JP2002515820A - 微量流体処理システム - Google Patents
微量流体処理システムInfo
- Publication number
- JP2002515820A JP2002515820A JP50690697A JP50690697A JP2002515820A JP 2002515820 A JP2002515820 A JP 2002515820A JP 50690697 A JP50690697 A JP 50690697A JP 50690697 A JP50690697 A JP 50690697A JP 2002515820 A JP2002515820 A JP 2002515820A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- substrate
- channels
- treatment system
- outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Hematology (AREA)
- Organic Chemistry (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 1以上のチャネルが内部に集積的に形成された基板を備え、 前記1以上のチャネルは、前記1以上のチャネル内を前記基板から外部の分 析および/または収集システムに向けて通過する微少量の流体試料の移送に適用 される1以上の出口に終結する ことを特徴とする微量流体処理システム。 2. 前記1以上のチャネルは、前記基板の1以上の面に延長されることを特 徴とする請求項1の微量流体処理システム。 3. 前記基板は、単一面内に複数のチャネルを備えることを特徴とする請求 項1の微量流体処理システム。 4. 前記基板は、複数の前記面を備えることを特徴とする請求項3の微量流 体処理システム。 5. 前記1以上の出口の少なくとも1つは、前記1以上のチャネルが通過す る面とは異なる面に配設されていることを特徴とする請求項1の微量流体処理シ ステム。 6. 前記基板は、光学的勾配材料であることを特徴とする請求項1の微量流 体処理システム。 7. 前記基板は、非導電性材料であることを特徴とする請求項1の微量流体 処理システム。 8. 前記基板は、導電性材料であることを特徴とする請求項1の微量流体処 理システム。 9. 前記基板は、廃棄可能な材料であることを特徴とする請求項1の微量流 体処理システム。 10. 2つの前記出口の間の前記基板の表面部分は、凹んでいることを特徴と する請求項1の微量流体処理システム。 11. 前記チャネルの2以上は、前記1以上の出口の1つに終結していること を特徴とする請求項1の微量流体処理システム。 12. 前記1以上の出口の少なくとも1つは、前記流体試料を外部の分析およ び/または収集デバイスにスプレイ移送させるために適用されることを特徴とす る請求項1の微量流体処理システム。 13. 前記1以上の出口の少なくとも1つは、前記流体試料を外部の分析およ び/または収集デバイスにエレクトロスプレイ移送させるためのエレクトロスプ レイ出口として構成されていることを特徴とする請求項12の微量流体処理シス テム。 14. 前記出口は、気圧式または超音波式噴霧を伴うスプレイを行うように構 成されていることを特徴とする請求項12の微量流体処理システム。 15. 前記エレクトロスプレイ出口は、前記1以上のチャネルに集積的に組み 立てられていることを特徴とする請求項13の微量流体処理システム。 16. 前記エレクトロスプレイ出口は、前記基板から分離して組み立てられ、 そして前記1以上のチャネルの端部に固着されていることを特徴とする請求項1 3の微量流体処理システム。 17. 前記1以上の出口の少なくとも1つは、大気圧−化学イオン化による前 記流体試料の移送に適用されることを特徴とする請求項1の微量流体処理システ ム。 18. 前記1以上の出口の少なくとも1つは、マトリクス支援レーザ脱離イオ ン化による前記流体試料の移送に適用されることを特徴とする請求項1の微量流 体処理システム。 19. 前記基板の前記1以上のチャネルに隣接する領域は、微量流体試料の試 料化学または微小準備または分析操作を導入するために、および流体試料を前記 領域から前記1以上のチャネル内に移送するために適用されることを特徴とする 請求項1の微量流体処理システム。 20. 前記基板に固着され、流体を前記1以上のチャネル内に移送するために 適用される貯蔵器または入り口を更に備えることを特徴とする請求項1の微量流 体処理システム。 21. 前記1以上の出口の回りの前記基板の表面の部分は、前記1以上の出口 に出て行く前記流体試料によって表面が湿ることを防止する材料で被覆されてい ることを特徴とする請求項1の微量流体処理システム。 22. 前記基板は、表面が湿らない材料であることを特徴とする請求項1の微 量流体処理システム。 23. 前記1以上の出口に隣接する前記1以上のチャネルの内部は、前記エレ クトロスプレイ出口の中に形成されていることを特徴とする請求項13の微量流 体処理システム。 24. 前記エレクトロスプレイ出口は、金属で被覆されていることを特徴とす る請求項13の微量流体処理システム。 25. 前記1以上のチャネルの1つの内部表面は、前記基板とは異なる材料で 被覆されていることを特徴とする請求項1の微量流体処理システム。 26. 1以上の出口で終結する1以上のチャネルを集積化した基板を提供する ステップと、 前記1以上のチャネルの1つに流体試料を供給するステップと、 前記チャネル内で前記流体試料を前記出口の方向に通過させるステップと、 前記チャネルの前記出口を通して前記基板から前記流体試料を出し、そして 前記基板から離れた外部の分析および/または収集システムに移送するステップ と を備えることを特徴とする微少量の流体を処理するための方法。 27. 前記出口は、前記基板から前記外部の分析および/または収集システム に向けて出て行く前記流体試料をスプレイするように構成されていることを特徴 とする請求項26の方法。 28. 前記分析および/または収集システムは質量分析器であり、そして前記 出口は、前記微量流体処理システムと前記質量分析器との間のエレクトロスプレ イ・インターフェースとして構成されていることを特徴とする請求項27の方法 。 29. 