KR100403189B1 - 표면검사장치 - Google Patents

표면검사장치 Download PDF

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Publication number
KR100403189B1
KR100403189B1 KR10-2001-0046602A KR20010046602A KR100403189B1 KR 100403189 B1 KR100403189 B1 KR 100403189B1 KR 20010046602 A KR20010046602 A KR 20010046602A KR 100403189 B1 KR100403189 B1 KR 100403189B1
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KR
South Korea
Prior art keywords
light
specular reflection
inspection
optical system
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR10-2001-0046602A
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English (en)
Korean (ko)
Other versions
KR20020012133A (ko
Inventor
오오모리다께오
후까자와가즈히꼬
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20020012133A publication Critical patent/KR20020012133A/ko
Application granted granted Critical
Publication of KR100403189B1 publication Critical patent/KR100403189B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR10-2001-0046602A 2000-08-04 2001-08-01 표면검사장치 Expired - Lifetime KR100403189B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2000-00236774 2000-08-04
JP2000236774 2000-08-04
JPJP-P-2001-00215211 2001-07-16
JP2001215211A JP2002139451A (ja) 2000-08-04 2001-07-16 表面検査装置

Publications (2)

Publication Number Publication Date
KR20020012133A KR20020012133A (ko) 2002-02-15
KR100403189B1 true KR100403189B1 (ko) 2003-10-23

Family

ID=26597364

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-0046602A Expired - Lifetime KR100403189B1 (ko) 2000-08-04 2001-08-01 표면검사장치

Country Status (4)

Country Link
US (1) US6693293B2 (https=)
JP (1) JP2002139451A (https=)
KR (1) KR100403189B1 (https=)
TW (1) TW500919B (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI285738B (en) * 2000-09-26 2007-08-21 Olympus Corp Defect detecting apparatus and computer readable medium
US7016525B2 (en) * 2002-05-02 2006-03-21 Mitutoyo Corporation Systems and methods for continuously varying wavelength illumination
EP1464920B1 (de) * 2003-04-03 2007-07-25 Erwin Pristner Vorrichtung zum Erfassen, Bestimmen und Dokumentieren von Schäden, insbesondere durch plötzliche Ereignisse verursachte Deformationen an lackierten Oberflächen
TW200540939A (en) * 2004-04-22 2005-12-16 Olympus Corp Defect inspection device and substrate manufacturing system using the same
JP4728061B2 (ja) * 2004-10-14 2011-07-20 株式会社ディスコ 被加工物形状認識装置
US7991242B2 (en) 2005-05-11 2011-08-02 Optosecurity Inc. Apparatus, method and system for screening receptacles and persons, having image distortion correction functionality
US20070041613A1 (en) * 2005-05-11 2007-02-22 Luc Perron Database of target objects suitable for use in screening receptacles or people and method and apparatus for generating same
EP1886257A1 (en) * 2005-05-11 2008-02-13 Optosecurity Inc. Method and system for screening luggage items, cargo containers or persons
JP4661441B2 (ja) * 2005-08-05 2011-03-30 凸版印刷株式会社 周期構造の欠陥測定装置
JP4778755B2 (ja) * 2005-09-09 2011-09-21 株式会社日立ハイテクノロジーズ 欠陥検査方法及びこれを用いた装置
CN101184988A (zh) * 2005-12-14 2008-05-21 株式会社尼康 表面检测设备及表面检测方法
CA2584683A1 (en) * 2006-04-20 2007-10-20 Optosecurity Inc. Apparatus, method and system for screening receptacles and persons
US7899232B2 (en) * 2006-05-11 2011-03-01 Optosecurity Inc. Method and apparatus for providing threat image projection (TIP) in a luggage screening system, and luggage screening system implementing same
JP4251193B2 (ja) * 2006-05-23 2009-04-08 コニカミノルタセンシング株式会社 反射特性測定装置
US8494210B2 (en) * 2007-03-30 2013-07-23 Optosecurity Inc. User interface for use in security screening providing image enhancement capabilities and apparatus for implementing same
US7990546B2 (en) * 2007-07-16 2011-08-02 Applied Materials Israel, Ltd. High throughput across-wafer-variation mapping
US7903250B1 (en) * 2008-06-09 2011-03-08 Kla-Tencor Corporation Control by sample reflectivity
US8724882B2 (en) * 2008-07-29 2014-05-13 Applied Materials Israel, Ltd. Mapping variations of a surface
JP4922334B2 (ja) * 2009-03-31 2012-04-25 株式会社東芝 パターン検査装置およびパターン検査方法
KR101493133B1 (ko) * 2009-07-01 2015-02-12 가부시키가이샤 니콘 노광 상태 평가 방법 및 노광 상태 평가 장치
NL2004949A (en) * 2009-08-21 2011-02-22 Asml Netherlands Bv Inspection method and apparatus.
US9111331B2 (en) 2011-09-07 2015-08-18 Rapiscan Systems, Inc. X-ray inspection system that integrates manifest data with imaging/detection processing
KR101376831B1 (ko) * 2012-03-27 2014-03-20 삼성전기주식회사 표면결함 검사방법
AT513747B1 (de) 2013-02-28 2014-07-15 Mikroelektronik Ges Mit Beschränkter Haftung Ab Bestückungsverfahren für Schaltungsträger und Schaltungsträger
US9299374B2 (en) * 2014-07-15 2016-03-29 International Business Machines Corporation Dynamically optimizing read performance by adjusting servo-based head location
PL3764281T3 (pl) 2016-02-22 2025-02-10 Rapiscan Systems, Inc. Sposoby identyfikacji broni palnej na obrazach radiograficznych
WO2018213971A1 (zh) * 2017-05-22 2018-11-29 深圳配天智能技术研究院有限公司 一种视觉检测参数的确定方法、视觉检测设备以及视觉检测系统
CN112147710B (zh) * 2019-06-26 2022-02-18 上海微电子装备（集团）股份有限公司 一种湿法光胶装置的检测方法及检测装置
US12163438B2 (en) * 2022-08-11 2024-12-10 Rtx Corporation Detection of gas turbine engine blade abnormalities based on light reflections
US20250044235A1 (en) * 2023-07-31 2025-02-06 Kabushiki Kaisha Toshiba Optical apparatus, optical inspection apparatus, optical inspection method, and non-transitory storage medium storing optical inspection program

