JP2005503017A5 - - Google Patents
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- Publication number
- JP2005503017A5 JP2005503017A5 JP2003527775A JP2003527775A JP2005503017A5 JP 2005503017 A5 JP2005503017 A5 JP 2005503017A5 JP 2003527775 A JP2003527775 A JP 2003527775A JP 2003527775 A JP2003527775 A JP 2003527775A JP 2005503017 A5 JP2005503017 A5 JP 2005503017A5
- Authority
- JP
- Japan
- Prior art keywords
- pressure chamber
- fluid
- pressure
- assembly
- chamber assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/951,355 US6619304B2 (en) | 2001-09-13 | 2001-09-13 | Pressure chamber assembly including non-mechanical drive means |
| PCT/US2002/024004 WO2003023827A1 (en) | 2001-09-13 | 2002-07-30 | Pressure chamber assembly including drive means |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005503017A JP2005503017A (ja) | 2005-01-27 |
| JP2005503017A5 true JP2005503017A5 (https=) | 2006-01-05 |
Family
ID=25491593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003527775A Pending JP2005503017A (ja) | 2001-09-13 | 2002-07-30 | 駆動手段を含む圧力チャンバアセンブリ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6619304B2 (https=) |
| EP (1) | EP1425780A1 (https=) |
| JP (1) | JP2005503017A (https=) |
| KR (1) | KR20040035772A (https=) |
| CN (1) | CN1585999A (https=) |
| TW (1) | TWI222127B (https=) |
| WO (1) | WO2003023827A1 (https=) |
Families Citing this family (53)
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| US6314601B1 (en) * | 1999-09-24 | 2001-11-13 | Mcclain James B. | System for the control of a carbon dioxide cleaning apparatus |
| US7080651B2 (en) * | 2001-05-17 | 2006-07-25 | Dainippon Screen Mfg. Co., Ltd. | High pressure processing apparatus and method |
| JP3836765B2 (ja) * | 2002-08-02 | 2006-10-25 | 株式会社神戸製鋼所 | 高圧処理装置 |
| US7392815B2 (en) * | 2003-03-31 | 2008-07-01 | Lam Research Corporation | Chamber for wafer cleaning and method for making the same |
| US20050022850A1 (en) * | 2003-07-29 | 2005-02-03 | Supercritical Systems, Inc. | Regulation of flow of processing chemistry only into a processing chamber |
| EP1503401A1 (en) * | 2003-08-01 | 2005-02-02 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | Method and apparatus for cleaning a substrate by using a supercritical fluid |
| WO2005092487A1 (ja) * | 2004-03-26 | 2005-10-06 | National Institute Of Advanced Industrial Science And Technology | 超臨界処理方法およびそれに用いる装置 |
| TWI250559B (en) * | 2004-07-09 | 2006-03-01 | Innolux Display Corp | Coating apparatus and coating method using the same |
| KR101121417B1 (ko) * | 2004-10-28 | 2012-03-15 | 주성엔지니어링(주) | 표시소자의 제조장치 |
| JP2007036109A (ja) * | 2005-07-29 | 2007-02-08 | Dainippon Screen Mfg Co Ltd | 高圧処理装置 |
| US20090179158A1 (en) * | 2008-01-16 | 2009-07-16 | Varian Semiconductor Equpiment Associate, Inc. | In-vacuum protective liners |
| US8020398B2 (en) * | 2008-10-02 | 2011-09-20 | Varian Semiconductor Equipment Associates, Inc. | Fluid delivery mechanism for vacuum wafer processing system |
| US8282268B2 (en) * | 2009-02-24 | 2012-10-09 | Island Oasis Frozen Cocktail Co., Inc. | Magnetic drive for food processing apparatus |
| US9166139B2 (en) * | 2009-05-14 | 2015-10-20 | The Neothermal Energy Company | Method for thermally cycling an object including a polarizable material |
| US8550388B2 (en) | 2010-03-15 | 2013-10-08 | Moog Inc. | Drive circuit with integrated power factor correction for blender/shaver machine |
| US8888086B2 (en) * | 2011-05-11 | 2014-11-18 | Sematech, Inc. | Apparatus with surface protector to inhibit contamination |
| US9597701B2 (en) * | 2013-12-31 | 2017-03-21 | Lam Research Ag | Apparatus for treating surfaces of wafer-shaped articles |
| US9657397B2 (en) * | 2013-12-31 | 2017-05-23 | Lam Research Ag | Apparatus for treating surfaces of wafer-shaped articles |
| EP3115190B1 (de) * | 2015-07-06 | 2020-11-18 | Feintool International Holding AG | Vorrichtung und verfahren zum steuern des hauptantriebs einer feinschneidpresse |
