JP4499293B2 - 基板支持装置 - Google Patents

基板支持装置 Download PDF

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Publication number
JP4499293B2
JP4499293B2 JP2000584509A JP2000584509A JP4499293B2 JP 4499293 B2 JP4499293 B2 JP 4499293B2 JP 2000584509 A JP2000584509 A JP 2000584509A JP 2000584509 A JP2000584509 A JP 2000584509A JP 4499293 B2 JP4499293 B2 JP 4499293B2
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JP
Japan
Prior art keywords
substrate
support plate
support
support device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000584509A
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English (en)
Japanese (ja)
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JP2002530880A (ja
JP2002530880A5 (https=
Inventor
シューベルト、ゲルハルト
キルシュシュタイン、ウルフ−カルステン
リッセ、シュテファン
ハルニッシュ、ゲルト
カルコヴスキー、ゲルハルト
グイエノット、フォルカー
Original Assignee
ヴィステック エレクトロン ビーム ゲーエムべーハー
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Publication date
Application filed by ヴィステック エレクトロン ビーム ゲーエムべーハー filed Critical ヴィステック エレクトロン ビーム ゲーエムべーハー
Publication of JP2002530880A publication Critical patent/JP2002530880A/ja
Publication of JP2002530880A5 publication Critical patent/JP2002530880A5/ja
Application granted granted Critical
Publication of JP4499293B2 publication Critical patent/JP4499293B2/ja
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2000584509A 1998-11-20 1999-11-16 基板支持装置 Expired - Fee Related JP4499293B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19853588.0 1998-11-20
DE19853588A DE19853588B4 (de) 1998-11-20 1998-11-20 Halteeinrichtung für ein Substrat
PCT/DE1999/003638 WO2000031774A2 (de) 1998-11-20 1999-11-16 Halteeinrichtung für ein substrat

Publications (3)

Publication Number Publication Date
JP2002530880A JP2002530880A (ja) 2002-09-17
JP2002530880A5 JP2002530880A5 (https=) 2009-03-26
JP4499293B2 true JP4499293B2 (ja) 2010-07-07

Family

ID=7888462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000584509A Expired - Fee Related JP4499293B2 (ja) 1998-11-20 1999-11-16 基板支持装置

Country Status (6)

Country Link
US (1) US6426860B1 (https=)
EP (1) EP1050070B1 (https=)
JP (1) JP4499293B2 (https=)
DE (2) DE19853588B4 (https=)
TW (1) TW452674B (https=)
WO (1) WO2000031774A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10057292C2 (de) * 2000-11-17 2003-02-13 Leica Microsystems Vorrichtung zum Aufnehmen von Mirodissektaten
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
US7154731B1 (en) * 2003-07-18 2006-12-26 Novellus Systems, Inc. Reflective coating for electrostatic chucks
US20060194516A1 (en) * 2005-01-31 2006-08-31 Tokyo Electron Limited Processing apparatus and processing method
JP5635240B2 (ja) * 2009-03-17 2014-12-03 株式会社ニューフレアテクノロジー 校正ブロック及び荷電粒子ビーム描画装置
JP5807242B2 (ja) * 2009-11-09 2015-11-10 株式会社ブイ・テクノロジー マスク保持機構
CN110268108B (zh) 2016-12-12 2022-09-06 埃克切拉生物科学公司 用于使用微毛细管阵列进行筛选的方法和系统
US11085039B2 (en) 2016-12-12 2021-08-10 xCella Biosciences, Inc. Methods and systems for screening using microcapillary arrays
EP3562796B1 (en) 2016-12-30 2023-04-19 Xcella Biosciences, Inc. Multi-stage sample recovery system
ES3039910T3 (en) 2018-12-06 2025-10-27 Xcella Biosciences Inc Lateral loading of microcapillary arrays
EP4533531A1 (en) * 2022-05-27 2025-04-09 Entegris, Inc. Reticle container having magnetic particle capture
CN115309004B (zh) * 2022-08-09 2023-04-11 上海图双精密装备有限公司 一种多尺寸兼容光刻机的传输系统

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295430A (ja) * 1986-06-16 1987-12-22 Toshiba Corp 縦形移動テ−ブル
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JP3027165B2 (ja) * 1990-05-17 2000-03-27 キヤノン株式会社 位置決め装置
JP3238925B2 (ja) * 1990-11-17 2001-12-17 株式会社東芝 静電チャック
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
US5883778A (en) * 1994-02-28 1999-03-16 Applied Materials, Inc. Electrostatic chuck with fluid flow regulator
US5535090A (en) * 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
JPH07273383A (ja) * 1994-03-30 1995-10-20 Canon Inc 真空封入式圧電アクチュエータおよび該真空封入式圧電アクチュエータを用いた位置決め装置
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus
JP3551423B2 (ja) * 1995-03-14 2004-08-04 株式会社ニコン 露光装置
JPH08288372A (ja) * 1995-04-11 1996-11-01 Nippon Pillar Packing Co Ltd ウエハ支持プレート
JP3274791B2 (ja) * 1995-07-28 2002-04-15 株式会社日立製作所 電子線描画装置
JP3596127B2 (ja) * 1995-12-04 2004-12-02 ソニー株式会社 静電チャック、薄板保持装置、半導体製造装置、搬送方法及び半導体の製造方法
US5644137A (en) 1996-03-04 1997-07-01 Waggener; Herbert A. Stabilizing support mechanism for electron beam apparatus
JPH09266166A (ja) * 1996-03-28 1997-10-07 Nikon Corp 露光装置
JPH1050604A (ja) * 1996-04-04 1998-02-20 Nikon Corp 位置管理方法及び位置合わせ方法
JPH09283398A (ja) * 1996-04-09 1997-10-31 Nikon Corp 試料台、反射鏡保持装置及び露光装置
JP3709904B2 (ja) * 1996-11-14 2005-10-26 株式会社ニコン 投影露光装置
JPH1080468A (ja) * 1996-09-09 1998-03-31 Sanden Corp 手指消毒器
JP3832681B2 (ja) * 1997-03-19 2006-10-11 株式会社ニコン ステージ装置及び該装置を備えた露光装置
JPH11251409A (ja) * 1998-03-02 1999-09-17 Nikon Corp 位置決め装置、及び露光装置

Also Published As

Publication number Publication date
US6426860B1 (en) 2002-07-30
WO2000031774A3 (de) 2000-11-23
TW452674B (en) 2001-09-01
EP1050070A2 (de) 2000-11-08
EP1050070B1 (de) 2005-10-19
EP1050070A3 (de) 2002-09-11
DE19853588A1 (de) 2000-06-21
JP2002530880A (ja) 2002-09-17
DE19853588B4 (de) 2005-04-21
DE59912677D1 (de) 2005-11-24
WO2000031774A2 (de) 2000-06-02

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