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030830A (en) * 1976-01-05 1977-06-21 Atlantic Research Corporation Process and apparatus for sensing defects on a smooth surface
JPH0587740A (ja) * 1991-09-30 1993-04-06 Matsushita Electric Ind Co Ltd 異物検査装置
JPH0694642A (ja) * 1992-09-16 1994-04-08 Kawasaki Steel Corp 表面欠陥検査方法および装置
JPH07218451A (ja) * 1994-01-31 1995-08-18 Nippon Steel Corp 光学式鋼板表面検査装置
JP2000155099A (ja) * 1998-09-18 2000-06-06 Hitachi Ltd 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2001041720A (ja) * 1999-07-29 2001-02-16 Nikon Corp 欠陥検出方法および装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02216035A (ja) * 1989-02-16 1990-08-28 Fujitsu Ltd 微粒子の検出方法
JPH085573A (ja) 1994-06-16 1996-01-12 Sumitomo Kinzoku Ceramics:Kk ワーク表面の検査装置と検査方法
JPH0854346A (ja) * 1994-08-17 1996-02-27 Hitachi Ltd 異物検査方法および異物検査装置
JP3668294B2 (ja) * 1995-08-22 2005-07-06 オリンパス株式会社 表面欠陥検査装置
JP3692685B2 (ja) * 1997-02-19 2005-09-07 株式会社ニコン 欠陥検査装置
AU8127498A (en) * 1997-07-10 1999-02-08 Nikon Corporation Device and method for inspecting surface
KR100267665B1 (ko) * 1997-08-28 2001-01-15 하나와 요시카즈 표면검사장치
JPH11166901A (ja) * 1997-12-03 1999-06-22 Nikon Corp 検査装置及び方法
JPH11344447A (ja) * 1998-06-03 1999-12-14 Hitachi Ltd 光学式欠陥検査装置
JP2000028535A (ja) 1999-05-11 2000-01-28 Nidek Co Ltd 欠陥検査装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030830A (en) * 1976-01-05 1977-06-21 Atlantic Research Corporation Process and apparatus for sensing defects on a smooth surface
JPH0587740A (ja) * 1991-09-30 1993-04-06 Matsushita Electric Ind Co Ltd 異物検査装置
JPH0694642A (ja) * 1992-09-16 1994-04-08 Kawasaki Steel Corp 表面欠陥検査方法および装置
JPH07218451A (ja) * 1994-01-31 1995-08-18 Nippon Steel Corp 光学式鋼板表面検査装置
JP2000155099A (ja) * 1998-09-18 2000-06-06 Hitachi Ltd 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
JP2001041720A (ja) * 1999-07-29 2001-02-16 Nikon Corp 欠陥検出方法および装置

Also Published As

Publication number Publication date
JP2002139451A (ja) 2002-05-17
US6693293B2 (en) 2004-02-17
US20020017620A1 (en) 2002-02-14
KR20020012133A (ko) 2002-02-15
TW500919B (en) 2002-09-01

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