JP2006121074A - 半導体素子及びその製造方法 - Google Patents
半導体素子及びその製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 220
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 238000000034 method Methods 0.000 claims description 117
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 78
- 229910052710 silicon Inorganic materials 0.000 claims description 77
- 239000010703 silicon Substances 0.000 claims description 77
- 125000006850 spacer group Chemical group 0.000 claims description 76
- 239000000758 substrate Substances 0.000 claims description 68
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 38
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 38
- 238000005530 etching Methods 0.000 claims description 28
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 18
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 18
- 238000002955 isolation Methods 0.000 claims description 17
- 229910021332 silicide Inorganic materials 0.000 claims description 13
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 13
- 239000012535 impurity Substances 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 6
- 239000011810 insulating material Substances 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 238000009413 insulation Methods 0.000 claims description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims 3
- 239000000969 carrier Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 80
- 230000008569 process Effects 0.000 description 25
- 230000005669 field effect Effects 0.000 description 21
- 239000013078 crystal Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000000994 depressogenic effect Effects 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Abstract
【解決手段】ここに開示される半導体素子は活性領域を限定する第1半導体パターンと、前記第1半導体パターン上に離隔されて配置された第2半導体パターンと、前記第2半導体パターンと離されて、これらの間の第1半導体パターン上に配置され絶縁されたゲート電極と、前記絶縁されたゲート電極及び前記第2半導体パターンの間の隙間を満たす応力発生パターンとを含む。前記応力発生パターンは前記ゲート電極の下部の第1半導体パターンに定義されるチャンネル領域に応力を加えて、これによってキャリアの移動度を増加させることができる。
【選択図】図4G
Description
v=μE
T.Ghani,「A 90nm High Volume ManufacturingLogic Technology Featuring Novel 45nm Gate Length Strained Silicon CMOS Transistor」,technicaldigest IEDM 2003,p978
103 埋没酸化膜
105 半導体基板
105A 半導体パターン
105C チャンネル領域
105D ドレイン領域
105DE ドレイン拡張領域
106 素子分離膜
107 ゲート絶縁膜
109 ゲート電極
113 バッファ層
115 犠牲スペーサ
117 エピタキシャルシリコン層
117E エピタキシャルシリコン層
119RD、119RS 陥没領域
121 ゲルマニウム層
121PS、121PD ゲルマニウムエピタキシャル層(応力発生パターン)
