JP2002139451A - 表面検査装置 - Google Patents

表面検査装置

Info

Publication number
JP2002139451A
JP2002139451A JP2001215211A JP2001215211A JP2002139451A JP 2002139451 A JP2002139451 A JP 2002139451A JP 2001215211 A JP2001215211 A JP 2001215211A JP 2001215211 A JP2001215211 A JP 2001215211A JP 2002139451 A JP2002139451 A JP 2002139451A
Authority
JP
Japan
Prior art keywords
light
inspection
illumination
image
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001215211A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002139451A5 (https=
Inventor
Takeo Omori
健雄 大森
Kazuhiko Fukazawa
和彦 深澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001215211A priority Critical patent/JP2002139451A/ja
Priority to US09/918,476 priority patent/US6693293B2/en
Priority to KR10-2001-0046602A priority patent/KR100403189B1/ko
Priority to TW90119015A priority patent/TW500919B/zh
Publication of JP2002139451A publication Critical patent/JP2002139451A/ja
Publication of JP2002139451A5 publication Critical patent/JP2002139451A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2001215211A 2000-08-04 2001-07-16 表面検査装置 Pending JP2002139451A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001215211A JP2002139451A (ja) 2000-08-04 2001-07-16 表面検査装置
US09/918,476 US6693293B2 (en) 2000-08-04 2001-08-01 Surface inspection apparatus using radiation or light
KR10-2001-0046602A KR100403189B1 (ko) 2000-08-04 2001-08-01 표면검사장치
TW90119015A TW500919B (en) 2000-08-04 2001-08-03 Surface inspection apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-236774 2000-08-04
JP2000236774 2000-08-04
JP2001215211A JP2002139451A (ja) 2000-08-04 2001-07-16 表面検査装置

Publications (2)

Publication Number Publication Date
JP2002139451A true JP2002139451A (ja) 2002-05-17
JP2002139451A5 JP2002139451A5 (https=) 2008-07-10

Family

ID=26597364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001215211A Pending JP2002139451A (ja) 2000-08-04 2001-07-16 表面検査装置

Country Status (4)

Country Link
US (1) US6693293B2 (https=)
JP (1) JP2002139451A (https=)
KR (1) KR100403189B1 (https=)
TW (1) TW500919B (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006138836A (ja) * 2004-10-14 2006-06-01 Disco Abrasive Syst Ltd 被加工物形状認識装置
JP2007040915A (ja) * 2005-08-05 2007-02-15 Toppan Printing Co Ltd 周期構造の欠陥測定装置
JP2010237048A (ja) * 2009-03-31 2010-10-21 Advanced Mask Inspection Technology Kk パターン検査装置およびパターン検査方法

