JP2011502347A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011502347A5 JP2011502347A5 JP2010530298A JP2010530298A JP2011502347A5 JP 2011502347 A5 JP2011502347 A5 JP 2011502347A5 JP 2010530298 A JP2010530298 A JP 2010530298A JP 2010530298 A JP2010530298 A JP 2010530298A JP 2011502347 A5 JP2011502347 A5 JP 2011502347A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- mirror
- imaging optical
- image
- field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 33
- 238000003384 imaging method Methods 0.000 claims 29
- 210000001747 pupil Anatomy 0.000 claims 4
- 238000005286 illumination Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US98278507P | 2007-10-26 | 2007-10-26 | |
| DE102007051670 | 2007-10-26 | ||
| DE102007051670.5 | 2007-10-26 | ||
| US60/982,785 | 2007-10-26 | ||
| PCT/EP2008/008381 WO2009052932A1 (en) | 2007-10-26 | 2008-10-02 | Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011502347A JP2011502347A (ja) | 2011-01-20 |
| JP2011502347A5 true JP2011502347A5 (enExample) | 2011-11-24 |
| JP5337159B2 JP5337159B2 (ja) | 2013-11-06 |
Family
ID=40490434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010530298A Active JP5337159B2 (ja) | 2007-10-26 | 2008-10-02 | 結像光学系及びこれを有する投影露光装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US8576376B2 (enExample) |
| EP (2) | EP2203787B1 (enExample) |
| JP (1) | JP5337159B2 (enExample) |
| KR (2) | KR101515663B1 (enExample) |
| CN (2) | CN101836164B (enExample) |
| DE (1) | DE102008042917A1 (enExample) |
| TW (1) | TWI391704B (enExample) |
| WO (1) | WO2009052932A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009053023A2 (en) | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type |
| WO2009052932A1 (en) | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type |
| DE102007051671A1 (de) | 2007-10-26 | 2009-05-07 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik |
| DE102009046685A1 (de) * | 2009-11-13 | 2011-05-26 | Carl Zeiss Smt Gmbh | Abbildende Optik |
| CN105511065B (zh) * | 2009-12-14 | 2019-04-23 | 卡尔蔡司Smt有限责任公司 | 照明光学部件、照明系统、投射曝光设备及组件制造方法 |
| DE102010001336B3 (de) | 2010-01-28 | 2011-07-28 | Carl Zeiss SMT GmbH, 73447 | Anordnung und Verfahren zur Charakterisierung der Polarisationseigenschaften eines optischen Systems |
| EP2598931B1 (en) | 2010-07-30 | 2020-12-02 | Carl Zeiss SMT GmbH | Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |
| DE102010039745A1 (de) * | 2010-08-25 | 2012-03-01 | Carl Zeiss Smt Gmbh | Abbildende Optik |
| DE102010043498A1 (de) * | 2010-11-05 | 2012-05-10 | Carl Zeiss Smt Gmbh | Projektionsobjektiv einer für EUV ausgelegten mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum optischen Justieren eines Projektionsobjektives |
| DE102011076752A1 (de) | 2011-05-31 | 2012-12-06 | Carl Zeiss Smt Gmbh | Abbildende Optik |
| DE102012208793A1 (de) | 2012-05-25 | 2013-11-28 | Carl Zeiss Smt Gmbh | Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik |
| US9448343B2 (en) * | 2013-03-15 | 2016-09-20 | Kla-Tencor Corporation | Segmented mirror apparatus for imaging and method of using the same |
| DE102014223811B4 (de) | 2014-11-21 | 2016-09-29 | Carl Zeiss Smt Gmbh | Abbildende Optik für die EUV-Projektionslithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines strukturierten Bauteils |
