CN1161655C - 构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法 - Google Patents

构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法 Download PDF

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Publication number
CN1161655C
CN1161655C CNB988040328A CN98804032A CN1161655C CN 1161655 C CN1161655 C CN 1161655C CN B988040328 A CNB988040328 A CN B988040328A CN 98804032 A CN98804032 A CN 98804032A CN 1161655 C CN1161655 C CN 1161655C
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CN
China
Prior art keywords
alkyl
material according
pigments
hydrogen
pigment
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Expired - Fee Related
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CNB988040328A
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English (en)
Chinese (zh)
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CN1252135A (zh
Inventor
U�����
U·谢德利
E·廷格莱
-
V·哈尔-古勒
G·德基策尔
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BASF Schweiz AG
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Ciba Spezialitaetenchemie Holding AG
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Publication of CN1252135A publication Critical patent/CN1252135A/zh
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/04Additive processes using colour screens; Materials therefor; Preparing or processing such materials
    • G03C7/06Manufacture of colour screens
    • G03C7/10Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots
    • G03C7/12Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots by photo-exposure
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00Monoazo dyes prepared by diazotising and coupling
    • C09B29/32Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
    • C09B29/33Aceto- or benzoylacetylarylides
    • C09B29/335Aceto- or benzoylacetylarylides free of acid groups
    • C09B29/338Heterocyclic arylides, e.g. acetoacetylaminobenzimidazolone
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B33/00Disazo and polyazo dyes of the types A->K<-B, A->B->K<-C, or the like, prepared by diazotising and coupling
    • C09B33/02Disazo dyes
    • C09B33/153Disazo dyes in which the coupling component is a bis-(aceto-acetyl amide) or a bis-(benzoyl-acetylamide)
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B35/00Disazo and polyazo dyes of the type A<-D->B prepared by diazotising and coupling
    • C09B35/02Disazo dyes
    • C09B35/021Disazo dyes characterised by two coupling components of the same type
    • C09B35/035Disazo dyes characterised by two coupling components of the same type in which the coupling component containing an activated methylene group
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0077Preparations with possibly reduced vat, sulfur or indigo dyes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Indole Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
CNB988040328A 1997-04-09 1998-03-26 构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法 Expired - Fee Related CN1161655C (zh)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
CH822/1997 1997-04-09
CH82297 1997-04-09
CH823/1997 1997-04-09
CH82397 1997-04-09
CH157397 1997-06-30
CH1573/1997 1997-06-30
CH289697 1997-12-16
CH2896/1997 1997-12-16

Publications (2)

Publication Number Publication Date
CN1252135A CN1252135A (zh) 2000-05-03
CN1161655C true CN1161655C (zh) 2004-08-11

Family

ID=27428013

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB988040328A Expired - Fee Related CN1161655C (zh) 1997-04-09 1998-03-26 构造的着色有机材料、按图形掩蔽的方法和制备图形黑色基质的方法

Country Status (8)

Country Link
US (2) US6010567A (enExample)
EP (1) EP0974075B1 (enExample)
JP (1) JP2002512647A (enExample)
KR (1) KR20010006127A (enExample)
CN (1) CN1161655C (enExample)
AU (1) AU7211498A (enExample)
DE (1) DE69807203T2 (enExample)
WO (1) WO1998045757A1 (enExample)

