JP2012039008A - 半導体素子 - Google Patents
半導体素子 Download PDFInfo
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- H01L24/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
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- H01L2224/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
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- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L2224/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
- H01L2224/401—Disposition
- H01L2224/40135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/40137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
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- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
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- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
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Abstract
【解決手段】半導体素子において、基板15の一主面に凹凸形状の表面処理部が設けられ、表面処理部上にはんだ接合層17が形成され、このはんだ接合層を介して半導体実装部品の実装基板が接合されている。
【選択図】図4
Description
前記はんだ接合層の接合材は鉛フリーはんだ材料であり、AgまたはCuのはんだ材料粒子を含有し、該はんだ材料粒子はナノオーダーないしミクロンオーダーの大きさを有する粒子と、該はんだ接合層の厚さを制御する大きさを有するスペーサー粒子とを含み、該スペーサー粒子はその粒子表面に反応制御のためのコーティングを含むことを特徴とする半導体素子が提供される。
Claims (13)
- 一主面に凹凸形状の表面処理部を有する第1の基板と、該第1の基板の一主面上に設けられたはんだ接合層と、該はんだ接合層上に設けられた、第2の基板、該第2の基板上に設けられた配線部、及び該配線部上に実装された少なくとも1つの半導体チップを含む半導体実装部品とを具備することを特徴とする半導体素子。
- 前記表面処理部の凹凸形状は、基板に、電流、時間、添加剤などの製造条件を変化させ、メッキを行うことにより形成されることを特徴とする請求項1に記載の半導体素子。
- 前記表面処理部の凹凸形状は、メッキ後に、エッチングにより形成されることを特徴とする請求項1または2に記載の半導体素子。
- 前記エッチングは、メッキ後にマスキングを施した後に行われることを特徴とする請求項3に記載の半導体素子。
- 前記はんだ接合層と表面処理部を加熱し接合させる際に、加圧を行なうことを特徴とする請求項1ないし3のいずれか1項に記載の半導体素子。
- 前記はんだ接合層の接合材は、AgまたはCuを含有する鉛フリーはんだ材料であることを特徴とする請求項1ないし4のいずれか1項に記載の半導体素子。
- 第1の基板と、該第1の基板の一主面上に設けられたはんだ接合層と、該はんだ接合層上に設けられた、第2の基板、該第2の基板上に設けられた配線部、及び該配線部上に実装された少なくとも1つの半導体チップを含む半導体実装部品とを具備する半導体素子において、
前記はんだ接合層の接合材は鉛フリーはんだ材料であり、AgまたはCuのはんだ材料粒子を含有し、該はんだ材料粒子はナノオーダーないしミクロンオーダーの大きさを有する粒子と、該はんだ接合層の厚さを制御する大きさを有するスペーサー粒子とを含み、該スペーサー粒子はその粒子表面に反応制御のためのコーティングを含むことを特徴とする半導体素子。 - 前記コーティングは、はんだ接合温度で溶けない請求項7に記載の半導体素子。
- 前記コーティングは、ゾルゲル法により形成されたセラミックである請求項8に記載の半導体素子。
- 前記スペーサー粒子表面にCoを付着させる請求項7に記載の半導体素子。
- 前記スペーサー粒子はCu粒子であり、その表面にCoがめっきされている請求項10に記載の半導体素子。
- 前記第1の基板の一主面に凹凸形状の表面処理部を有することを特徴とする請求項7ないし11のいずれか1項に記載の半導体素子。
- 前記半導体チップは、絶縁ゲート型バイポーラトランジスタチップを含み、前記半導体実装部品上に充填された絶縁性ゲルと、該半導体実装部品及び該絶縁性ゲルを封止するケースとをさらに含むことを特徴とする請求項1ないし12のいずれか1項に記載の半導体素子。
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JP2010179628A JP5832731B2 (ja) | 2010-08-10 | 2010-08-10 | 半導体素子 |
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JP2014045576A Division JP5859046B2 (ja) | 2014-03-07 | 2014-03-07 | 半導体素子 |
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JP2012039008A true JP2012039008A (ja) | 2012-02-23 |
JP5832731B2 JP5832731B2 (ja) | 2015-12-16 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013181177A (ja) * | 2012-02-29 | 2013-09-12 | Jx Nippon Mining & Metals Corp | コバルトめっき銅微粉及びコバルトめっき銅微粉を用いて製造した導電ペースト並びにコバルトめっき銅微粉の製造方法 |
JP2016103552A (ja) * | 2014-11-28 | 2016-06-02 | Towa株式会社 | 突起電極付き板状部材の製造方法、突起電極付き板状部材、電子部品の製造方法、及び電子部品 |
