JP5654735B2 - 結像光学器械及びその結像光学器械を含む投影露光装置 - Google Patents

結像光学器械及びその結像光学器械を含む投影露光装置 Download PDF

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JP5654735B2
JP5654735B2 JP2009118455A JP2009118455A JP5654735B2 JP 5654735 B2 JP5654735 B2 JP 5654735B2 JP 2009118455 A JP2009118455 A JP 2009118455A JP 2009118455 A JP2009118455 A JP 2009118455A JP 5654735 B2 JP5654735 B2 JP 5654735B2
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シェーファー ディヴィッド
シェーファー ディヴィッド
フェルトマン ハイコ
フェルトマン ハイコ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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JP2009118455A 2008-05-15 2009-05-15 結像光学器械及びその結像光学器械を含む投影露光装置 Active JP5654735B2 (ja)

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Publication number Priority date Publication date Assignee Title
DE102016212578A1 (de) * 2016-07-11 2018-01-11 Carl Zeiss Smt Gmbh Projektionsoptik für die EUV-Projektionslithographie
JP6635904B2 (ja) 2016-10-14 2020-01-29 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP2019211798A (ja) * 2019-09-18 2019-12-12 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法

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JP3339592B2 (ja) * 1993-03-12 2002-10-28 株式会社ニコン 反射屈折投影光学系、並びに露光方法及び装置
JP2000098228A (ja) * 1998-09-21 2000-04-07 Nikon Corp 投影露光装置及び露光方法、並びに反射縮小投影光学系
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
JP2006196559A (ja) * 2005-01-12 2006-07-27 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2007206319A (ja) * 2006-02-01 2007-08-16 Nikon Corp 反射屈折光学系、露光装置及びマイクロデバイスの製造方法
JP2008089832A (ja) * 2006-09-29 2008-04-17 Canon Inc 露光装置

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