|
US666560A
(en)
*
|
1899-07-25 |
1901-01-22 |
William S Rowland |
Wire fence.
|
|
DE3343868A1
(de)
|
1983-12-03 |
1985-06-13 |
Zeiss Carl Fa |
Objektiv mit kegelschnittflaechen fuer die mikrozonenabbildung
|
|
US4650292A
(en)
|
1983-12-28 |
1987-03-17 |
Polaroid Corporation |
Analytic function optical component
|
|
US5003567A
(en)
*
|
1989-02-09 |
1991-03-26 |
Hawryluk Andrew M |
Soft x-ray reduction camera for submicron lithography
|
|
JP2691226B2
(ja)
|
1989-07-10 |
1997-12-17 |
株式会社ニコン |
赤外線撮像光学装置
|
|
US5071240A
(en)
|
1989-09-14 |
1991-12-10 |
Nikon Corporation |
Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
|
|
US5063586A
(en)
|
1989-10-13 |
1991-11-05 |
At&T Bell Laboratories |
Apparatus for semiconductor lithography
|
|
US5212588A
(en)
*
|
1991-04-09 |
1993-05-18 |
The United States Of America As Represented By The United States Department Of Energy |
Reflective optical imaging system for extreme ultraviolet wavelengths
|
|
US5309276A
(en)
|
1991-08-29 |
1994-05-03 |
Optical Research Associates |
Catoptric optical system including concave and convex reflectors
|
|
JPH0736959A
(ja)
|
1993-07-15 |
1995-02-07 |
Hitachi Ltd |
自由曲面光学系の設計方法
|
|
DE4327656A1
(de)
*
|
1993-08-17 |
1995-02-23 |
Steinheil Optronik Gmbh |
Infrarot-Objektiv
|
|
CA2177170A1
(en)
|
1993-11-23 |
1995-06-01 |
Oleg Vladimirovich Selifanov |
An abrasive material for precision surface treatment and a method for the manufacturing thereof
|
|
JP3358097B2
(ja)
|
1994-04-12 |
2002-12-16 |
株式会社ニコン |
X線投影露光装置
|
|
US6166866A
(en)
|
1995-02-28 |
2000-12-26 |
Canon Kabushiki Kaisha |
Reflecting type optical system
|
|
EP0730180B1
(en)
|
1995-02-28 |
2002-09-04 |
Canon Kabushiki Kaisha |
Reflecting type of zoom lens
|
|
US6021004A
(en)
|
1995-02-28 |
2000-02-01 |
Canon Kabushiki Kaisha |
Reflecting type of zoom lens
|
|
US5815310A
(en)
*
|
1995-12-12 |
1998-09-29 |
Svg Lithography Systems, Inc. |
High numerical aperture ring field optical reduction system
|
|
JP3041328B2
(ja)
|
1996-03-21 |
2000-05-15 |
株式会社那須板金工業 |
平板葺き屋根構造
|
|
US5686728A
(en)
*
|
1996-05-01 |
1997-11-11 |
Lucent Technologies Inc |
Projection lithography system and method using all-reflective optical elements
|
|
JPH11110791A
(ja)
|
1997-09-30 |
1999-04-23 |
Pioneer Electron Corp |
光情報記録媒体の再生ピックアップ装置
|
|
TW594438B
(en)
*
|
1997-11-07 |
2004-06-21 |
Koninkl Philips Electronics Nv |
Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system
|
|
EP1039510A4
(en)
*
|
1997-11-14 |
2003-11-12 |
Nikon Corp |
EXPOSURE DEVICE, MANUFACTURING METHOD THEREOF, AND EXPOSURE METHOD
|
|
US6240158B1
(en)
*
|
1998-02-17 |
2001-05-29 |
Nikon Corporation |
X-ray projection exposure apparatus with a position detection optical system
|
|
US6226346B1
(en)
|
1998-06-09 |
2001-05-01 |
The Regents Of The University Of California |
Reflective optical imaging systems with balanced distortion
|
|
JP2000091209A