| GB201703549D0 (en) * | 2017-03-06 | 2017-04-19 | Hodges & Drake Design Ltd | Apparatus for dispensing a flowable product |
| US10224224B2 (en) | 2017-03-10 | 2019-03-05 | Micromaterials, LLC | High pressure wafer processing systems and related methods |
| US10622214B2 (en) | 2017-05-25 | 2020-04-14 | Applied Materials, Inc. | Tungsten defluorination by high pressure treatment |
| US10847360B2 (en) | 2017-05-25 | 2020-11-24 | Applied Materials, Inc. | High pressure treatment of silicon nitride film |
| KR102574914B1 (ko) | 2017-06-02 | 2023-09-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 보론 카바이드 하드마스크의 건식 스트리핑 |
| JP6947914B2 (ja) | 2017-08-18 | 2021-10-13 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 高圧高温下のアニールチャンバ |
| US10276411B2 (en) | 2017-08-18 | 2019-04-30 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
| CN111095524B (zh) | 2017-09-12 | 2023-10-03 | 应用材料公司 | 用于使用保护阻挡物层制造半导体结构的设备和方法 |
| US10643867B2 (en) | 2017-11-03 | 2020-05-05 | Applied Materials, Inc. | Annealing system and method |
| JP7122102B2 (ja) | 2017-11-08 | 2022-08-19 | 東京エレクトロン株式会社 | ガス供給システム及びガス供給方法 |
| KR102585074B1 (ko) | 2017-11-11 | 2023-10-04 | 마이크로머티어리얼즈 엘엘씨 | 고압 프로세싱 챔버를 위한 가스 전달 시스템 |
| SG11202003438QA (en) | 2017-11-16 | 2020-05-28 | Applied Materials Inc | High pressure steam anneal processing apparatus |
| JP2021503714A (ja) | 2017-11-17 | 2021-02-12 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 高圧処理システムのためのコンデンサシステム |
| JP7299898B2 (ja) | 2018-01-24 | 2023-06-28 | アプライド マテリアルズ インコーポレイテッド | 高圧アニールを用いたシーム修復 |
| CN111902929B (zh) | 2018-03-09 | 2025-09-19 | 应用材料公司 | 用于含金属材料的高压退火处理 |
| US10714331B2 (en) | 2018-04-04 | 2020-07-14 | Applied Materials, Inc. | Method to fabricate thermally stable low K-FinFET spacer |
| KR102126180B1 (ko) * | 2018-04-30 | 2020-06-26 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
| US10950429B2 (en) | 2018-05-08 | 2021-03-16 | Applied Materials, Inc. | Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom |
| US10566188B2 (en) | 2018-05-17 | 2020-02-18 | Applied Materials, Inc. | Method to improve film stability |
| US10704141B2 (en) | 2018-06-01 | 2020-07-07 | Applied Materials, Inc. | In-situ CVD and ALD coating of chamber to control metal contamination |
| US10748783B2 (en) | 2018-07-25 | 2020-08-18 | Applied Materials, Inc. | Gas delivery module |
| US10675581B2 (en) | 2018-08-06 | 2020-06-09 | Applied Materials, Inc. | Gas abatement apparatus |
| US11964290B2 (en) * | 2018-09-12 | 2024-04-23 | Smc Corporation | Compressed-fluid discharge control device |
| JP7179172B6 (ja) | 2018-10-30 | 2022-12-16 | アプライド マテリアルズ インコーポレイテッド | 半導体用途の構造体をエッチングするための方法 |
| KR20210077779A (ko) | 2018-11-16 | 2021-06-25 | 어플라이드 머티어리얼스, 인코포레이티드 | 강화된 확산 프로세스를 사용한 막 증착 |
| WO2020117462A1 (en) | 2018-12-07 | 2020-06-11 | Applied Materials, Inc. | Semiconductor processing system |
| WO2020149936A1 (en) * | 2019-01-18 | 2020-07-23 | Applied Materials, Inc. | Heated pedestal design for improved heat transfer and temperature uniformity |
| KR102616514B1 (ko) * | 2019-03-14 | 2023-12-26 | 주식회사 케이씨텍 | 기판 처리 장치 및 기판 처리 방법 |
| KR102210830B1 (ko) * | 2019-03-25 | 2021-02-02 | 무진전자 주식회사 | 기판 건조 챔버 |
| US11901222B2 (en) | 2020-02-17 | 2024-02-13 | Applied Materials, Inc. | Multi-step process for flowable gap-fill film |
| EP4189150A4 (en) * | 2020-07-30 | 2024-08-21 | Cool Clean Technologies, LLC | PROCEDURES FOR HANDLING PERSONAL PROTECTIVE EQUIPMENT |
| KR102852007B1 (ko) * | 2020-12-30 | 2025-08-29 | 세메스 주식회사 | 지지 장치 및 지지 장치를 포함하는 기판 처리 장치 |
| CN113322449B (zh) * | 2021-05-26 | 2022-10-21 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其承载装置 |
| US20230072156A1 (en) * | 2021-09-02 | 2023-03-09 | Wonik Ips Co., Ltd. | Substrate processing apparatus |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4106825A (en) | 1976-12-13 | 1978-08-15 | Autoclave Engineers, Inc. | High pressure magnetic drive including magnetic thrust bearings |
