JP2002530880A5 - - Google Patents

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Publication number
JP2002530880A5
JP2002530880A5 JP2000584509A JP2000584509A JP2002530880A5 JP 2002530880 A5 JP2002530880 A5 JP 2002530880A5 JP 2000584509 A JP2000584509 A JP 2000584509A JP 2000584509 A JP2000584509 A JP 2000584509A JP 2002530880 A5 JP2002530880 A5 JP 2002530880A5
Authority
JP
Japan
Prior art keywords
substrate
support
support plate
support device
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000584509A
Other languages
English (en)
Japanese (ja)
Other versions
JP4499293B2 (ja
JP2002530880A (ja
Filing date
Publication date
Priority claimed from DE19853588A external-priority patent/DE19853588B4/de
Application filed filed Critical
Publication of JP2002530880A publication Critical patent/JP2002530880A/ja
Publication of JP2002530880A5 publication Critical patent/JP2002530880A5/ja
Application granted granted Critical
Publication of JP4499293B2 publication Critical patent/JP4499293B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000584509A 1998-11-20 1999-11-16 基板支持装置 Expired - Fee Related JP4499293B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19853588.0 1998-11-20
DE19853588A DE19853588B4 (de) 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat
PCT/DE1999/003638 WO2000031774A2 (de) 1998-11-20 1999-11-16 Halteeinrichtung für ein substrat

Publications (3)

Publication Number Publication Date
JP2002530880A JP2002530880A (ja) 2002-09-17
JP2002530880A5 true JP2002530880A5 (https=) 2009-03-26
JP4499293B2 JP4499293B2 (ja) 2010-07-07

Family

ID=7888462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000584509A Expired - Fee Related JP4499293B2 (ja) 1998-11-20 1999-11-16 基板支持装置

Country Status (6)

Country Link
US (1) US6426860B1 (https=)
EP (1) EP1050070B1 (https=)
JP (1) JP4499293B2 (https=)
DE (2) DE19853588B4 (https=)
TW (1) TW452674B (https=)
WO (1) WO2000031774A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10057292C2 (de) * 2000-11-17 2003-02-13 Leica Microsystems Vorrichtung zum Aufnehmen von Mirodissektaten
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
US7154731B1 (en) * 2003-07-18 2006-12-26 Novellus Systems, Inc. Reflective coating for electrostatic chucks
US20060194516A1 (en) * 2005-01-31 2006-08-31 Tokyo Electron Limited Processing apparatus and processing method
JP5635240B2 (ja) * 2009-03-17 2014-12-03 株式会社ニューフレアテクノロジー 校正ブロック及び荷電粒子ビーム描画装置
JP5807242B2 (ja) * 2009-11-09 2015-11-10 株式会社ブイ・テクノロジー マスク保持機構
CN110268108B (zh) 2016-12-12 2022-09-06 埃克切拉生物科学公司 用于使用微毛细管阵列进行筛选的方法和系统
US11085039B2 (en) 2016-12-12 2021-08-10 xCella Biosciences, Inc. Methods and systems for screening using microcapillary arrays
EP3562796B1 (en) 2016-12-30 2023-04-19 Xcella Biosciences, Inc. Multi-stage sample recovery system
ES3039910T3 (en) 2018-12-06 2025-10-27 Xcella Biosciences Inc Lateral loading of microcapillary arrays
EP4533531A1 (en) * 2022-05-27 2025-04-09 Entegris, Inc. Reticle container having magnetic particle capture
CN115309004B (zh) * 2022-08-09 2023-04-11 上海图双精密装备有限公司 一种多尺寸兼容光刻机的传输系统

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295430A (ja) * 1986-06-16 1987-12-22 Toshiba Corp 縦形移動テ−ブル
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JP3027165B2 (ja) * 1990-05-17 2000-03-27 キヤノン株式会社 位置決め装置
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
US5883778A (en) * 1994-02-28 1999-03-16 Applied Materials, Inc. Electrostatic chuck with fluid flow regulator
US5535090A (en) * 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
JPH07273383A (ja) * 1994-03-30 1995-10-20 Canon Inc 真空封入式圧電アクチュエータおよび該真空封入式圧電アクチュエータを用いた位置決め装置
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus
JP3551423B2 (ja) * 1995-03-14 2004-08-04 株式会社ニコン 露光装置
JPH08288372A (ja) * 1995-04-11 1996-11-01 Nippon Pillar Packing Co Ltd ウエハ支持プレート
JP3274791B2 (ja) * 1995-07-28 2002-04-15 株式会社日立製作所 電子線描画装置
JP3596127B2 (ja) * 1995-12-04 2004-12-02 ソニー株式会社 静電チャック、薄板保持装置、半導体製造装置、搬送方法及び半導体の製造方法
US5644137A (en) 1996-03-04 1997-07-01 Waggener; Herbert A. Stabilizing support mechanism for electron beam apparatus
JPH09266166A (ja) * 1996-03-28 1997-10-07 Nikon Corp 露光装置
JPH1050604A (ja) * 1996-04-04 1998-02-20 Nikon Corp 位置管理方法及び位置合わせ方法
JPH09283398A (ja) * 1996-04-09 1997-10-31 Nikon Corp 試料台、反射鏡保持装置及び露光装置
JP3709904B2 (ja) * 1996-11-14 2005-10-26 株式会社ニコン 投影露光装置
JPH1080468A (ja) * 1996-09-09 1998-03-31 Sanden Corp 手指消毒器
JP3832681B2 (ja) * 1997-03-19 2006-10-11 株式会社ニコン ステージ装置及び該装置を備えた露光装置
JPH11251409A (ja) * 1998-03-02 1999-09-17 Nikon Corp 位置決め装置、及び露光装置

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