JP2005311293A - 半導体チップ、半導体装置、半導体装置の製造方法及び電子機器 - Google Patents

半導体チップ、半導体装置、半導体装置の製造方法及び電子機器 Download PDF

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JP2005311293A
JP2005311293A JP2004319480A JP2004319480A JP2005311293A JP 2005311293 A JP2005311293 A JP 2005311293A JP 2004319480 A JP2004319480 A JP 2004319480A JP 2004319480 A JP2004319480 A JP 2004319480A JP 2005311293 A JP2005311293 A JP 2005311293A
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Prior art keywords
conductive layer
semiconductor device
conductive
semiconductor chip
auxiliary
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JP2004319480A
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Japanese (ja)
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JP2005311293A5 (enExample
Inventor
Hideo Imai
英生 今井
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Seiko Epson Corp
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Seiko Epson Corp
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Priority to JP2004319480A priority Critical patent/JP2005311293A/ja
Priority to TW094105056A priority patent/TWI257676B/zh
Priority to US11/064,596 priority patent/US20050212130A1/en
Priority to CNA2005100590688A priority patent/CN1674242A/zh
Priority to KR1020050024407A priority patent/KR100659447B1/ko
Publication of JP2005311293A publication Critical patent/JP2005311293A/ja
Publication of JP2005311293A5 publication Critical patent/JP2005311293A5/ja
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    • EFIXED CONSTRUCTIONS
    • E03WATER SUPPLY; SEWERAGE
    • E03FSEWERS; CESSPOOLS
    • E03F5/00Sewerage structures
    • E03F5/10Collecting-tanks; Equalising-tanks for regulating the run-off; Laying-up basins
    • E03F5/105Accessories, e.g. flow regulators or cleaning devices
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • EFIXED CONSTRUCTIONS
    • E02HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02BHYDRAULIC ENGINEERING
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JP2004319480A 2004-03-26 2004-11-02 半導体チップ、半導体装置、半導体装置の製造方法及び電子機器 Pending JP2005311293A (ja)

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JP2010161322A (ja) * 2009-01-10 2010-07-22 Enrei Yu 半導体部材のメタルバンプと密封を形成する方法
JP2013140902A (ja) * 2012-01-06 2013-07-18 Enrei Yu 半導体パッケージ及びその製造方法
WO2013133116A1 (ja) * 2012-03-05 2013-09-12 デクセリアルズ株式会社 異方性導電材料を用いた接続方法及び異方性導電接合体
JP2015005741A (ja) * 2013-05-22 2015-01-08 積水化学工業株式会社 接続構造体

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JP2005191541A (ja) * 2003-12-05 2005-07-14 Seiko Epson Corp 半導体装置、半導体チップ、半導体装置の製造方法及び電子機器
JP4750586B2 (ja) * 2006-02-28 2011-08-17 住友電工デバイス・イノベーション株式会社 半導体装置および電子装置並びにその製造方法
KR20110052880A (ko) * 2009-11-13 2011-05-19 삼성전자주식회사 플립 칩 패키지 및 그의 제조 방법
CN103107156B (zh) * 2011-11-11 2016-02-10 讯忆科技股份有限公司 晶圆焊垫的凸块结构及其制造方法
US9331033B1 (en) * 2014-12-23 2016-05-03 Sunasic Technologies Inc. Method for forming stacked metal contact in electrical communication with aluminum wiring in semiconductor wafer of integrated circuit
CN105826206B (zh) * 2015-01-05 2018-07-24 旭景科技股份有限公司 用于形成堆栈金属接点与半导体晶圆内铝线电连通的方法

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JP2000294593A (ja) * 1999-04-08 2000-10-20 Nec Corp 集積回路の端子構造
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JP2010161322A (ja) * 2009-01-10 2010-07-22 Enrei Yu 半導体部材のメタルバンプと密封を形成する方法
JP2013140902A (ja) * 2012-01-06 2013-07-18 Enrei Yu 半導体パッケージ及びその製造方法
WO2013133116A1 (ja) * 2012-03-05 2013-09-12 デクセリアルズ株式会社 異方性導電材料を用いた接続方法及び異方性導電接合体
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KR101994507B1 (ko) 2012-03-05 2019-06-28 데쿠세리아루즈 가부시키가이샤 이방성 도전 재료를 사용한 접속 방법 및 이방성 도전 접합체
JP2015005741A (ja) * 2013-05-22 2015-01-08 積水化学工業株式会社 接続構造体

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