JP2009276769A5 - - Google Patents

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Publication number
JP2009276769A5
JP2009276769A5 JP2009118455A JP2009118455A JP2009276769A5 JP 2009276769 A5 JP2009276769 A5 JP 2009276769A5 JP 2009118455 A JP2009118455 A JP 2009118455A JP 2009118455 A JP2009118455 A JP 2009118455A JP 2009276769 A5 JP2009276769 A5 JP 2009276769A5
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JP
Japan
Prior art keywords
imaging
mirrors
mirror
field
imaging optics
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JP2009118455A
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English (en)
Japanese (ja)
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JP2009276769A (ja
JP5654735B2 (ja
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Publication of JP2009276769A5 publication Critical patent/JP2009276769A5/ja
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Publication of JP5654735B2 publication Critical patent/JP5654735B2/ja
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JP2009118455A 2008-05-15 2009-05-15 結像光学器械及びその結像光学器械を含む投影露光装置 Active JP5654735B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5345308P 2008-05-15 2008-05-15
US61/053,453 2008-05-15

Publications (3)

Publication Number Publication Date
JP2009276769A JP2009276769A (ja) 2009-11-26
JP2009276769A5 true JP2009276769A5 (enExample) 2012-06-07
JP5654735B2 JP5654735B2 (ja) 2015-01-14

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ID=41445618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009118455A Active JP5654735B2 (ja) 2008-05-15 2009-05-15 結像光学器械及びその結像光学器械を含む投影露光装置

Country Status (1)

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JP (1) JP5654735B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016212578A1 (de) * 2016-07-11 2018-01-11 Carl Zeiss Smt Gmbh Projektionsoptik für die EUV-Projektionslithographie
JP6635904B2 (ja) 2016-10-14 2020-01-29 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP2019211798A (ja) * 2019-09-18 2019-12-12 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3339592B2 (ja) * 1993-03-12 2002-10-28 株式会社ニコン 反射屈折投影光学系、並びに露光方法及び装置
JP2000098228A (ja) * 1998-09-21 2000-04-07 Nikon Corp 投影露光装置及び露光方法、並びに反射縮小投影光学系
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2007206319A (ja) * 2006-02-01 2007-08-16 Nikon Corp 反射屈折光学系、露光装置及びマイクロデバイスの製造方法
JP2008089832A (ja) * 2006-09-29 2008-04-17 Canon Inc 露光装置

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