EP3834929A1 (en) | 2011-08-31 | 2021-06-16 | Sekisui Chemical Co., Ltd. | Catalyst for oxygenate synthesis and method for manufacturing same, device for manufacturing oxygenate, and method for manufacturing oxygenate |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129257A (ja) * | 1984-11-27 | 1986-06-17 | Sumitomo Metal Ind Ltd | 連続鋳造用鋳型の製法 |
JPH06302938A (ja) * | 1993-04-09 | 1994-10-28 | Ibiden Co Ltd | プリント配線板及びその製造方法 |
JP2000345201A (ja) * | 1999-05-31 | 2000-12-12 | Mitsui Mining & Smelting Co Ltd | 複合銅微粉末及びその製造方法 |
JP2002203932A (ja) * | 2000-10-31 | 2002-07-19 | Hitachi Ltd | 半導体パワー素子用放熱基板とその導体板及びヒートシンク材並びにロー材 |
JP2002270740A (ja) * | 2001-03-09 | 2002-09-20 | Toyo Kohan Co Ltd | 半導体用放熱板およびそれを用いた半導体装置 |
JP2004162164A (ja) * | 2002-09-20 | 2004-06-10 | Dowa Mining Co Ltd | 導電ペースト用銅粉およびその製造方法 |
JP2006210258A (ja) * | 2005-01-31 | 2006-08-10 | Sony Corp | スペーサ、並びに、平面型表示装置及びその組立方法 |
JP2007258184A (ja) * | 2007-05-11 | 2007-10-04 | Hitachi Chem Co Ltd | 電極の接続構造 |
JP2007329362A (ja) * | 2006-06-09 | 2007-12-20 | Hitachi Ltd | パワーモジュール |
JP2008166086A (ja) * | 2006-12-28 | 2008-07-17 | Hitachi Ltd | 導電性焼結層形成用組成物、これを用いた導電性被膜形成法および接合法 |
JP2009075232A (ja) * | 2007-09-19 | 2009-04-09 | Seiko Epson Corp | 電子デバイス、電子デバイスの製造方法、電気光学装置、及び電子機器 |
JP2010109158A (ja) * | 2008-10-30 | 2010-05-13 | Hitachi Ltd | 半導体装置 |
-
2010
- 2010-08-10 JP JP2010179628A patent/JP5832731B2/ja not_active Expired - Fee Related
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129257A (ja) * | 1984-11-27 | 1986-06-17 | Sumitomo Metal Ind Ltd | 連続鋳造用鋳型の製法 |
JPH06302938A (ja) * | 1993-04-09 | 1994-10-28 | Ibiden Co Ltd | プリント配線板及びその製造方法 |
JP2000345201A (ja) * | 1999-05-31 | 2000-12-12 | Mitsui Mining & Smelting Co Ltd | 複合銅微粉末及びその製造方法 |
JP2002203932A (ja) * | 2000-10-31 | 2002-07-19 | Hitachi Ltd | 半導体パワー素子用放熱基板とその導体板及びヒートシンク材並びにロー材 |
JP2002270740A (ja) * | 2001-03-09 | 2002-09-20 | Toyo Kohan Co Ltd | 半導体用放熱板およびそれを用いた半導体装置 |
JP2004162164A (ja) * | 2002-09-20 | 2004-06-10 | Dowa Mining Co Ltd | 導電ペースト用銅粉およびその製造方法 |
JP2006210258A (ja) * | 2005-01-31 | 2006-08-10 | Sony Corp | スペーサ、並びに、平面型表示装置及びその組立方法 |
JP2007329362A (ja) * | 2006-06-09 | 2007-12-20 | Hitachi Ltd | パワーモジュール |
JP2008166086A (ja) * | 2006-12-28 | 2008-07-17 | Hitachi Ltd | 導電性焼結層形成用組成物、これを用いた導電性被膜形成法および接合法 |
JP2007258184A (ja) * | 2007-05-11 | 2007-10-04 | Hitachi Chem Co Ltd | 電極の接続構造 |
JP2009075232A (ja) * | 2007-09-19 | 2009-04-09 | Seiko Epson Corp | 電子デバイス、電子デバイスの製造方法、電気光学装置、及び電子機器 |
JP2010109158A (ja) * | 2008-10-30 | 2010-05-13 | Hitachi Ltd | 半導体装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3834929A1 (en) | 2011-08-31 | 2021-06-16 | Sekisui Chemical Co., Ltd. | Catalyst for oxygenate synthesis and method for manufacturing same, device for manufacturing oxygenate, and method for manufacturing oxygenate |
JP2013181177A (ja) * | 2012-02-29 | 2013-09-12 | Jx Nippon Mining & Metals Corp | コバルトめっき銅微粉及びコバルトめっき銅微粉を用いて製造した導電ペースト並びにコバルトめっき銅微粉の製造方法 |
JP2016103552A (ja) * | 2014-11-28 | 2016-06-02 | Towa株式会社 | 突起電極付き板状部材の製造方法、突起電極付き板状部材、電子部品の製造方法、及び電子部品 |
CN105655250A (zh) * | 2014-11-28 | 2016-06-08 | 东和株式会社 | 带突起电极的板状构件、电子部件及两者的制造方法 |
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