JP2005505943A5 - - Google Patents
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- Publication number
- JP2005505943A5 JP2005505943A5 JP2003535983A JP2003535983A JP2005505943A5 JP 2005505943 A5 JP2005505943 A5 JP 2005505943A5 JP 2003535983 A JP2003535983 A JP 2003535983A JP 2003535983 A JP2003535983 A JP 2003535983A JP 2005505943 A5 JP2005505943 A5 JP 2005505943A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- support block
- group
- hydrocarbyl
- polymers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000642 polymer Polymers 0.000 claims description 10
- 239000004094 surface-active agent Substances 0.000 claims description 7
- 229920001577 copolymer Polymers 0.000 claims description 6
- 239000002202 Polyethylene glycol Substances 0.000 claims description 5
- 229920001223 polyethylene glycol Polymers 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- VJMGCRKBPXGKAH-UHFFFAOYSA-N 3,4,4-trimethyl-1,3-oxazolidine Chemical compound CN1COCC1(C)C VJMGCRKBPXGKAH-UHFFFAOYSA-N 0.000 claims description 2
- 230000003115 biocidal effect Effects 0.000 claims description 2
- 239000003139 biocide Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 18
- 239000004065 semiconductor Substances 0.000 claims 17
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 9
- 125000004432 carbon atom Chemical group C* 0.000 claims 7
- 239000000853 adhesive Substances 0.000 claims 6
- 230000001070 adhesive effect Effects 0.000 claims 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 3
- 229920003986 novolac Polymers 0.000 claims 3
- 229920005573 silicon-containing polymer Polymers 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000005498 polishing Methods 0.000 claims 2
- VSHIRTNKIXRXMI-UHFFFAOYSA-N 2,2-dimethyl-1,3-oxazolidine Chemical compound CC1(C)NCCO1 VSHIRTNKIXRXMI-UHFFFAOYSA-N 0.000 claims 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
- -1 1- isocyanato -1-methylethyl Chemical group 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 229940058020 2-amino-2-methyl-1-propanol Drugs 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- GUQMDNQYMMRJPY-UHFFFAOYSA-N 4,4-dimethyl-1,3-oxazolidine Chemical compound CC1(C)COCN1 GUQMDNQYMMRJPY-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- CBTVGIZVANVGBH-UHFFFAOYSA-N aminomethyl propanol Chemical compound CC(C)(N)CO CBTVGIZVANVGBH-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229920000847 nonoxynol Polymers 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical class CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/975,437 US20030092246A1 (en) | 2001-10-11 | 2001-10-11 | Assembly system for stationing semiconductor wafer suitable for processing and process for manufacturing semiconductor wafer |
| PCT/EP2002/011043 WO2003033208A1 (en) | 2001-10-11 | 2002-10-02 | Assembly system for stationing semiconductor wafer and process f or manufacturing semiconductor wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005505943A JP2005505943A (ja) | 2005-02-24 |
| JP2005505943A5 true JP2005505943A5 (https=) | 2009-03-05 |
Family
ID=25523031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003535983A Pending JP2005505943A (ja) | 2001-10-11 | 2002-10-02 | 加工に適する半導体ウェーハの固定用アッセンブリーシステムおよび半導体ウェーハの製造法 |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US20030092246A1 (https=) |
| EP (1) | EP1448340B1 (https=) |
| JP (1) | JP2005505943A (https=) |
| KR (1) | KR20040041666A (https=) |
| CN (1) | CN100420546C (https=) |
| AT (1) | ATE332211T1 (https=) |
| DE (1) | DE60212992T2 (https=) |
| MY (1) | MY132030A (https=) |
| TW (1) | TW593613B (https=) |
| WO (1) | WO2003033208A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6643507B1 (en) | 1998-12-31 | 2003-11-04 | At&T Corp. | Wireless centrex automatic callback |
| US20050282961A1 (en) * | 2004-06-18 | 2005-12-22 | Hsienkun Tsai | Pressure-sensitive label laminates with improved convertability and broad temperature adhesion performance |
| EP1966410B1 (en) | 2005-09-26 | 2018-12-26 | Planar Solutions LLC | Ultrapure colloidal silica for use in chemical mechanical polishing applications |
| JP5020496B2 (ja) * | 2005-10-28 | 2012-09-05 | 東京応化工業株式会社 | 接着剤組成物および接着フィルム |
| NL1036215A1 (nl) * | 2007-12-11 | 2009-06-15 | Asml Netherlands Bv | Lithographic method and carrier substrate. |
