JP2009531675A5 - - Google Patents
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- Publication number
- JP2009531675A5 JP2009531675A5 JP2009501869A JP2009501869A JP2009531675A5 JP 2009531675 A5 JP2009531675 A5 JP 2009531675A5 JP 2009501869 A JP2009501869 A JP 2009501869A JP 2009501869 A JP2009501869 A JP 2009501869A JP 2009531675 A5 JP2009531675 A5 JP 2009531675A5
- Authority
- JP
- Japan
- Prior art keywords
- scale
- carrier
- electrode
- voltage
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 claims description 25
- 238000005259 measurement Methods 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 7
- 239000002241 glass-ceramic Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 11
- 239000003989 dielectric material Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 8
- 230000008901 benefit Effects 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000006094 Zerodur Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000005411 Van der Waals force Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 241000669003 Aspidiotus destructor Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 241000668842 Lepidosaphes gloverii Species 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006014789.8 | 2006-03-29 | ||
| DE102006014789 | 2006-03-29 | ||
| PCT/EP2007/000404 WO2007112796A1 (de) | 2006-03-29 | 2007-01-18 | Verfahren zum halten eines massstabs an einem träger sowie anordnung mit einem träger und einem massstab |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009531675A JP2009531675A (ja) | 2009-09-03 |
| JP2009531675A5 true JP2009531675A5 (https=) | 2012-03-29 |
| JP4982554B2 JP4982554B2 (ja) | 2012-07-25 |
Family
ID=37891991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009501869A Active JP4982554B2 (ja) | 2006-03-29 | 2007-01-18 | 担持体にスケールを保持するための方法ならびに担持体とスケールを備えた組立体 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7549234B2 (https=) |
| EP (1) | EP2002216B1 (https=) |
| JP (1) | JP4982554B2 (https=) |
| CN (1) | CN101416031A (https=) |
| WO (1) | WO2007112796A1 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7707739B2 (en) * | 2005-11-04 | 2010-05-04 | Dr. Johannes Heidenhain Gmbh | Method for attaching a scale to a carrier, a scale, and carrier having a scale |
| DE102008043353A1 (de) * | 2008-10-31 | 2010-05-06 | Dr. Johannes Heidenhain Gmbh | Längenmesseinrichtung |
| JP5162800B2 (ja) * | 2009-03-24 | 2013-03-13 | 株式会社ミツトヨ | リニアスケール |
| DE102009044917A1 (de) * | 2009-09-23 | 2011-04-07 | Dr. Johannes Heidenhain Gmbh | Längenmesseinrichtung |
| DE102009047120A1 (de) * | 2009-11-25 | 2011-05-26 | Dr. Johannes Heidenhain Gmbh | Anordnung mit einem an einem Träger befestigten Maßstab |
| DE102011079446A1 (de) | 2011-07-20 | 2013-02-07 | Robert Bosch Gmbh | Sensoreinrichtung, insbesondere für die Verwendung in einem Kraftfahrzeug |
| CN103322900B (zh) * | 2013-06-21 | 2016-02-03 | 深圳市华星光电技术有限公司 | 一种靶材的刻蚀量测装置及量测方法 |
| TWI656596B (zh) * | 2014-08-26 | 2019-04-11 | Asml Holding N. V. | 靜電夾具及其製造方法 |
| DE102016201088A1 (de) * | 2016-01-26 | 2017-07-27 | Dr. Johannes Heidenhain Gmbh | Verfahren zum Bearbeiten einer Maßverkörperung |
| DE102019206523A1 (de) | 2019-05-07 | 2020-11-12 | Zf Friedrichshafen Ag | Leistungsmodul mit gehäusten Leistungshalbleitern zur steuerbaren elektrischen Leistungsversorgung eines Verbrauchers |
| EP3892962B1 (de) | 2020-04-08 | 2023-03-08 | Dr. Johannes Heidenhain GmbH | Anordnung für eine positionsmessung |
| WO2023076359A1 (en) * | 2021-10-28 | 2023-05-04 | Entegris, Inc. | Electrostatic chuck that includes upper ceramic layer that includes a dielectric layer, and related methods and structures |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3635511A1 (de) * | 1986-10-18 | 1988-04-28 | Zeiss Carl Fa | Halterung fuer mass- und formverkoerperung |
| EP0288613A1 (en) | 1987-05-01 | 1988-11-02 | Agfa-Gevaert N.V. | Electrostatic holder |
| JPH0814485B2 (ja) * | 1988-01-25 | 1996-02-14 | 株式会社ミツトヨ | スケール精度測定装置及び測定方法 |
| DE3929629A1 (de) * | 1989-09-06 | 1991-03-07 | Zeiss Carl Fa | Laengen- oder winkelmesseinrichtung |
| DE19512892C2 (de) * | 1995-04-06 | 1998-11-05 | Heidenhain Gmbh Dr Johannes | Positionsmeßeinrichtung |
| US5838529A (en) * | 1995-12-22 | 1998-11-17 | Lam Research Corporation | Low voltage electrostatic clamp for substrates such as dielectric substrates |
| DE19854318A1 (de) * | 1998-11-25 | 2000-05-31 | Heidenhain Gmbh Dr Johannes | Längenmeßeinrichtung |
| US6772531B1 (en) * | 1999-11-30 | 2004-08-10 | Renishaw Plc | Measurement apparatus including a track for a measurement scale and apparatus for tensioning the scale |
| US7289212B2 (en) | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| JP2003036573A (ja) * | 2001-07-26 | 2003-02-07 | Pioneer Electronic Corp | ディスク原盤製造装置 |
| US6867377B2 (en) * | 2000-12-26 | 2005-03-15 | Emcore Corporation | Apparatus and method of using flexible printed circuit board in optical transceiver device |
| DE10153147A1 (de) | 2001-10-27 | 2003-05-08 | Zeiss Carl | Verfahren zum Aufbringen eines Maßstabes auf einen Träger |
| US6754062B2 (en) * | 2002-02-27 | 2004-06-22 | Praxair S.T. Technology, Inc. | Hybrid ceramic electrostatic clamp |
| JP4024600B2 (ja) * | 2002-06-25 | 2007-12-19 | 株式会社ミツトヨ | 枠多点固定タイプのユニット型直線変位測定装置、及び、その固定方法 |
| US8043797B2 (en) * | 2004-10-12 | 2011-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7196770B2 (en) * | 2004-12-07 | 2007-03-27 | Asml Netherlands B.V. | Prewetting of substrate before immersion exposure |
| WO2007008792A2 (en) * | 2005-07-08 | 2007-01-18 | Nexgensemi Holdings Corporation | Apparatus and method for controlled particle beam manufacturing |
| US7707739B2 (en) * | 2005-11-04 | 2010-05-04 | Dr. Johannes Heidenhain Gmbh | Method for attaching a scale to a carrier, a scale, and carrier having a scale |
| US7804582B2 (en) * | 2006-07-28 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
-
2007
- 2007-01-18 EP EP07702852.0A patent/EP2002216B1/de active Active
- 2007-01-18 CN CNA2007800124892A patent/CN101416031A/zh active Pending
- 2007-01-18 WO PCT/EP2007/000404 patent/WO2007112796A1/de not_active Ceased
- 2007-01-18 JP JP2009501869A patent/JP4982554B2/ja active Active
- 2007-03-08 US US11/715,637 patent/US7549234B2/en active Active
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