123 ゲートスペーサ
125 シリサイド膜
205A シリコンピン(半導体ピン)
209 ゲート電極
219RS 陥没領域
221PS 応力発生パターン
Claims (38)
- 活性領域を限定する第1半導体パターンと、
前記第1半導体パターン上にゲート絶縁膜を間に置いて形成されたゲート電極と、
前記ゲート電極の両側壁に形成されたゲートスペーサと、
前記ゲートスペーサの下部の第1半導体パターン上に形成された応力発生パターンとを含むことを特徴とする半導体素子。 - 前記ゲートスペーサの外側の第1半導体パターン上に形成された第2半導体パターンをさらに含むことを特徴とする請求項1に記載の半導体素子。
- 前記応力発生パターンの各々の両側の第1半導体パターンの上部面は前記応力発生パターンの底面より高いことを特徴とする請求項1または2に記載の半導体素子。
- 前記応力発生パターンの大きさは、前記ゲート電極から前記第1半導体パターンを囲む素子分離膜までの距離に影響を受けず、一定であることを特徴とする請求項1または2に記載の半導体素子。
- 前記応力発生パターンはそれらの間の第1半導体パターンに対して圧縮応力を印加することを特徴とする請求項1に記載の半導体素子。
- 前記応力発生パターンは前記第1半導体パターン及び前記第2半導体パターンの間に限定されることを特徴とする請求項2に記載の半導体素子。
- 前記第1半導体パターンはシリコンであり、前記応力発生パターンはエピタキシャルシリコン−ゲルマニウムであることを特徴とする請求項1に記載の半導体素子。
- 前記第1半導体パターンはシリコンであり、前記第2半導体パターンはエピタキシャルシリコンであり、前記応力発生パターンはエピタキシャルシリコン−ゲルマニウムであることを特徴とする請求項2に記載の半導体素子。
- 前記応力発生パターンはシリコン窒化膜であることを特徴とする請求項1または2に記載の半導体素子。
- 前記ゲート電極は前記第1半導体パターンの上部面及び両側面上に形成され、
前記応力発生パターンは前記ゲートスペーサの下部の第1半導体パターンの上部面及び両側面上に形成されることを特徴とする請求項1または2に記載の半導体素子。 - 前記ゲート電極の下部の第1半導体パターンの上部面及び両側面にチャンネルが形成されることを特徴とする請求項10に記載の半導体素子。
- 前記第1半導体パターンの下に埋没酸化膜及び支持半導体基板をさらに含むことを特徴とする請求項1または2に記載の半導体素子。
- ソース/ドレイン領域、チャンネル領域、そしてこれらの間に位置して、前記ソース/ドレイン領域及び前記チャンネル領域より表面が低いソース/ドレイン拡張領域を含む半導体パターンと、
前記チャンネル領域上にゲート絶縁膜を間に置いて形成されたゲート電極と、
前記ソース/ドレイン拡張領域上に形成された応力発生パターンとを含むことを特徴とする半導体素子。 - 前記ソース/ドレイン領域上に形成されたエピタキシャル半導体パターンをさらに含むことを特徴とする請求項13に記載の半導体素子。
- 前記半導体パターンは単結晶シリコンであり、前記応力発生パターンはエピタキシャルシリコン−ゲルマニウムであることを特徴とする請求項13に記載の半導体素子。
- 前記半導体パターンは単結晶シリコンであり、前記応力発生パターンはシリコン窒化膜であることを特徴とする請求項13に記載の半導体素子。
- 前記ゲート電極の両側壁上に配置されたバッファ層をさらに含み、
前記圧縮応力パターンは前記バッファ層上に延ばし、前記ソース/ドレイン領域の表面一部分に延ばして、
前記ゲート電極の両側壁上に前記応力発生パターンを覆う絶縁スペーサをさらに含むことを特徴とする請求項16に記載の半導体素子。 - 前記半導体パターンは単結晶シリコンであり、前記エピタキシャル半導体パターンはエピタキシャルシリコンであり、前記応力発生パターンはエピタキシャルシリコン−ゲルマニウムであることを特徴とする請求項14に記載の半導体素子。
- 前記ソース/ドレイン領域上に配置されたシリサイド膜をさらに含むことを特徴とする請求項13に記載の半導体素子。
- 前記応力発生パターンの大きさは前記ゲート電極から前記第1半導体パターンを囲む素子分離膜までの距離に影響を受けず、一定であることを特徴とする請求項13または14に記載の半導体素子。
- 活性領域を限定する第1半導体パターンを形成し、
前記第1半導体パターン上に絶縁されたゲート電極を形成し、
前記絶縁されたゲート電極の両側の第1半導体パターン上に隙間を置いて第2半導体パターンを形成し、
前記隙間を満たす応力発生パターンを形成することを含むことを特徴とする半導体素子形成方法。 - 前記絶縁されたゲート電極の両側の第1半導体パターン上に隙間を形成することは、
前記絶縁されたゲート電極の両側壁上に犠牲スペーサを形成し、
前記犠牲スペーサの外側の第1半導体パターン上に前記第2半導体パターンを形成し、
前記犠牲スペーサを除去することを含むことを特徴とする請求項21に記載の半導体素子形成方法。 - 前記隙間によって露出した第1半導体パターンの上部面が低くなるように、前記隙間によって露出した第1半導体パターンの一部をエッチングすることをさらに含むことを特徴とする請求項22に記載の半導体素子形成方法。
- 前記隙間によって露出した第1半導体パターンの一部がエッチングされるとき、前記第2半導体パターンの一部または全部がエッチングされることを特徴とする請求項23に記載の半導体素子形成方法。
