JP2007158225A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2007158225A
JP2007158225A JP2005354544A JP2005354544A JP2007158225A JP 2007158225 A JP2007158225 A JP 2007158225A JP 2005354544 A JP2005354544 A JP 2005354544A JP 2005354544 A JP2005354544 A JP 2005354544A JP 2007158225 A JP2007158225 A JP 2007158225A
Authority
JP
Japan
Prior art keywords
reticle
slit
optical system
exposure apparatus
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005354544A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007158225A5 (enExample
Inventor
Haruna Kawashima
春名 川島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005354544A priority Critical patent/JP2007158225A/ja
Priority to US11/567,558 priority patent/US8077288B2/en
Publication of JP2007158225A publication Critical patent/JP2007158225A/ja
Publication of JP2007158225A5 publication Critical patent/JP2007158225A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005354544A 2005-12-08 2005-12-08 露光装置 Withdrawn JP2007158225A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005354544A JP2007158225A (ja) 2005-12-08 2005-12-08 露光装置
US11/567,558 US8077288B2 (en) 2005-12-08 2006-12-06 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005354544A JP2007158225A (ja) 2005-12-08 2005-12-08 露光装置

Publications (2)

Publication Number Publication Date
JP2007158225A true JP2007158225A (ja) 2007-06-21
JP2007158225A5 JP2007158225A5 (enExample) 2009-01-29

Family

ID=38138932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005354544A Withdrawn JP2007158225A (ja) 2005-12-08 2005-12-08 露光装置

Country Status (2)

Country Link
US (1) US8077288B2 (enExample)
JP (1) JP2007158225A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010097128A (ja) * 2008-10-20 2010-04-30 Nikon Corp フィルタ装置、照明装置、露光装置、及びデバイス製造方法
JP2010225900A (ja) * 2009-03-24 2010-10-07 Toshiba Corp 露光装置および電子デバイスの製造方法
JP2011044480A (ja) * 2009-08-19 2011-03-03 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP2018031873A (ja) * 2016-08-24 2018-03-01 キヤノン株式会社 露光装置、露光方法、および物品製造方法
WO2024218897A1 (ja) * 2023-04-19 2024-10-24 信越エンジニアリング株式会社 プリント配線基板用露光装置、露光方法及びプリント配線基板の製造方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HRP20181266T1 (hr) 2009-10-01 2018-10-05 Adare Pharmaceuticals, Inc. Kortikosteroidni pripravci za oralnu primjenu
ITMI20121441A1 (it) * 2012-08-24 2014-02-25 Moleskine S P A Taccuino e metodo per digitalizzare appunti
JP2014045148A (ja) 2012-08-28 2014-03-13 Toshiba Corp 露光装置の制御方法、露光装置の制御プログラムおよび露光装置
WO2015034678A2 (en) 2013-09-06 2015-03-12 Aptalis Pharmatech, Inc. Corticosteroid containing orally disintegrating tablet compositions for eosinophilic esophagitis
JP6278761B2 (ja) * 2014-03-11 2018-02-14 キヤノン株式会社 読取制御装置、および、読取制御方法
JP2018010105A (ja) * 2016-07-13 2018-01-18 キヤノン株式会社 露光装置、露光方法、および物品製造方法
TWI777515B (zh) 2016-08-18 2022-09-11 美商愛戴爾製藥股份有限公司 治療嗜伊紅性食道炎之方法
US20180256515A1 (en) 2017-03-10 2018-09-13 Adare Pharmaceuticals, Inc. Oral amphetamine composition
CN114815511B (zh) * 2021-01-29 2025-07-04 中国科学院微电子研究所 一种用于调节狭缝式曝光带均匀性的装置和光刻机

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3232473B2 (ja) 1996-01-10 2001-11-26 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3937580B2 (ja) 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3862438B2 (ja) * 1998-12-28 2006-12-27 キヤノン株式会社 走査露光装置、走査露光方法およびデバイス製造方法
TW546699B (en) * 2000-02-25 2003-08-11 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
JP2005109304A (ja) * 2003-10-01 2005-04-21 Canon Inc 照明光学系及び露光装置
JP4458329B2 (ja) * 2003-12-26 2010-04-28 キヤノン株式会社 露光装置及びデバイス製造方法
US7532308B2 (en) * 2005-09-13 2009-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010097128A (ja) * 2008-10-20 2010-04-30 Nikon Corp フィルタ装置、照明装置、露光装置、及びデバイス製造方法
JP2010225900A (ja) * 2009-03-24 2010-10-07 Toshiba Corp 露光装置および電子デバイスの製造方法
JP2011044480A (ja) * 2009-08-19 2011-03-03 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP2018031873A (ja) * 2016-08-24 2018-03-01 キヤノン株式会社 露光装置、露光方法、および物品製造方法
WO2024218897A1 (ja) * 2023-04-19 2024-10-24 信越エンジニアリング株式会社 プリント配線基板用露光装置、露光方法及びプリント配線基板の製造方法

Also Published As

Publication number Publication date
US8077288B2 (en) 2011-12-13
US20070132978A1 (en) 2007-06-14

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