DE19853588B4 - Halteeinrichtung für ein Substrat - Google Patents

Halteeinrichtung für ein Substrat Download PDF

Info

Publication number
DE19853588B4
DE19853588B4 DE19853588A DE19853588A DE19853588B4 DE 19853588 B4 DE19853588 B4 DE 19853588B4 DE 19853588 A DE19853588 A DE 19853588A DE 19853588 A DE19853588 A DE 19853588A DE 19853588 B4 DE19853588 B4 DE 19853588B4
Authority
DE
Germany
Prior art keywords
support plate
substrate
support
exposure
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19853588A
Other languages
German (de)
English (en)
Other versions
DE19853588A1 (de
Inventor
Gerhard Dipl.-Phys. Schubert
Ulf-Carsten Dipl.-Phys. Kirschstein
Stefan Dipl.-Ing. Risse
Gerd Dipl.-Ing. Harnisch
Gerhard Dr. Kalkowski
Volker Dr. Guyenot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Electron Beam GmbH
Vistec Lithography Ltd
Original Assignee
Vistec Electron Beam GmbH
Vistec Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE19853588A priority Critical patent/DE19853588B4/de
Application filed by Vistec Electron Beam GmbH, Vistec Lithography Ltd filed Critical Vistec Electron Beam GmbH
Priority to PCT/DE1999/003638 priority patent/WO2000031774A2/de
Priority to US09/600,630 priority patent/US6426860B1/en
Priority to EP99963248A priority patent/EP1050070B1/de
Priority to JP2000584509A priority patent/JP4499293B2/ja
Priority to DE59912677T priority patent/DE59912677D1/de
Priority to TW088120041A priority patent/TW452674B/zh
Publication of DE19853588A1 publication Critical patent/DE19853588A1/de
Application granted granted Critical
Publication of DE19853588B4 publication Critical patent/DE19853588B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE19853588A 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat Expired - Fee Related DE19853588B4 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE19853588A DE19853588B4 (de) 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat
US09/600,630 US6426860B1 (en) 1998-11-20 1999-11-16 Holding device for a substrate
EP99963248A EP1050070B1 (de) 1998-11-20 1999-11-16 Belichtungsanlage mit halteeinrichtung für ein substrat
JP2000584509A JP4499293B2 (ja) 1998-11-20 1999-11-16 基板支持装置
PCT/DE1999/003638 WO2000031774A2 (de) 1998-11-20 1999-11-16 Halteeinrichtung für ein substrat
DE59912677T DE59912677D1 (de) 1998-11-20 1999-11-16 Belichtungsanlage mit halteeinrichtung für ein substrat
TW088120041A TW452674B (en) 1998-11-20 1999-11-17 Holding device for a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19853588A DE19853588B4 (de) 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat

Publications (2)

Publication Number Publication Date
DE19853588A1 DE19853588A1 (de) 2000-06-21
DE19853588B4 true DE19853588B4 (de) 2005-04-21

Family

ID=7888462

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19853588A Expired - Fee Related DE19853588B4 (de) 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat
DE59912677T Expired - Lifetime DE59912677D1 (de) 1998-11-20 1999-11-16 Belichtungsanlage mit halteeinrichtung für ein substrat

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE59912677T Expired - Lifetime DE59912677D1 (de) 1998-11-20 1999-11-16 Belichtungsanlage mit halteeinrichtung für ein substrat

Country Status (6)

