JP2004514027A5 - - Google Patents
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- Publication number
- JP2004514027A5 JP2004514027A5 JP2002542733A JP2002542733A JP2004514027A5 JP 2004514027 A5 JP2004514027 A5 JP 2004514027A5 JP 2002542733 A JP2002542733 A JP 2002542733A JP 2002542733 A JP2002542733 A JP 2002542733A JP 2004514027 A5 JP2004514027 A5 JP 2004514027A5
- Authority
- JP
- Japan
- Prior art keywords
- dispersion
- liquid carrier
- fumed
- metal ion
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 description 47
- 239000006185 dispersion Substances 0.000 description 38
- 239000007788 liquid Substances 0.000 description 38
- 229910021645 metal ion Inorganic materials 0.000 description 35
- 229910044991 metal oxide Inorganic materials 0.000 description 33
- 150000004706 metal oxides Chemical class 0.000 description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 229910021485 fumed silica Inorganic materials 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000002585 base Substances 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical group [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001428 transition metal ion Inorganic materials 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US24966400P | 2000-11-15 | 2000-11-15 | |
| US60/249,664 | 2000-11-15 | ||
| PCT/US2001/044250 WO2002040399A2 (en) | 2000-11-15 | 2001-11-14 | Method of preparing a fumed metal oxide dispertion |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009122386A Division JP2009234908A (ja) | 2000-11-15 | 2009-05-20 | フュームド金属酸化物分散体の製造方法 |
| JP2012221498A Division JP2013049620A (ja) | 2000-11-15 | 2012-10-03 | フュームド金属酸化物分散体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004514027A JP2004514027A (ja) | 2004-05-13 |
| JP2004514027A5 true JP2004514027A5 (https=) | 2009-02-12 |
| JP5154731B2 JP5154731B2 (ja) | 2013-02-27 |
Family
ID=22944463
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002542733A Expired - Fee Related JP5154731B2 (ja) | 2000-11-15 | 2001-11-14 | フュームド金属酸化物分散体の製造方法 |
| JP2009122386A Withdrawn JP2009234908A (ja) | 2000-11-15 | 2009-05-20 | フュームド金属酸化物分散体の製造方法 |
| JP2011000146A Expired - Lifetime JP5524094B2 (ja) | 2000-11-15 | 2011-01-04 | フュームド金属酸化物分散体の製造方法 |
| JP2012221498A Pending JP2013049620A (ja) | 2000-11-15 | 2012-10-03 | フュームド金属酸化物分散体の製造方法 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009122386A Withdrawn JP2009234908A (ja) | 2000-11-15 | 2009-05-20 | フュームド金属酸化物分散体の製造方法 |
| JP2011000146A Expired - Lifetime JP5524094B2 (ja) | 2000-11-15 | 2011-01-04 | フュームド金属酸化物分散体の製造方法 |
| JP2012221498A Pending JP2013049620A (ja) | 2000-11-15 | 2012-10-03 | フュームド金属酸化物分散体の製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6638982B2 (https=) |
| EP (1) | EP1349809B1 (https=) |
| JP (4) | JP5154731B2 (https=) |
| AT (1) | ATE390386T1 (https=) |
| AU (1) | AU2002219869A1 (https=) |
| DE (1) | DE60133411T2 (https=) |
| WO (1) | WO2002040399A2 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6638982B2 (en) * | 2000-11-15 | 2003-10-28 | Cabot Corporation | Method of preparing a fumed metal oxide dispersion |
| US6846526B2 (en) * | 2001-01-26 | 2005-01-25 | Eastman Kodak Company | Ink jet recording element |
