JP2016502136A - Ｅｕｖコレクター - Google Patents

Ｅｕｖコレクター Download PDF

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Publication number
JP2016502136A
JP2016502136A JP2015541074A JP2015541074A JP2016502136A JP 2016502136 A JP2016502136 A JP 2016502136A JP 2015541074 A JP2015541074 A JP 2015541074A JP 2015541074 A JP2015541074 A JP 2015541074A JP 2016502136 A JP2016502136 A JP 2016502136A
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JP
Japan
Prior art keywords
collector
mirror
euv radiation
illumination
far field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015541074A
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English (en)
Japanese (ja)
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JP2016502136A5 (enExample
Inventor
マルティン エントレス
マルティン エントレス
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2016502136A publication Critical patent/JP2016502136A/ja
Publication of JP2016502136A5 publication Critical patent/JP2016502136A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
    • G02B27/4277—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path being separated by an air space
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2015541074A 2012-11-09 2013-10-25 Ｅｕｖコレクター Pending JP2016502136A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261724398P 2012-11-09 2012-11-09
DE102012220465.2 2012-11-09
US61/724,398 2012-11-09
DE102012220465.2A DE102012220465A1 (de) 2012-11-09 2012-11-09 EUV-Kollektor
PCT/EP2013/072427 WO2014072190A1 (en) 2012-11-09 2013-10-25 Euv collector

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018193508A Division JP6792600B2 (ja) 2012-11-09 2018-10-12 Ｅｕｖコレクター

Publications (2)

Publication Number Publication Date
JP2016502136A true JP2016502136A (ja) 2016-01-21
JP2016502136A5 JP2016502136A5 (enExample) 2018-04-05

Family

ID=50555780

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2015541074A Pending JP2016502136A (ja) 2012-11-09 2013-10-25 Ｅｕｖコレクター
JP2018193508A Active JP6792600B2 (ja) 2012-11-09 2018-10-12 Ｅｕｖコレクター

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018193508A Active JP6792600B2 (ja) 2012-11-09 2018-10-12 Ｅｕｖコレクター

Country Status (5)

Country Link
US (1) US9754695B2 (enExample)
JP (2) JP2016502136A (enExample)
CN (1) CN104769503B (enExample)
DE (1) DE102012220465A1 (enExample)
WO (1) WO2014072190A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014223452A1 (de) * 2014-11-18 2016-05-19 Carl Zeiss Smt Gmbh Optisches Teilsystem für die Projektionslithographie sowie Beleuchtungsoptik für die Projektionslithographie
CN107111242B (zh) * 2014-11-18 2020-04-24 卡尔蔡司Smt有限责任公司 Euv投射光刻的照明光学单元
DE102015201138A1 (de) 2015-01-23 2016-01-28 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102017217680A1 (de) * 2017-10-05 2017-11-23 Carl Zeiss Smt Gmbh Projektionsobjektiv mit einem Messstrahlengang
DE102019212017A1 (de) * 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102020001448B3 (de) * 2020-03-03 2021-04-22 Friedrich Grimm Hybridprisma als Bauelement für optische Systeme
DE102020212367A1 (de) * 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Optische Komponente
DE102021208674A1 (de) 2021-08-10 2023-02-16 Carl Zeiss Smt Gmbh EUV-Kollektor zum Einsatz in einer EUV-Projektionsbelichtungsanlage
DE102022209573A1 (de) 2022-09-13 2023-11-23 Carl Zeiss Smt Gmbh EUV-Kollektor zur Verwendung in einer EUV-Projektionsbelichtungsvorrichtung
DE102023206346A1 (de) 2023-07-04 2024-05-02 Carl Zeiss Smt Gmbh EUV-Kollektor zur Verwendung in einer EUV-Projektionsbelichtungsvorrichtung
DE102024204260A1 (de) * 2024-05-07 2025-11-13 Carl Zeiss Smt Gmbh Kollektorvorrichtung, Waferinspektionsanlage mit einer Kollektorvorrichtung

Citations (11)

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JP2002319537A (ja) * 2001-01-23 2002-10-31 Carl Zeiss Semiconductor Manufacturing Technologies Ag 波長が１９３ｎｍ以下の照明光学系のための集光器
JP2004333475A (ja) * 2003-05-05 2004-11-25 Northrop Grumman Corp レーザプラズマｅｕｖ源用の高効率コレクタ
JP2005049845A (ja) * 2003-07-09 2005-02-24 Asml Netherlands Bv ミラー及びミラーを備えたリソグラフィック装置
JP2005536900A (ja) * 2002-08-26 2005-12-02 カール・ツァイス・エスエムティー・アーゲー 極紫外線リソグラフィーシステム内で所定の帯域の放射線を取り除く格子ベースのスペクトルフィルター
JP2006523038A (ja) * 2003-04-08 2006-10-05 サイマー インコーポレイテッド Ｅｕｖ光源用コレクタ
US20080266650A1 (en) * 2005-02-08 2008-10-30 Jose Sasian Efficient EUV collector designs
JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
JP2011522434A (ja) * 2008-06-05 2011-07-28 サジェム デファンス セキュリテ 放射線コレクタ
WO2011138259A1 (en) * 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh Euv collector
JP2013211517A (ja) * 2012-03-01 2013-10-10 Gigaphoton Inc Ｅｕｖ光集光装置
JP2014530509A (ja) * 2011-10-11 2014-11-17 カール・ツァイス・エスエムティー・ゲーエムベーハー コレクター

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US7410265B2 (en) * 2000-09-13 2008-08-12 Carl Zeiss Smt Ag Focusing-device for the radiation from a light source
US7075712B2 (en) 2002-05-30 2006-07-11 Fujitsu Limited Combining and distributing amplifiers for optical network and method
US7034320B2 (en) 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
EP1469349B1 (en) 2003-04-17 2011-10-05 ASML Netherlands B.V. Lithographic projection apparatus with collector including a concave mirror and a convex mirror
JP4120502B2 (ja) 2003-07-14 2008-07-16 株式会社ニコン 集光光学系、光源ユニット、照明光学装置および露光装置
US7481544B2 (en) * 2004-03-05 2009-01-27 Optical Research Associates Grazing incidence relays
WO2006021419A2 (en) * 2004-08-23 2006-03-02 Carl Zeiss Smt Ag Illumination system of a microlithographic exposure apparatus
EP2083327B1 (en) * 2008-01-28 2017-11-29 Media Lario s.r.l. Improved grazing incidence collector optical systems for EUV and X-ray applications
EP2083328B1 (en) 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
DE102009033297A1 (de) * 2009-07-15 2011-01-20 Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh Bestrahlung bzw. Bestrahlungsplanung für ein Rescanning-Verfahren mit einem Partikelstrahl
US8330131B2 (en) * 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8686381B2 (en) * 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US8344339B2 (en) * 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
US20120050707A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US20120050706A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
DE102011075579A1 (de) 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
US8731139B2 (en) * 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
TWI596384B (zh) * 2012-01-18 2017-08-21 Ａｓｍｌ荷蘭公司 光源收集器元件、微影裝置及元件製造方法
NL2010274C2 (en) * 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
JP6453251B2 (ja) * 2013-03-14 2019-01-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002319537A (ja) * 2001-01-23 2002-10-31 Carl Zeiss Semiconductor Manufacturing Technologies Ag 波長が１９３ｎｍ以下の照明光学系のための集光器
JP2005536900A (ja) * 2002-08-26 2005-12-02 カール・ツァイス・エスエムティー・アーゲー 極紫外線リソグラフィーシステム内で所定の帯域の放射線を取り除く格子ベースのスペクトルフィルター
JP2006523038A (ja) * 2003-04-08 2006-10-05 サイマー インコーポレイテッド Ｅｕｖ光源用コレクタ
JP2004333475A (ja) * 2003-05-05 2004-11-25 Northrop Grumman Corp レーザプラズマｅｕｖ源用の高効率コレクタ
JP2005049845A (ja) * 2003-07-09 2005-02-24 Asml Netherlands Bv ミラー及びミラーを備えたリソグラフィック装置
US20080266650A1 (en) * 2005-02-08 2008-10-30 Jose Sasian Efficient EUV collector designs
JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
JP2011522434A (ja) * 2008-06-05 2011-07-28 サジェム デファンス セキュリテ 放射線コレクタ
WO2011138259A1 (en) * 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh Euv collector
JP2014530509A (ja) * 2011-10-11 2014-11-17 カール・ツァイス・エスエムティー・ゲーエムベーハー コレクター
JP2013211517A (ja) * 2012-03-01 2013-10-10 Gigaphoton Inc Ｅｕｖ光集光装置

Also Published As

Publication number Publication date
CN104769503A (zh) 2015-07-08
US20150194230A1 (en) 2015-07-09
CN104769503B (zh) 2018-06-19
US9754695B2 (en) 2017-09-05
JP2019012290A (ja) 2019-01-24
WO2014072190A1 (en) 2014-05-15
JP6792600B2 (ja) 2020-11-25
DE102012220465A1 (de) 2014-05-15

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