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI285738B (en) * 2000-09-26 2007-08-21 Olympus Corp Defect detecting apparatus and computer readable medium
US7016525B2 (en) * 2002-05-02 2006-03-21 Mitutoyo Corporation Systems and methods for continuously varying wavelength illumination
EP1464920B1 (de) * 2003-04-03 2007-07-25 Erwin Pristner Vorrichtung zum Erfassen, Bestimmen und Dokumentieren von Schäden, insbesondere durch plötzliche Ereignisse verursachte Deformationen an lackierten Oberflächen
TW200540939A (en) * 2004-04-22 2005-12-16 Olympus Corp Defect inspection device and substrate manufacturing system using the same
US7991242B2 (en) 2005-05-11 2011-08-02 Optosecurity Inc. Apparatus, method and system for screening receptacles and persons, having image distortion correction functionality
US20070041613A1 (en) * 2005-05-11 2007-02-22 Luc Perron Database of target objects suitable for use in screening receptacles or people and method and apparatus for generating same
EP1886257A1 (en) * 2005-05-11 2008-02-13 Optosecurity Inc. Method and system for screening luggage items, cargo containers or persons
JP4778755B2 (ja) * 2005-09-09 2011-09-21 株式会社日立ハイテクノロジーズ 欠陥検査方法及びこれを用いた装置
CN101184988A (zh) * 2005-12-14 2008-05-21 株式会社尼康 表面检测设备及表面检测方法
CA2584683A1 (en) * 2006-04-20 2007-10-20 Optosecurity Inc. Apparatus, method and system for screening receptacles and persons
US7899232B2 (en) * 2006-05-11 2011-03-01 Optosecurity Inc. Method and apparatus for providing threat image projection (TIP) in a luggage screening system, and luggage screening system implementing same
JP4251193B2 (ja) * 2006-05-23 2009-04-08 コニカミノルタセンシング株式会社 反射特性測定装置
US8494210B2 (en) * 2007-03-30 2013-07-23 Optosecurity Inc. User interface for use in security screening providing image enhancement capabilities and apparatus for implementing same
US7990546B2 (en) * 2007-07-16 2011-08-02 Applied Materials Israel, Ltd. High throughput across-wafer-variation mapping
US7903250B1 (en) * 2008-06-09 2011-03-08 Kla-Tencor Corporation Control by sample reflectivity
US8724882B2 (en) * 2008-07-29 2014-05-13 Applied Materials Israel, Ltd. Mapping variations of a surface
KR101493133B1 (ko) * 2009-07-01 2015-02-12 가부시키가이샤 니콘 노광 상태 평가 방법 및 노광 상태 평가 장치
NL2004949A (en) * 2009-08-21 2011-02-22 Asml Netherlands Bv Inspection method and apparatus.
US9111331B2 (en) 2011-09-07 2015-08-18 Rapiscan Systems, Inc. X-ray inspection system that integrates manifest data with imaging/detection processing
KR101376831B1 (ko) * 2012-03-27 2014-03-20 삼성전기주식회사 표면결함 검사방법
AT513747B1 (de) 2013-02-28 2014-07-15 Mikroelektronik Ges Mit Beschränkter Haftung Ab Bestückungsverfahren für Schaltungsträger und Schaltungsträger
US9299374B2 (en) * 2014-07-15 2016-03-29 International Business Machines Corporation Dynamically optimizing read performance by adjusting servo-based head location
PL3764281T3 (pl) 2016-02-22 2025-02-10 Rapiscan Systems, Inc. Sposoby identyfikacji broni palnej na obrazach radiograficznych
WO2018213971A1 (zh) * 2017-05-22 2018-11-29 深圳配天智能技术研究院有限公司 一种视觉检测参数的确定方法、视觉检测设备以及视觉检测系统
CN112147710B (zh) * 2019-06-26 2022-02-18 上海微电子装备（集团）股份有限公司 一种湿法光胶装置的检测方法及检测装置
US12163438B2 (en) * 2022-08-11 2024-12-10 Rtx Corporation Detection of gas turbine engine blade abnormalities based on light reflections
US20250044235A1 (en) * 2023-07-31 2025-02-06 Kabushiki Kaisha Toshiba Optical apparatus, optical inspection apparatus, optical inspection method, and non-transitory storage medium storing optical inspection program