| US7037553B2 (en) * | 2001-08-21 | 2006-05-02 | Konica Corporation | Manufacturing process for ink-jet recording medium |
| US6746527B1 (en) * | 2003-03-26 | 2004-06-08 | Nu-Kote International, Inc. | Aqueous magnetic ink character recognition ink-jet ink composition containing a combination of special surfactants |
| DE10342826B3 (de) | 2003-09-17 | 2005-05-12 | Degussa Ag | Dispersion von pyrogen hergestelltem Ceroxid |
| ATE469863T1 (de) * | 2004-05-04 | 2010-06-15 | Cabot Corp | Verfahren zur herstellung einer dispersion von metalloxid-aggregatteilchen mit einem gewünschten aggregatteilchendurchmesser |
| DE102004054392A1 (de) * | 2004-08-28 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zum Verbinden von Bauteilen aus hochkieselsäurehaltigem Werkstoff, sowie aus derartigen Bauteilen zusammengefügter Bauteil-Verbund |
| JP4954519B2 (ja) * | 2004-11-12 | 2012-06-20 | 富士フイルム株式会社 | インクジェット記録用媒体、及びインクジェット記録用媒体の製造方法 |
| US8227369B2 (en) * | 2005-05-25 | 2012-07-24 | Celanese International Corp. | Layered composition and processes for preparing and using the composition |
| DE102007049742A1 (de) * | 2007-10-16 | 2009-04-23 | Evonik Degussa Gmbh | Verfahren zur Herstellung einer Titan-Silicium-Mischoxid enthaltenden Dispersion |
| US20090184283A1 (en) * | 2008-01-18 | 2009-07-23 | Deborah Duen Ling Chung | Antioxidants for phase change ability and thermal stability enhancement |
| US10184057B2 (en) | 2011-03-01 | 2019-01-22 | Thomas Villwock | Nanoparticle suspension for inkjet printing magnetizable characters on a substrate |
| US20140197354A1 (en) * | 2011-09-11 | 2014-07-17 | Acta Technology Inc. | Method of making nanaofluids for ground souce heat pumps and other applications |
| US8580138B2 (en) * | 2011-09-11 | 2013-11-12 | Acta Technology Inc | Nanofluids and a method of making nanofluids for ground source heat pumps and other applications |
| US8993490B2 (en) * | 2011-12-20 | 2015-03-31 | Halliburton Energy Services, Inc. | Method for the removal or suppression of interfering metal ions using environmentally friendly competitive binders |
| CN108780258A (zh) * | 2016-03-07 | 2018-11-09 | 巴斯夫欧洲公司 | 使用预混印刷配制剂的涂布方法 |
| US11640615B2 (en) | 2016-09-08 | 2023-05-02 | Thomas Villwock | Methods and systems for authenticating goods and services using electronic analysis of analyte encoded compositions |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE509387A (https=) * | 1951-03-01 | |||
| US2984629A (en) | 1957-11-04 | 1961-05-16 | Cabot Corp | Aqueous dispersions of pyrogenic silica |
| US3055831A (en) * | 1961-09-25 | 1962-09-25 | Johns Manville | Handleable heat insulation shapes |
| GB1326574A (en) * | 1970-10-30 | 1973-08-15 | Degussa | Production of stabilised dispersions of pyrogenic silica |
| US4036663A (en) | 1971-11-05 | 1977-07-19 | J. M. Huber Corporation | Inorganic pigments and methods for producing the pigments and aqueous slurries thereof |
| US4010242A (en) | 1972-04-07 | 1977-03-01 | E. I. Dupont De Nemours And Company | Uniform oxide microspheres and a process for their manufacture |
| US3956171A (en) * | 1973-07-30 | 1976-05-11 | E. I. Du Pont De Nemours And Company | Process for preparing stable positively charged alumina coated silica sols and product thereof |
