KR20040005677A - 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이 렌즈 - Google Patents
리소그래피 시스템의 조명 시스템에서 사용되는 릴레이 렌즈 Download PDFInfo
- Publication number
- KR20040005677A KR20040005677A KR1020030046329A KR20030046329A KR20040005677A KR 20040005677 A KR20040005677 A KR 20040005677A KR 1020030046329 A KR1020030046329 A KR 1020030046329A KR 20030046329 A KR20030046329 A KR 20030046329A KR 20040005677 A KR20040005677 A KR 20040005677A
- Authority
- KR
- South Korea
- Prior art keywords
- lens
- refraction
- spherical
- lens group
- relay
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 title abstract description 9
- 238000001459 lithography Methods 0.000 title abstract description 7
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims abstract description 19
- 229910001634 calcium fluoride Inorganic materials 0.000 claims abstract description 19
- 239000011521 glass Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 230000005499 meniscus Effects 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 15
- 238000001393 microlithography Methods 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 210000001747 pupil Anatomy 0.000 description 5
- 239000000758 substrate Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000001179 pupillary effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39424402P | 2002-07-09 | 2002-07-09 | |
| US60/394,244 | 2002-07-09 | ||
| US10/607,193 | 2003-06-27 | ||
| US10/607,193 US7289277B2 (en) | 2002-07-09 | 2003-06-27 | Relay lens used in an illumination system of a lithography system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020070084443A Division KR100888011B1 (ko) | 2002-07-09 | 2007-08-22 | 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이렌즈 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20040005677A true KR20040005677A (ko) | 2004-01-16 |
Family
ID=29740281
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020030046329A Ceased KR20040005677A (ko) | 2002-07-09 | 2003-07-09 | 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이 렌즈 |
| KR1020070084443A Expired - Fee Related KR100888011B1 (ko) | 2002-07-09 | 2007-08-22 | 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이렌즈 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020070084443A Expired - Fee Related KR100888011B1 (ko) | 2002-07-09 | 2007-08-22 | 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이렌즈 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7289277B2 (enExample) |
| EP (1) | EP1380871B1 (enExample) |
| JP (1) | JP4159936B2 (enExample) |
| KR (2) | KR20040005677A (enExample) |
| CN (1) | CN1328608C (enExample) |
| DE (1) | DE60306042T2 (enExample) |
| SG (1) | SG105008A1 (enExample) |
| TW (1) | TWI301564B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100426462C (zh) * | 2005-02-03 | 2008-10-15 | 日立笠户机械股份有限公司 | 图案形成方法 |
| CN100388014C (zh) * | 2005-05-16 | 2008-05-14 | 中强光电股份有限公司 | 侧向照明式透镜组 |
| GB0800677D0 (en) * | 2008-01-16 | 2008-02-20 | Zeiss Carl Smt Ag | Illumination system of a microlithographic projection exposure apparatus |
| CN103293863B (zh) * | 2012-02-24 | 2015-11-18 | 上海微电子装备有限公司 | 一种光刻照明系统 |
| CN104777609B (zh) * | 2015-04-03 | 2018-07-13 | 中国科学院上海光学精密机械研究所 | 光刻机照明光瞳偏振态测量用光学系统 |
| US11442254B2 (en) | 2019-04-05 | 2022-09-13 | Inner Ray, Inc. | Augmented reality projection device |
| CN119717400B (zh) * | 2023-09-27 | 2025-09-16 | 光科芯图(北京)科技有限公司 | 基于平面波的照明系统及曝光设备 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US36832A (en) * | 1862-11-04 | Improvement in friction-couplings | ||
| JPH03230112A (ja) * | 1990-02-05 | 1991-10-14 | Minolta Camera Co Ltd | 投影レンズ系 |
| US5402267A (en) | 1991-02-08 | 1995-03-28 | Carl-Zeiss-Stiftung | Catadioptric reduction objective |
| USRE38438E1 (en) * | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
| DE19653983A1 (de) * | 1996-12-21 | 1998-06-25 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| US6680803B2 (en) * | 1996-12-21 | 2004-01-20 | Carl-Zeiss Smt Ag | Partial objective in an illuminating systems |
| US5969882A (en) | 1997-04-01 | 1999-10-19 | Nikon Corporation | Catadioptric optical system |
| KR20010031779A (ko) * | 1997-11-07 | 2001-04-16 | 오노 시게오 | 투영 노광 장치, 투영 노광 방법 및 그 장치의 제조 방법 |
| JP2000143278A (ja) | 1998-11-10 | 2000-05-23 | Nikon Corp | 耐久性の向上された投影露光装置及び結像光学系の製造方法 |
| JP4432153B2 (ja) * | 1999-08-03 | 2010-03-17 | 株式会社ニコン | ズームレンズ |
| EP1115019A3 (en) | 1999-12-29 | 2004-07-28 | Carl Zeiss | Projection exposure lens with aspheric elements |
| JP2002055277A (ja) * | 2000-08-11 | 2002-02-20 | Nikon Corp | リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置 |
| DE10113612A1 (de) | 2001-02-23 | 2002-09-05 | Zeiss Carl | Teilobjektiv in einem Beleuchtungssystem |
| JP3985937B2 (ja) * | 2001-07-10 | 2007-10-03 | オリンパス株式会社 | 蛍光用顕微鏡対物レンズ |
-
2003
- 2003-06-27 US US10/607,193 patent/US7289277B2/en not_active Expired - Lifetime
- 2003-07-08 TW TW092118620A patent/TWI301564B/zh not_active IP Right Cessation
- 2003-07-09 JP JP2003194430A patent/JP4159936B2/ja not_active Expired - Fee Related
- 2003-07-09 SG SG200304198A patent/SG105008A1/en unknown