(ja)
|
1998-09-14 |
2000-03-31 |
Nikon Corp |
露光装置の製造方法、露光装置、及びデバイス製造方法
|
|
JP4238390B2
(ja)
*
|
1998-02-27 |
2009-03-18 |
株式会社ニコン |
照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
|
|
US6859328B2
(en)
|
1998-05-05 |
2005-02-22 |
Carl Zeiss Semiconductor |
Illumination system particularly for microlithography
|
|
EP0955641B1
(de)
*
|
1998-05-05 |
2004-04-28 |
Carl Zeiss |
Beleuchtungssystem insbesondere für die EUV-Lithographie
|
|
US7186983B2
(en)
*
|
1998-05-05 |
2007-03-06 |
Carl Zeiss Smt Ag |
Illumination system particularly for microlithography
|
|
DE10138313A1
(de)
|
2001-01-23 |
2002-07-25 |
Zeiss Carl |
Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
|
|
US6396067B1
(en)
|
1998-05-06 |
2002-05-28 |
Koninklijke Philips Electronics N.V. |
Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
|
|
US6577443B2
(en)
|
1998-05-30 |
2003-06-10 |
Carl-Zeiss Stiftung |
Reduction objective for extreme ultraviolet lithography
|
|
DE19923609A1
(de)
*
|
1998-05-30 |
1999-12-02 |
Zeiss Carl Fa |
Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie
|
|
EP1293832A1
(en)
*
|
1998-06-08 |
2003-03-19 |
Nikon Corporation |
Projection exposure apparatus and method
|
|
US6072852A
(en)
|
1998-06-09 |
2000-06-06 |
The Regents Of The University Of California |
High numerical aperture projection system for extreme ultraviolet projection lithography
|
|
US6213610B1
(en)
|
1998-09-21 |
2001-04-10 |
Nikon Corporation |
Catoptric reduction projection optical system and exposure apparatus and method using same
|
|
JP2000100694A
(ja)
|
1998-09-22 |
2000-04-07 |
Nikon Corp |
反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
|
|
US6195201B1
(en)
*
|
1999-01-27 |
2001-02-27 |
Svg Lithography Systems, Inc. |
Reflective fly's eye condenser for EUV lithography
|
|
EP1035445B1
(de)
|
1999-02-15 |
2007-01-31 |
Carl Zeiss SMT AG |
Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
|
|
US6600552B2
(en)
|
1999-02-15 |
2003-07-29 |
Carl-Zeiss Smt Ag |
Microlithography reduction objective and projection exposure apparatus
|
|
US7151592B2
(en)
|
1999-02-15 |
2006-12-19 |
Carl Zeiss Smt Ag |
Projection system for EUV lithography
|
|
WO2002048796A2
(en)
|
2000-12-12 |
2002-06-20 |
Carl Zeiss Smt Ag |
Projection system for euv lithography
|
|
US6033079A
(en)
|
1999-03-15 |
2000-03-07 |
Hudyma; Russell |
High numerical aperture ring field projection system for extreme ultraviolet lithography
|
|
WO2000055849A1
(en)
|
1999-03-15 |
2000-09-21 |
Matsushita Electric Industrial Co., Ltd. |
Convergent device, optical head, optical information recording/reproducing and optical information recording/reproducing method
|
|
JP2000286189A
(ja)
*
|
1999-03-31 |
2000-10-13 |
Nikon Corp |
露光装置および露光方法ならびにデバイス製造方法
|
|
US6426506B1
(en)
|
1999-05-27 |
2002-07-30 |
The Regents Of The University Of California |
