ATE514115T1 - Optisches projektionssystem, belichtungsgeräte und belichtungsverfahren - Google Patents
Optisches projektionssystem, belichtungsgeräte und belichtungsverfahrenInfo
- Publication number
- ATE514115T1 ATE514115T1 AT05799383T AT05799383T ATE514115T1 AT E514115 T1 ATE514115 T1 AT E514115T1 AT 05799383 T AT05799383 T AT 05799383T AT 05799383 T AT05799383 T AT 05799383T AT E514115 T1 ATE514115 T1 AT E514115T1
- Authority
- AT
- Austria
- Prior art keywords
- plane
- optical system
- projection optical
- image
- numerical aperture
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 16
- 230000004075 alteration Effects 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 2
- 238000003384 imaging method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004326141 | 2004-11-10 | ||
PCT/JP2005/019689 WO2006051689A1 (ja) | 2004-11-10 | 2005-10-26 | 投影光学系、露光装置、および露光方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE514115T1 true ATE514115T1 (de) | 2011-07-15 |
Family
ID=36336372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05799383T ATE514115T1 (de) | 2004-11-10 | 2005-10-26 | Optisches projektionssystem, belichtungsgeräte und belichtungsverfahren |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080123074A1 (de) |
EP (1) | EP1816502B1 (de) |
KR (1) | KR20070083543A (de) |
AT (1) | ATE514115T1 (de) |
TW (1) | TW200616043A (de) |
WO (1) | WO2006051689A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
CN1938646B (zh) | 2004-01-20 | 2010-12-15 | 卡尔蔡司Smt股份公司 | 曝光装置和用于投影透镜的测量装置 |
WO2005111689A2 (en) | 2004-05-17 | 2005-11-24 | Carl Zeiss Smt Ag | Catadioptric projection objective with intermediate images |
DE102006021797A1 (de) | 2006-05-09 | 2007-11-15 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung mit thermischer Dämpfung |
US8027023B2 (en) | 2006-05-19 | 2011-09-27 | Carl Zeiss Smt Gmbh | Optical imaging device and method for reducing dynamic fluctuations in pressure difference |
JP5253081B2 (ja) * | 2008-10-14 | 2013-07-31 | キヤノン株式会社 | 投影光学系、露光装置及びデバイスの製造方法 |
CN102662307B (zh) * | 2012-05-02 | 2014-03-12 | 中国科学院光电技术研究所 | 一种高分辨率投影光学系统 |
CN103149808B (zh) * | 2013-02-27 | 2015-02-18 | 中国科学院光电技术研究所 | 一种浸没式紫外光学系统 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
DE59105735D1 (de) * | 1990-05-02 | 1995-07-20 | Fraunhofer Ges Forschung | Belichtungsvorrichtung. |
US5229872A (en) | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
DE69709584T2 (de) | 1996-03-04 | 2002-06-13 | Asm Lithography B.V., Veldhoven | Lithographisches gerät zur step-und-scan übertragung eines maskenmusters |
JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
WO1999066542A1 (fr) | 1998-06-17 | 1999-12-23 | Nikon Corporation | Procede et dispositif d'exposition |
WO2001050171A1 (de) * | 1999-12-29 | 2001-07-12 | Carl Zeiss | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
US7187503B2 (en) * | 1999-12-29 | 2007-03-06 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
DE10229249A1 (de) * | 2002-03-01 | 2003-09-04 | Zeiss Carl Semiconductor Mfg | Refraktives Projektionsobjektiv mit einer Taille |
DE10210899A1 (de) | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
KR20040104691A (ko) * | 2002-05-03 | 2004-12-10 | 칼 짜이스 에스엠테 아게 | 높은 개구를 갖는 투영 대물렌즈 |
US7362508B2 (en) | 2002-08-23 | 2008-04-22 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
JP2004205698A (ja) * | 2002-12-24 | 2004-07-22 | Nikon Corp | 投影光学系、露光装置および露光方法 |
AU2003304557A1 (en) * | 2003-10-22 | 2005-06-08 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
-
2005
- 2005-10-26 TW TW094137432A patent/TW200616043A/zh unknown
- 2005-10-26 US US11/666,725 patent/US20080123074A1/en not_active Abandoned
- 2005-10-26 EP EP05799383A patent/EP1816502B1/de not_active Revoked
- 2005-10-26 KR KR1020077005330A patent/KR20070083543A/ko not_active Application Discontinuation
- 2005-10-26 WO PCT/JP2005/019689 patent/WO2006051689A1/ja not_active Application Discontinuation
- 2005-10-26 AT AT05799383T patent/ATE514115T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1816502B1 (de) | 2011-06-22 |
TW200616043A (en) | 2006-05-16 |
KR20070083543A (ko) | 2007-08-24 |
EP1816502A1 (de) | 2007-08-08 |
WO2006051689A1 (ja) | 2006-05-18 |
EP1816502A4 (de) | 2009-09-30 |
US20080123074A1 (en) | 2008-05-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE514115T1 (de) | Optisches projektionssystem, belichtungsgeräte und belichtungsverfahren | |
US7046451B2 (en) | Immersion microscope objective lens | |
JP3360387B2 (ja) | 投影光学系及び投影露光装置 | |
KR100378921B1 (ko) | 노광장치 | |
KR100315180B1 (ko) | 투영광학계및투영노광장치 | |
SG160223A1 (en) | Projection optical system, exposure apparatus, and exposure method | |
DE602006009006D1 (de) | Abbildungslinse | |
ATE507498T1 (de) | Abbildungslinse | |
ATE547731T1 (de) | Abbildungslinse und bildaufnahmevorrichtung | |
WO2009004966A1 (ja) | 撮像レンズ及び撮像装置並びに携帯端末 | |
ATE347120T1 (de) | Hmd-vorrichtung (head mounted display) mit einer eine asphärische fläche aufweisenden abbildungsoptik | |
JP3823436B2 (ja) | 投影光学系 | |
ATE408852T1 (de) | Kompaktes objektiv mit vier einzellinsen | |
TW200632567A (en) | Lithographic apparatus and device manufacturing method | |
WO2017217291A1 (ja) | リレー光学系及びそれを用いた硬性鏡用光学系、硬性鏡 | |
JP6019244B2 (ja) | 遠赤外線レーザ加工のためのFθレンズ及びレーザ加工デバイス | |
CN100492175C (zh) | 一种投影光学系统 | |
JP3010365B2 (ja) | 対物レンズ | |
TW200834259A (en) | Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element | |
JP2002244036A (ja) | 投影レンズ、及び微細構造化部品の製造方法 | |
EP2003478A4 (de) | Optisches projektionssystem, ausrichter und geräteherstellungsverfahren | |
JP2005039211A (ja) | 投影光学系、露光装置及びデバイスの製造方法 | |
EP1235091A3 (de) | Optisches Projektionssystem und hiermit versehener Belichtungsapparat | |
TW200509106A (en) | Optical pickup device, optical information recording and reproducing apparatus and objective lens | |
JP5836087B2 (ja) | 顕微鏡用リレー光学系 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |