JP2005072488A - 半導体レーザ装置 - Google Patents
半導体レーザ装置 Download PDFInfo
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- JP2005072488A JP2005072488A JP2003303368A JP2003303368A JP2005072488A JP 2005072488 A JP2005072488 A JP 2005072488A JP 2003303368 A JP2003303368 A JP 2003303368A JP 2003303368 A JP2003303368 A JP 2003303368A JP 2005072488 A JP2005072488 A JP 2005072488A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0287—Facet reflectivity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2214—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Abstract
【解決手段】 少なくとも活性層と、クラッド層と、光を出射する端面とを有する半導体レーザ装置において、その端面には、波長によって反射率が変化する低反射膜が設けられていて、この低反射膜の反射率が極小となる波長は半導体レーザ装置の利得が最大となる波長より長波長側にあり、低反射膜の反射率が波長の増加に伴って減少する領域でのみ半導体レーザ装置の利得と損失が等しくなることを特徴とする。半導体レーザ装置の利得が最大となる波長における低反射膜の反射率は1%以下であることが好ましい。
【選択図】 図1
Description
2 n側GaAs基板
3 n側AlGaAsクラッド層
4 アンドープn側AlGaAsガイド層
5 アンドープn側GaAsガイド層
6 アンドープInGaAs量子井戸活性層
7 アンドープGaAsバリア層
8 アンドープp側GaAsガイド層
9 アンドープp側AlGaAsガイド層
10 p側AlGaAsクラッド層
11 p側GaAsキャップ層
12 Si3N4絶縁膜
13 p側電極
14 金線
15 リッジ領域
16 低屈折率領域
17 高屈折率領域
18 半導体レーザ装置
19 第1層膜
20 第2層膜
21 第3層膜
22 第4層膜
23 第5層膜
24 第6層膜
25 外部空間
Claims (3)
- 少なくとも活性層と、クラッド層と、光を出射する端面とを有する半導体レーザ装置において、
前記端面には、波長によって反射率が変化する低反射膜が設けられていて、
前記低反射膜の反射率が極小となる波長は前記半導体レーザ装置の利得が最大となる波長より長波長側にあり、
前記低反射膜の反射率が波長の増加に伴って減少する領域でのみ前記半導体レーザ装置の利得と損失が等しくなることを特徴とする半導体レーザ装置。 - 前記半導体レーザ装置の利得が最大となる波長における前記低反射膜の反射率は1%以下である請求項1に記載の半導体レーザ装置。
- 前記低反射膜はAl2O3膜の上にSiO2膜とTa2O5膜が交互に積層された膜であり、前記端面に最も近接して前記Al2O3膜が形成される請求項1または2に記載の半導体レーザ装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003303368A JP2005072488A (ja) | 2003-08-27 | 2003-08-27 | 半導体レーザ装置 |
TW093116659A TWI232015B (en) | 2003-08-27 | 2004-06-10 | Semiconductor laser device |
US10/866,696 US7215694B2 (en) | 2003-08-27 | 2004-06-15 | Semiconductor laser device |
CNB2004100588908A CN100355162C (zh) | 2003-08-27 | 2004-08-03 | 半导体激光器 |
KR1020040065964A KR100754956B1 (ko) | 2003-08-27 | 2004-08-20 | 반도체 레이저장치 및 레이저시스템 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003303368A JP2005072488A (ja) | 2003-08-27 | 2003-08-27 | 半導体レーザ装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2005072488A true JP2005072488A (ja) | 2005-03-17 |
Family
ID=34213992
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003303368A Pending JP2005072488A (ja) | 2003-08-27 | 2003-08-27 | 半導体レーザ装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7215694B2 (ja) |
JP (1) | JP2005072488A (ja) |
KR (1) | KR100754956B1 (ja) |
CN (1) | CN100355162C (ja) |
TW (1) | TWI232015B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006216791A (ja) * | 2005-02-03 | 2006-08-17 | Eudyna Devices Inc | レーザ装置、レーザ装置の制御装置、レーザ装置の制御方法、レーザ装置の波長切換方法およびレーザ装置の制御データ |
