JP2003535356A5 - - Google Patents

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Publication number
JP2003535356A5
JP2003535356A5 JP2001550065A JP2001550065A JP2003535356A5 JP 2003535356 A5 JP2003535356 A5 JP 2003535356A5 JP 2001550065 A JP2001550065 A JP 2001550065A JP 2001550065 A JP2001550065 A JP 2001550065A JP 2003535356 A5 JP2003535356 A5 JP 2003535356A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001550065A
Other languages
Japanese (ja)
Other versions
JP2003535356A (ja
Filing date
Publication date
Priority claimed from DE2000102626 external-priority patent/DE10002626A1/de
Application filed filed Critical
Priority claimed from PCT/EP2000/013148 external-priority patent/WO2001050171A1/de
Publication of JP2003535356A publication Critical patent/JP2003535356A/ja
Publication of JP2003535356A5 publication Critical patent/JP2003535356A5/ja
Pending legal-status Critical Current

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JP2001550065A 1999-12-29 2000-12-22 非球面レンズ表面が隣接して配置されている投影対物レンズ Pending JP2003535356A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US17352399P 1999-12-29 1999-12-29
US60/173,523 1999-12-29
DE2000102626 DE10002626A1 (de) 2000-01-22 2000-01-22 Katadioptrisches Objektiv mit Asphären
DE10002626.5 2000-01-22
DE10021739 2000-05-04
DE10021739.7 2000-05-04
PCT/EP2000/013148 WO2001050171A1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Publications (2)

Publication Number Publication Date
JP2003535356A JP2003535356A (ja) 2003-11-25
JP2003535356A5 true JP2003535356A5 (enrdf_load_stackoverflow) 2007-12-27

Family

ID=27213593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001550065A Pending JP2003535356A (ja) 1999-12-29 2000-12-22 非球面レンズ表面が隣接して配置されている投影対物レンズ

Country Status (6)

Country Link
US (3) US6646718B2 (enrdf_load_stackoverflow)
EP (1) EP1242843B1 (enrdf_load_stackoverflow)
JP (1) JP2003535356A (enrdf_load_stackoverflow)
KR (1) KR100854052B1 (enrdf_load_stackoverflow)
DE (1) DE50012452D1 (enrdf_load_stackoverflow)
WO (1) WO2001050171A1 (enrdf_load_stackoverflow)

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EP1242843B1 (de) * 1999-12-29 2006-03-22 Carl Zeiss SMT AG Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
KR20030072568A (ko) * 2000-12-22 2003-09-15 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 하나 이상의 비구면 렌즈를 갖는 대물렌즈
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
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US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
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AU2003210214A1 (en) * 2002-03-01 2003-09-16 Carl Zeiss Smt Ag Refractive projection lens
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US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
AU2003258519A1 (en) * 2002-07-18 2004-02-09 Carl Zeiss Smt Ag Catadioptric projection objective
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
WO2004023172A1 (de) 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen
WO2004025349A1 (de) * 2002-09-09 2004-03-25 Carl Zeiss Smt Ag Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen
EP1608004A4 (en) * 2003-03-17 2008-07-02 Nikon Corp OPTICAL PROJECTION SYSTEM, EXPOSURE SYSTEM AND LIGHTING PROCESS
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US7551361B2 (en) 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7177087B2 (en) * 2003-10-28 2007-02-13 Leupold & Stevens, Inc. Compound asperic ocular for riflescope
KR100965330B1 (ko) 2003-12-15 2010-06-22 칼 짜이스 에스엠티 아게 적어도 한 개의 액체 렌즈를 가진 마이크로리소그래피 투사대물렌즈로서의 대물렌즈
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN100592210C (zh) 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US7511798B2 (en) 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
ATE514115T1 (de) * 2004-11-10 2011-07-15 Nikon Corp Optisches projektionssystem, belichtungsgeräte und belichtungsverfahren
TWI454731B (zh) * 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
TWI305107B (en) * 2005-09-29 2009-01-01 Young Optics Inc Optical projection apparatus
DE102008015775A1 (de) 2007-04-16 2008-12-18 Carl Zeiss Smt Ag Chromatisch korrigiertes Lithographieobjektiv
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
KR101505256B1 (ko) 2010-04-23 2015-03-30 칼 짜이스 에스엠티 게엠베하 리소그래픽 시스템의 광학 소자의 조작을 포함하는 리소그래픽 시스템의 작동 방법

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JPH1195098A (ja) 1997-09-16 1999-04-09 Nitto Kogaku Kk 投写用ズームレンズおよびプロジェクタ装置
JP4083856B2 (ja) * 1998-02-18 2008-04-30 リコー光学株式会社 投射用ズームレンズ
US6166864A (en) * 1998-03-10 2000-12-26 Canon Kabushiki Kaisha Zoom lens and optical apparatus using the same
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JP2000195772A (ja) * 1998-12-25 2000-07-14 Nikon Corp 投影露光装置
JPH11307443A (ja) * 1998-04-24 1999-11-05 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
DE19939088A1 (de) * 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
WO2000039623A1 (fr) * 1998-12-25 2000-07-06 Nikon Corporation Systeme optique de formation d'image par reflexion refraction et appareil d'exposition par projection comprenant le systeme optique
JP3359302B2 (ja) * 1999-06-14 2002-12-24 キヤノン株式会社 投影露光装置
JP3423644B2 (ja) * 1999-06-14 2003-07-07 キヤノン株式会社 投影光学系及びそれを用いた投影露光装置
US6867922B1 (en) * 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP4717974B2 (ja) * 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
EP1242843B1 (de) * 1999-12-29 2006-03-22 Carl Zeiss SMT AG Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
US6542723B1 (en) * 2000-02-11 2003-04-01 Lucent Technologies Inc. Optoelectronic phase locked loop with balanced photodetection for clock recovery in high-speed optical time division multiplexed systems

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