- 2003-07-09 CN CNB031474225A patent/CN1328608C/zh not_active Expired - Lifetime
- 2003-07-09 EP EP03015468A patent/EP1380871B1/en not_active Expired - Lifetime
- 2003-07-09 DE DE60306042T patent/DE60306042T2/de not_active Expired - Lifetime
- 2003-07-09 KR KR1020030046329A patent/KR20040005677A/ko not_active Ceased
-
2007
- 2007-08-22 KR KR1020070084443A patent/KR100888011B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1328608C (zh) | 2007-07-25 |
| KR20070093380A (ko) | 2007-09-18 |
| JP4159936B2 (ja) | 2008-10-01 |
| DE60306042D1 (de) | 2006-07-27 |
| EP1380871A2 (en) | 2004-01-14 |
| DE60306042T2 (de) | 2006-11-02 |
| US7289277B2 (en) | 2007-10-30 |
| JP2004046189A (ja) | 2004-02-12 |
| CN1495461A (zh) | 2004-05-12 |
| KR100888011B1 (ko) | 2009-03-09 |
| EP1380871B1 (en) | 2006-06-14 |
| US20040008408A1 (en) | 2004-01-15 |
| TWI301564B (en) | 2008-10-01 |
| EP1380871A3 (en) | 2004-03-03 |
| SG105008A1 (en) | 2004-07-30 |
| TW200500819A (en) | 2005-01-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20030709 |
|
| AMND | Amendment | ||
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| AMND | Amendment | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20040923 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20030709 Comment text: Patent Application |
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| E902 | Notification of reason for refusal | ||
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Comment text: Notification of reason for refusal Patent event date: 20060330 Patent event code: PE09021S01D |
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Comment text: Notification of reason for refusal Patent event date: 20061020 Patent event code: PE09021S01D |
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Patent event date: 20070420 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20061020 Comment text: Notification of reason for refusal Patent event code: PE06011S01I Patent event date: 20060330 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
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| J201 | Request for trial against refusal decision | ||
| PJ0201 | Trial against decision of rejection |
Patent event date: 20070723 Comment text: Request for Trial against Decision on Refusal Patent event code: PJ02012R01D Patent event date: 20070420 Comment text: Decision to Refuse Application Patent event code: PJ02011S01I Appeal kind category: Appeal against decision to decline refusal Decision date: 20080801 Appeal identifier: 2007101008050 Request date: 20070723 |
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| A107 | Divisional application of patent | ||
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| PA0107 | Divisional application |
Comment text: Divisional Application of Patent Patent event date: 20070822 Patent event code: PA01071R01D |
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| PB0901 | Examination by re-examination before a trial |
Comment text: Amendment to Specification, etc. Patent event date: 20070822 Patent event code: PB09011R02I Comment text: Request for Trial against Decision on Refusal Patent event date: 20070723 Patent event code: PB09011R01I Comment text: Amendment to Specification, etc. Patent event date: 20061220 Patent event code: PB09011R02I Comment text: Amendment to Specification, etc. Patent event date: 20060615 Patent event code: PB09011R02I Comment text: Amendment to Specification, etc. Patent event date: 20040923 Patent event code: PB09011R02I Comment text: Amendment to Specification, etc. Patent event date: 20030904 Patent event code: PB09011R02I |
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| B601 | Maintenance of original decision after re-examination before a trial | ||
| E801 | Decision on dismissal of amendment | ||
| PB0601 | Maintenance of original decision after re-examination before a trial |
Comment text: Report of Result of Re-examination before a Trial Patent event code: PB06011S01D Patent event date: 20070918 |
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| PE0801 | Dismissal of amendment |
Patent event code: PE08012E01D Comment text: Decision on Dismissal of Amendment Patent event date: 20070918 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20070822 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20061220 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20060615 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20040923 Patent event code: PE08011R01I Comment text: Amendment to Specification, etc. Patent event date: 20030904 |
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| J301 | Trial decision |
Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20070723 Effective date: 20080801 |
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| PJ1301 | Trial decision |
Patent event code: PJ13011S01D Patent event date: 20080801 Comment text: Trial Decision on Objection to Decision on Refusal Appeal kind category: Appeal against decision to decline refusal Request date: 20070723 Decision date: 20080801 Appeal identifier: 2007101008050 |