JP2005517620A5 - - Google Patents

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Publication number
JP2005517620A5
JP2005517620A5 JP2003567985A JP2003567985A JP2005517620A5 JP 2005517620 A5 JP2005517620 A5 JP 2005517620A5 JP 2003567985 A JP2003567985 A JP 2003567985A JP 2003567985 A JP2003567985 A JP 2003567985A JP 2005517620 A5 JP2005517620 A5 JP 2005517620A5
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JP
Japan
Prior art keywords
sio
plane
parallel
layer
pigment
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Application number
JP2003567985A
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English (en)
Japanese (ja)
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JP2005517620A (ja
JP4476629B2 (ja
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Application filed filed Critical
Priority claimed from PCT/EP2003/001323 external-priority patent/WO2003068868A2/en
Publication of JP2005517620A publication Critical patent/JP2005517620A/ja
Publication of JP2005517620A5 publication Critical patent/JP2005517620A5/ja
Application granted granted Critical
Publication of JP4476629B2 publication Critical patent/JP4476629B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003567985A 2002-02-18 2003-02-11 亜酸化ケイ素、二酸化ケイ素及び/又は炭化ケイ素の面平行な構造を製造する方法、当該方法によって得られる面平行な構造ならびにその使用 Expired - Lifetime JP4476629B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE10206820 2002-02-18
DE10210743 2002-03-12
DE10227229 2002-06-18
EP02405649 2002-07-25
PCT/EP2003/001323 WO2003068868A2 (en) 2002-02-18 2003-02-11 Method of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof

Publications (3)

Publication Number Publication Date
JP2005517620A JP2005517620A (ja) 2005-06-16
JP2005517620A5 true JP2005517620A5 (https=) 2006-03-30
JP4476629B2 JP4476629B2 (ja) 2010-06-09

Family

ID=27739210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003567985A Expired - Lifetime JP4476629B2 (ja) 2002-02-18 2003-02-11 亜酸化ケイ素、二酸化ケイ素及び/又は炭化ケイ素の面平行な構造を製造する方法、当該方法によって得られる面平行な構造ならびにその使用

Country Status (9)

Country Link
US (1) US7256425B2 (https=)
EP (1) EP1476508A2 (https=)
JP (1) JP4476629B2 (https=)
KR (2) KR100948245B1 (https=)
CN (1) CN1633477A (https=)
AU (1) AU2003206875A1 (https=)
CA (1) CA2474640A1 (https=)
MX (1) MXPA04007992A (https=)
WO (1) WO2003068868A2 (https=)

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RU2005125917A (ru) 2003-01-17 2006-04-27 Циба Спешиалти Кемикэлз Холдинг Инк. (Ch) Способ получения пористых неорганических материалов или матричного материала, содержащего наночастицы
JP2006517988A (ja) 2003-01-23 2006-08-03 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド プレートレット形状顔料
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JP2005298907A (ja) * 2004-04-13 2005-10-27 Oike Ind Co Ltd 鱗片状メタルフレークの製造方法及び鱗片状メタルフレーク
JP2005298905A (ja) * 2004-04-13 2005-10-27 Oike Ind Co Ltd 鱗片状メタルフレーク及び鱗片状メタルフレークの製造方法
US20070231295A1 (en) * 2004-05-12 2007-10-04 Holger Hoppe Antimicrobial Silicon Oxide Flakes
EP1769049A2 (en) * 2004-07-16 2007-04-04 Ciba Specialty Chemicals Holding Inc. Luminescent silicon oxide flakes
US20080072794A1 (en) * 2004-07-26 2008-03-27 Holger Hoppe Reactive Silicon Suboxide Flakes
KR20070051345A (ko) * 2004-08-23 2007-05-17 시바 스페셜티 케미칼스 홀딩 인크. 알루미늄 및 SiOZ(Z=0.7-2.0)를 기본으로 하는플레이크형 안료의 제조방법
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KR20070086311A (ko) * 2004-12-15 2007-08-27 시바 스페셜티 케미칼스 홀딩 인크. 금속 산화물을 유기 기재에 마이크로파 침착시키는 방법
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DE102005030862B4 (de) * 2005-07-01 2009-12-24 Sintec Keramik Gmbh Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper
EP1912755A1 (en) 2005-08-12 2008-04-23 Dunwilco (1198) Limited Process for producing metal flakes
GB0516968D0 (en) * 2005-08-18 2005-09-28 Dunwilco 1198 Ltd Process
KR20080070861A (ko) 2005-11-17 2008-07-31 시바 홀딩 인크 플레이크형 입자의 제조 방법
WO2007060125A1 (en) * 2005-11-25 2007-05-31 Ciba Specialty Chemicals Holding Inc. Reactive silicon oxide flakes
US20080054270A1 (en) * 2006-09-05 2008-03-06 Yoshiyuki Suda Semiconductor memory device and the production method
CN100519822C (zh) * 2006-09-27 2009-07-29 宝山钢铁股份有限公司 有机预涂金属板上SiOx镀层的真空制备方法
DE102007059860A1 (de) * 2007-12-12 2009-06-18 Evonik Degussa Gmbh Schülpen aus pyrogen hergestelltem Siliziumdioxid
DE102008032781A1 (de) * 2008-07-11 2010-01-21 Klöckner Pentaplast GmbH & Co. KG Verpackungsfolie für Produktauthentifizierung, Authentifizierungsverfahren und -system
US9077029B2 (en) 2010-02-23 2015-07-07 Samsung Sdi Co., Ltd. Negative active material for rechargeable lithium battery and rechargeable lithium battery including the same
JP6072787B2 (ja) * 2012-06-20 2017-02-01 日本碍子株式会社 断熱用多孔質板状フィラー、コーティング組成物、断熱膜、および断熱膜構造
JPWO2014157160A1 (ja) * 2013-03-29 2017-02-16 信越化学工業株式会社 酸化珪素の製造装置及び製造方法
KR101612104B1 (ko) * 2013-05-16 2016-04-14 주식회사 엘지화학 SiO 제조 장치 및 방법
WO2015035066A1 (en) 2013-09-04 2015-03-12 President And Fellows Of Harvard College Growing films via sequential liquid/vapor phases
WO2015076317A1 (ja) * 2013-11-19 2015-05-28 日本碍子株式会社 断熱膜、および断熱膜構造
WO2015080065A1 (ja) 2013-11-26 2015-06-04 日本碍子株式会社 多孔質材料及び断熱膜
CA2835583A1 (fr) 2013-11-28 2015-05-28 Hydro-Quebec Methode de preparation de siox nano-structure, et son utilisation comme anode de batterie lithium-ion
CN105870157B (zh) * 2016-05-30 2019-03-12 深圳市华星光电技术有限公司 用于打印成膜的凹槽结构及其制作方法
CN111453737B (zh) * 2019-01-22 2021-08-03 成都博达爱福科技有限公司 一种由mq硅树脂制备氧化亚硅的方法
CN112322191B (zh) * 2020-12-02 2021-06-29 徐州威聚电子材料有限公司 一种液体抛光蜡及其制备方法
CN116332193B (zh) * 2023-05-18 2024-07-05 深圳凝石材料科技有限公司 烧结硅氧负极材料的方法

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