- 前記犠牲スペーサの外側の第1半導体パターン上に第2半導体パターンを形成することは、
エピタキシャル成長法を適用して前記犠牲スペーサの外側に露出した第1半導体パターン上に選択的にエピタキシャル層を形成することによってなされることを特徴とする請求項22乃至24のうちのいずれか一項に記載の半導体素子形成方法。 - 前記応力発生パターンを形成することは、
エピタキシャル成長法を適用して前記第1及び第2半導体パターンより格子定数が大きい異種エピタキシャル層を形成することによってなされることを特徴とする請求項22に記載の半導体素子形成方法。 - 前記第1半導体層はシリコンで形成され、前記第2半導体パターンはシリコンエピタキシャル層で形成され、前記応力発生パターンはシリコン−ゲルマニウムエピタキシャル層で形成されることを特徴とする請求項26に記載の半導体素子形成方法。
- 前記応力発生パターンを形成することは、
前記隙間を満たすように全面にシリコン窒化膜を形成することによってなされ、
スペーサ絶縁膜を形成し、
前記第2半導体パターンが露出するまで前記スペーサ絶縁膜をエッチバックして絶縁膜スペーサを形成することをさらに含むことを特徴とする請求項22乃至24のうちのいずれか一項に記載の半導体素子形成方法。 - 前記犠牲スペーサを形成した後、不純物イオンを注入してソース/ドレイン領域を形成することをさらに含むことを特徴とする請求項22乃至24のうちのいずれか一項に記載の半導体素子形成方法。
- 前記犠牲スペーサを除去した後、不純物イオンを注入してソース/ドレイン拡張領域を形成することをさらに含むことを特徴とする請求項29に記載の半導体素子形成方法。
- 前記第1半導体パターンを形成することは、
支持半導体基板、埋没酸化膜及び第1半導体基板が順に積層されたSOI基板を準備し、
活性領域を限定するエッチングマスクを使って前記埋没酸化膜が露出するまで前記第1半導体基板をパターニングすることを含んでなされることを特徴とする請求項22に記載の半導体素子形成方法。 - 前記第1半導体パターンを形成することは、
第1半導体基板を準備し、
活性領域を限定するエッチングマスクを使って前記第1半導体基板を所定の深さエッチングし、
エッチングされた部分に絶縁物質を満たして素子分離膜を形成することを含むことを特徴とする請求項22に記載の半導体素子形成方法。 - 活性領域を限定する第1半導体パターンを形成し、
前記第1半導体パターン上にゲート絶縁膜を介在してゲート電極を形成し、
前記ゲート電極の両側壁上にバッファ層を介在して犠牲スペーサを形成し、
前記犠牲スペーサの外側の第1半導体パターン上にエピタキシャル第2半導体パターンを形成し、
前記犠牲スペーサを除去し、
前記スペーサ除去によって露出した第1半導体パターン上に応力発生パターンを形成することを含むことを特徴とする半導体素子形成方法。 - 前記犠牲スペーサの除去によって露出した第1半導体パターンの一部をエッチングすることをさらに含むことを特徴とする請求項33に記載の半導体素子形成方法。
- 前記第1半導体パターンの一部をエッチングするとき、前記エピタキシャル第2半導体パターンの一部または全部が除去されることを特徴とする請求項34に記載の半導体素子形成方法。
- 前記エピタキシャル第2半導体パターン及びゲート電極の間の隙間を満たす応力発生パターンを形成することは、前記第1半導体パターン及び前記エピタキシャル第2半導体パターンより格子定数が大きい異種エピタキシャル第3半導体層を形成することを含むことを特徴とする請求項33または34に記載の半導体素子形成方法。
- 前記エピタキシャル第2半導体パターン及びゲート電極の間の隙間を満たす応力発生パターンを形成することは、シリコン窒化膜を形成することを含むことを特徴とする請求項33または34に記載の半導体素子形成方法。
- 前記第1半導体パターンは上部面及び両側面を具備し、
前記ゲート電極は前記第1半導体パターンの上部面及び両側面上に形成されて、前記第1半導体パターンの上部面及び両側面上にチャンネル領域が形成されることを特徴とする請求項33または34に記載の半導体素子形成方法。
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JP2007110098A (ja) * | 2005-09-13 | 2007-04-26 | Infineon Technologies Ag | 応力変形させた半導体装置およびその製造方法 |
JP2007250665A (ja) * | 2006-03-14 | 2007-09-27 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2008028324A (ja) * | 2006-07-25 | 2008-02-07 | Elpida Memory Inc | 半導体装置及びその製造方法 |
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JP2012054587A (ja) * | 2011-10-24 | 2012-03-15 | Toshiba Corp | 半導体装置の製造方法 |
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