Compact multi-bounce projection system for extreme ultraviolet projection lithography
|
|
JP4212721B2
(ja)
|
1999-06-10 |
2009-01-21 |
三菱電機株式会社 |
広角反射光学系
|
|
JP4717974B2
(ja)
|
1999-07-13 |
2011-07-06 |
株式会社ニコン |
反射屈折光学系及び該光学系を備える投影露光装置
|
|
US6557443B1
(en)
|
1999-09-09 |
2003-05-06 |
Larue Mark C. |
Bar feeder for machining center
|
|
EP1093021A3
(en)
*
|
1999-10-15 |
2004-06-30 |
Nikon Corporation |
Projection optical system as well as equipment and methods making use of said system
|
|
US6621557B2
(en)
*
|
2000-01-13 |
2003-09-16 |
Nikon Corporation |
Projection exposure apparatus and exposure methods
|
|
TW538256B
(en)
*
|
2000-01-14 |
2003-06-21 |
Zeiss Stiftung |
Microlithographic reduction projection catadioptric objective
|
|
US6867913B2
(en)
*
|
2000-02-14 |
2005-03-15 |
Carl Zeiss Smt Ag |
6-mirror microlithography projection objective
|
|
JP2002015979A
(ja)
|
2000-06-29 |
2002-01-18 |
Nikon Corp |
投影光学系、露光装置及び露光方法
|
|
JP2004512552A
(ja)
|
2000-10-20 |
2004-04-22 |
カール ツァイス シュティフトゥング トレイディング アズ カール ツァイス |
8反射鏡型マイクロリソグラフィ用投影光学系
|
|
DE10052289A1
(de)
*
|
2000-10-20 |
2002-04-25 |
Zeiss Carl |
8-Spiegel-Mikrolithographie-Projektionsobjektiv
|
|
TW573234B
(en)
|
2000-11-07 |
2004-01-21 |
Asml Netherlands Bv |
Lithographic projection apparatus and integrated circuit device manufacturing method
|
|
KR100831706B1
(ko)
|
2001-01-09 |
2008-05-22 |
칼 짜이스 에스엠티 에이지 |
극자외선 리소그라피를 위한 투영시스템
|
|
US6387723B1
(en)
|
2001-01-19 |
2002-05-14 |
Silicon Light Machines |
Reduced surface charging in silicon-based devices
|
|
US20020171047A1
(en)
*
|
2001-03-28 |
2002-11-21 |
Chan Kin Foeng |
Integrated laser diode array and applications
|
|
JP4349550B2
(ja)
|
2001-03-29 |
2009-10-21 |
フジノン株式会社 |
反射型投映用光学系
|
|
TW594043B
(en)
|
2001-04-11 |
2004-06-21 |
Matsushita Electric Industrial Co Ltd |
Reflection type optical apparatus and photographing apparatus using the same, multi-wavelength photographing apparatus, monitoring apparatus for vehicle
|
|
JP2002329655A
(ja)
*
|
2001-05-01 |
2002-11-15 |
Canon Inc |
反射型縮小投影光学系、露光装置及びデバイス製造方法
|
|
DE10139177A1
(de)
*
|
2001-08-16 |
2003-02-27 |
Zeiss Carl |
Objektiv mit Pupillenobskuration
|
|
JP4134544B2
(ja)
|
2001-10-01 |
2008-08-20 |
株式会社ニコン |
結像光学系および露光装置
|
|
JP2003114387A
(ja)
|
2001-10-04 |
2003-04-18 |
Nikon Corp |
反射屈折光学系および該光学系を備える投影露光装置
|
|
JP3581689B2
(ja)
|
2002-01-31 |
2004-10-27 |
キヤノン株式会社 |
位相測定装置
|
|
EP1333260A3
(en)
|
2002-01-31 |
2004-02-25 |
Canon Kabushiki Kaisha |
Phase measuring method and apparatus
|
|
JP2003233001A
(ja)
|
2002-02-07 |
2003-08-22 |
Canon Inc |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
JP2003233005A
(ja)
|
2002-02-07 |
2003-08-22 |
Canon Inc |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
JP2003233002A
(ja)
|
2002-02-07 |
2003-08-22 |
Canon Inc |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
US6989922B2
(en)
|
2002-06-21 |
2006-01-24 |
Nikon Corporation |