| CN101885613B (zh) * | 2010-07-29 | 2012-07-04 | 西安理工大学 | 电子陶瓷成型用粘合剂及其制备方法 |
| FR3005895B1 (fr) * | 2013-05-27 | 2015-06-26 | Commissariat Energie Atomique | Procede d'assemblage de deux substrats de nature differente via une couche intermediaire ductile |
| US10556317B2 (en) | 2016-03-03 | 2020-02-11 | P.R. Hoffman Machine Products Inc. | Polishing machine wafer holder |
| CN106041739B (zh) * | 2016-05-27 | 2018-02-23 | 华侨大学 | 一种超硬磨料磨具的微生物修整方法 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4251400A (en) * | 1971-11-03 | 1981-02-17 | Borden, Inc. | Hot and cold water redispersible polyvinyl acetate adhesives |
| US3905928A (en) * | 1974-02-15 | 1975-09-16 | Burlington Industries Inc | Hot melt size and yarn sized therewith |
| US4073756A (en) * | 1976-04-26 | 1978-02-14 | Konishi Co., Ltd. | Solid adhesive compositions |
| JPS608426Y2 (ja) * | 1976-12-08 | 1985-03-25 | シャープ株式会社 | 半導体ウエハ−の保持基板 |
| US5714029A (en) * | 1984-03-12 | 1998-02-03 | Nitto Electric Industrial Co., Ltd. | Process for working a semiconductor wafer |
| US4853286A (en) * | 1984-05-29 | 1989-08-01 | Mitsui Toatsu Chemicals, Incorporated | Wafer processing film |
| JP2807322B2 (ja) * | 1989-10-09 | 1998-10-08 | 三井化学株式会社 | 帯電防止性に優れた樹脂組成物 |
| JPH0641504A (ja) * | 1991-07-12 | 1994-02-15 | Saiden Kagaku Kk | アルカリ可溶型粘着剤組成物 |
| KR930006846A (ko) * | 1991-09-02 | 1993-04-22 | 사와무라 하루오 | 반도체 웨이퍼의 이면 연삭방법 및 그 방법에 이용하는 점착 테이프 |
| US5196443A (en) * | 1991-09-25 | 1993-03-23 | Buckman Laboratories International, Inc. | Synergistic combinations of 2-(thiocyanomethylthio) benzothiazole with a mixture of 4,4-dimethyloxazolidine and 3,4,4-trimethyloxazolidine in controlling fungal and bacterial growth in aqueous fluids |
| US5534053A (en) * | 1993-01-12 | 1996-07-09 | Rodel, Inc. | Composition for reducing or eliminating static charge in adhesive film |
| JP3410202B2 (ja) * | 1993-04-28 | 2003-05-26 | 日本テキサス・インスツルメンツ株式会社 | ウェハ貼着用粘着シートおよびこれを用いた半導体装置の製造方法 |
| IL113583A (en) * | 1994-05-26 | 1999-12-22 | Rohm & Haas | Acrylic pressure sensitive adhesive |
| TW311927B (https=) * | 1995-07-11 | 1997-08-01 | Minnesota Mining & Mfg | |
| IT1279051B1 (it) * | 1995-10-27 | 1997-12-04 | 3V Sigma Spa | Composizioni addensanti in forma solida costituite da polimeri o copolimeri e poliglicoli |
| JP2741362B2 (ja) * | 1995-12-05 | 1998-04-15 | 日化精工株式会社 | ウエハ−の仮着用接着剤 |
| JPH09260471A (ja) * | 1996-03-18 | 1997-10-03 | Kazuo Inoue | 焼結炭化硅素基体上に化学蒸着炭化硅素膜をコーティングした半導体ウエハ用真空チャック |
| JP3620554B2 (ja) * | 1996-03-25 | 2005-02-16 | 信越半導体株式会社 | 半導体ウェーハ製造方法 |
| US5700581A (en) * | 1996-06-26 | 1997-12-23 | International Business Machines Corporation | Solvent-free epoxy based adhesives for semiconductor chip attachment and process |
| DE19756614A1 (de) * | 1997-12-18 | 1999-07-01 | Wacker Siltronic Halbleitermat | Verfahren zur Montage und Demontage einer Halbleiterscheibe, und Stoffmischung, die zur Durchführung des Verfahrens geeignet ist |
| JP2000015573A (ja) | 1998-06-30 | 2000-01-18 | Ibiden Co Ltd | ウェハ研磨装置用ウェハ保持プレート及び半導体ウェハの研磨方法 |
| JP4275221B2 (ja) * | 1998-07-06 | 2009-06-10 | リンテック株式会社 | 粘接着剤組成物および粘接着シート |
| JP2001226650A (ja) * | 2000-02-16 | 2001-08-21 | Nitto Denko Corp | 放射線硬化型熱剥離性粘着シート、及びこれを用いた切断片の製造方法 |
| US6952025B2 (en) * | 2000-06-08 | 2005-10-04 | Showa Denko K.K. | Semiconductor light-emitting device |
-
2001
- 2001-10-11 US US09/975,437 patent/US20030092246A1/en not_active Abandoned
-
2002
- 2002-10-02 WO PCT/EP2002/011043 patent/WO2003033208A1/en not_active Ceased
- 2002-10-02 JP JP2003535983A patent/JP2005505943A/ja active Pending
- 2002-10-02 DE DE60212992T patent/DE60212992T2/de not_active Expired - Lifetime
- 2002-10-02 AT AT02782813T patent/ATE332211T1/de not_active IP Right Cessation
- 2002-10-02 EP EP02782813A patent/EP1448340B1/en not_active Expired - Lifetime
- 2002-10-02 KR KR10-2004-7005000A patent/KR20040041666A/ko not_active Ceased
- 2002-10-02 CN CNB028200500A patent/CN100420546C/zh not_active Expired - Fee Related
- 2002-10-09 MY MYPI20023763A patent/MY132030A/en unknown
- 2002-10-11 TW TW091123455A patent/TW593613B/zh not_active IP Right Cessation
-
2003
- 2003-03-24 US US10/395,747 patent/US6924016B2/en not_active Expired - Fee Related
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