前記出口は、圧搾空気式または超音波式噴霧を伴うスプレイを行うよう に構成されていることを特徴とする請求項27の方法。 30. 前記分析および/または収集システムは質量分析器であり、そして前記 出口は、大気圧−化学イオン化により前記流体試料を前記質量分析器に移送する ように構成されていることを特徴とする請求項26の方法。 31. 前記出口は、前記基板から前記外部の分析および/または収集システム に向けて出て行く前記流体試料を、マトリクス支援レーザ脱離イオン化によりス プレイするように構成されていることを特徴とする請求項26の方法。 32. 前記外部の分析および/または収集システムは、レーザ誘起蛍光による 検出用であることを特徴とする請求項26の方法。 33. 前記流体試料を前記基板から出て行かせるステップにおいて、前記微量 流体処理システムは、前記外部分析および/または収集システムに対し静止して いることを特徴とする請求項26の方法。 34. 前記流体試料を前記基板から出て行かせるステップにおいて、前記微量 流体処理システムは、前記外部分析および/または収集システムに対し移動する ことを特徴とする請求項26の方法。 35. 前記流体試料を前記基板から出て行かせるステップに先行して、前記流 体試料または前記流体試料の成分は、前記チャネル内で検出されることを特徴と する請求項26の方法。 36. 前記基板は、流体試料を前記試料の成分に分離するためのデバイスを更 に備え、前記方法は、前記試料を前記試料の成分に分離するためのステップを更 に備えることを特徴とする請求項26の方法。 37. 前記流体試料を前記試料の成分に分離するためのデバイスは、前記基板 内に集積化されていることを特徴とする請求項36の方法。 38. 前記流体試料を前記試料の成分に分離するためのデバイスは、前記基板 に取り外し可能に結合されていることを特徴とする請求項36の方法。 39. 前記1以上のチャネルの前記1つは、流体試料を前記試料の成分に分離 するためのデバイスを備えていることを特徴とする請求項36の方法。 40. 前記基板は、試料の温浸を生起させるためのデバイスを更に備え、前記 方法は、前記試料を温浸するステップを更に備えることを特徴とする請求項26 の方法。 41. 前記基板は、試料を脱塩するためのデバイスを更に備え、前記方法は、 前記試料を脱塩するステップを更に備えることを特徴とする請求項26の方法。 42. 前記基板は、試料を予備濃縮するためのデバイスを更に備え、前記方法 は、前記試料を予備濃縮するステップを更に備えることを特徴とする請求項26 の方法。 43. 前記基板は、試料に親和力結合するためのデバイスを更に備え、前記方 法は、前記試料を親和力結合するステップを更に備えることを特徴とする請求項 26の方法。 44. 前記基板は、試料をサイズ排除クロマトグラフィするためのデバイスを 更に備え、前記方法は、前記試料をサイズ排除クロマトグラフィするステップを 更に備えることを特徴とする請求項26の方法。
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US134995P | 1995-07-21 | 1995-07-21 | |
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US08/675,177 | 1996-07-03 | ||
US08/675,177 US5872010A (en) | 1995-07-21 | 1996-07-03 | Microscale fluid handling system |
PCT/US1996/011985 WO1997004297A1 (en) | 1995-07-21 | 1996-07-19 | Microscale fluid handling system |
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JP2002515820A true JP2002515820A (ja) | 2002-05-28 |
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US (1) | US5872010A (ja) |
EP (1) | EP0840886B1 (ja) |
JP (1) | JP4489187B2 (ja) |
AT (1) | ATE463732T1 (ja) |
CA (1) | CA2227331C (ja) |
DE (1) | DE69638159D1 (ja) |
WO (1) | WO1997004297A1 (ja) |
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- 1996-07-19 CA CA002227331A patent/CA2227331C/en not_active Expired - Lifetime
- 1996-07-19 AT AT96926099T patent/ATE463732T1/de active
- 1996-07-19 WO PCT/US1996/011985 patent/WO1997004297A1/en active Application Filing
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Also Published As
Publication number | Publication date |
---|---|
CA2227331C (en) | 2002-04-02 |
US5872010A (en) | 1999-02-16 |
JP4489187B2 (ja) | 2010-06-23 |
EP0840886A1 (en) | 1998-05-13 |
DE69638159D1 (de) | 2010-05-20 |
EP0840886A4 (en) | 2005-12-21 |
EP0840886B1 (en) | 2010-04-07 |
WO1997004297A1 (en) | 1997-02-06 |
CA2227331A1 (en) | 1997-02-06 |
ATE463732T1 (de) | 2010-04-15 |
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