| US4042361A (en) | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
| NL7707961A (nl) * | 1977-07-18 | 1979-01-22 | Stamicarbon | Werkwijze ter bereiding van poreus, zuiver siliciumdioxyde. |
| DE2931810A1 (de) * | 1979-08-06 | 1981-02-19 | Degussa | Temperaturstabilisiertes siliciumdioxid-mischoxid, das verfahren zu seiner herstellung und verwendung |
| US4427811A (en) | 1981-12-30 | 1984-01-24 | Dow Corning Corporation | Silicone elastomeric emulsion having improved shelf life |
| US4588421A (en) | 1984-10-15 | 1986-05-13 | Nalco Chemical Company | Aqueous silica compositions for polishing silicon wafers |
| US5221497A (en) * | 1988-03-16 | 1993-06-22 | Nissan Chemical Industries, Ltd. | Elongated-shaped silica sol and method for preparing the same |
| US5246624A (en) | 1989-03-21 | 1993-09-21 | Cabot Corporation | Aqueous colloidal dispersion of fumed silica, acid and stabilizer |
| DE4006392A1 (de) * | 1989-03-21 | 1990-09-27 | Cabot Corp | Waessrige colloidale dispersion aus in der gasphase hergestelltem siliciumdioxid, aus einer saeure und aus einem stabilisator, sowie ein verfahren zu ihrer hertellung |
| US5116535A (en) * | 1989-03-21 | 1992-05-26 | Cabot Corporation | Aqueous colloidal dispersion of fumed silica without a stabilizer |
| JP3546467B2 (ja) * | 1994-04-28 | 2004-07-28 | 日産化学工業株式会社 | 水性アルミナゾル及びその製造法 |
| FR2732327B1 (fr) * | 1995-04-03 | 1997-05-09 | Rhone Poulenc Chimie | Suspension aqueuse de silice et de sulfate d'aluminium ou d'alun, procedes de preparation et utilisations de ladite suspension |
| JPH09142827A (ja) * | 1995-09-12 | 1997-06-03 | Tokuyama Corp | シリカ分散液及びその製造方法 |
| JP3437900B2 (ja) * | 1995-11-10 | 2003-08-18 | 株式会社トクヤマ | 研磨剤 |
| US5660622A (en) * | 1996-08-08 | 1997-08-26 | Nikoloff; Koyu P. | Coating for ink jet recording sheets |
| JPH10172934A (ja) * | 1996-12-05 | 1998-06-26 | Fujimi Inkooporeetetsudo:Kk | 研磨用組成物 |
| JP3922758B2 (ja) * | 1997-05-02 | 2007-05-30 | 株式会社トクヤマ | シリカ分散液の製造方法 |
| KR100510815B1 (ko) * | 1997-05-07 | 2005-10-24 | 제이에스알 가부시끼가이샤 | 무기입자의 수성분산체 및 그의 제조방법 |
| KR19990023544A (ko) | 1997-08-19 | 1999-03-25 | 마쯔모또 에이찌 | 무기 입자의 수성 분산체와 그의 제조 방법 |
| US6638982B2 (en) * | 2000-11-15 | 2003-10-28 | Cabot Corporation | Method of preparing a fumed metal oxide dispersion |
-
2001
- 2001-11-14 US US09/992,730 patent/US6638982B2/en not_active Expired - Lifetime
- 2001-11-14 DE DE60133411T patent/DE60133411T2/de not_active Expired - Lifetime
- 2001-11-14 WO PCT/US2001/044250 patent/WO2002040399A2/en not_active Ceased
- 2001-11-14 EP EP01996510A patent/EP1349809B1/en not_active Expired - Lifetime
- 2001-11-14 JP JP2002542733A patent/JP5154731B2/ja not_active Expired - Fee Related
- 2001-11-14 AU AU2002219869A patent/AU2002219869A1/en not_active Abandoned
- 2001-11-14 AT AT01996510T patent/ATE390386T1/de not_active IP Right Cessation
-
2009
- 2009-05-20 JP JP2009122386A patent/JP2009234908A/ja not_active Withdrawn
-
2011
- 2011-01-04 JP JP2011000146A patent/JP5524094B2/ja not_active Expired - Lifetime
-
2012
- 2012-10-03 JP JP2012221498A patent/JP2013049620A/ja active Pending
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