JP2004006885A5 - - Google Patents

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Publication number
JP2004006885A5
JP2004006885A5 JP2003147766A JP2003147766A JP2004006885A5 JP 2004006885 A5 JP2004006885 A5 JP 2004006885A5 JP 2003147766 A JP2003147766 A JP 2003147766A JP 2003147766 A JP2003147766 A JP 2003147766A JP 2004006885 A5 JP2004006885 A5 JP 2004006885A5
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JP
Japan
Prior art keywords
frequency power
reactor
vapor deposition
chemical vapor
frequency
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003147766A
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English (en)
Japanese (ja)
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JP2004006885A (ja
JP4217883B2 (ja
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Priority claimed from US09/026,566 external-priority patent/US6112697A/en
Application filed filed Critical
Publication of JP2004006885A publication Critical patent/JP2004006885A/ja
Publication of JP2004006885A5 publication Critical patent/JP2004006885A5/ja
Application granted granted Critical
Publication of JP4217883B2 publication Critical patent/JP4217883B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003147766A 1998-02-19 2003-05-26 高周波型プラズマ強化化学気相堆積反応装置、及びそれを用いる方法 Expired - Fee Related JP4217883B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/026,566 US6112697A (en) 1998-02-19 1998-02-19 RF powered plasma enhanced chemical vapor deposition reactor and methods

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000532862A Division JP3822055B2 (ja) 1998-02-19 1999-02-16 高周波型プラズマ強化化学気相堆積反応装置、及びそれを実施する方法

Publications (3)

Publication Number Publication Date
JP2004006885A JP2004006885A (ja) 2004-01-08
JP2004006885A5 true JP2004006885A5 (enExample) 2005-04-07
JP4217883B2 JP4217883B2 (ja) 2009-02-04

Family

ID=21832548

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000532862A Expired - Fee Related JP3822055B2 (ja) 1998-02-19 1999-02-16 高周波型プラズマ強化化学気相堆積反応装置、及びそれを実施する方法
JP2003147766A Expired - Fee Related JP4217883B2 (ja) 1998-02-19 2003-05-26 高周波型プラズマ強化化学気相堆積反応装置、及びそれを用いる方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2000532862A Expired - Fee Related JP3822055B2 (ja) 1998-02-19 1999-02-16 高周波型プラズマ強化化学気相堆積反応装置、及びそれを実施する方法

Country Status (9)

Country Link
US (2) US6112697A (enExample)
EP (1) EP1057207B1 (enExample)
JP (2) JP3822055B2 (enExample)
KR (1) KR100388529B1 (enExample)
AT (1) ATE269586T1 (enExample)
AU (1) AU3293999A (enExample)
DE (1) DE69918063T2 (enExample)
TW (1) TW523830B (enExample)
WO (1) WO1999043017A1 (enExample)

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