ではない。
Claims (6)
- ベース基板とセラミック絶縁基板及び半導体チップがはんだで接続され、樹脂が充填されてなるパワーモジュールにおいて、
前記セラミック絶縁基板とベース基板とのはんだ付け端部周囲、及びその周囲の前記セラミック絶縁基板の端部周囲とその周囲の前記ベース基板表面の一部を包むようにエポキシ系樹脂を被覆して構成することを特徴とするパワーモジュール。 - ベース基板とセラミック絶縁基板及び半導体チップがはんだで接続され、樹脂が充填されてなるパワーモジュールにおいて、
前記セラミック絶縁基板とベース基板とのはんだ付け端部周囲、及びその周囲の前記セラミック絶縁基板の端部周囲とその周囲のデインプル溝加工が施された前記ベース基板表面の一部を包むようにエポキシ系樹脂を被覆して構成することを特徴とするパワーモジュール。 - ベース基板とセラミック絶縁基板及び半導体チップがはんだで接続され、樹脂が充填されてなるパワーモジュールにおいて、
前記セラミック絶縁基板とベース基板とのはんだ付け端部の周囲、及びその周囲の前記セラミック絶縁基板の端部周囲とその周囲の前記ベース基板表面の一部を包むようにエポキシ系樹脂を被覆し、更に、前記半導体チップ上面に高熱伝導性金属板をはんだ付けすると共に該金属板の表面から電極をとり除き、かつ、前記熱伝導性金属板の下面,半導体チップの周囲,はんだ付け部の周囲、及びその周囲の前記セラミック絶縁基板上及びその上の電極上をエポキシ系樹脂で被覆して構成することを特徴とするパワーモジュール。 - ベース基板とセラミック絶縁基板及び半導体チップがはんだで接続され、樹脂で充填されてなるパワーモジュールにおいて、
前記セラミック絶縁基板とベース基板とのはんだ付け端部の周囲、及びその周囲の前記セラミック絶縁基板の端部周囲とその周囲のデインプル溝加工が施された前記ベース基板表面の一部を包むようにエポキシ系樹脂を被覆し、更に、前記半導体チップ上面に高熱伝導性金属板をはんだ付けすると共に該金属板表面から電極をとり除き、かつ、前記熱伝導性金属板の下面,半導体チップの周囲,はんだ付け部の周囲、及びその周囲の前記セラミック絶縁基板上及びその上の電極上をエポキシ系樹脂で被覆して構成することを特徴とするパワーモジュール。 - 請求項1乃至4のいずれか1項に記載のパワーモジュールにおいて、
前記セラミック絶縁基板とベース基板とのはんだ付け端部の4隅部、もしくは4隅部と4辺の中間部に部分的にエポキシ系樹脂を塗布し、該エポキシ系樹脂を塗布したベース基板表面にデインプル溝加工が施されていることを特徴とするパワーモジュール。 - 請求項1乃至5のいずれか1項記載のパワーモジュールにおいて、
前記半導体チップの周辺は、前記エポキシ系樹脂を塗布する前に、ポリイミド系の樹脂が予め塗布されていることを特徴とするパワーモジュール。
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