JP2004046189A5 - - Google Patents

Download PDF

Info

Publication number
JP2004046189A5
JP2004046189A5 JP2003194430A JP2003194430A JP2004046189A5 JP 2004046189 A5 JP2004046189 A5 JP 2004046189A5 JP 2003194430 A JP2003194430 A JP 2003194430A JP 2003194430 A JP2003194430 A JP 2003194430A JP 2004046189 A5 JP2004046189 A5 JP 2004046189A5
Authority
JP
Japan
Prior art keywords
lens
relay
lens group
relay lens
group includes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003194430A
Other languages
English (en)
Japanese (ja)
Other versions
JP4159936B2 (ja
JP2004046189A (ja
Filing date
Publication date
Priority claimed from US10/607,193 external-priority patent/US7289277B2/en
Application filed filed Critical
Publication of JP2004046189A publication Critical patent/JP2004046189A/ja
Publication of JP2004046189A5 publication Critical patent/JP2004046189A5/ja
Application granted granted Critical
Publication of JP4159936B2 publication Critical patent/JP4159936B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003194430A 2002-07-09 2003-07-09 リソグラフィシステムの照明システムで使用されるリレーレンズ Expired - Fee Related JP4159936B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39424402P 2002-07-09 2002-07-09
US10/607,193 US7289277B2 (en) 2002-07-09 2003-06-27 Relay lens used in an illumination system of a lithography system

Publications (3)

Publication Number Publication Date
JP2004046189A JP2004046189A (ja) 2004-02-12
JP2004046189A5 true JP2004046189A5 (enExample) 2005-06-16
JP4159936B2 JP4159936B2 (ja) 2008-10-01

Family

ID=29740281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003194430A Expired - Fee Related JP4159936B2 (ja) 2002-07-09 2003-07-09 リソグラフィシステムの照明システムで使用されるリレーレンズ

Country Status (8)

Country Link
US (1) US7289277B2 (enExample)
EP (1) EP1380871B1 (enExample)
JP (1) JP4159936B2 (enExample)
KR (2) KR20040005677A (enExample)
CN (1) CN1328608C (enExample)
DE (1) DE60306042T2 (enExample)
SG (1) SG105008A1 (enExample)
TW (1) TWI301564B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100426462C (zh) * 2005-02-03 2008-10-15 日立笠户机械股份有限公司 图案形成方法
CN100388014C (zh) * 2005-05-16 2008-05-14 中强光电股份有限公司 侧向照明式透镜组
GB0800677D0 (en) * 2008-01-16 2008-02-20 Zeiss Carl Smt Ag Illumination system of a microlithographic projection exposure apparatus
CN103293863B (zh) * 2012-02-24 2015-11-18 上海微电子装备有限公司 一种光刻照明系统
CN104777609B (zh) * 2015-04-03 2018-07-13 中国科学院上海光学精密机械研究所 光刻机照明光瞳偏振态测量用光学系统
US11442254B2 (en) 2019-04-05 2022-09-13 Inner Ray, Inc. Augmented reality projection device
CN119717400B (zh) * 2023-09-27 2025-09-16 光科芯图(北京)科技有限公司 基于平面波的照明系统及曝光设备

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US36832A (en) * 1862-11-04 Improvement in friction-couplings
JPH03230112A (ja) * 1990-02-05 1991-10-14 Minolta Camera Co Ltd 投影レンズ系
US5402267A (en) * 1991-02-08 1995-03-28 Carl-Zeiss-Stiftung Catadioptric reduction objective
USRE38438E1 (en) * 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
DE19653983A1 (de) * 1996-12-21 1998-06-25 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
US6680803B2 (en) * 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
US5969882A (en) 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
WO1999025008A1 (en) * 1997-11-07 1999-05-20 Nikon Corporation Projection exposure device, projection exposure method, and method of manufacturing projection exposure device
JP2000143278A (ja) 1998-11-10 2000-05-23 Nikon Corp 耐久性の向上された投影露光装置及び結像光学系の製造方法
JP4432153B2 (ja) * 1999-08-03 2010-03-17 株式会社ニコン ズームレンズ
EP1115019A3 (en) 1999-12-29 2004-07-28 Carl Zeiss Projection exposure lens with aspheric elements
JP2002055277A (ja) 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
DE10113612A1 (de) 2001-02-23 2002-09-05 Zeiss Carl Teilobjektiv in einem Beleuchtungssystem
JP3985937B2 (ja) * 2001-07-10 2007-10-03 オリンパス株式会社 蛍光用顕微鏡対物レンズ

Similar Documents

Publication Publication Date Title
JP2005519332A5 (enExample)
JP2004522187A5 (enExample)
JP2017040849A5 (enExample)
TW200508818A (en) Projection objectives including a plurality of mirrors with lenses ahead of mirror m3
JP2007502019A5 (enExample)
CN101101365A (zh) 用于数字投影的固定焦距的投影物镜
CN109283668A (zh) 光学镜头
JP2007532937A5 (enExample)
EP1059550A4 (en) REFRACTION REFLECTION IMAGE FORMING SYSTEM AND PROJECTION EXPOSURE APPARATUS INCLUDING THE OPTICAL SYSTEM
JP2007516613A (ja) 少なくとも1つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ
ATE507498T1 (de) Abbildungslinse
JP2004523000A5 (enExample)
JP2009527002A5 (enExample)
JP2009186569A5 (enExample)
JP2007510955A5 (enExample)
JP2000171706A5 (enExample)
EP1884815A3 (en) Fixed-focal objective of the retrofocus type for projector
JPH10115779A5 (ja) 投影光学系、露光装置及び露光方法
ATE534051T1 (de) Retrofokus zoomobjektiv mit drei linsengruppen
TW448307B (en) Optical projection system
EP2189848A3 (en) Catadioptric projection objective
JP2004046189A5 (enExample)
JP2008519433A5 (enExample)
JP2005316398A5 (enExample)
JP2001356268A5 (enExample)