TW452674B - Holding device for a substrate - Google Patents

Holding device for a substrate Download PDF

Info

Publication number
TW452674B
TW452674B TW088120041A TW88120041A TW452674B TW 452674 B TW452674 B TW 452674B TW 088120041 A TW088120041 A TW 088120041A TW 88120041 A TW88120041 A TW 88120041A TW 452674 B TW452674 B TW 452674B
Authority
TW
Taiwan
Prior art keywords
substrate
patent application
supporting device
scope
carrier plate
Prior art date
Application number
TW088120041A
Other languages
English (en)
Chinese (zh)
Inventor
Gerhard Schubert
Ulf-Carsten Kirschstein
Stefan Risse
Gerd Harnisch
Gerhard Kalkowski
Original Assignee
Leica Microsys Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leica Microsys Lithography Ltd filed Critical Leica Microsys Lithography Ltd
Application granted granted Critical
Publication of TW452674B publication Critical patent/TW452674B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW088120041A 1998-11-20 1999-11-17 Holding device for a substrate TW452674B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19853588A DE19853588B4 (de) 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat

Publications (1)

Publication Number Publication Date
TW452674B true TW452674B (en) 2001-09-01

Family

ID=7888462

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088120041A TW452674B (en) 1998-11-20 1999-11-17 Holding device for a substrate

Country Status (6)

Country Link
US (1) US6426860B1 (https=)
EP (1) EP1050070B1 (https=)
JP (1) JP4499293B2 (https=)
DE (2) DE19853588B4 (https=)
TW (1) TW452674B (https=)
WO (1) WO2000031774A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI866235B (zh) * 2022-05-27 2024-12-11 美商恩特葛瑞斯股份有限公司 可捕獲磁性粒子的光罩容器

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* Cited by examiner, † Cited by third party
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DE10057292C2 (de) * 2000-11-17 2003-02-13 Leica Microsystems Vorrichtung zum Aufnehmen von Mirodissektaten
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
US7154731B1 (en) * 2003-07-18 2006-12-26 Novellus Systems, Inc. Reflective coating for electrostatic chucks
US20060194516A1 (en) * 2005-01-31 2006-08-31 Tokyo Electron Limited Processing apparatus and processing method
JP5635240B2 (ja) * 2009-03-17 2014-12-03 株式会社ニューフレアテクノロジー 校正ブロック及び荷電粒子ビーム描画装置
JP5807242B2 (ja) * 2009-11-09 2015-11-10 株式会社ブイ・テクノロジー マスク保持機構
CN110268108B (zh) 2016-12-12 2022-09-06 埃克切拉生物科学公司 用于使用微毛细管阵列进行筛选的方法和系统
US11085039B2 (en) 2016-12-12 2021-08-10 xCella Biosciences, Inc. Methods and systems for screening using microcapillary arrays
EP3562796B1 (en) 2016-12-30 2023-04-19 Xcella Biosciences, Inc. Multi-stage sample recovery system
ES3039910T3 (en) 2018-12-06 2025-10-27 Xcella Biosciences Inc Lateral loading of microcapillary arrays
CN115309004B (zh) * 2022-08-09 2023-04-11 上海图双精密装备有限公司 一种多尺寸兼容光刻机的传输系统

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JPS62295430A (ja) * 1986-06-16 1987-12-22 Toshiba Corp 縦形移動テ−ブル
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JP3027165B2 (ja) * 1990-05-17 2000-03-27 キヤノン株式会社 位置決め装置
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
US5883778A (en) * 1994-02-28 1999-03-16 Applied Materials, Inc. Electrostatic chuck with fluid flow regulator
US5535090A (en) * 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
JPH07273383A (ja) * 1994-03-30 1995-10-20 Canon Inc 真空封入式圧電アクチュエータおよび該真空封入式圧電アクチュエータを用いた位置決め装置
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus
JP3551423B2 (ja) * 1995-03-14 2004-08-04 株式会社ニコン 露光装置
JPH08288372A (ja) * 1995-04-11 1996-11-01 Nippon Pillar Packing Co Ltd ウエハ支持プレート
JP3274791B2 (ja) * 1995-07-28 2002-04-15 株式会社日立製作所 電子線描画装置
JP3596127B2 (ja) * 1995-12-04 2004-12-02 ソニー株式会社 静電チャック、薄板保持装置、半導体製造装置、搬送方法及び半導体の製造方法
US5644137A (en) 1996-03-04 1997-07-01 Waggener; Herbert A. Stabilizing support mechanism for electron beam apparatus
JPH09266166A (ja) * 1996-03-28 1997-10-07 Nikon Corp 露光装置
JPH1050604A (ja) * 1996-04-04 1998-02-20 Nikon Corp 位置管理方法及び位置合わせ方法
JPH09283398A (ja) * 1996-04-09 1997-10-31 Nikon Corp 試料台、反射鏡保持装置及び露光装置
JP3709904B2 (ja) * 1996-11-14 2005-10-26 株式会社ニコン 投影露光装置
JPH1080468A (ja) * 1996-09-09 1998-03-31 Sanden Corp 手指消毒器
JP3832681B2 (ja) * 1997-03-19 2006-10-11 株式会社ニコン ステージ装置及び該装置を備えた露光装置
JPH11251409A (ja) * 1998-03-02 1999-09-17 Nikon Corp 位置決め装置、及び露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI866235B (zh) * 2022-05-27 2024-12-11 美商恩特葛瑞斯股份有限公司 可捕獲磁性粒子的光罩容器

Also Published As

Publication number Publication date
US6426860B1 (en) 2002-07-30
WO2000031774A3 (de) 2000-11-23
EP1050070A2 (de) 2000-11-08
JP4499293B2 (ja) 2010-07-07
EP1050070B1 (de) 2005-10-19
EP1050070A3 (de) 2002-09-11
DE19853588A1 (de) 2000-06-21
JP2002530880A (ja) 2002-09-17
DE19853588B4 (de) 2005-04-21
DE59912677D1 (de) 2005-11-24
WO2000031774A2 (de) 2000-06-02

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees