JP2002512647A - 黒色着色された組織化高分子量材料 - Google Patents
黒色着色された組織化高分子量材料Info
- Publication number
- JP2002512647A JP2002512647A JP54232198A JP54232198A JP2002512647A JP 2002512647 A JP2002512647 A JP 2002512647A JP 54232198 A JP54232198 A JP 54232198A JP 54232198 A JP54232198 A JP 54232198A JP 2002512647 A JP2002512647 A JP 2002512647A
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- hydrogen
- formula
- independently
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
- G03C7/04—Additive processes using colour screens; Materials therefor; Preparing or processing such materials
- G03C7/06—Manufacture of colour screens
- G03C7/10—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots
- G03C7/12—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots by photo-exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B29/00—Monoazo dyes prepared by diazotising and coupling
- C09B29/32—Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
- C09B29/33—Aceto- or benzoylacetylarylides
- C09B29/335—Aceto- or benzoylacetylarylides free of acid groups
- C09B29/338—Heterocyclic arylides, e.g. acetoacetylaminobenzimidazolone
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B33/00—Disazo and polyazo dyes of the types A->K<-B, A->B->K<-C, or the like, prepared by diazotising and coupling
- C09B33/02—Disazo dyes
- C09B33/153—Disazo dyes in which the coupling component is a bis-(aceto-acetyl amide) or a bis-(benzoyl-acetylamide)
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B35/00—Disazo and polyazo dyes of the type A<-D->B prepared by diazotising and coupling
- C09B35/02—Disazo dyes
- C09B35/021—Disazo dyes characterised by two coupling components of the same type
- C09B35/035—Disazo dyes characterised by two coupling components of the same type in which the coupling component containing an activated methylene group
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0077—Preparations with possibly reduced vat, sulfur or indigo dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Optical Filters (AREA)
- Indole Compounds (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH82397 | 1997-04-09 | ||
| CH822/97 | 1997-04-09 | ||
| CH823/97 | 1997-04-09 | ||
| CH82297 | 1997-04-09 | ||
| CH157397 | 1997-06-30 | ||
| CH1573/97 | 1997-06-30 | ||
| CH289697 | 1997-12-16 | ||
| CH2896/97 | 1997-12-16 | ||
| PCT/EP1998/001800 WO1998045757A1 (en) | 1997-04-09 | 1998-03-26 | Black-pigmented structured high molecular weight material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002512647A true JP2002512647A (ja) | 2002-04-23 |
| JP2002512647A5 JP2002512647A5 (enExample) | 2005-11-10 |
Family
ID=27428013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54232198A Withdrawn JP2002512647A (ja) | 1997-04-09 | 1998-03-26 | 黒色着色された組織化高分子量材料 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6010567A (enExample) |
| EP (1) | EP0974075B1 (enExample) |
| JP (1) | JP2002512647A (enExample) |
| KR (1) | KR20010006127A (enExample) |
| CN (1) | CN1161655C (enExample) |
| AU (1) | AU7211498A (enExample) |
| DE (1) | DE69807203T2 (enExample) |
| WO (1) | WO1998045757A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006282804A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | 可溶性顔料前駆体および有機顔料の製造方法 |
| JP2007308709A (ja) * | 1999-07-09 | 2007-11-29 | Ciba Specialty Chem Holding Inc | 改善された色特性を有する顔料及びその製造方法 |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69418826T2 (de) * | 1993-11-22 | 1999-10-21 | Ciba Specialty Chemicals Holding Inc., Basel | Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung |
| US6026207A (en) * | 1997-05-21 | 2000-02-15 | Alcatel | Black appearing color coating for optical fiber and method using same |
| US6444807B1 (en) | 1998-09-21 | 2002-09-03 | Ciba Specialty Chemicals Corporation | Substituted phthalocyanine |
| US6423839B1 (en) * | 1999-04-16 | 2002-07-23 | Ciba Specialty Chemicals Corporation | Mixed color pigment precursors and their use |
| KR100455652B1 (ko) | 1999-09-06 | 2004-11-06 | 삼성전자주식회사 | 포지티브형 포토레지스트 막의 제조방법 |
| EP1487925A1 (en) * | 2002-03-25 | 2004-12-22 | Ciba SC Holding AG | Black pigment compositions |
| DE10303913A1 (de) * | 2003-01-31 | 2004-08-12 | Quiss Gmbh | Identifizierungsvorrichtung |
| CN1813034A (zh) * | 2003-06-27 | 2006-08-02 | 西巴特殊化学品控股有限公司 | 具有高储存密度的光学记录材料 |
| US7077898B2 (en) * | 2003-07-17 | 2006-07-18 | Ciba Specialty Chemicals Corporation | Black pigment compositions |
| CN100379205C (zh) * | 2003-08-11 | 2008-04-02 | 华为技术有限公司 | 交换机加速arp表项老化的方法 |
| US20110009536A1 (en) * | 2006-12-14 | 2011-01-13 | Ciba Corporation | C.i. pigment violet 37 in rod-like form |
| GB0722779D0 (en) * | 2007-11-20 | 2008-01-02 | Sterix Ltd | Compound |