| WO1992005922A1 (en) | 1990-09-27 | 1992-04-16 | Genmark Automation | Vacuum elevator |
| JP3512796B2 (ja) | 1992-03-27 | 2004-03-31 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル | フルオロポリマーの製造方法 |
| US5324540A (en) * | 1992-08-17 | 1994-06-28 | Tokyo Electron Limited | System and method for supporting and rotating substrates in a process chamber |
| US5514220A (en) | 1992-12-09 | 1996-05-07 | Wetmore; Paula M. | Pressure pulse cleaning |
| DE69523208T2 (de) | 1994-04-08 | 2002-06-27 | Texas Instruments Inc., Dallas | Verfahren zur Reinigung von Halbleiterscheiben mittels verflüssigter Gase |
| US5482564A (en) | 1994-06-21 | 1996-01-09 | Texas Instruments Incorporated | Method of unsticking components of micro-mechanical devices |
| US5522938A (en) | 1994-08-08 | 1996-06-04 | Texas Instruments Incorporated | Particle removal in supercritical liquids using single frequency acoustic waves |
| US5982986A (en) | 1995-02-03 | 1999-11-09 | Applied Materials, Inc. | Apparatus and method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber |
| DE19506404C1 (de) | 1995-02-23 | 1996-03-14 | Siemens Ag | Verfahren zum Freiätzen (Separieren) und Trocknen mikromechanischer Komponenten |
| JPH08330266A (ja) | 1995-05-31 | 1996-12-13 | Texas Instr Inc <Ti> | 半導体装置等の表面を浄化し、処理する方法 |
| TW331652B (en) * | 1995-06-16 | 1998-05-11 | Ebara Corp | Thin film vapor deposition apparatus |
| US5783082A (en) | 1995-11-03 | 1998-07-21 | University Of North Carolina | Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants |
| US5868856A (en) | 1996-07-25 | 1999-02-09 | Texas Instruments Incorporated | Method for removing inorganic contamination by chemical derivitization and extraction |
| US5868862A (en) | 1996-08-01 | 1999-02-09 | Texas Instruments Incorporated | Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media |
| US5908510A (en) | 1996-10-16 | 1999-06-01 | International Business Machines Corporation | Residue removal by supercritical fluids |
| US6149828A (en) | 1997-05-05 | 2000-11-21 | Micron Technology, Inc. | Supercritical etching compositions and method of using same |
| US6500605B1 (en) | 1997-05-27 | 2002-12-31 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| EP0986667B1 (en) | 1997-05-30 | 2009-01-07 | Micell Integrated Systems, Inc. | Surface treatment |
| EP0899857B1 (de) * | 1997-08-25 | 2007-11-28 | LUST ANTRIEBSTECHNIK GmbH | Magnetgelagerte Rotationsanordnung |
| US6001418A (en) | 1997-12-16 | 1999-12-14 | The University Of North Carolina At Chapel Hill | Spin coating method and apparatus for liquid carbon dioxide systems |
| US6067728A (en) | 1998-02-13 | 2000-05-30 | G.T. Equipment Technologies, Inc. | Supercritical phase wafer drying/cleaning system |
| US6242165B1 (en) | 1998-08-28 | 2001-06-05 | Micron Technology, Inc. | Supercritical compositions for removal of organic material and methods of using same |
| US6277753B1 (en) | 1998-09-28 | 2001-08-21 | Supercritical Systems Inc. | Removal of CMP residue from semiconductors using supercritical carbon dioxide process |
| JP3579278B2 (ja) * | 1999-01-26 | 2004-10-20 | 東京エレクトロン株式会社 | 縦型熱処理装置及びシール装置 |
| US6412503B1 (en) * | 1999-06-01 | 2002-07-02 | Applied Materials, Inc. | Magnetically coupled substrate roller |
| KR100744888B1 (ko) | 1999-11-02 | 2007-08-01 | 동경 엘렉트론 주식회사 | 소재를 초임계 처리하기 위한 장치 및 방법 |
-
2001
- 2001-09-13 US US09/951,355 patent/US6619304B2/en not_active Expired - Fee Related
-
2002
- 2002-05-24 TW TW091111057A patent/TWI222127B/zh not_active IP Right Cessation
- 2002-07-30 JP JP2003527775A patent/JP2005503017A/ja active Pending
- 2002-07-30 WO PCT/US2002/024004 patent/WO2003023827A1/en not_active Ceased
- 2002-07-30 KR KR10-2004-7003688A patent/KR20040035772A/ko not_active Withdrawn
- 2002-07-30 CN CNA028225252A patent/CN1585999A/zh active Pending
- 2002-07-30 EP EP02759202A patent/EP1425780A1/en not_active Withdrawn
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