Country Link
US (1) US6426860B1 (https=)
EP (1) EP1050070B1 (https=)
JP (1) JP4499293B2 (https=)
DE (2) DE19853588B4 (https=)
TW (1) TW452674B (https=)
WO (1) WO2000031774A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10057292C2 (de) * 2000-11-17 2003-02-13 Leica Microsystems Vorrichtung zum Aufnehmen von Mirodissektaten
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
US7154731B1 (en) * 2003-07-18 2006-12-26 Novellus Systems, Inc. Reflective coating for electrostatic chucks
US20060194516A1 (en) * 2005-01-31 2006-08-31 Tokyo Electron Limited Processing apparatus and processing method
JP5635240B2 (ja) * 2009-03-17 2014-12-03 株式会社ニューフレアテクノロジー 校正ブロック及び荷電粒子ビーム描画装置
JP5807242B2 (ja) * 2009-11-09 2015-11-10 株式会社ブイ・テクノロジー マスク保持機構
CN110268108B (zh) 2016-12-12 2022-09-06 埃克切拉生物科学公司 用于使用微毛细管阵列进行筛选的方法和系统
US11085039B2 (en) 2016-12-12 2021-08-10 xCella Biosciences, Inc. Methods and systems for screening using microcapillary arrays
EP3562796B1 (en) 2016-12-30 2023-04-19 Xcella Biosciences, Inc. Multi-stage sample recovery system
ES3039910T3 (en) 2018-12-06 2025-10-27 Xcella Biosciences Inc Lateral loading of microcapillary arrays
EP4533531A1 (en) * 2022-05-27 2025-04-09 Entegris, Inc. Reticle container having magnetic particle capture
CN115309004B (zh) * 2022-08-09 2023-04-11 上海图双精密装备有限公司 一种多尺寸兼容光刻机的传输系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5535090A (en) * 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295430A (ja) * 1986-06-16 1987-12-22 Toshiba Corp 縦形移動テ−ブル
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JP3027165B2 (ja) * 1990-05-17 2000-03-27 キヤノン株式会社 位置決め装置
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
US5883778A (en) * 1994-02-28 1999-03-16 Applied Materials, Inc. Electrostatic chuck with fluid flow regulator
JPH07273383A (ja) * 1994-03-30 1995-10-20 Canon Inc 真空封入式圧電アクチュエータおよび該真空封入式圧電アクチュエータを用いた位置決め装置
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
JP3551423B2 (ja) * 1995-03-14 2004-08-04 株式会社ニコン 露光装置
JPH08288372A (ja) * 1995-04-11 1996-11-01 Nippon Pillar Packing Co Ltd ウエハ支持プレート
JP3274791B2 (ja) * 1995-07-28 2002-04-15 株式会社日立製作所 電子線描画装置
JP3596127B2 (ja) * 1995-12-04 2004-12-02 ソニー株式会社 静電チャック、薄板保持装置、半導体製造装置、搬送方法及び半導体の製造方法
US5644137A (en) 1996-03-04 1997-07-01 Waggener; Herbert A. Stabilizing support mechanism for electron beam apparatus
JPH09266166A (ja) * 1996-03-28 1997-10-07 Nikon Corp 露光装置
JPH1050604A (ja) * 1996-04-04 1998-02-20 Nikon Corp 位置管理方法及び位置合わせ方法
JPH09283398A (ja) * 1996-04-09 1997-10-31 Nikon Corp 試料台、反射鏡保持装置及び露光装置
JP3709904B2 (ja) * 1996-11-14 2005-10-26 株式会社ニコン 投影露光装置
JPH1080468A (ja) * 1996-09-09 1998-03-31 Sanden Corp 手指消毒器
JP3832681B2 (ja) * 1997-03-19 2006-10-11 株式会社ニコン ステージ装置及び該装置を備えた露光装置
JPH11251409A (ja) * 1998-03-02 1999-09-17 Nikon Corp 位置決め装置、及び露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
US5535090A (en) * 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus

Also Published As

Publication number Publication date
US6426860B1 (en) 2002-07-30
WO2000031774A3 (de) 2000-11-23
TW452674B (en) 2001-09-01
EP1050070A2 (de) 2000-11-08
JP4499293B2 (ja) 2010-07-07
EP1050070B1 (de) 2005-10-19
EP1050070A3 (de) 2002-09-11
DE19853588A1 (de) 2000-06-21
JP2002530880A (ja) 2002-09-17
DE59912677D1 (de) 2005-11-24
WO2000031774A2 (de) 2000-06-02

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee