DE102006014380A1 - Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille - Google Patents

Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille Download PDF

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Publication number
DE102006014380A1
DE102006014380A1 DE102006014380A DE102006014380A DE102006014380A1 DE 102006014380 A1 DE102006014380 A1 DE 102006014380A1 DE 102006014380 A DE102006014380 A DE 102006014380A DE 102006014380 A DE102006014380 A DE 102006014380A DE 102006014380 A1 DE102006014380 A1 DE 102006014380A1
Authority
DE
Germany
Prior art keywords
mirror
plane
projection
projection lens
objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102006014380A
Other languages
German (de)
English (en)
Inventor
Hans-Jürgen Mann
Wolfgang Singer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102006014380A priority Critical patent/DE102006014380A1/de
Priority to TW103125259A priority patent/TWI550305B/zh
Priority to TW096109615A priority patent/TWI456250B/zh
Priority to EP07005743.5A priority patent/EP1840622A3/de
Priority to US11/689,672 priority patent/US7869138B2/en
Priority to JP2007081783A priority patent/JP5714201B2/ja
Priority to KR1020070029682A priority patent/KR101121817B1/ko
Publication of DE102006014380A1 publication Critical patent/DE102006014380A1/de
Priority to US12/949,985 priority patent/US8094380B2/en
Priority to KR1020110071470A priority patent/KR101166658B1/ko
Priority to US13/312,196 priority patent/US8810927B2/en
Priority to KR1020120002600A priority patent/KR101144492B1/ko
Priority to JP2012285891A priority patent/JP5883778B2/ja
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
DE102006014380A 2006-03-27 2006-03-27 Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille Ceased DE102006014380A1 (de)

Priority Applications (12)

Application Number Priority Date Filing Date Title
DE102006014380A DE102006014380A1 (de) 2006-03-27 2006-03-27 Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
TW103125259A TWI550305B (zh) 2006-03-27 2007-03-20 具入瞳負後焦之投影物鏡及投影曝光裝置
TW096109615A TWI456250B (zh) 2006-03-27 2007-03-20 具入瞳負後焦之投影物鏡及投影曝光裝置
EP07005743.5A EP1840622A3 (de) 2006-03-27 2007-03-21 Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US11/689,672 US7869138B2 (en) 2006-03-27 2007-03-22 Projection objective and projection exposure apparatus with negative back focus of the entry pupil
JP2007081783A JP5714201B2 (ja) 2006-03-27 2007-03-27 入射瞳のバック・フォーカスが負である投影対物レンズおよび投影露光装置
KR1020070029682A KR101121817B1 (ko) 2006-03-27 2007-03-27 입구퓨필의 네거티브 백포커스를 갖는 투사대물렌즈 및투사노출장치
US12/949,985 US8094380B2 (en) 2006-03-27 2010-11-19 Projection objective and projection exposure apparatus with negative back focus of the entry pupil
KR1020110071470A KR101166658B1 (ko) 2006-03-27 2011-07-19 입구퓨필의 네거티브 백포커스를 갖는 투사대물렌즈 및 투사노출장치
US13/312,196 US8810927B2 (en) 2006-03-27 2011-12-06 Projection objective and projection exposure apparatus with negative back focus of the entry pupil
KR1020120002600A KR101144492B1 (ko) 2006-03-27 2012-01-09 입구퓨필의 네거티브 백포커스를 갖는 투사대물렌즈 및 투사노출장치
JP2012285891A JP5883778B2 (ja) 2006-03-27 2012-12-27 入射瞳のバック・フォーカスが負である投影対物系および投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006014380A DE102006014380A1 (de) 2006-03-27 2006-03-27 Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille

Publications (1)

Publication Number Publication Date
DE102006014380A1 true DE102006014380A1 (de) 2007-10-11

Family

ID=38513148

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102006014380A Ceased DE102006014380A1 (de) 2006-03-27 2006-03-27 Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille

Country Status (6)

Country Link
US (3) US7869138B2 (enExample)
EP (1) EP1840622A3 (enExample)
JP (2) JP5714201B2 (enExample)
KR (3) KR101121817B1 (enExample)
DE (1) DE102006014380A1 (enExample)
TW (2) TWI456250B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015036227A1 (de) * 2013-09-11 2015-03-19 Carl Zeiss Smt Gmbh Beleuchtungssystem
DE102014216801A1 (de) * 2014-08-25 2016-02-25 Carl Zeiss Smt Gmbh Facettenspiegel für eine Beleuchtungsoptik für die Projektionslithographie
US9810890B2 (en) 2013-09-11 2017-11-07 Carl Zeiss Smt Gmbh Collector
DE102021206953A1 (de) 2021-07-02 2022-06-02 Carl Zeiss Smt Gmbh Optisches system, lithographieanlage und verfahren zum betreiben eines optischen systems

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Publication number Priority date Publication date Assignee Title
EP1924888B1 (en) 2005-09-13 2013-07-24 Carl Zeiss SMT GmbH Microlithography projection optical system, method for manufacturing a device and method to design an optical surface
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
DE102006056035A1 (de) * 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Projektions-Mikrolithographie, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
EP1950594A1 (de) * 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102008002377A1 (de) * 2007-07-17 2009-01-22 Carl Zeiss Smt Ag Beleuchtungssystem sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einem derartigen Beleuchtungssystem
WO2009115180A1 (en) * 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projection objective for microlithography
DE102008000800A1 (de) 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
DE102008033342A1 (de) 2008-07-16 2010-01-21 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
DE102008000967B4 (de) * 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
DE102008033340B3 (de) * 2008-07-16 2010-04-08 Carl Zeiss Smt Ag Abbildende Optik
DE102008046699B4 (de) 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
JP5533656B2 (ja) * 2008-09-18 2014-06-25 株式会社ニコン 結像光学系、露光装置及び電子デバイスの製造方法
DE102008049588B4 (de) * 2008-09-30 2018-04-05 Carl Zeiss Smt Gmbh Optische Abbildungseinrichtung, Mikroskop und Abbildungsverfahren für die Mikroskopie
DE102008049589A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie
KR20100044625A (ko) * 2008-10-22 2010-04-30 삼성전자주식회사 주기적으로 활성화되는 복제 경로를 구비하는 지연 동기 루프를 구비하는 반도체 장치
WO2010099807A1 (de) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Beleuchtungsoptik sowie optische systeme für die mikrolithographie
US8743342B2 (en) * 2009-11-17 2014-06-03 Nikon Corporation Reflective imaging optical system, exposure apparatus, and method for producing device
JPWO2011065374A1 (ja) 2009-11-24 2013-04-18 株式会社ニコン 結像光学系、露光装置、およびデバイス製造方法
US8317344B2 (en) 2010-06-08 2012-11-27 Nikon Corporation High NA annular field catoptric projection optics using Zernike polynomial mirror surfaces
DE102010041623A1 (de) * 2010-09-29 2012-03-29 Carl Zeiss Smt Gmbh Spiegel
US20120170014A1 (en) * 2011-01-04 2012-07-05 Northwestern University Photolithography system using a solid state light source
DE102011076752A1 (de) * 2011-05-31 2012-12-06 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011086345A1 (de) * 2011-11-15 2013-05-16 Carl Zeiss Smt Gmbh Spiegel
CN102402135B (zh) * 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法
WO2013118615A1 (ja) 2012-02-06 2013-08-15 株式会社ニコン 反射結像光学系、露光装置、およびデバイス製造方法
DE102012204273B4 (de) * 2012-03-19 2015-08-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
WO2014019617A1 (en) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Imaging optical unit for a projection exposure apparatus
DE102013218130A1 (de) * 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
JP6215009B2 (ja) * 2013-11-15 2017-10-18 株式会社東芝 撮像装置及び撮像方法
JP5854295B2 (ja) * 2014-04-11 2016-02-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系
CN105511231B (zh) * 2014-10-16 2019-03-29 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
DE102014223811B4 (de) 2014-11-21 2016-09-29 Carl Zeiss Smt Gmbh Abbildende Optik für die EUV-Projektionslithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines strukturierten Bauteils
JP6370255B2 (ja) * 2015-04-07 2018-08-08 信越化学工業株式会社 ペリクル用フレーム及びそれを用いたペリクル
DE102017217251A1 (de) 2017-09-27 2019-03-28 Carl Zeiss Smt Gmbh Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems
RU2760443C1 (ru) * 2020-12-07 2021-11-25 Общество с Ограниченной Ответственностью Научно Исследовательский Центр «Астрофизика» Устройство фокусировки для лазерной обработки
DE102022206110A1 (de) * 2022-06-20 2023-12-21 Carl Zeiss Smt Gmbh Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld
DE102022209908A1 (de) 2022-09-21 2024-03-21 Carl Zeiss Smt Gmbh Facettenspiegel, Beleuchtungsoptik, Anordnung eines Facettenspiegels, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines nanostrukturierten Bauelements

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KR101144492B1 (ko) 2012-05-14
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KR101166658B1 (ko) 2012-07-18
JP2013065051A (ja) 2013-04-11
TW201447362A (zh) 2014-12-16
US20120075608A1 (en) 2012-03-29
US8094380B2 (en) 2012-01-10
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TWI550305B (zh) 2016-09-21
US20110063596A1 (en) 2011-03-17
EP1840622A2 (de) 2007-10-03
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US8810927B2 (en) 2014-08-19
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US7869138B2 (en) 2011-01-11
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US20070223112A1 (en) 2007-09-27

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