JP2009276769A5 - - Google Patents
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- Publication number
- JP2009276769A5 JP2009276769A5 JP2009118455A JP2009118455A JP2009276769A5 JP 2009276769 A5 JP2009276769 A5 JP 2009276769A5 JP 2009118455 A JP2009118455 A JP 2009118455A JP 2009118455 A JP2009118455 A JP 2009118455A JP 2009276769 A5 JP2009276769 A5 JP 2009276769A5
- Authority
- JP
- Japan
- Prior art keywords
- imaging
- mirrors
- mirror
- field
- imaging optics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000003384 imaging method Methods 0.000 claims 60
- 230000003287 optical effect Effects 0.000 claims 26
- 210000001747 pupil Anatomy 0.000 claims 7
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5345308P | 2008-05-15 | 2008-05-15 | |
| US61/053,453 | 2008-05-15 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009276769A JP2009276769A (ja) | 2009-11-26 |
| JP2009276769A5 true JP2009276769A5 (enExample) | 2012-06-07 |
| JP5654735B2 JP5654735B2 (ja) | 2015-01-14 |
Family
ID=41445618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009118455A Active JP5654735B2 (ja) | 2008-05-15 | 2009-05-15 | 結像光学器械及びその結像光学器械を含む投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5654735B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016212578A1 (de) * | 2016-07-11 | 2018-01-11 | Carl Zeiss Smt Gmbh | Projektionsoptik für die EUV-Projektionslithographie |
| JP6635904B2 (ja) | 2016-10-14 | 2020-01-29 | キヤノン株式会社 | 投影光学系、露光装置及び物品の製造方法 |
| JP6882053B2 (ja) * | 2016-12-05 | 2021-06-02 | キヤノン株式会社 | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 |
| JP2019211798A (ja) * | 2019-09-18 | 2019-12-12 | キヤノン株式会社 | 投影光学系、露光装置及び物品の製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3339592B2 (ja) * | 1993-03-12 | 2002-10-28 | 株式会社ニコン | 反射屈折投影光学系、並びに露光方法及び装置 |
| JP2000098228A (ja) * | 1998-09-21 | 2000-04-07 | Nikon Corp | 投影露光装置及び露光方法、並びに反射縮小投影光学系 |
| DE10052289A1 (de) * | 2000-10-20 | 2002-04-25 | Zeiss Carl | 8-Spiegel-Mikrolithographie-Projektionsobjektiv |
| JP2006196559A (ja) * | 2005-01-12 | 2006-07-27 | Nikon Corp | 露光装置及びマイクロデバイスの製造方法 |
| JP2007206319A (ja) * | 2006-02-01 | 2007-08-16 | Nikon Corp | 反射屈折光学系、露光装置及びマイクロデバイスの製造方法 |
| JP2008089832A (ja) * | 2006-09-29 | 2008-04-17 | Canon Inc | 露光装置 |
-
2009
- 2009-05-15 JP JP2009118455A patent/JP5654735B2/ja active Active
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