Deformable mirror actuation system
|
|
JP2004029625A
(ja)
|
2002-06-28 |
2004-01-29 |
Nikon Corp |
投影光学系、露光装置及び露光方法
|
|
JP2004170869A
(ja)
*
|
2002-11-22 |
2004-06-17 |
Nikon Corp |
結像光学系、露光装置および露光方法
|
|
JP3938040B2
(ja)
|
2002-12-27 |
2007-06-27 |
キヤノン株式会社 |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
US7268891B2
(en)
*
|
2003-01-15 |
2007-09-11 |
Asml Holding N.V. |
Transmission shear grating in checkerboard configuration for EUV wavefront sensor
|
|
JP2004252358A
(ja)
*
|
2003-02-21 |
2004-09-09 |
Canon Inc |
反射型投影光学系及び露光装置
|
|
JP2004252363A
(ja)
*
|
2003-02-21 |
2004-09-09 |
Canon Inc |
反射型投影光学系
|
|
JP2004258541A
(ja)
|
2003-02-27 |
2004-09-16 |
Canon Inc |
反射型光学系
|
|
JP2005003943A
(ja)
*
|
2003-06-12 |
2005-01-06 |
Fuji Xerox Co Ltd |
光学素子およびその製造方法
|
|
JP4428947B2
(ja)
|
2003-06-30 |
2010-03-10 |
キヤノン株式会社 |
結像光学系
|
|
JP2005055553A
(ja)
|
2003-08-08 |
2005-03-03 |
Nikon Corp |
ミラー、温度調整機構付きミラー及び露光装置
|
|
US7085075B2
(en)
|
2003-08-12 |
2006-08-01 |
Carl Zeiss Smt Ag |
Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
|
|
JP2005166778A
(ja)
|
2003-12-01 |
2005-06-23 |
Canon Inc |
露光装置、デバイスの製造方法
|
|
DE10359576A1
(de)
|
2003-12-18 |
2005-07-28 |
Carl Zeiss Smt Ag |
Verfahren zur Herstellung einer optischen Einheit
|
|
DE10360414A1
(de)
|
2003-12-19 |
2005-07-21 |
Carl Zeiss Smt Ag |
EUV-Projektionsobjektiv sowie Verfahren zu dessen Herstellung
|
|
WO2005083759A1
(ja)
*
|
2004-02-27 |
2005-09-09 |
Nikon Corporation |
露光装置、及び微細パターンを有するデバイスの製造方法
|
|
JP2005294608A
(ja)
|
2004-04-01 |
2005-10-20 |
Nikon Corp |
放電光源ユニット、照明光学装置、露光装置および露光方法
|
|
JP2005294087A
(ja)
|
2004-04-01 |
2005-10-20 |
Nikon Corp |
光源ユニット、照明光学装置、露光装置および露光方法
|
|
JP4338577B2
(ja)
*
|
2004-04-28 |
2009-10-07 |
株式会社ブイ・テクノロジー |
露光装置
|
|
US7114818B2
(en)
|
2004-05-06 |
2006-10-03 |
Olympus Corporation |
Optical system, and electronic equipment that incorporates the same
|
|
WO2006069725A1
(de)
*
|
2004-12-23 |
2006-07-06 |
Carl Zeiss Smt Ag |
Hochaperturiges objektiv mit obskurierter pupille
|
|
DE102005042005A1
(de)
|
2004-12-23 |
2006-07-06 |
Carl Zeiss Smt Ag |
Hochaperturiges Objektiv mit obskurierter Pupille
|
|
JP2006245147A
(ja)
|
2005-03-01 |
2006-09-14 |
Canon Inc |
投影光学系、露光装置及びデバイスの製造方法
|
|
JP2006253487A
(ja)
|
2005-03-11 |
2006-09-21 |
Nikon Corp |
照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法
|
|
JP2006351586A
(ja)
|
2005-06-13 |
2006-12-28 |
Nikon Corp |
照明装置、投影露光装置、及びマイクロデバイスの製造方法
|
|
KR100604942B1
(ko)
|
2005-06-18 |
2006-07-31 |
삼성전자주식회사 |
비축상(off-axis) 프로젝션 광학계 및 이를 적용한극자외선 리소그래피 장치
|
|
KR100962911B1
(ko)
|
2005-09-13 |
2010-06-10 |
칼 짜이스 에스엠테 아게 |
마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
|
|
DE102006003375A1
(de)
|
2006-01-24 |
2007-08-09 |
Carl Zeiss Smt Ag |
Gruppenweise korrigiertes Objektiv
|
|
DE102006014380A1
(de)
|
2006-03-27 |
2007-10-11 |
Carl Zeiss Smt Ag |
Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
|