| JP2010083982A (ja) | 2008-09-30 | 2010-04-15 | Fujifilm Corp | 有機顔料微粒子の製造方法、それにより得られる有機顔料微粒子、その分散液、及びその組成物 |
| EP2350161B1 (en) | 2008-10-31 | 2018-11-21 | Basf Se | Diketopyrrolopyrrole polymers for use in organic field effect transistors |
| WO2010136353A1 (en) | 2009-05-27 | 2010-12-02 | Basf Se | Diketopyrrolopyrrole polymers for use in organic semiconductor devices |
| CN102892807A (zh) | 2010-05-19 | 2013-01-23 | 巴斯夫欧洲公司 | 用于有机半导体器件的二酮基吡咯并吡咯聚合物 |
| WO2012017005A2 (en) | 2010-08-05 | 2012-02-09 | Basf Se | Polymers based on benzodiones |
| JP6165135B2 (ja) | 2011-06-22 | 2017-07-19 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 有機半導体素子内で使用するためのジケトピロロピロールオリゴマー |
| US8544990B2 (en) | 2011-07-29 | 2013-10-01 | Videojet Technologies Inc. | Pigmented ink jet ink composition |
| US9209412B2 (en) | 2011-09-02 | 2015-12-08 | Basf Se | Diketopyrrolopyrrole oligomers and compositions, comprising diketopyrrolopyrrole oligomers |
| KR102030860B1 (ko) | 2011-10-04 | 2019-11-08 | 바스프 에스이 | 벤조디온 기재 중합체 |
| KR20150082473A (ko) | 2012-11-07 | 2015-07-15 | 바스프 에스이 | 나프토디온 기재 중합체 |
| JP6162984B2 (ja) * | 2013-03-14 | 2017-07-12 | 山本化成株式会社 | 感熱発色性組成物及び該組成物を用いてなる感熱記録材料 |
| CN103451998B (zh) * | 2013-09-18 | 2015-12-09 | 潍坊恒联特种纸有限公司 | 一种彩色无尘纸表面施胶染色工艺 |
| PT3772529T (pt) * | 2019-08-05 | 2023-07-18 | Sanko Tekstil Isletmeleri San Ve Tic As | Corantes sensíveis ao ph para materiais têxteis, um processo para a sua preparação e utilizações dos mesmos |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5268245A (en) * | 1992-07-09 | 1993-12-07 | Polaroid Corporation | Process for forming a filter on a solid state imager |
| EP0648770B1 (de) * | 1993-10-13 | 2000-05-17 | Ciba SC Holding AG | Pyrrolo[3,4-c]pyrrole |
| EP0648817B1 (de) * | 1993-10-13 | 1999-11-10 | Ciba SC Holding AG | Neue Fluoreszenzfarbstoffe |
| EP0654711B1 (en) * | 1993-11-22 | 1999-06-02 | Ciba SC Holding AG | Compositions for making structured color images and application thereof |
| DE69418826T2 (de) * | 1993-11-22 | 1999-10-21 | Ciba Specialty Chemicals Holding Inc., Basel | Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung |
| DE69507874T2 (de) * | 1994-12-26 | 1999-07-29 | Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa | Bildschirm und Verfahren zur Herstellung desselben |
| TW472072B (en) * | 1995-05-12 | 2002-01-11 | Ciba Sc Holding Ag | Process for colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors |
| DE69632168T2 (de) * | 1995-05-12 | 2004-08-12 | Ciba Specialty Chemicals Holding Inc. | Verfahren zum Färben von hochmolekularen organischen Kunststoffen in der Masse mit löslichen phthalocyaninen Precursoren |
| EP0742255B1 (en) * | 1995-05-12 | 2004-04-14 | Ciba SC Holding AG | Colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors |
| EP0761772B1 (de) * | 1995-07-28 | 2000-03-15 | Ciba SC Holding AG | Lösliche Chromophore mit leicht abspaltbaren löslichmachenden Gruppen |
| EP0968250B1 (en) * | 1997-01-27 | 2001-04-18 | Ciba SC Holding AG | Soluble chromophores having improved solubilising groups |
| KR20010014330A (ko) * | 1997-06-30 | 2001-02-26 | 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 | C.i. 안료 레드 222를 함유하는 안료 분산제 |
-
1998
- 1998-03-26 AU AU72114/98A patent/AU7211498A/en not_active Abandoned
- 1998-03-26 EP EP98919165A patent/EP0974075B1/en not_active Expired - Lifetime
- 1998-03-26 DE DE69807203T patent/DE69807203T2/de not_active Expired - Fee Related
- 1998-03-26 CN CNB988040328A patent/CN1161655C/zh not_active Expired - Fee Related
- 1998-03-26 WO PCT/EP1998/001800 patent/WO1998045757A1/en not_active Ceased
- 1998-03-26 JP JP54232198A patent/JP2002512647A/ja not_active Withdrawn
- 1998-03-26 KR KR1019997009205A patent/KR20010006127A/ko not_active Abandoned
- 1998-04-08 US US09/057,090 patent/US6010567A/en not_active Expired - Fee Related
-
1999
- 1999-08-17 US US09/376,188 patent/US6165681A/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007308709A (ja) * | 1999-07-09 | 2007-11-29 | Ciba Specialty Chem Holding Inc | 改善された色特性を有する顔料及びその製造方法 |
| JP2006282804A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | 可溶性顔料前駆体および有機顔料の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0974075A1 (en) | 2000-01-26 |
| EP0974075B1 (en) | 2002-08-14 |
| DE69807203T2 (de) | 2003-05-28 |
| AU7211498A (en) | 1998-10-30 |
| US6010567A (en) | 2000-01-04 |
| KR20010006127A (ko) | 2001-01-26 |
| CN1252135A (zh) | 2000-05-03 |
| CN1161655C (zh) | 2004-08-11 |
| DE69807203D1 (de) | 2002-09-19 |
| WO1998045757A1 (en) | 1998-10-15 |
| US6165681A (en) | 2000-12-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050328 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050328 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20051018 |