JP2016502136A5 - - Google Patents

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Publication number
JP2016502136A5
JP2016502136A5 JP2015541074A JP2015541074A JP2016502136A5 JP 2016502136 A5 JP2016502136 A5 JP 2016502136A5 JP 2015541074 A JP2015541074 A JP 2015541074A JP 2015541074 A JP2015541074 A JP 2015541074A JP 2016502136 A5 JP2016502136 A5 JP 2016502136A5
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JP
Japan
Prior art keywords
collector
mirror
illumination
intensity distribution
euv radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015541074A
Other languages
English (en)
Japanese (ja)
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JP2016502136A (ja
Filing date
Publication date
Priority claimed from DE102012220465.2A external-priority patent/DE102012220465A1/de
Application filed filed Critical
Publication of JP2016502136A publication Critical patent/JP2016502136A/ja
Publication of JP2016502136A5 publication Critical patent/JP2016502136A5/ja
Pending legal-status Critical Current

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JP2015541074A 2012-11-09 2013-10-25 Ｅｕｖコレクター Pending JP2016502136A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261724398P 2012-11-09 2012-11-09
DE102012220465.2 2012-11-09
US61/724,398 2012-11-09
DE102012220465.2A DE102012220465A1 (de) 2012-11-09 2012-11-09 EUV-Kollektor
PCT/EP2013/072427 WO2014072190A1 (en) 2012-11-09 2013-10-25 Euv collector

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018193508A Division JP6792600B2 (ja) 2012-11-09 2018-10-12 Ｅｕｖコレクター

Publications (2)

Publication Number Publication Date
JP2016502136A JP2016502136A (ja) 2016-01-21
JP2016502136A5 true JP2016502136A5 (enExample) 2018-04-05

Family

ID=50555780

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2015541074A Pending JP2016502136A (ja) 2012-11-09 2013-10-25 Ｅｕｖコレクター
JP2018193508A Active JP6792600B2 (ja) 2012-11-09 2018-10-12 Ｅｕｖコレクター

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018193508A Active JP6792600B2 (ja) 2012-11-09 2018-10-12 Ｅｕｖコレクター

Country Status (5)

Country Link
US (1) US9754695B2 (enExample)
JP (2) JP2016502136A (enExample)
CN (1) CN104769503B (enExample)
DE (1) DE102012220465A1 (enExample)
WO (1) WO2014072190A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014223452A1 (de) * 2014-11-18 2016-05-19 Carl Zeiss Smt Gmbh Optisches Teilsystem für die Projektionslithographie sowie Beleuchtungsoptik für die Projektionslithographie
CN107111242B (zh) * 2014-11-18 2020-04-24 卡尔蔡司Smt有限责任公司 Euv投射光刻的照明光学单元
DE102015201138A1 (de) 2015-01-23 2016-01-28 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102017217680A1 (de) * 2017-10-05 2017-11-23 Carl Zeiss Smt Gmbh Projektionsobjektiv mit einem Messstrahlengang
DE102019212017A1 (de) * 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102020001448B3 (de) * 2020-03-03 2021-04-22 Friedrich Grimm Hybridprisma als Bauelement für optische Systeme
DE102020212367A1 (de) * 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Optische Komponente
DE102021208674A1 (de) 2021-08-10 2023-02-16 Carl Zeiss Smt Gmbh EUV-Kollektor zum Einsatz in einer EUV-Projektionsbelichtungsanlage
DE102022209573A1 (de) 2022-09-13 2023-11-23 Carl Zeiss Smt Gmbh EUV-Kollektor zur Verwendung in einer EUV-Projektionsbelichtungsvorrichtung
DE102023206346A1 (de) 2023-07-04 2024-05-02 Carl Zeiss Smt Gmbh EUV-Kollektor zur Verwendung in einer EUV-Projektionsbelichtungsvorrichtung
DE102024204260A1 (de) * 2024-05-07 2025-11-13 Carl Zeiss Smt Gmbh Kollektorvorrichtung, Waferinspektionsanlage mit einer Kollektorvorrichtung

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US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
EP1469349B1 (en) 2003-04-17 2011-10-05 ASML Netherlands B.V. Lithographic projection apparatus with collector including a concave mirror and a convex mirror
US7075713B2 (en) 2003-05-05 2006-07-11 University Of Central Florida Research Foundation High efficiency collector for laser plasma EUV source
EP1496521A1 (en) * 2003-07-09 2005-01-12 ASML Netherlands B.V. Mirror and lithographic apparatus with mirror
JP4120502B2 (ja) 2003-07-14 2008-07-16 株式会社ニコン 集光光学系、光源ユニット、照明光学装置および露光装置
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JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
EP2083327B1 (en) * 2008-01-28 2017-11-29 Media Lario s.r.l. Improved grazing incidence collector optical systems for EUV and X-ray applications
EP2083328B1 (en) 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
FR2932283B1 (fr) * 2008-06-05 2010-07-30 Sagem Defense Securite Collecteur de rayonnement
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US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8686381B2 (en) * 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US8344339B2 (en) * 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
US20120050707A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US20120050706A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
DE102011075579A1 (de) 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
US8731139B2 (en) * 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
DE102011084266A1 (de) * 2011-10-11 2013-04-11 Carl Zeiss Smt Gmbh Kollektor
TWI596384B (zh) * 2012-01-18 2017-08-21 Ａｓｍｌ荷蘭公司 光源收集器元件、微影裝置及元件製造方法
NL2010274C2 (en) * 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
JP2013211517A (ja) * 2012-03-01 2013-10-10 Gigaphoton Inc Ｅｕｖ光集光装置
JP6453251B2 (ja) * 2013-03-14 2019-01-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット

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