DE102007053328A1 (de) | 2007-03-28 | 2008-10-09 | Mitsubishi Electric Corp. | Halbleiterlaser mit Fabry-Perot-Resonator |
JP2009182052A (ja) * | 2008-01-29 | 2009-08-13 | Sumitomo Electric Ind Ltd | 半導体レーザ素子 |
DE102013215052A1 (de) | 2012-10-09 | 2014-04-10 | Mitsubishi Electric Corp. | Halbleiterlaservorrichtung |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3857294B2 (ja) | 2004-11-11 | 2006-12-13 | 三菱電機株式会社 | 半導体レーザ |
DE102020202018A1 (de) | 2020-02-18 | 2021-08-19 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaser und verfahren zu dessen herstellung |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07226562A (ja) * | 1994-02-10 | 1995-08-22 | Rohm Co Ltd | 半導体レーザおよびその製法 |
JPH09107156A (ja) * | 1995-10-12 | 1997-04-22 | Fujikura Ltd | 半導体レーザ |
JPH09129979A (ja) * | 1995-11-06 | 1997-05-16 | Furukawa Electric Co Ltd:The | 半導体レーザ装置 |
JPH1117248A (ja) * | 1997-06-25 | 1999-01-22 | Nippon Telegr & Teleph Corp <Ntt> | 半導体レーザ用高反射膜構造および半導体レーザ |
JP2001111163A (ja) * | 1999-10-06 | 2001-04-20 | Oki Electric Ind Co Ltd | 半導体レーザ素子 |
JP2001119096A (ja) * | 1999-10-18 | 2001-04-27 | Fuji Photo Film Co Ltd | 半導体レーザー装置 |
JP2002064244A (ja) * | 2000-06-06 | 2002-02-28 | Furukawa Electric Co Ltd:The | 分布帰還型半導体レーザ素子 |
JP2003179304A (ja) * | 2001-09-28 | 2003-06-27 | Furukawa Electric Co Ltd:The | 半導体レーザ装置、半導体レーザモジュールおよび半導体レーザモジュールを用いた光ファイバ増幅器 |
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JP3014208B2 (ja) * | 1992-02-27 | 2000-02-28 | 三菱電機株式会社 | 半導体光素子 |
US5285468A (en) * | 1992-07-17 | 1994-02-08 | At&T Bell Laboratories | Analog optical fiber communication system, and laser adapted for use in such a system |
WO1997010630A1 (en) * | 1995-09-14 | 1997-03-20 | Philips Electronics N.V. | Semiconductor diode laser and method of manufacturing same |
JPH1084161A (ja) * | 1996-09-06 | 1998-03-31 | Sumitomo Electric Ind Ltd | 半導体レーザ及びその製造方法 |
JP3538515B2 (ja) * | 1997-03-04 | 2004-06-14 | シャープ株式会社 | 半導体レーザ素子 |
JP3814432B2 (ja) * | 1998-12-04 | 2006-08-30 | 三菱化学株式会社 | 化合物半導体発光素子 |
US6798811B1 (en) * | 1999-11-30 | 2004-09-28 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser device, method for fabricating the same, and optical disk apparatus |
US6693935B2 (en) * | 2000-06-20 | 2004-02-17 | Sony Corporation | Semiconductor laser |
JP2002164609A (ja) * | 2000-11-28 | 2002-06-07 | Sharp Corp | 半導体レーザ素子およびその製造方法 |
JP2002299759A (ja) * | 2001-04-02 | 2002-10-11 | Furukawa Electric Co Ltd:The | 半導体レーザ装置 |
JP2003204110A (ja) * | 2001-11-01 | 2003-07-18 | Furukawa Electric Co Ltd:The | 半導体レーザ装置およびこれを用いた半導体レーザモジュール |
JP4236840B2 (ja) * | 2001-12-25 | 2009-03-11 | 富士フイルム株式会社 | 半導体レーザ素子 |
JP2004088049A (ja) | 2002-03-08 | 2004-03-18 | Mitsubishi Electric Corp | 光半導体装置 |
JP3856300B2 (ja) * | 2002-03-11 | 2006-12-13 | ソニー株式会社 | 半導体レーザ素子 |
JP2004327581A (ja) * | 2003-04-23 | 2004-11-18 | Mitsubishi Electric Corp | 半導体レーザ装置 |
-
2003
- 2003-08-27 JP JP2003303368A patent/JP2005072488A/ja active Pending
-
2004
- 2004-06-10 TW TW093116659A patent/TWI232015B/zh not_active IP Right Cessation
- 2004-06-15 US US10/866,696 patent/US7215694B2/en not_active Expired - Fee Related
- 2004-08-03 CN CNB2004100588908A patent/CN100355162C/zh not_active Expired - Fee Related
- 2004-08-20 KR KR1020040065964A patent/KR100754956B1/ko not_active IP Right Cessation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07226562A (ja) * | 1994-02-10 | 1995-08-22 | Rohm Co Ltd | 半導体レーザおよびその製法 |
JPH09107156A (ja) * | 1995-10-12 | 1997-04-22 | Fujikura Ltd | 半導体レーザ |
JPH09129979A (ja) * | 1995-11-06 | 1997-05-16 | Furukawa Electric Co Ltd:The | 半導体レーザ装置 |
JPH1117248A (ja) * | 1997-06-25 | 1999-01-22 | Nippon Telegr & Teleph Corp <Ntt> | 半導体レーザ用高反射膜構造および半導体レーザ |
JP2001111163A (ja) * | 1999-10-06 | 2001-04-20 | Oki Electric Ind Co Ltd | 半導体レーザ素子 |
JP2001119096A (ja) * | 1999-10-18 | 2001-04-27 | Fuji Photo Film Co Ltd | 半導体レーザー装置 |
JP2002064244A (ja) * | 2000-06-06 | 2002-02-28 | Furukawa Electric Co Ltd:The | 分布帰還型半導体レーザ素子 |
JP2003179304A (ja) * | 2001-09-28 | 2003-06-27 | Furukawa Electric Co Ltd:The | 半導体レーザ装置、半導体レーザモジュールおよび半導体レーザモジュールを用いた光ファイバ増幅器 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006216791A (ja) * | 2005-02-03 | 2006-08-17 | Eudyna Devices Inc | レーザ装置、レーザ装置の制御装置、レーザ装置の制御方法、レーザ装置の波長切換方法およびレーザ装置の制御データ |
DE102007053328A1 (de) | 2007-03-28 | 2008-10-09 | Mitsubishi Electric Corp. | Halbleiterlaser mit Fabry-Perot-Resonator |
US7627010B2 (en) | 2007-03-28 | 2009-12-01 | Mitsubishi Electric Corporation | Semiconductor laser having Fabry-Perot resonator |
JP2009182052A (ja) * | 2008-01-29 | 2009-08-13 | Sumitomo Electric Ind Ltd | 半導体レーザ素子 |
DE102013215052A1 (de) | 2012-10-09 | 2014-04-10 | Mitsubishi Electric Corp. | Halbleiterlaservorrichtung |
US8767788B2 (en) | 2012-10-09 | 2014-07-01 | Mitsubishi Electric Corporation | Semiconductor laser device |
DE102013215052B4 (de) | 2012-10-09 | 2019-02-21 | Mitsubishi Electric Corp. | Halbleiterlaservorrichtung |
Also Published As
Publication number | Publication date |
---|---|
US20050047464A1 (en) | 2005-03-03 |
US7215694B2 (en) | 2007-05-08 |
CN1592012A (zh) | 2005-03-09 |
TW200509490A (en) | 2005-03-01 |
KR100754956B1 (ko) | 2007-09-04 |
KR20050022333A (ko) | 2005-03-07 |
CN100355162C (zh) | 2007-12-12 |
TWI232015B (en) | 2005-05-01 |
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