| DE102015221983A1 (de) * | 2015-11-09 | 2017-05-11 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
| CN108152940B (zh) * | 2016-12-05 | 2021-04-27 | 佳能株式会社 | 反射折射光学系统、照明光学系统、曝光装置 |
| DE102017215664A1 (de) | 2017-09-06 | 2019-03-07 | Carl Zeiss Smt Gmbh | Optisches System für eine Projektionsbelichtungsanlage |
| US10533823B1 (en) * | 2018-10-27 | 2020-01-14 | Lewis Smith | Tension gun for firing arrows |
| JP2022096461A (ja) * | 2020-12-17 | 2022-06-29 | キヤノン株式会社 | 光学系及び面分光装置 |
| DE102024203605A1 (de) * | 2024-04-18 | 2025-10-23 | Carl Zeiss Smt Gmbh | Abbildende Optik für die Projektionslithographie |
Family Cites Families (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR890004881B1 (ko) * | 1983-10-19 | 1989-11-30 | 가부시기가이샤 히다찌세이사꾸쇼 | 플라즈마 처리 방법 및 그 장치 |
| US4804258A (en) | 1986-05-05 | 1989-02-14 | Hughes Aircraft Company | Four mirror afocal wide field of view optical system |
| GB2197962A (en) | 1986-11-10 | 1988-06-02 | Compact Spindle Bearing Corp | Catoptric reduction imaging apparatus |
| IL113789A (en) | 1994-05-23 | 1999-01-26 | Hughes Aircraft Co | A non-focusing device with three hinged mirrors and a corrective mirror |
| US5473263A (en) | 1994-12-19 | 1995-12-05 | Advanced Micro Devices, Inc. | Negative feedback to reduce voltage oscillation in CMOS output buffers |
| JPH09213618A (ja) * | 1996-01-31 | 1997-08-15 | Canon Inc | 投影露光装置及びそれを用いたデバイスの製造方法 |
| US5737137A (en) * | 1996-04-01 | 1998-04-07 | The Regents Of The University Of California | Critical illumination condenser for x-ray lithography |
| US7186983B2 (en) * | 1998-05-05 | 2007-03-06 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| US6600552B2 (en) | 1999-02-15 | 2003-07-29 | Carl-Zeiss Smt Ag | Microlithography reduction objective and projection exposure apparatus |
| EP1035445B1 (de) * | 1999-02-15 | 2007-01-31 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
| US7151592B2 (en) * | 1999-02-15 | 2006-12-19 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
| US6985210B2 (en) * | 1999-02-15 | 2006-01-10 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
| US6033079A (en) * | 1999-03-15 | 2000-03-07 | Hudyma; Russell | High numerical aperture ring field projection system for extreme ultraviolet lithography |
| JP4143236B2 (ja) | 1999-10-15 | 2008-09-03 | キヤノン株式会社 | 画像形成装置 |
| JP2001185480A (ja) * | 1999-10-15 | 2001-07-06 | Nikon Corp | 投影光学系及び該光学系を備える投影露光装置 |
| EP1093021A3 (en) | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projection optical system as well as equipment and methods making use of said system |
| US6867913B2 (en) | 2000-02-14 | 2005-03-15 | Carl Zeiss Smt Ag | 6-mirror microlithography projection objective |
| KR100787525B1 (ko) | 2000-08-01 | 2007-12-21 | 칼 짜이스 에스엠티 아게 | 6 거울-마이크로리소그래피 - 투사 대물렌즈 |
| DE10052289A1 (de) | 2000-10-20 | 2002-04-25 | Zeiss Carl | 8-Spiegel-Mikrolithographie-Projektionsobjektiv |
| US6785051B2 (en) | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| DE10139177A1 (de) | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
| EP1437408A4 (en) * | 2001-09-17 | 2006-08-23 | Takeshi Imanishi | NOVEL ANTISENSE OLIGONUCLEOTIDE DERIVATIVES AGAINST HEPATITIS C VIRUS |