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02216035A (ja) * 1989-02-16 1990-08-28 Fujitsu Ltd 微粒子の検出方法
JPH0854346A (ja) * 1994-08-17 1996-02-27 Hitachi Ltd 異物検査方法および異物検査装置
JPH0961365A (ja) * 1995-08-22 1997-03-07 Olympus Optical Co Ltd 表面欠陥検査装置
JPH10232122A (ja) * 1997-02-19 1998-09-02 Nikon Corp 欠陥検査装置
JPH11166901A (ja) * 1997-12-03 1999-06-22 Nikon Corp 検査装置及び方法
JPH11344447A (ja) * 1998-06-03 1999-12-14 Hitachi Ltd 光学式欠陥検査装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030830A (en) * 1976-01-05 1977-06-21 Atlantic Research Corporation Process and apparatus for sensing defects on a smooth surface
JP3099451B2 (ja) * 1991-09-30 2000-10-16 松下電器産業株式会社 異物検査装置
JPH0694642A (ja) * 1992-09-16 1994-04-08 Kawasaki Steel Corp 表面欠陥検査方法および装置
JP3021266B2 (ja) * 1994-01-31 2000-03-15 新日本製鐵株式会社 光学式鋼板表面検査装置
JPH085573A (ja) 1994-06-16 1996-01-12 Sumitomo Kinzoku Ceramics:Kk ワーク表面の検査装置と検査方法
AU8127498A (en) * 1997-07-10 1999-02-08 Nikon Corporation Device and method for inspecting surface
KR100267665B1 (ko) * 1997-08-28 2001-01-15 하나와 요시카즈 표면검사장치
JP3610837B2 (ja) * 1998-09-18 2005-01-19 株式会社日立製作所 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2000028535A (ja) 1999-05-11 2000-01-28 Nidek Co Ltd 欠陥検査装置
JP4470239B2 (ja) * 1999-07-29 2010-06-02 株式会社ニコン 欠陥検出方法および装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02216035A (ja) * 1989-02-16 1990-08-28 Fujitsu Ltd 微粒子の検出方法
JPH0854346A (ja) * 1994-08-17 1996-02-27 Hitachi Ltd 異物検査方法および異物検査装置
JPH0961365A (ja) * 1995-08-22 1997-03-07 Olympus Optical Co Ltd 表面欠陥検査装置
JPH10232122A (ja) * 1997-02-19 1998-09-02 Nikon Corp 欠陥検査装置
JPH11166901A (ja) * 1997-12-03 1999-06-22 Nikon Corp 検査装置及び方法
JPH11344447A (ja) * 1998-06-03 1999-12-14 Hitachi Ltd 光学式欠陥検査装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006138836A (ja) * 2004-10-14 2006-06-01 Disco Abrasive Syst Ltd 被加工物形状認識装置
JP2007040915A (ja) * 2005-08-05 2007-02-15 Toppan Printing Co Ltd 周期構造の欠陥測定装置
JP2010237048A (ja) * 2009-03-31 2010-10-21 Advanced Mask Inspection Technology Kk パターン検査装置およびパターン検査方法

Also Published As

Publication number Publication date
KR100403189B1 (ko) 2003-10-23
US6693293B2 (en) 2004-02-17
US20020017620A1 (en) 2002-02-14
KR20020012133A (ko) 2002-02-15
TW500919B (en) 2002-09-01

Similar Documents

Publication Publication Date Title
JP2002139451A (ja) 表面検査装置
JP4778755B2 (ja) 欠陥検査方法及びこれを用いた装置
US6762831B2 (en) Method and apparatus for inspecting defects
KR101656045B1 (ko) 웨이퍼 검사 시스템 및 방법
US20110141272A1 (en) Apparatus and method for inspecting an object surface defect
JP2005536732A (ja) 物体を検査するための装置及び方法
JP3729156B2 (ja) パターン欠陥検出方法およびその装置
WO2010021214A1 (ja) パターン欠陥検査装置および方法
JP2009283633A (ja) 表面検査装置及び表面検査方法
TWI817991B (zh) 光學系統，照明模組及自動光學檢測系統
JP4632564B2 (ja) 表面欠陥検査装置
US8223328B2 (en) Surface inspecting apparatus and surface inspecting method
JPH11166901A (ja) 検査装置及び方法
JP5288672B2 (ja) 表面欠陥検査装置
JP2005274156A (ja) 欠陥検査装置
JP4162319B2 (ja) 欠陥検査装置
JP4506723B2 (ja) 表面検査装置
JP2010230611A (ja) パターン欠陥検査装置および方法
JP4622933B2 (ja) 表面検査方法及び表面検査装置
JP2010107465A (ja) 欠陥検査装置及び欠陥検査方法
JP2006220578A (ja) 表面検査装置
JP2006313143A (ja) ムラ検査装置およびムラ検査方法
JP2004061371A (ja) 欠陥検査装置および欠陥検査方法
JP3428772B2 (ja) 表面検査装置
JP2005221458A (ja) 膜厚分布検査方法および装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080526

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080528

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100820

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100827

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101014

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101217

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110506