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DE69418826T2 (de) * 1993-11-22 1999-10-21 Ciba Specialty Chemicals Holding Inc., Basel Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung
US6026207A (en) * 1997-05-21 2000-02-15 Alcatel Black appearing color coating for optical fiber and method using same
US6444807B1 (en) 1998-09-21 2002-09-03 Ciba Specialty Chemicals Corporation Substituted phthalocyanine
US6423839B1 (en) 1999-04-16 2002-07-23 Ciba Specialty Chemicals Corporation Mixed color pigment precursors and their use
WO2001004215A2 (en) * 1999-07-09 2001-01-18 Ciba Specialty Chemicals Holding Inc. Pigments having improved colouristic properties and process for their preparation
KR100455652B1 (ko) 1999-09-06 2004-11-06 삼성전자주식회사 포지티브형 포토레지스트 막의 제조방법
AU2003223967A1 (en) * 2002-03-25 2003-10-08 Ciba Specialty Chemicals Holding Inc. Black pigment compositions
DE10303913A1 (de) * 2003-01-31 2004-08-12 Quiss Gmbh Identifizierungsvorrichtung
US20080130474A1 (en) * 2003-06-27 2008-06-05 Beat Schmidhalter Optical Recording Materials Having High Stroage Density
WO2005014727A1 (en) * 2003-07-17 2005-02-17 Ciba Specialty Chemicals Holding Inc. Black pigment compositions
CN100379205C (zh) * 2003-08-11 2008-04-02 华为技术有限公司 交换机加速arp表项老化的方法
JP4621528B2 (ja) * 2005-03-31 2011-01-26 富士フイルム株式会社 可溶性顔料前駆体および有機顔料の製造方法
US20110009536A1 (en) * 2006-12-14 2011-01-13 Ciba Corporation C.i. pigment violet 37 in rod-like form
GB0722779D0 (en) 2007-11-20 2008-01-02 Sterix Ltd Compound
JP2010083982A (ja) 2008-09-30 2010-04-15 Fujifilm Corp 有機顔料微粒子の製造方法、それにより得られる有機顔料微粒子、その分散液、及びその組成物
CN107099023B (zh) 2008-10-31 2019-10-22 巴斯夫欧洲公司 用于有机场效应晶体管的二酮吡咯并吡咯聚合物
BRPI1011853A2 (pt) 2009-05-27 2019-09-24 Basf Se polímero, material, camada ou componente semicondutores orgânicos, dispositivo semicondutor, processos para a preparação de um dispositivo semicondutor orgânico, e de um polímero, e, uso do polímero e/ou do material, camada ou componente semicondutores orgãnicos.
WO2011144566A2 (en) 2010-05-19 2011-11-24 Basf Se Diketopyrrolopyrrole polymers for use in organic semiconductor devices
WO2012017005A2 (en) 2010-08-05 2012-02-09 Basf Se Polymers based on benzodiones
CN103619855B (zh) 2011-06-22 2017-08-08 巴斯夫欧洲公司 用于有机半导体器件的二酮基吡咯并吡咯低聚物
US8544990B2 (en) 2011-07-29 2013-10-01 Videojet Technologies Inc. Pigmented ink jet ink composition
US9209412B2 (en) 2011-09-02 2015-12-08 Basf Se Diketopyrrolopyrrole oligomers and compositions, comprising diketopyrrolopyrrole oligomers
EP2764034B1 (en) 2011-10-04 2023-08-30 CLAP Co., Ltd. Polymers based on benzodiones
WO2014072292A2 (en) 2012-11-07 2014-05-15 Basf Se Polymers based on naphthodiones
JP6162984B2 (ja) * 2013-03-14 2017-07-12 山本化成株式会社 感熱発色性組成物及び該組成物を用いてなる感熱記録材料
CN103451998B (zh) * 2013-09-18 2015-12-09 潍坊恒联特种纸有限公司 一种彩色无尘纸表面施胶染色工艺
ES2948010T3 (es) * 2019-08-05 2023-08-25 Sanko Tekstil Isletmeleri San Ve Tic As Tintes sensibles al pH para materiales textiles, un proceso para su preparación y usos de los mismos

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US5268245A (en) * 1992-07-09 1993-12-07 Polaroid Corporation Process for forming a filter on a solid state imager
EP0648770B1 (de) * 1993-10-13 2000-05-17 Ciba SC Holding AG Pyrrolo[3,4-c]pyrrole
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JP2002514263A (ja) * 1997-06-30 2002-05-14 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 微細顔料分散体を製造する方法

Also Published As

Publication number Publication date
CN1252135A (zh) 2000-05-03
EP0974075B1 (en) 2002-08-14
AU7211498A (en) 1998-10-30
WO1998045757A1 (en) 1998-10-15
JP2002512647A (ja) 2002-04-23
DE69807203D1 (de) 2002-09-19
US6010567A (en) 2000-01-04
KR20010006127A (ko) 2001-01-26
US6165681A (en) 2000-12-26
DE69807203T2 (de) 2003-05-28
EP0974075A1 (en) 2000-01-26

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