| JP2004022945A (ja) | 2002-06-19 | 2004-01-22 | Canon Inc | 露光装置及び方法 |
| JP2004158786A (ja) | 2002-11-08 | 2004-06-03 | Canon Inc | 投影光学系及び露光装置 |
| JP3938040B2 (ja) * | 2002-12-27 | 2007-06-27 | キヤノン株式会社 | 反射型投影光学系、露光装置及びデバイス製造方法 |
| JP2004252358A (ja) | 2003-02-21 | 2004-09-09 | Canon Inc | 反射型投影光学系及び露光装置 |
| JP2004252363A (ja) * | 2003-02-21 | 2004-09-09 | Canon Inc | 反射型投影光学系 |
| JP2005057154A (ja) | 2003-08-07 | 2005-03-03 | Canon Inc | 露光装置 |
| TWI311691B (en) | 2003-10-30 | 2009-07-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| KR101200654B1 (ko) | 2003-12-15 | 2012-11-12 | 칼 짜이스 에스엠티 게엠베하 | 고 개구율 및 평평한 단부면을 가진 투사 대물렌즈 |
| JP2005189247A (ja) * | 2003-12-24 | 2005-07-14 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| WO2005098504A1 (en) | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
| ATE411543T1 (de) | 2004-12-15 | 2008-10-15 | Europ Agence Spatiale | Weitwinkel-vierspiegelteleskop mit asphärischen ausserachsenspiegeln |
| JP5366405B2 (ja) * | 2004-12-23 | 2013-12-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 遮光瞳を有する高開口率対物光学系 |
| DE102005042005A1 (de) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
| EP2192446B1 (en) * | 2005-03-08 | 2011-10-19 | Carl Zeiss SMT GmbH | Microlithography projection system with an accessible aperture stop |
| KR101309880B1 (ko) | 2005-05-13 | 2013-09-17 | 칼 짜이스 에스엠티 게엠베하 | 낮은 입사각을 갖는 육-미러 ｅｕｖ 프로젝션 시스템 |
| FR2899698A1 (fr) * | 2006-04-07 | 2007-10-12 | Sagem Defense Securite | Dispositif de collecte de flux de rayonnement electromagnetique dans l'extreme ultraviolet |
| DE102006017336B4 (de) | 2006-04-11 | 2011-07-28 | Carl Zeiss SMT GmbH, 73447 | Beleuchtungssystem mit Zoomobjektiv |
| US20080118849A1 (en) * | 2006-11-21 | 2008-05-22 | Manish Chandhok | Reflective optical system for a photolithography scanner field projector |
| EP1930771A1 (en) | 2006-12-04 | 2008-06-11 | Carl Zeiss SMT AG | Projection objectives having mirror elements with reflective coatings |
| EP1950594A1 (de) * | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
| WO2009052932A1 (en) * | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type |
| WO2009053023A2 (en) | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type |
| DE102007051671A1 (de) | 2007-10-26 | 2009-05-07 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik |
-
2008
- 2008-10-02 WO PCT/EP2008/008381 patent/WO2009052932A1/en not_active Ceased
- 2008-10-02 JP JP2010530298A patent/JP5337159B2/ja active Active
- 2008-10-02 CN CN2008801133751A patent/CN101836164B/zh active Active
- 2008-10-02 CN CN201210297391.9A patent/CN102819197B/zh active Active
- 2008-10-02 EP EP20080802769 patent/EP2203787B1/en active Active
- 2008-10-02 KR KR1020107010512A patent/KR101515663B1/ko active Active
- 2008-10-02 KR KR1020147033292A patent/KR101592136B1/ko active Active
- 2008-10-02 EP EP12171864.7A patent/EP2533104B1/en active Active
- 2008-10-16 DE DE200810042917 patent/DE102008042917A1/de not_active Withdrawn
- 2008-10-24 TW TW97140945A patent/TWI391704B/zh active
-
2010
- 2010-04-26 US US12/767,521 patent/US8576376B2/en not_active Expired - Fee Related
-
2013
- 2013-09-25 US US14/036,563 patent/US9152056B2/en active Active
-
2015
- 2015-09-09 US US14/849,128 patent/US20160004165A1/en not_active Abandoned